EP2839059B1 - Procédé de fabrication d'un bain électrolytique pour la réalisation d'une sous-couche métallique à base de platine sur un substrat métallique. - Google Patents
Procédé de fabrication d'un bain électrolytique pour la réalisation d'une sous-couche métallique à base de platine sur un substrat métallique. Download PDFInfo
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- EP2839059B1 EP2839059B1 EP13722499.4A EP13722499A EP2839059B1 EP 2839059 B1 EP2839059 B1 EP 2839059B1 EP 13722499 A EP13722499 A EP 13722499A EP 2839059 B1 EP2839059 B1 EP 2839059B1
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- European Patent Office
- Prior art keywords
- solution
- platinum
- bath
- salt
- hpo
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims description 95
- 229910052697 platinum Inorganic materials 0.000 title claims description 45
- 239000000758 substrate Substances 0.000 title claims description 23
- 238000000034 method Methods 0.000 title claims description 18
- 239000000243 solution Substances 0.000 claims description 84
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 60
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 238000007254 oxidation reaction Methods 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 20
- 230000003647 oxidation Effects 0.000 claims description 19
- 239000003446 ligand Substances 0.000 claims description 17
- 150000003839 salts Chemical class 0.000 claims description 17
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 claims description 15
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 claims description 15
- 229910000388 diammonium phosphate Inorganic materials 0.000 claims description 15
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 claims description 11
- 235000019838 diammonium phosphate Nutrition 0.000 claims description 11
- 235000019837 monoammonium phosphate Nutrition 0.000 claims description 11
- 229910019142 PO4 Inorganic materials 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 10
- -1 amine compound Chemical class 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 239000007853 buffer solution Substances 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- GNFTZDOKVXKIBK-UHFFFAOYSA-N 3-(2-methoxyethoxy)benzohydrazide Chemical compound COCCOC1=CC=CC(C(=O)NN)=C1 GNFTZDOKVXKIBK-UHFFFAOYSA-N 0.000 claims description 2
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 239000003792 electrolyte Substances 0.000 claims 5
- 238000000151 deposition Methods 0.000 description 18
- 150000003057 platinum Chemical class 0.000 description 17
- 239000000203 mixture Substances 0.000 description 16
- 230000008021 deposition Effects 0.000 description 15
- 239000010410 layer Substances 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 13
- 239000000126 substance Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 239000000919 ceramic Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229910000601 superalloy Inorganic materials 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 5
- 238000005868 electrolysis reaction Methods 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-L Phosphate ion(2-) Chemical compound OP([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-L 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910000951 Aluminide Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- 150000003058 platinum compounds Chemical class 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- ZNZJJSYHZBXQSM-UHFFFAOYSA-N propane-2,2-diamine Chemical class CC(C)(N)N ZNZJJSYHZBXQSM-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- 229910000943 NiAl Inorganic materials 0.000 description 1
- 241000920340 Pion Species 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000005700 Putrescine Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 241001080024 Telles Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- BIGPRXCJEDHCLP-UHFFFAOYSA-N ammonium bisulfate Chemical compound [NH4+].OS([O-])(=O)=O BIGPRXCJEDHCLP-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 150000005829 chemical entities Chemical class 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- UQUPIHHYKUEXQD-UHFFFAOYSA-N n,n′-dimethyl-1,3-propanediamine Chemical compound CNCCCNC UQUPIHHYKUEXQD-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910000907 nickel aluminide Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010891 toxic waste Substances 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 235000011178 triphosphate Nutrition 0.000 description 1
- 239000001226 triphosphate Substances 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
Definitions
- the invention relates to a method of manufacturing an electrolytic bath for producing a platinum-based metal underlayer on a metal substrate.
- Such metal sub-layers belong in particular to a coating on a substrate consisting of a metal part called to withstand high mechanical and thermal stresses in operation, in particular a superalloy substrate.
- a thermomechanical part constitutes in particular an aeronautical or terrestrial turbine engine part. Said part may for example be a blade or a turbomachine turbine distributor and in particular in a high-pressure turbojet or turboprop turboprop turbine.
- the limit temperature of use of the superalloys is of the order of 1100 ° C, the temperature of the gases at the outlet of the combustion chamber or turbine inlet up to 1600 ° C.
- thermal barriers in aircraft engines has become widespread over the last thirty years and makes it possible to increase the inlet temperature of the gases in the turbines, to reduce the cooling air flow and thus improve the efficiency of the engines.
- this insulating coating makes it possible to create on a cooled part, in steady state of operation, a thermal gradient across the coating, whose total amplitude can exceed 100 ° C for a coating of about 150 to 200 microns thick. having a conductivity of 1.1 Wm -1 .K -1 .
- the operating temperature of the underlying metal forming the substrate for the coating is reduced by the same gradient, which results in significant gains in the necessary cooling air volume, the service life of the part and the specific consumption of the material. turbine engine.
- a thermal barrier comprising a yttria-stabilized zirconia-based ceramic layer, namely a yttria-containing zirconia comprising a molar content of yttrium oxide between 4 and 12% (especially between 6 and 8%), which has a coefficient of expansion different from the superalloy constituting the substrate and a relatively low thermal conductivity.
- zirconia-based ceramic layer partially stabilized with yttrium oxide for example Zr 0.92 Y 0.08 O 1.96 .
- a metal underlayer with a coefficient of expansion ideally close to the substrate, is generally interposed between the substrate of the part and the ceramic layer.
- the metal sub-layer firstly makes it possible to reduce the stresses due to the difference between the thermal expansion coefficients of the ceramic layer and the superalloy forming the substrate.
- This underlayer also provides adhesion between the substrate of the part and the ceramic layer, knowing that the adhesion between the underlayer and the substrate of the part is by inter-diffusion, and that the adhesion between the underlayer and the ceramic layer is made by mechanical anchoring and by the propensity of the underlayer to be developed at high temperature, at the ceramic / underlayer interface, a thin oxide layer which ensures the chemical contact with ceramics.
- this metal sub-layer ensures the protection of the superalloy of the part against corrosion and oxidation phenomena (the ceramic layer is permeable to oxygen).
- a sublayer consisting of a nickel aluminide comprising a metal selected from platinum, chromium, palladium, ruthenium, iridium, osmium, rhodium, or mixture of these metals and / or a reactive element selected from zirconium (Zr), cerium (Ce), lanthanum (La), titanium (Ti), tantalum (Ta), hafnium (Hf), silicon (Si) and yttrium (Y).
- Zr zirconium
- Ce cerium
- La lanthanum
- Ti titanium
- Ta tantalum
- Hf hafnium
- Si silicon
- Y yttrium
- a (Ni, Pt) Al type coating is used in which the platinum is inserted into the nickel network of the ⁇ -NiAl intermetallic compounds.
- platinum When developing thermal barriers, platinum has a dual role: it is a diffusion barrier to prevent the diffusion of aluminum from the layer to the substrate.
- platinum aluminide increases the corrosion resistance at high temperature and the adhesion of protective layers.
- platinum aluminide coatings rapidly degrade at 1100 ° C: there are phase transformations related to the inter-diffusion of the elements of the coating and the substrates.
- this metal sub-layer may consist of a NiPtAl platinum-modified nickel aluminide, according to a process comprising the following steps: the preparation of the surface of the part by chemical etching and sanding; depositing on the part, by electrolysis, a platinum coating (Pt); the possible heat treatment of the assembly to diffuse Pt in the room; aluminum deposition (Al) by chemical vapor deposition (CVD) or physical vapor deposition (PVD); the possible heat treatment of the assembly to diffuse Pt and Al in the room; the preparation of the surface of the formed metallic underlayer; and electron beam evaporation (EB-PVD) deposition of a ceramic coating.
- Pt platinum coating
- Al aluminum deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- EB-PVD electron beam evaporation
- the platinum is deposited electrolytically before the thermochemical treatment of aluminization in the vapor phase.
- electroplating reduces a complexed metal entity initially present in the solution by passing an electric current over a conductive part (the cathode). between an anode (electrode seat of an oxidation reaction) and a cathode on which deposition takes place (and on which other reduction reactions can take place simultaneously).
- the pH of these solutions can be basic, acidic or neutral.
- the compounds obtained after the extraction of platinum are ammonium hexachloroplatinate (IV): (NH 4 ) 2 PtCl 6 or potassium hexachloroplatinate (IV): K 2 PtCl 6 .
- the main platinum compounds present in the casting baths are derived from the transformation of these compounds.
- electroplating baths for depositing platinum have been proposed to date and include a number of chemical species in aqueous solution, giving the bath its properties.
- the present invention aims to provide an electrolytic bath for the deposition of platinum on a metal substrate, which electrolytic bath has an improvement in technical performance, including identical or almost identical parameters and deposition conditions regardless of the geometry of the piece, an identical or almost identical deposition rate regardless of the current density applied, a deposition quality in accordance with the specifications, and an improved service life.
- a complex resulting from the bond between an amino ligand and a platinum metal salt is preferred.
- a ligand without carbon chain and a single amine function NH 3 (ammonia) or a salt xNH 4 + or an X-NH 2 ammonium) or X is chosen either as inert molecule, spectator of the main reaction is as an interacting molecule in formulation reactions.
- the metal salt of the third system is chosen from platinum salts of oxidation state IV.
- This solution also has the additional advantage of allowing, in addition, to use platinum salts of oxidation degree IV, much more stable than platinum salts of oxidation state II.
- the first system, the second system and the fourth system are grouped into a single solution forming a first solution B.
- the third system forms a second solution A consisting of an aqueous solution with platinum, comprising sodium hydroxide (NaOH) and at least one platinum salt of degree of oxidation IV.
- a second solution A consisting of an aqueous solution with platinum, comprising sodium hydroxide (NaOH) and at least one platinum salt of degree of oxidation IV.
- the molar ratio between the amount of sodium hydroxide NaOH and the amount of platinum salt of oxidation degree IV is 2.
- a step f) is carried out during which said electrolytic bath is heated at a temperature of between 80 ° C. and 97 ° C. for at least two hours. then a step g) is carried out during which electroplating of a platinum deposit on a metal substrate is carried out with said electrolytic bath.
- the second solution A is added to the first solution B.
- the first solution B is brought to a temperature of 60 ° C.
- said oxidation state platinum salt IV is diammonium hexachloroplatinate of formula (NH 4 ) 2 PtCl 6 .
- said amine compound x p - (NH 4 ) + p comprises diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 and / or ammonium dihydrogen phosphate NH 4 H 2 PO 4 .
- the first system comprises diammonium hydrogenophosphate (NH 4 ) 2 HPO 4 and ammonium dihydrogen phosphate NH 4 H 2 PO 4 with a molar ratio of 2 between the amount of ammonium dihydrogen phosphate NH 4 H 2 PO 4 and the amount of diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 .
- said platinum salt of oxidation state IV is diammonium hexachloroplatinate of formula (NH 4 ) 2 PtCl 6 .
- the molar ratio between the amount of sodium hydroxide NaOH and the amount of platinum salt of oxidation degree IV is 2.
- said amine compound x p- (NH 4 ) + p comprises diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 and / or ammonium dihydrogen phosphate NH 4 H 2 PO 4 .
- the first solution B comprises diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 and ammonium dihydrogen phosphate NH 4 H 2 PO 4 with a molar ratio of 2 between the amount of ammonium dihydrogenophosphate NH 4 H 2 PO 4 and the amount of diammonium hydrogen phosphate (NH 4 ) 2 HPO 4 .
- the invention also relates to the electrolytic bath resulting from the manufacturing method according to the invention.
- Such an electrolytic bath for producing a platinum-based metal underlayer on a superalloying substrate is characterized in that it comprises a platinum amine complex of the wavelength of a Pt-NH bond. 3 or Pt-NH 2 and a buffer solution
- An electrolytic bath makes it possible to deposit the platinum in a way which is particularly ecological and economical (short time of realization, realization under atmospheric pressure avoiding the equipment of putting under vacuum) compared to techniques of deposition in vapor phase or thermal projection.
- this deposition method is compatible with pierced parts: the geometry of the current lines preventing significant deposition in the holes, in particular small cooling holes which are thus not obstructed.
- the bath formulation is made from four ingredients distributed between two separate solutions, A and B, heated and stirred separately to react the ingredients together in each solution, before mixing together the two solutions A and B.
- the mixture between the two solutions A and B is then itself heated and stirred. Once the heating time of the mixture A + B is respected, the platinum plating bath is ready for use for carrying out the electroplating.
- solution A comprises, inter alia, the platinum salt (s)
- solution B is the solution comprising, inter alia, ligands (it is recalled that a ligand is a chemical entity, ionic or molecular, bearing chemical functions allowing it to bind to one or more metallic entities, usually a cation, the association of a metallic entity with one or more ligands forming a soluble edifice in solution called complex).
- the pH of the mixture of solutions A + B is set between 6 and 10 and preferably between 6 and 7.
- T ° heating B (° C) Heating time B (h) T ° heater AB (° C) Heating time AB (h) 1 50 ° C 1:30 50 ° C 1 hour 2 50 ° C 4:30 85 ° C 3h 3 50 ° C 8h 95 ° C 8h 4 85 ° C 1:30 85 ° C 8h 5 85 ° C 4:30 95 ° C 1 hour 6 85 ° C 8h 50 ° C 3h 7 95 ° C 1:30 95 ° C 3h 8 95 ° C 4:30 50 ° C 8h 9 95 ° C 8h 85 ° C 1 hour
- pions are coated with platinum at different intensities. Each pawn is weighed before and after deposit.
- the bath of test 2 offers the following advantages:
- the bath of test 2 shows little loss of platinum over time ( Figure 1 C) and that the average efficiency ( Figure 2A ) and speed ( Figure 2B ) of the bath is almost identical after three successive regenerations.
- Concerning the platinum losses we encounter with the reference bath many platinum losses, mainly in the form of a platinum solid precipitate at the bottom of the tank.
- the baths according to the invention it is observed for the baths according to the invention that the platinum losses are lower and above all constant in time (constant with the electrolyses).
- the bath of test 2 is the one with less platinum losses, so the bath of test 2 is more economical from the economic point of view.
- the manufacture of the electrolytic bath is similar to that of the recipe of Example 1, except for the following points.
- Solution B comprises ammonium hydrogen sulphate of chemical formula (NH 4 ) 2 SO 4 in an amount of 43.5 g and diammonium sulphate of chemical formula NH 4 S O 4 in an amount of 76 g and water . The whole is brought to 50 ° C during 4:30.
- the pH of the mixture of solutions A + B is set between 1 and 5.
- the manufacture of the electrolytic bath is similar to that of the recipe of Example 1, except for the following points.
- Solution B contains ammonium acetate of chemical formula CH 3 COONH 4 in an amount of 102.4 g and acetic acid of chemical formula CH 3 COOH in an amount of 39.6 g.
- the whole is brought to 50 ° C during 4:30.
- the pH of the mixture of solutions A + B is set between 1 and 5.
- the ligand is chosen from aliphatic polyamines of 3 to 20 carbon atoms with a linear or branched carbon chain.
- the ligand is chosen from primary polyamines such as diaminopropanes such as 1,3-diaminopropane and 1,2-diaminopropane, diethylenetriamine, 1,4-diaminobutane and 1,6-diaminohexane; secondary polyamines such as N, N 'dimethyl-1,3-propanediamine; and tertiary polyamines such as N, N, N ', N' tetramethylethylenediamine.
- the ligands preferentially chosen are diaminopropanes.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
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Application Number | Priority Date | Filing Date | Title |
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FR1253599A FR2989694B1 (fr) | 2012-04-19 | 2012-04-19 | Procede de fabrication d'un bain electrolytique pour la realisation d'une sous-couche metallique a base de platine sur un substrat metallique |
PCT/FR2013/050855 WO2013156737A1 (fr) | 2012-04-19 | 2013-04-18 | Procede de fabrication d'un bain electrolytique pour la realisation d'une sous-couche metallique a base de platine sur un substrat metallique |
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EP2839059A1 EP2839059A1 (fr) | 2015-02-25 |
EP2839059B1 true EP2839059B1 (fr) | 2016-04-13 |
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EP13722499.4A Active EP2839059B1 (fr) | 2012-04-19 | 2013-04-18 | Procédé de fabrication d'un bain électrolytique pour la réalisation d'une sous-couche métallique à base de platine sur un substrat métallique. |
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US (1) | US9752243B2 (hr) |
EP (1) | EP2839059B1 (hr) |
JP (1) | JP6290179B2 (hr) |
CN (1) | CN104271811B (hr) |
BR (1) | BR112014026033B1 (hr) |
CA (1) | CA2870760C (hr) |
FR (1) | FR2989694B1 (hr) |
IN (1) | IN2014DN08735A (hr) |
RU (1) | RU2625923C2 (hr) |
WO (1) | WO2013156737A1 (hr) |
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CN104975312A (zh) * | 2015-07-30 | 2015-10-14 | 江苏金曼科技有限责任公司 | 一种延长镀液使用寿命的电镀方法 |
FR3058165B1 (fr) | 2016-10-27 | 2018-12-14 | Safran Aircraft Engines | Procede et dispositif de regeneration de bain de platine |
FR3066505B1 (fr) | 2017-05-16 | 2021-04-09 | Safran Aircraft Engines | Procede et dispositif ameliores de filtration de bain de platine par electrodialyse |
CN110894617A (zh) * | 2018-09-13 | 2020-03-20 | 深圳市永达锐国际科技有限公司 | 3d铂金电铸工艺方法 |
CN114214685A (zh) * | 2021-09-22 | 2022-03-22 | 湘潭大学 | 高温防护涂层及其制备方法与应用 |
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NL124423C (hr) * | 1963-03-20 | |||
US3285839A (en) * | 1963-12-16 | 1966-11-15 | American Chem & Refining Co | Method and bath for electroplating rhenium |
GB1431548A (en) * | 1972-09-21 | 1976-04-07 | Engelhard Ind Ltd | Electrodeposition of plantinum |
US4182724A (en) * | 1976-04-06 | 1980-01-08 | Rustenburg Platinum Mines Limited | Compositions containing platinum |
SU707382A1 (ru) * | 1978-05-30 | 2000-06-20 | Р.В. Джагацпанян | Электролит платинирования |
SU954527A1 (ru) * | 1980-12-30 | 1982-08-30 | Предприятие П/Я В-2287 | Электролит дл платинировани титана |
US4427502A (en) * | 1981-11-16 | 1984-01-24 | Bell Telephone Laboratories, Incorporated | Platinum and platinum alloy electroplating baths and processes |
GB8821005D0 (en) * | 1988-09-07 | 1988-10-05 | Johnson Matthey Plc | Improvements in plating |
US5041196A (en) * | 1989-12-26 | 1991-08-20 | Olin Corporation | Electrochemical method for producing chlorine dioxide solutions |
IL98550A (en) | 1990-06-29 | 1996-07-23 | Electroplating Eng | Baths for the investment of platinum and for the production of platinum products by electricity, methods for investing platinum and for the production of platinum products that use them and products produced by them |
JP2577832B2 (ja) * | 1990-06-29 | 1997-02-05 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 白金電鋳浴 |
JPH04333589A (ja) * | 1990-06-29 | 1992-11-20 | Electroplating Eng Of Japan Co | 高硬度白金材料の製造方法及びその高硬度白金材料 |
US5788823A (en) * | 1996-07-23 | 1998-08-04 | Howmet Research Corporation | Platinum modified aluminide diffusion coating and method |
GB2351089B (en) * | 1999-06-15 | 2001-04-18 | Hong Kong Productivity Council | Platinum electroforming/electroplating bath and method |
-
2012
- 2012-04-19 FR FR1253599A patent/FR2989694B1/fr active Active
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- 2013-04-18 EP EP13722499.4A patent/EP2839059B1/fr active Active
- 2013-04-18 IN IN8735DEN2014 patent/IN2014DN08735A/en unknown
- 2013-04-18 CA CA2870760A patent/CA2870760C/fr active Active
- 2013-04-18 WO PCT/FR2013/050855 patent/WO2013156737A1/fr active Application Filing
- 2013-04-18 CN CN201380023550.9A patent/CN104271811B/zh active Active
- 2013-04-18 RU RU2014146284A patent/RU2625923C2/ru active
- 2013-04-18 JP JP2015506292A patent/JP6290179B2/ja active Active
- 2013-04-18 US US14/395,190 patent/US9752243B2/en active Active
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Publication number | Publication date |
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US9752243B2 (en) | 2017-09-05 |
IN2014DN08735A (hr) | 2015-05-22 |
WO2013156737A1 (fr) | 2013-10-24 |
EP2839059A1 (fr) | 2015-02-25 |
CN104271811A (zh) | 2015-01-07 |
RU2625923C2 (ru) | 2017-07-19 |
CA2870760A1 (fr) | 2013-10-24 |
JP6290179B2 (ja) | 2018-03-07 |
FR2989694B1 (fr) | 2015-02-27 |
CA2870760C (fr) | 2021-02-23 |
US20150075996A1 (en) | 2015-03-19 |
BR112014026033A2 (pt) | 2017-06-27 |
RU2014146284A (ru) | 2016-06-10 |
JP2015514873A (ja) | 2015-05-21 |
CN104271811B (zh) | 2016-10-12 |
BR112014026033B1 (pt) | 2020-11-24 |
FR2989694A1 (fr) | 2013-10-25 |
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