EP2791259A1 - Siliconlöser - Google Patents
SiliconlöserInfo
- Publication number
- EP2791259A1 EP2791259A1 EP12795474.1A EP12795474A EP2791259A1 EP 2791259 A1 EP2791259 A1 EP 2791259A1 EP 12795474 A EP12795474 A EP 12795474A EP 2791259 A1 EP2791259 A1 EP 2791259A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- fluoride
- silicone
- salts
- solvent
- solubilizer according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
- C11D7/16—Phosphates including polyphosphates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
- C09D9/005—Chemical paint or ink removers containing organic solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/08—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
- H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
- H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/24—Organic compounds containing halogen
- C11D3/245—Organic compounds containing halogen containing fluorine
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/62—Plastics recycling; Rubber recycling
Definitions
- the present invention relates to a composition for depolymerization and removal of silicone residues.
- This composition called a silicone remover, contains a
- Alkylammonium fluoride an inorganic basic salt and a solvent.
- the composition of the invention is particularly suitable for removing crosslinked or uncrosslinked, filled or unfilled silicone residues from sensitive surfaces and substrates.
- the silicone solubilizer can be liquid, pasty or gelatinous in a variety of applications, depending on the application.
- US 5,008,229 is directed to solutions of phosphonitrilic chlorides in an organic solvent and to the use of such compositions for accelerating the
- Reaction products of phosphorus-nitrogen-chloride and octamethylcyclotetrasiloxane often have viscosities exceeding several thousand mPa-s (centipoises), which makes the materials less suitable as catalysts for the removal of polydimethylsiloxane backbones.
- organic acids or alkalis which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for example, organic acids or alkalis, which in the removal of silicones from various substrates, for
- the object of the present invention was therefore a
- composition which is suitable for removing crosslinked and uncrosslinked polysiloxane residues from various substrates or between substrates, at the same time inert to the substrates, and this does not damage or corrode even in a thin layer during the exposure time, to remove the silicone impurities.
- This object has surprisingly been achieved by a silicone solubilizer
- inorganic salts are particularly suitable, the corrosive action of a silicone dissolving composition of an organic tetraalkylammonium fluoride and a solvent
- the silicone solubilizers according to the invention are particularly well suited for removing polysiloxane residues or layers on or between substrates.
- the silicone solubilizers according to the invention have the advantage that they act selectively on silicone polymers or polydimethylsiloxane groups. Other plastics are not affected by the mechanism of the reaction.
- Example of plastics inert to the silicone solubilizer according to the invention :
- Polyolefin polystyrene, polyvinyl chloride, polyethylene,
- Silicone solubilizers according to the invention merely dissolve, for example, addition-crosslinked, condensation-crosslinked and peroxydically crosslinked silicone rubbers such as RTV-1, RTV-2, LSR and HTV.
- the silicone solubilizer according to the invention also works
- Silicone rubbers depending on the application furthermore
- Contain components such as fillers, for example hydrophilic or hydrophobic silicic acids, precipitated silicas,
- Silicone resins aluminum oxides, titanium oxides, carbon blacks, graphites, metals, metal carbonates, diatomaceous earths, metal dusts, fibers such as glass fibers or plastic fibers and other additives such as fungicides, fragrances, corrosion inhibitors,
- Oxidation inhibitors light stabilizers, flame retardants, dispersing agents, adhesion promoters,
- component A) corresponds to the general formula (1): wherein
- the compounds A) have long been known in the art and are commercially available. examples for
- preferred compounds A) are: tetramethylammonium fluoride, tetraethylammonium fluoride, tetrabutylammonium fluoride,
- Tetrapentylammonium fluoride Tetrapentylammonium fluoride, tetrahexylammonium fluoride,
- Tetraheptylammonium fluoride Tetraheptylammonium fluoride, tetraoctylammonium fluoride,
- Tetraisopropylammonium fluoride Tetraisobutylammonium fluoride, tetra (ter-butyl) ammonium fluoride, tetra (tert-pentyl) ammonium fluoride.
- M are sodium, potassium, magnesium, calcium and ammonium.
- Particularly preferred compounds B) are Na 3 PO 4 , Na 2 HPO 4 , NaH 2 PO 4 , MgHPO 4 , Mg 3 (PO 4 ) 2, (NH 4 ) H 2 PO 4 , (NH 4 ) 2 HPO 4 , ( NH 4 ) 3 PO 4 .
- Component C) is a solvent which is capable of dissolving component A) and at least 0.001% by weight of component B).
- Examples of the component C) are linear, branched and cyclic ethers which may also contain other heteroatoms such as nitrogen, phosphorus or halogen atoms.
- dialkyl ethers diethyl ether, di-n-propyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, dihexyl ether, dioctyl ether, 2-ethylhexyl vinyl ether, 4-chlorobutyl ether, dichloromethyl methyl ether, 1, 2 -Dirnethoxypropan, tert. - Amyl methyl ether, tert. Butyl ethyl ether, di-sec. butyl ether, tetraethylene glycol dimethyl ether; cyclic ethers:
- Oxacyclopentane tetrahydrofuran
- Benzopyran 1-4-dioxane
- Ethers containing aromatic groups methyl phenyl ether, 2-nitrophenyl phenyl ether,, 4-dimethoxybenzene, 1, 3, 5-trimethoxybenzene, butyl phenyl ether, 1, 4 -Diethoxybenzol.
- Another class of compounds which can preferably be used as component C) is the substance class of the ketones which contains linear, branched and cyclic compounds which may additionally contain further heteroatoms such as nitrogen, phosphorus or halogen atoms. Particularly preferred are linear and branched aliphatic molecules.
- ketones within the meaning of component C are listed below:
- Another class of compounds that can be used preferably as component C) is the class of esters containing linear, branched and cyclic compounds which
- hetero atoms such as nitrogen, phosphorus or May contain halogen atoms.
- hetero atoms such as nitrogen, phosphorus or May contain halogen atoms.
- Esters which are considered to be dipolar aprotic solvents are considered to be dipolar aprotic solvents.
- esters within the meaning of component C are listed below:
- C) is selected from the group of the following
- Solvents alkyl carboxylates, dialkyl ethers, alkyl aryl ethers, ketones.
- C) selected from the group: ethyl acetate, propyl acetate,
- silicone solvents according to the invention may contain thickener D) in order to adjust the viscosity and, for example, prepare pasty masses.
- thickeners D) are: precipitated silica, hydrophilic or hydrophobic finely divided silica,
- Alumina, titania, calcium salts of carboxylic acids, carbon blacks or carboxymethylcellulose It is possible to use all thickeners D) known from the prior art which have a water content of less than 5000 ppm. Prefers the water content should be below 2500 ppra and
- Component A) and the silicone solvent would lose its equilibrium property.
- D) is preferred from the
- the preparation of the silicone solvent according to the invention is carried out by mixing A) with B) and C) and possibly D) ideally until the formation of a clear solution.
- the mixing is usually carried out by intensive stirring of the components between 0.5 and 10 hours at room temperature or elevated temperature (up to 140 ° C).
- thickeners D are used, this is done by adjusting the viscosity of the silicone solubilizer according to the invention to a defined range. This is the
- Thickener D in amounts of 0.1 to 30 wt.% Used to 100 wt.% Silicone Solvent. From 0.5 to 10% by weight and more preferably from 1 to 5% by weight of D) are preferably added.
- Another object of the present invention is the use of the silicone solubilizer according to the invention for
- the exposure time can be between 10 s and several hours. In a preferred
- the exposure time is between 30 s and 10 min.
- Solvent C temperatures between 20 ° C and 150 ° C can be applied, wherein as a preferred temperature range 20 ° C to 100 ° C can be specified. Likewise accelerating acts any circulation of the silicone solubilizer according to the invention, for example by pumping, shaking or by the
- Embodiment is the exposure time at room temperature using ultrasound between 10 s and 5 min.
- the exposure time at room temperature using ultrasound between 10 s and 5 min.
- the cleavage products are washed off with solvent without additives, which may or may not be identical to the solvent C) used in the dissolution reaction.
- Ultrasonic bath (Bandelin RM 40), by introducing an ultrasonic probe or the like.
- Trisodium phosphate dissolved in 97.45 g of 2-octanone at room temperature by stirring within 30 min.
- Trisodium phosphate dissolved in 97.45 g of n-propyl acetate at room temperature by stirring within 30 min.
- Example 7 silicone dissolving composition 7 (not
- Example 9 Dissolution of a polydimethylsiloxane composition
- silicone solubilizer according to the invention are particularly peculiar to remove silicone residues at a significantly reduced aluminum corrosion. Normally it is at
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Detergent Compositions (AREA)
- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011088885A DE102011088885A1 (de) | 2011-12-16 | 2011-12-16 | Siliconlöser |
| PCT/EP2012/074661 WO2013087510A1 (de) | 2011-12-16 | 2012-12-06 | Siliconlöser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP2791259A1 true EP2791259A1 (de) | 2014-10-22 |
Family
ID=47291013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP12795474.1A Withdrawn EP2791259A1 (de) | 2011-12-16 | 2012-12-06 | Siliconlöser |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9309488B2 (de) |
| EP (1) | EP2791259A1 (de) |
| JP (1) | JP5951796B2 (de) |
| KR (1) | KR101636390B1 (de) |
| CN (1) | CN103998537B (de) |
| DE (1) | DE102011088885A1 (de) |
| TW (1) | TW201326385A (de) |
| WO (1) | WO2013087510A1 (de) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101974224B1 (ko) * | 2012-11-09 | 2019-05-02 | 동우 화인켐 주식회사 | 접착 폴리머 제거용 조성물 |
| WO2014205285A1 (en) * | 2013-06-20 | 2014-12-24 | Dow Corning Corporation | Method of removing silicone resin from a substrate |
| US10894935B2 (en) | 2015-12-04 | 2021-01-19 | Samsung Electronics Co., Ltd. | Composition for removing silicone resins and method of thinning substrate by using the same |
| BR112018015267B1 (pt) | 2016-02-18 | 2023-03-07 | Ecolab Usa Inc | Método e composição para remover sujeiras, rótulos e outro material adesivo de uma superfície |
| WO2019211050A1 (en) | 2018-05-03 | 2019-11-07 | Hfc Prestige International Holding Switzerland S.A.R.L | Multicomponent composition |
| US12053542B2 (en) | 2018-07-06 | 2024-08-06 | Wella International Operations Switzerland Sàrl | Multicomponent silicone composition |
| JP2021534078A (ja) | 2018-07-06 | 2021-12-09 | ウエラ インターナショナル オペレーションズ スウィッツァーランド エスエーアールエルWella International Operations Switzerland Sarl | 多成分pur組成物 |
| JP2021530473A (ja) | 2018-07-06 | 2021-11-11 | エイチエフシー・プレステージ・インターナショナル・ホールディング・スウィッツァーランド・エスアーエールエル | 毛髪着色組成物ならびにその塗布および除去のための方法 |
| US11766394B2 (en) | 2018-07-06 | 2023-09-26 | Wella International Operations Switzerland Sarl | Multicomponent composition (Michael addition) |
| WO2020114647A1 (en) | 2018-12-03 | 2020-06-11 | Hfc Prestige International Holding Switzerland S.A.R.L | Multicomponent in situ coloration composition |
| JP7219423B2 (ja) * | 2019-02-15 | 2023-02-08 | 日産化学株式会社 | 洗浄剤組成物及び洗浄方法 |
| US12441964B2 (en) | 2019-02-15 | 2025-10-14 | Nissan Chemical Corporation | Cleaning agent composition and cleaning method |
| KR102181219B1 (ko) * | 2019-04-19 | 2020-11-20 | 동우 화인켐 주식회사 | 접착 폴리머 제거용 조성물 |
| US11781092B2 (en) | 2019-08-27 | 2023-10-10 | Resonac Corporation | Composition, and method for cleaning adhesive polymer |
| JP7299564B2 (ja) * | 2019-11-20 | 2023-06-28 | 日産化学株式会社 | 洗浄剤組成物の洗浄能の向上方法、洗浄剤組成物の製造方法及び洗浄剤組成物 |
| JP7284460B2 (ja) * | 2019-11-20 | 2023-05-31 | 日産化学株式会社 | 洗浄剤組成物の製造方法、洗浄剤組成物入り容器の製造方法及び洗浄剤組成物を容器に充填して保存する方法 |
| JP7530035B2 (ja) * | 2020-03-23 | 2024-08-07 | 日産化学株式会社 | バンプ付き半導体基板の洗浄方法 |
| JP7780127B2 (ja) * | 2020-03-23 | 2025-12-04 | 日産化学株式会社 | 半導体基板の洗浄方法及び加工された半導体基板の製造方法 |
| KR102192954B1 (ko) * | 2020-03-26 | 2020-12-18 | 동우 화인켐 주식회사 | 고분자 세정용 조성물 |
| CN115427547A (zh) | 2020-04-09 | 2022-12-02 | 昭和电工株式会社 | 组合物、及粘接性聚合物的洗涤方法 |
| WO2022002987A1 (en) | 2020-06-30 | 2022-01-06 | Hfc Prestige Service Germany Gmbh | Method for coloring anagenic hair with a two component composition |
| EP4284631A4 (de) * | 2021-02-01 | 2025-06-25 | Bowling Green State University | Fluoridkatalysierte polysiloxandepolymerisation |
| CN116024056B (zh) * | 2021-10-25 | 2025-05-30 | 中国石油化工股份有限公司 | 一种乙醛聚合变质产物溶解剂及其制备方法和应用 |
| FR3140883B1 (fr) * | 2022-10-17 | 2026-02-13 | Elkem Silicones France Sas | Dépolymérisation de polymères silicones en organopolysiloxanes |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2710843A (en) | 1949-09-14 | 1955-06-14 | Dow Corning | Method of removing a siloxane resinous coating from a tin surface |
| DE3725377A1 (de) | 1987-07-31 | 1989-02-09 | Wacker Chemie Gmbh | Verfahren zum kondensieren und/oder aequilibrieren von organo(poly)siloxanen |
| DE3903137A1 (de) | 1989-02-02 | 1990-08-16 | Wacker Chemie Gmbh | Phosphornitridchloride enthaltende zusammensetzungen |
| US5593507A (en) | 1990-08-22 | 1997-01-14 | Kabushiki Kaisha Toshiba | Cleaning method and cleaning apparatus |
| EP0496899B1 (de) | 1990-08-22 | 1996-10-16 | Kabushiki Kaisha Toshiba | Reinigungsverfahren |
| GB2298429A (en) | 1995-03-02 | 1996-09-04 | Gen Electric | Silicone equilibration catalyst |
| JPH08250400A (ja) | 1995-03-14 | 1996-09-27 | Mitsubishi Electric Corp | シリコーン樹脂の除去法 |
| JPH10251566A (ja) | 1997-03-13 | 1998-09-22 | Toshiba Silicone Co Ltd | ポリオルガノシロキサン系硬化物の溶解剤および該硬化物の除去方法 |
| US6818608B2 (en) * | 2002-02-01 | 2004-11-16 | John C. Moore | Cured polymers dissolving compositions |
| US6652665B1 (en) * | 2002-05-31 | 2003-11-25 | International Business Machines Corporation | Method of removing silicone polymer deposits from electronic components |
| US7312261B2 (en) * | 2004-05-11 | 2007-12-25 | International Business Machines Corporation | Thermal interface adhesive and rework |
| US7232770B2 (en) | 2005-05-03 | 2007-06-19 | General Chemical Performance Products Llc | High temperature and chemical resistant process for wafer thinning and backside processing |
| US7700533B2 (en) * | 2005-06-23 | 2010-04-20 | Air Products And Chemicals, Inc. | Composition for removal of residue comprising cationic salts and methods using same |
| KR100655647B1 (ko) | 2005-07-04 | 2006-12-08 | 삼성전자주식회사 | 반도체 기판용 세정액 조성물, 이의 제조 방법, 이를이용한 반도체 기판의 세정 방법 및 반도체 장치의 제조방법 |
| TW200722505A (en) * | 2005-09-30 | 2007-06-16 | Rohm & Haas Elect Mat | Stripper |
| US7534753B2 (en) * | 2006-01-12 | 2009-05-19 | Air Products And Chemicals, Inc. | pH buffered aqueous cleaning composition and method for removing photoresist residue |
| US20080096785A1 (en) * | 2006-10-19 | 2008-04-24 | Air Products And Chemicals, Inc. | Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue |
| JP4499751B2 (ja) * | 2006-11-21 | 2010-07-07 | エア プロダクツ アンド ケミカルズ インコーポレイテッド | フォトレジスト、エッチ残留物及びbarcを除去するための配合物及び同配合物を含む方法 |
| EP1965418A1 (de) * | 2007-03-02 | 2008-09-03 | Air Products and Chemicals, Inc. | Formulierung zur Entfernung von Fotolacken, Ätzresten und BARC |
| KR101416103B1 (ko) * | 2007-11-12 | 2014-07-09 | (주)코미코 | 불순물 제거용 세정액 및 이를 이용한 불순물 제거방법 |
| US7687447B2 (en) | 2008-03-13 | 2010-03-30 | Air Products And Chemicals, Inc. | Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid |
-
2011
- 2011-12-16 DE DE102011088885A patent/DE102011088885A1/de not_active Withdrawn
-
2012
- 2012-12-05 TW TW101145600A patent/TW201326385A/zh unknown
- 2012-12-06 KR KR1020147015999A patent/KR101636390B1/ko not_active Expired - Fee Related
- 2012-12-06 EP EP12795474.1A patent/EP2791259A1/de not_active Withdrawn
- 2012-12-06 US US14/362,783 patent/US9309488B2/en not_active Expired - Fee Related
- 2012-12-06 JP JP2014546428A patent/JP5951796B2/ja not_active Expired - Fee Related
- 2012-12-06 WO PCT/EP2012/074661 patent/WO2013087510A1/de not_active Ceased
- 2012-12-06 CN CN201280062299.2A patent/CN103998537B/zh not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
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| See references of WO2013087510A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103998537A (zh) | 2014-08-20 |
| KR20140096362A (ko) | 2014-08-05 |
| KR101636390B1 (ko) | 2016-07-05 |
| TW201326385A (zh) | 2013-07-01 |
| JP2015505886A (ja) | 2015-02-26 |
| CN103998537B (zh) | 2016-08-17 |
| DE102011088885A1 (de) | 2013-06-20 |
| US20140336093A1 (en) | 2014-11-13 |
| WO2013087510A1 (de) | 2013-06-20 |
| US9309488B2 (en) | 2016-04-12 |
| JP5951796B2 (ja) | 2016-07-13 |
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