EP2723922B1 - Électrolyte et son utilisation pour le dépôt de revêtements de ruthénium noir et revêtements obtenus en utilisant ledit électrolyte - Google Patents
Électrolyte et son utilisation pour le dépôt de revêtements de ruthénium noir et revêtements obtenus en utilisant ledit électrolyte Download PDFInfo
- Publication number
- EP2723922B1 EP2723922B1 EP12726136.0A EP12726136A EP2723922B1 EP 2723922 B1 EP2723922 B1 EP 2723922B1 EP 12726136 A EP12726136 A EP 12726136A EP 2723922 B1 EP2723922 B1 EP 2723922B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrolyte
- ruthenium
- chloride
- acid
- bromide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000003792 electrolyte Substances 0.000 title claims description 75
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 title claims description 66
- 229910052707 ruthenium Inorganic materials 0.000 title claims description 63
- 230000008021 deposition Effects 0.000 title claims description 19
- 238000000576 coating method Methods 0.000 title claims description 11
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 27
- 229910052717 sulfur Inorganic materials 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 15
- 239000011593 sulfur Substances 0.000 claims description 15
- -1 halide ion Chemical group 0.000 claims description 14
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 11
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 235000006408 oxalic acid Nutrition 0.000 claims description 9
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 claims description 6
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 claims description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 239000000872 buffer Substances 0.000 claims description 5
- 239000003093 cationic surfactant Substances 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 125000000129 anionic group Chemical group 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- NPAWNPCNZAPTKA-UHFFFAOYSA-M sodium;propane-1-sulfonate Chemical compound [Na+].CCCS([O-])(=O)=O NPAWNPCNZAPTKA-UHFFFAOYSA-M 0.000 claims description 4
- 239000004094 surface-active agent Substances 0.000 claims description 4
- 229910052723 transition metal Inorganic materials 0.000 claims description 4
- 150000003628 tricarboxylic acids Chemical class 0.000 claims description 4
- FTLYMKDSHNWQKD-UHFFFAOYSA-N (2,4,5-trichlorophenyl)boronic acid Chemical class OB(O)C1=CC(Cl)=C(Cl)C=C1Cl FTLYMKDSHNWQKD-UHFFFAOYSA-N 0.000 claims description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 3
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 claims description 3
- XLXCHZCQTCBUOX-UHFFFAOYSA-N 1-prop-2-enylimidazole Chemical compound C=CCN1C=CN=C1 XLXCHZCQTCBUOX-UHFFFAOYSA-N 0.000 claims description 3
- CXRFDZFCGOPDTD-UHFFFAOYSA-M Cetrimide Chemical compound [Br-].CCCCCCCCCCCCCC[N+](C)(C)C CXRFDZFCGOPDTD-UHFFFAOYSA-M 0.000 claims description 3
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 3
- 239000001361 adipic acid Substances 0.000 claims description 3
- 235000011037 adipic acid Nutrition 0.000 claims description 3
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 3
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- JBIROUFYLSSYDX-UHFFFAOYSA-M benzododecinium chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 JBIROUFYLSSYDX-UHFFFAOYSA-M 0.000 claims description 3
- TTZLKXKJIMOHHG-UHFFFAOYSA-M benzyl-decyl-dimethylazanium;chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 TTZLKXKJIMOHHG-UHFFFAOYSA-M 0.000 claims description 3
- OCBHHZMJRVXXQK-UHFFFAOYSA-M benzyl-dimethyl-tetradecylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 OCBHHZMJRVXXQK-UHFFFAOYSA-M 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- 150000001735 carboxylic acids Chemical class 0.000 claims description 3
- SXPWTBGAZSPLHA-UHFFFAOYSA-M cetalkonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 SXPWTBGAZSPLHA-UHFFFAOYSA-M 0.000 claims description 3
- 229960000228 cetalkonium chloride Drugs 0.000 claims description 3
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 claims description 3
- 235000015165 citric acid Nutrition 0.000 claims description 3
- HXWGXXDEYMNGCT-UHFFFAOYSA-M decyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCC[N+](C)(C)C HXWGXXDEYMNGCT-UHFFFAOYSA-M 0.000 claims description 3
- PLMFYJJFUUUCRZ-UHFFFAOYSA-M decyltrimethylammonium bromide Chemical compound [Br-].CCCCCCCCCC[N+](C)(C)C PLMFYJJFUUUCRZ-UHFFFAOYSA-M 0.000 claims description 3
- 238000004090 dissolution Methods 0.000 claims description 3
- DDXLVDQZPFLQMZ-UHFFFAOYSA-M dodecyl(trimethyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)C DDXLVDQZPFLQMZ-UHFFFAOYSA-M 0.000 claims description 3
- XJWSAJYUBXQQDR-UHFFFAOYSA-M dodecyltrimethylammonium bromide Chemical compound [Br-].CCCCCCCCCCCC[N+](C)(C)C XJWSAJYUBXQQDR-UHFFFAOYSA-M 0.000 claims description 3
- VUFOSBDICLTFMS-UHFFFAOYSA-M ethyl-hexadecyl-dimethylazanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)CC VUFOSBDICLTFMS-UHFFFAOYSA-M 0.000 claims description 3
- KSCHLNBLIAOANF-UHFFFAOYSA-M ethyl-hexadecyl-dimethylazanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)CC KSCHLNBLIAOANF-UHFFFAOYSA-M 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 claims description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 3
- 239000011976 maleic acid Substances 0.000 claims description 3
- 239000001630 malic acid Substances 0.000 claims description 3
- 235000011090 malic acid Nutrition 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- XCOHAFVJQZPUKF-UHFFFAOYSA-M octyltrimethylammonium bromide Chemical compound [Br-].CCCCCCCC[N+](C)(C)C XCOHAFVJQZPUKF-UHFFFAOYSA-M 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000011975 tartaric acid Substances 0.000 claims description 3
- 235000002906 tartaric acid Nutrition 0.000 claims description 3
- 150000000000 tetracarboxylic acids Chemical class 0.000 claims description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 3
- 229910001428 transition metal ion Inorganic materials 0.000 claims description 3
- AQZSPJRLCJSOED-UHFFFAOYSA-M trimethyl(octyl)azanium;chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(C)C AQZSPJRLCJSOED-UHFFFAOYSA-M 0.000 claims description 3
- CEYYIKYYFSTQRU-UHFFFAOYSA-M trimethyl(tetradecyl)azanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCC[N+](C)(C)C CEYYIKYYFSTQRU-UHFFFAOYSA-M 0.000 claims description 3
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- 239000007853 buffer solution Substances 0.000 claims description 2
- 239000003575 carbonaceous material Substances 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 229940081974 saccharin Drugs 0.000 claims 2
- 235000019204 saccharin Nutrition 0.000 claims 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims 2
- 238000007654 immersion Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 238000007747 plating Methods 0.000 description 8
- 230000002378 acidificating effect Effects 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 238000001336 glow discharge atomic emission spectroscopy Methods 0.000 description 5
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 4
- 235000019796 monopotassium phosphate Nutrition 0.000 description 4
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- ZNBNBTIDJSKEAM-UHFFFAOYSA-N 4-[7-hydroxy-2-[5-[5-[6-hydroxy-6-(hydroxymethyl)-3,5-dimethyloxan-2-yl]-3-methyloxolan-2-yl]-5-methyloxolan-2-yl]-2,8-dimethyl-1,10-dioxaspiro[4.5]decan-9-yl]-2-methyl-3-propanoyloxypentanoic acid Chemical compound C1C(O)C(C)C(C(C)C(OC(=O)CC)C(C)C(O)=O)OC11OC(C)(C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)CC1 ZNBNBTIDJSKEAM-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229910001229 Pot metal Inorganic materials 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000013566 allergen Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003303 ruthenium Chemical class 0.000 description 1
- DKNJHLHLMWHWOI-UHFFFAOYSA-L ruthenium(2+);sulfate Chemical compound [Ru+2].[O-]S([O-])(=O)=O DKNJHLHLMWHWOI-UHFFFAOYSA-L 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
- C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/005—Jewels; Clockworks; Coins
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
Definitions
- the invention relates to a ruthenium electrolyte which is suitable for the deposition of decorative and technical layers having a particular blackness.
- the invention further relates to the use of the electrolyte of the invention in a process for the deposition of decorative and industrial layers of ruthenium having a particular blackness ("black ruthenium") on jewelry, decorative goods, consumer goods and industrial articles.
- black ruthenium a particular blackness
- the invention therefore likewise relates to corresponding layers and the articles coated in this way.
- Consumer goods and industrial articles, jewelry and decorative goods are coated with thin oxidation-stable metal layers for protection against corrosion and/or for optical upgrading. These layers have to be mechanically stable and should not display tarnishing or wear phenomena even on prolonged use.
- a proven way of producing such layers are electroplating processes by means of which many metal and alloy layers can be obtained in high-quality form. Examples which are well known from everyday life are electrolytically deposited bronze and brass layers on door handles or knobs, chrome coatings on vehicle parts, zinc-plated tools or gold plating on watch straps.
- a particular challenge in the field of electroplating is to produce oxidation-stable and mechanically strong metal layers which have a black color and can be of interest not only in the decorative and jewelry sector but also for industrial applications, for example in the field of solar technology. Only a few metals are available for the production of oxidation-stable, black layers. Apart from ruthenium, rhodium and nickel are suitable. The use of the noble metal rhodium is restricted to the jewelry sector because of the high raw material costs. The use of inexpensive nickel and nickel-containing alloys is possible only in exceptional cases and with observance of strict regulations, especially in the jewelry and consumer goods sector, since nickel and nickel-containing metal layers are contact allergens. The use of ruthenium is an attractive alternative for all the fields of application described.
- Electrolytes for producing black ruthenium layers in electrolytic plating processes are known in the prior art.
- the most widely used baths contain ruthenium in the form of a complex with amidosulfonic acid or ruthenium as nitridochloro or nitridobromo complex ( US6117301 , US3576724 , JP63259095 , WO2001/011113 , DE19741990 , US4375392 , JP2054792 , EP1975282 ).
- the pH of the baths is frequently in the acid range.
- JP56119791 relates to a ruthenium electrolyte which contains from 1 to 20 g/l of ruthenium together with one or more compounds selected from the group consisting of dicarboxylic and tricarboxylic acids, benzenesulfonic acid, N-containing aromatics and amino acids or derivatives of the compounds mentioned and in which from 0.01 to 10 g/l of a thio compound as blackening additive are additionally used.
- black layers For upgrading jewelry and decorative goods, black layers have to have not only an excellent mechanical adhesive strength but also a defect-free optical quality. They have to be able to be produced as required in bright or matte form and with a very deep blackness. The same applies for applications in the industrial sector, in particular in solar technology. Black layers for upgrading consumer goods also have to satisfy demanding requirements in terms of the mechanical stability. In particular, they must not have any black abrasion even on frequent use over a long period of time.
- ruthenium baths and processes described in the prior art which satisfy these requirements either require the use of toxicologically problematical compounds such as thio compounds as blackening additive or contain a further transition metal to provide the required mechanical adhesive strength, which makes maintenance of the bath during the deposition process difficult.
- acid baths allow deposition only on metals which have a relatively noble character.
- US4082625 light-colored ruthenium deposits can also be obtained in the alkaline range.
- US350049 describes a process for the deposition of ruthenium in a pH range of 9-10. The ruthenium is kept in solution in this pH range by means of complexing anions (EDTA, NTA, CDTA). Stable but light-colored deposits of ruthenium are obtained.
- nitridochloro complex of ruthenium is also used in the aqueous, nonacidic bath for the electrodeposition of ruthenium which is described in US4297178 . It additionally contains oxalic acid or an oxalate anion. It is questionable whether the deposits produced in this way have an appropriate blackness.
- JP 2001-049485 A discloses a black ruthenium plating solution, comprising ruthenium sulfate, sulfamic acid, a thio compound and a sacrificial oxidizing agent.
- the ruthenium plating solution can be easily controlled during electrolysis, and it yields ruthenium depositions with good gloss, good adhesion to a substrate, and has excellent abrasion and corrosion resistance.
- the thio compound in the plating solution works as a color former which helps maintaining a dense blackness during electrolysis, and it also helps providing a stable black plating. However, the thio compound may decompose during electrolysis due to anodic oxidation, which leads to a decreasing black degree in the deposited ruthenium layers.
- the sacrificial oxidizing agent can be used for inhibiting the decomposition of the thio compound due to anodic oxidation. It is preferably chosen from hydroxylamine sulfate, formalin, and ascorbic acid. Ruthenium baths according to JP 2001-049485 A are strongly acid, their pH being 2 or lower, and the current density for depositing ruthenium layers is between 5 to 15 A/dm 2 . Thus, the pH range wherein this bath can be used is restricted to the strongly acidic range, and it is not suitable for use in low current density ranges.
- Ruthenium can be used in the form of a water-soluble compound known to those skilled in the art, preferably as a binuclear, anionic nitrido halo complex of the formula [Ru 2 N(H 2 O) 2 X 8 ] 3- , where X is a halide ion. Particular preference is given to the chloro complex [Ru 2 N(H 2 O) 2 Cl 8 ] 3- .
- the amount of the complex in the electrolyte of the invention can preferably be selected so that the concentration of ruthenium after complete dissolution of the compound is in the range from 0.5 to 10 gram per liter of electrolyte, calculated as ruthenium metal.
- the finished electrolyte particularly preferably contains from 1 to 8 gram of ruthenium per liter of electrolyte, very particularly preferably from 3 to 6 gram of ruthenium per liter of electrolyte. Preference is given to exclusively ruthenium being deposited from the electrolyte of the invention. In this case, the electrolyte contains no further transition metal ions in addition to ruthenium.
- the electrolyte contains particular organic compounds which have one or more carboxylic acid groups. These are in particular dicarboxylic, tricarboxylic or tetracarboxylic acids. These are adequately known to those skilled in the art and can be found, for example, in the literature ( Beyer-Walter, Lehrbuch der Organischen Chemie, 22nd edition, S. Hirzel-Verlag, p. 324 ff ). In this context, particular preference is given to acids selected from the group consisting of oxalic acid, citric acid, tartaric acid, succinic acid, maleic acid, glutaric acid, adipic acid, malonic acid, malic acid. The acids are naturally present in their anionic form in the electrolyte at the pH to be set.
- the carboxylic acids mentioned here are added to the electrolyte in a concentration of 0.05-2 mol per liter, preferably 0.1-1 mol per liter and very particularly preferably 0.2-0.5 mol per liter. This applies particularly to the use of oxalic acid which is assumed also to serve as conducting salt in the electrolyte.
- sulfur compounds are likewise present in the electrolytes in question here.
- These are in particular one or more sulfur compounds which contain at least one sulfur atom in a heterocyclic ring system (sulfur heterocycle) ( Beyer-Walter, Lehrbuch der Organischen Chemie, 22nd edition, S. Hirzel-Verlag, p. 703 ff ).
- sulfur heterocycle can be optionally aromatic or fully or partially saturated five- or six-membered rings based on carbon or corresponding fused ring systems which contain at least one sulfur atom and/or at least one further heteroatom such as nitrogen.
- the sulfur heterocycles to be used are preferably sufficiently water-soluble to be able to be used effectively in the appropriate concentration range in the electrolyte.
- Preferred compounds are those selected from the group consisting of 3-(2-benzothiazolyl-2-mercapto)propanesulfonic acid sodium salt, saccharin sodium salt, saccharin-N-propylsulfonate sodium salt, 6-methyl-3,4-dihydro-1,2,3-oxathiazin-4-one 2,2-dioxide, benzothiazole, 2-mercaptobenzothiazole, thiazole, isothiazole. Without being tied to the theory proposed here, it is assumed that the sulfur heterocycle contributes to the deep blackening in the deposition of the ruthenium.
- the sulfur heterocycle is used in a concentration of from 0.001 to 4 mol per liter, preferably from 0.002 to 1 mol per liter and very particularly preferably in a concentration of from 0.004 to 0.01 mol per liter, in the electrolyte.
- One or more surface-active substances of the cationic surfactant type are likewise present in the electrolyte.
- Possible surfactants of this type are, in particular, quaternary ammonium salts. These are adequately known to those skilled in the art ( Beyer-Walter, Lehrbuch der Organischen Chemie, 22nd edition, S. Hirzel-Verlag, p. 251 ff ).
- ammonium salts selected from the group consisting of octyltrimethylammonium bromide, octyltrimethylammonium chloride, decyltrimethylammonium bromide, decyltrimethylammonium chloride, dodecyltrimethylammonium bromide, dodecyltrimethylammonium chloride, tetradecyltrimethylammonium bromide, tetradecyltrimethylammonium chloride, hexadecyltrimethylammonium bromide, hexadecyltrimethylammonium chloride, ethyldimethylhexadecylammonium bromide, ethyldimethylhexadecylammonium chloride, benzyldimethyldecylammonium chloride, benzyldimethyldodecylammonium chloride, benzyldimethyltetradecylam
- the cationic surfactants under consideration here are used in a concentration of 0.1-20 mmol per liter, preferably 0.5-10 mmol per liter and very particularly preferably from 1 to 5 mmol per liter, in the electrolyte and are likewise decisive for a deeper black of the deposited layer.
- the pH of the electrolyte is preferably in the only weakly acidic to alkaline range.
- the pH is preferably set to a value in the range from 5 to 12.
- the pH of the electrolyte during use is more preferably in the range from 6 to 9, particularly preferably from 7 to 8.
- a pH of about 7.5 is especially preferably set.
- the pH is kept constant by addition of buffer substances. These are adequately known to those skilled in the art ( Handbook of Chemistry and Physics, CRC Press, 66th Edition, D-144 ff ).
- Preferred buffer systems are borate, phosphate and carbonate buffers. Compounds for producing these buffer systems can be selected from the group consisting of boric acid, potassium dihydrogenphosphate, dipotassium hydrogenphosphate, potassium hydrogencarbonate and dipotassium carbonate.
- the buffer system is used in a concentration of 0.08-1.15 mol per liter, preferably 0.15-0.65 mol per liter and very particularly preferably 0.2-0.4 mol per liter (based on the
- the present invention likewise provides for the use of the electrolyte of the invention.
- a person skilled in the art will immerse the conductive, in particular metallic, article to be coated as cathode in the electrolyte and bring about a flow of electric current between the anode and the cathode.
- the use of the electrolyte of the invention is preferably carried out in the same advantageous embodiments which have been described above for the electrolyte.
- the flow of electric current should be sufficient to bring about the deposition of the black ruthenium coatings on the conductive, in particular metallic, article within an acceptable period of time.
- a person skilled in the art will know the strength of the electric field which has to be set for this.
- a current density of 0.1-10 A/dm 2 is preferably set.
- the current density is particularly preferably from 0.2 to 5 A/dm 2 and very particularly preferably from 0.5 to 2 A/dm 2 .
- the temperature of the electrolyte during deposition can be set appropriately by a person skilled in the art.
- the temperature range to be set is advantageously 10-80°C.
- Preference is given to setting a temperature of from 50° to 75°C and particularly preferably 60° and 70°C. It can be advantageous for the electrolyte in question to be stirred during deposition.
- anode it is likewise possible to select embodiments which a person skilled in the art would consider for this purpose. Preference is given to using anodes made of a material selected from the group consisting of platinized titanium, graphite, iridium-transition metal mixed oxide and special carbon material ("Diamond-Like Carbon", DLC) or combinations thereof. Insoluble anodes made of a platinized titanium or iridium-transition metal mixed oxide have been found to be advantageous. Particular preference is given to using an anode made of platinized titanium.
- the present invention likewise provides black ruthenium layers which can be obtained by the process of the invention.
- the layers have a thickness of from 0.1 to 3 ⁇ m, preferably from 0.2 to 1.5 ⁇ m and very particularly preferably from 0.3 to 1.3 ⁇ m.
- the layer of the invention has a sulfur content of from 3% by weight to 6% by weight, preferably from 3.1% by weight to 5% by weight and particularly preferably from 3.2% by weight to 4.5% by weight, in its outer region (viewed from the visible surface inward) of about 1.1 ( ⁇ 0.2) ⁇ m.
- the sulfur content is especially preferably about 4% by weight.
- the ruthenium layer also has a carbon content of from 1% by weight to 2% by weight, preferably from 1.1% by weight to 1.8% by weight and very particularly preferably from 1.15% by weight to 1.5% by weight, in the same outer region.
- the value is especially preferably about 1.2% by weight.
- the ruthenium layer has an oxygen content of from 15% by weight to 20% by weight, preferably from 16% by weight to 19% by weight and particularly preferably from 17% by weight to 18.5% by weight, in the same outer region.
- the oxygen content here is especially preferably about 18% by weight. It appears to be particularly advantageous for the concentration of sulfur in this layer under consideration to have a gradient with the concentration increasing from the outside inward.
- a concentration of sulfur directly at the surface of about 2% by weight which can increase in an inward direction to 5% by weight is often measured.
- the values determined here have been determined by the GDOES method (Glow Discharge Optical Emission Spectrometry; R. Kenneth Marcus, Jose Broekaert: Glow Discharge Plasma in Analytical Spectroscopy, Wiley ISBN 0-471-60699-5 and Thomas Nelis, Richard Payling: Glow Discharge Optical Emission Spectroscopy - A Practical Guide, Royal Society of Chemistry, ISBN 0-85404-521-X ).
- the invention further provides particular articles such as decorative goods, consumer goods and industrial articles which have a layer according to the invention. Particular preference is given to articles in the case of which corresponding deposition in the acid range is not possible because of their base metal character.
- the deposition of black ruthenium coatings on conductive, in particular metallic, articles according to the present invention can be carried out by way of example as follows, taking account of what has been said above: for the electrolytic application of black ruthenium layers, the pieces of jewelry, decorative goods, consumer goods or industrial articles (referred to collectively as substrates) dip into the electrolyte of the invention and form the cathode.
- An anode made of, for example, platinized titanium (product information for PLATINODE® from Umicore Galvanotechnik GmbH) is likewise dipped into the electrolyte. An appropriate flow of electric current between the anode and the cathode is subsequently applied.
- a maximum current density of 10 ampere per square decimeter [A/dm 2 ] should not be exceeded. Above this value, proportions of amorphous ruthenium can be deposited. As a result, the layers can be nonuniform and have dark abrasion under mechanical stress.
- the current density selected is also determined by the type of coating process. In a barrel plating process, the preferred current density is in the range from 0.1 to 1 A/dm 2 . In rack plating processes, a current density of from 0.5 to 5 A/dm 2 leads to optically defect-free black ruthenium layers.
- the ruthenium electrolyte described which is provided by the present invention, is particularly well-suited in a process for the deposition of decorative deep black and optionally bright layers, for example on jewelry and decorative goods.
- the latter are likewise provided by the present invention.
- the electrolyte can preferably be used in barrel and rack plating processes.
- the electrolyte described here makes it possible to produce particularly compact and deep black deposits of ruthenium on the appropriate material (see drawing 1, which shows the results of the comparative example and of example 1 according to the invention). Furthermore, it is possible, when using the electrolyte, to work in the weakly acidic to alkaline region which for the first time allows the deposition of black ruthenium coatings on base metals without the latter having to be provided beforehand with a precious metal intermediate layer. This was not at all obvious in the light of the known prior art.
- Color values were measured on the resulting layers using a standard color measuring instrument according to the CIE-L* a* b* system.
- the layers were also examined by means of GDOES ( G low D ischarge O ptical Emission S pectroscopy).
- GDOES G low D ischarge O ptical Emission S pectroscopy
- the specimens are "sputtered-off" over an approximately flat plane in an argon plasma and excited to emit specific radiation.
- the radiation is detected in an optical spectrometer.
- the calculation of concentrations and depths is carried out by multimatrix calibration.
- a brass sheet is dipped in an electrolyte which has the compositions described below.
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Claims (24)
- Électrolyte ayant un pH allant de ≥ 5 à 12 pour le dépôt de couches décoratives et industrielles de ruthénium sur des articles conducteurs, en particulier métalliques, ayant une noirceur particulière,
caractérisé en ce que,
l'électrolyte a les constituants suivants :a) du ruthénium dissous en une concentration allant de 0,2 à 20 grammes par litre (g/L) d'électrolyte, calculée en tant que ruthénium métallique ;b) un ou plusieurs anions d'un acide dicarboxylique, tricarboxylique ou tétracarboxylique en une concentration de 0,05 à 2 moles par litre ;c) un ou plusieurs hétérocycles soufrés ;d) un ou plusieurs agents tensioactifs cationiques. - Électrolyte selon la revendication 1,
caractérisé en ce que
le ruthénium est présent en tant que complexe anionique binucléaire, nitruro-halo ruthénium de formule [Ru2N(H2O)2X8]3-, où X est un ion halogénure. - Électrolyte selon la revendication 1 et/ou 2,
caractérisé en ce que
la concentration de ruthénium après dissolution complète du composé est dans la plage allant de 2 à 8 grammes par litre d'électrolyte. - Électrolyte selon l'une ou plusieurs des revendications précédentes,
caractérisé en ce que
l'électrolyte est exempt d'autres ions de métal de transition. - Électrolyte selon l'une ou plusieurs des revendications précédentes,
caractérisé en ce que
l'acide carboxylique est choisi dans le groupe constitué d'acide oxalique, acide citrique, acide tartrique, acide succinique, acide maléique, acide glutarique, acide adipique, acide malonique, acide malique. - Électrolyte selon l'une ou plusieurs des revendications précédentes,
caractérisé en ce que
l'hétérocycle soufré est choisi dans le groupe constitué de sel sodique d'acide 3-(2-benzothiazolyl-2-mercapto)propanesulfonique, sel sodique de saccharine, sel sodique de N-propylsulfonate de saccharine, 2,2-dioxyde de 6-méthyl-3,4-dihydro-1,2,3-oxathiazin-4-one, benzothiazole, 2-mercaptobenzothiazole, thiazole et isothiazole. - Électrolyte selon l'une ou plusieurs des revendications précédentes,
caractérisé en ce que
l'agent tensioactif est choisi dans le groupe constitué de bromure d'octyltriméthylammonium, chlorure d'octyltriméthylammonium, bromure de décyltriméthylammonium, chlorure de décyltriméthylammonium, bromure de dodécyltriméthylammonium, chlorure de dodécyltriméthylammonium, bromure de tétradécyltriméthylammonium, chlorure de tétradécyltriméthylammonium, bromure d'hexadécyltriméthylammonium, chlorure d'hexadécyltriméthylammonium, bromure d'éthyldiméthylhexadécylammonium, chlorure d'éthyldiméthylhexadécylammonium, chlorure de benzyldiméthyldécylammonium, chlorure de benzyldiméthyldodécylammonium, chlorure de benzyldiméthyltétradécylammonium et chlorure de benzyldiméthylhexadécylammonium et des mélanges de ceux-ci. - Électrolyte selon l'une ou plusieurs des revendications précédentes,
caractérisé en ce que
le pH de l'électrolyte est dans la plage 7 à 8. - Électrolyte selon l'une ou plusieurs des revendications précédentes,
caractérisé en ce que
l'électrolyte comprend un système tampon choisi dans le groupe constitué de tampons borate, phosphate et carbonate. - Utilisation d'un électrolyte dans un procédé pour le dépôt de revêtements noirs de ruthénium sur des articles conducteurs, en particulier métalliques, par immersion de l'article à revêtir en tant que cathode dans l'électrolyte et établissement d'une circulation de courant électrique entre l'anode et la cathode,
caractérisée en ce que
un électrolyte selon l'une ou plusieurs des revendications précédentes est sélectionné. - Utilisation selon la revendication 10,
caractérisée en ce que
le ruthénium est présent en tant que complexe anionique binucléaire, nitruro-halo ruthénium de formule [Ru2N(H2O)2X8]3-, où X est un ion halogénure. - Utilisation selon la revendication 10 et/ou 11,
caractérisée en ce que
la concentration de ruthénium après dissolution complète du composé est dans la plage allant de 2 à 8 grammes par litre d'électrolyte. - Utilisation selon l'une ou plusieurs des revendications 10 à 12,
caractérisée en ce que
l'électrolyte est exempt d'autres ions de métal de transition. - Utilisation selon l'une ou plusieurs des revendications 10 à 13,
caractérisée en ce que
l'acide carboxylique est choisi dans le groupe constitué d'acide oxalique, acide citrique, acide tartrique, acide succinique, acide maléique, acide glutarique, acide adipique, acide malonique, acide malique. - Utilisation selon l'une ou plusieurs des revendications 10 à 14,
caractérisée en ce que
l'hétérocycle soufré est choisi dans le groupe constitué de sel sodique d'acide 3-(2-benzothiazolyl-2-mercapto)propanesulfonique, sel sodique de saccharine, sel sodique de N-propylsulfonate de saccharine, 2,2-dioxyde de 6-méthyl-3,4-dihydro-1,2,3-oxathiazin-4-one, benzothiazole, 2-mercaptobenzothiazole, thiazole et isothiazole. - Utilisation selon l'une ou plusieurs des revendications 10 à 15,
caractérisée en ce que
l'agent tensioactif est choisi dans le groupe constitué de bromure d'octyltriméthylammonium, chlorure d'octyltriméthylammonium, bromure de décyltriméthylammonium, chlorure de décyltriméthylammonium, bromure de dodécyltriméthylammonium, chlorure de dodécyltriméthylammonium, bromure de tétradécyltriméthylammonium, chlorure de tétradécyltriméthylammonium, bromure d'hexadécyltriméthylammonium, chlorure d'hexadécyltriméthylammonium, bromure d'éthyldiméthylhexadécylammonium, chlorure d'éthyldiméthylhexadécylammonium, chlorure de benzyldiméthyldécylammonium, chlorure de benzyldiméthyldodécylammonium, chlorure de benzyldiméthyltétradécylammonium et chlorure de benzyldiméthylhexadécylammonium et des mélanges de ceux-ci. - Utilisation selon l'une ou plusieurs des revendications 10 à 16,
caractérisée en ce que
une densité de courant de 0,1 à 10 A/dm2 est fixée. - Utilisation selon l'une ou plusieurs des revendications 10 à 17,
caractérisée en ce que
une température de 10 à 80 °C est fixée. - Utilisation selon l'une ou plusieurs des revendications 10 à 18,
caractérisée en ce que
des anodes insolubles constituées d'un matériau choisi dans le groupe constitué de titane platiné, graphite, oxyde mixte d'iridium-métal de transition et matériau carboné spécial et des combinaisons de ces anodes sont utilisées. - Couche noire de ruthénium sur des articles conducteurs, en particulier métalliques, pouvant être obtenue par le procédé d'immersion de l'article à revêtir en tant que cathode dans un électrolyte selon l'une quelconque des revendications 1 à 9 et établissement d'une circulation de courant électrique entre l'anode et la cathode.
- Couche de ruthénium selon la revendication 20,
caractérisée en ce que
elle a une épaisseur allant de 0,1 à 3 µm. - Couche de ruthénium selon la revendication 20,
caractérisée en ce que
la couche a une teneur en soufre allant de 3 % en poids à 6 % en poids dans la région externe de 1 µm. - Couche de ruthénium selon la revendication 20,
caractérisée en ce que
la couche a une teneur en carbone allant de 1 % en poids à 2 % en poids dans la région externe de 1 µm. - Couche de ruthénium selon la revendication 21,
caractérisée en ce que
la couche a une teneur en oxygène allant de 15 % en poids à 20 % en poids dans la région externe de 1 µm.
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DE102011105207.4A DE102011105207B4 (de) | 2011-06-17 | 2011-06-17 | Elektrolyt und seine Verwendung zur Abscheidung von Schwarz-Ruthenium-Überzügen und so erhaltene Überzüge und Artikel |
PCT/EP2012/060924 WO2012171856A2 (fr) | 2011-06-17 | 2012-06-08 | Électrolyte et son utilisation pour le dépôt de revêtements de ruthénium noir et revêtements obtenus en utilisant ledit électrolyte |
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US (1) | US20140131209A1 (fr) |
EP (1) | EP2723922B1 (fr) |
JP (1) | JP2014519555A (fr) |
KR (1) | KR20140033424A (fr) |
CN (1) | CN104040033B (fr) |
DE (1) | DE102011105207B4 (fr) |
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CN105018908A (zh) * | 2015-03-23 | 2015-11-04 | 深圳市贝加电子材料有限公司 | 用于线路板表面处理的化学镀钌溶液和线路板表面处理方法 |
PL3159435T3 (pl) * | 2015-10-21 | 2018-10-31 | Umicore Galvanotechnik Gmbh | Dodatek do elektrolitów do stopu srebro-palladowego |
US10886424B2 (en) | 2018-07-06 | 2021-01-05 | Merlin Solar Technologies, Inc. | Method for blackening a metallic article |
DE102019109188B4 (de) * | 2019-04-08 | 2022-08-11 | Umicore Galvanotechnik Gmbh | Verwendung eines Elektrolyten zur Abscheidung von anthrazit/schwarzen Rhodium/Ruthenium Legierungsschichten |
CN110965088A (zh) * | 2019-08-27 | 2020-04-07 | 周大福珠宝金行(深圳)有限公司 | 一种黄金的复古工艺以及复古黄金 |
DE102020131371A1 (de) * | 2020-11-26 | 2022-06-02 | Umicore Galvanotechnik Gmbh | Rutheniumlegierungsschicht und deren Schichtkombinationen |
US11558010B2 (en) | 2021-02-22 | 2023-01-17 | Merlin Solar Technologies, Inc. | Method for blackening an electrical conduit |
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GB1244309A (en) * | 1967-10-18 | 1971-08-25 | Int Nickel Ltd | Electrodeposition of ruthenium |
DE1959907A1 (de) * | 1968-11-28 | 1970-06-18 | Johnson Matthey Co Ltd | Rutheniumkomplex und seine Verwendung bei der Elektroplattierung |
GB1520140A (en) * | 1976-06-08 | 1978-08-02 | Inco Europ Ltd | Electrodeposition of ruthenium |
EP0018165A1 (fr) * | 1979-04-10 | 1980-10-29 | Inco Europe Limited | Bain et procédé pour le dépôt électrolytique de ruthénium, solution concentrée pour la fabrication de ce bain et objet revêtu de ruthénium |
JPS56119791A (en) * | 1980-02-28 | 1981-09-19 | Nippon Mining Co Ltd | Black ruthenium plating solution |
US4375392A (en) * | 1981-06-02 | 1983-03-01 | Occidental Chemical Corporation | Bath and process for the electrodeposition of ruthenium |
JPS63259095A (ja) * | 1987-04-16 | 1988-10-26 | Nippon Mining Co Ltd | ルテニウムめつき液 |
JPH0254792A (ja) * | 1988-08-16 | 1990-02-23 | Nippon Mining Co Ltd | ルテニウムめつき液 |
US6251249B1 (en) * | 1996-09-20 | 2001-06-26 | Atofina Chemicals, Inc. | Precious metal deposition composition and process |
DE19741990C1 (de) * | 1997-09-24 | 1999-04-29 | Degussa | Elektrolyt zur galvanischen Abscheidung von spannungsarmen, rißfesten Rutheniumschichten, Verfahren zur Herstellung und Verwendung |
JP3816241B2 (ja) * | 1998-07-14 | 2006-08-30 | 株式会社大和化成研究所 | 金属を還元析出させるための水溶液 |
JP3302949B2 (ja) * | 1999-08-03 | 2002-07-15 | 株式会社日鉱マテリアルズ | 黒色ルテニウムめっき液 |
KR20020045934A (ko) * | 2000-12-11 | 2002-06-20 | 이용정 | 보석의 흑색 루테늄 도금방법 |
US6736954B2 (en) * | 2001-10-02 | 2004-05-18 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
US20040154926A1 (en) * | 2002-12-24 | 2004-08-12 | Zhi-Wen Sun | Multiple chemistry electrochemical plating method |
DE502007002036D1 (de) * | 2007-03-28 | 2009-12-31 | Umicore Galvanotechnik Gmbh | Elektolyt und Verfahren zur Abscheidung von dekoraium |
CN101684565B (zh) * | 2009-08-10 | 2012-03-21 | 成都宏明双新科技股份有限公司 | 一种镀黑钌的工艺 |
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2011
- 2011-06-17 DE DE102011105207.4A patent/DE102011105207B4/de active Active
-
2012
- 2012-06-08 KR KR1020137033450A patent/KR20140033424A/ko not_active Application Discontinuation
- 2012-06-08 JP JP2014515143A patent/JP2014519555A/ja active Pending
- 2012-06-08 CN CN201280029704.0A patent/CN104040033B/zh active Active
- 2012-06-08 WO PCT/EP2012/060924 patent/WO2012171856A2/fr active Application Filing
- 2012-06-08 US US14/126,769 patent/US20140131209A1/en not_active Abandoned
- 2012-06-08 EP EP12726136.0A patent/EP2723922B1/fr active Active
- 2012-06-08 ES ES12726136T patent/ES2754262T3/es active Active
Non-Patent Citations (1)
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Also Published As
Publication number | Publication date |
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WO2012171856A3 (fr) | 2014-03-27 |
EP2723922A2 (fr) | 2014-04-30 |
DE102011105207A1 (de) | 2012-12-20 |
CN104040033A (zh) | 2014-09-10 |
KR20140033424A (ko) | 2014-03-18 |
US20140131209A1 (en) | 2014-05-15 |
CN104040033B (zh) | 2017-12-19 |
JP2014519555A (ja) | 2014-08-14 |
DE102011105207B4 (de) | 2015-09-10 |
ES2754262T3 (es) | 2020-04-16 |
WO2012171856A2 (fr) | 2012-12-20 |
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