EP2628607B1 - Verankerungsvorrichtung einer Metall-Einlegearbeit - Google Patents
Verankerungsvorrichtung einer Metall-Einlegearbeit Download PDFInfo
- Publication number
- EP2628607B1 EP2628607B1 EP12155635.1A EP12155635A EP2628607B1 EP 2628607 B1 EP2628607 B1 EP 2628607B1 EP 12155635 A EP12155635 A EP 12155635A EP 2628607 B1 EP2628607 B1 EP 2628607B1
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- EP
- European Patent Office
- Prior art keywords
- recess
- hole
- decoration
- deposition
- order
- Prior art date
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- 238000004873 anchoring Methods 0.000 title description 13
- 229910052751 metal Inorganic materials 0.000 title description 10
- 239000002184 metal Substances 0.000 title description 10
- 238000005034 decoration Methods 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 230000008021 deposition Effects 0.000 claims description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 11
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 8
- 239000007769 metal material Substances 0.000 claims description 8
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 230000000007 visual effect Effects 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 239000011195 cermet Substances 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 238000005240 physical vapour deposition Methods 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 3
- 229910010293 ceramic material Inorganic materials 0.000 claims 3
- 238000001465 metallisation Methods 0.000 claims 3
- 239000013078 crystal Substances 0.000 claims 1
- 238000007772 electroless plating Methods 0.000 claims 1
- 239000000919 ceramic Substances 0.000 description 13
- 208000031968 Cadaver Diseases 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 238000006073 displacement reaction Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000009877 rendering Methods 0.000 description 4
- 238000005844 autocatalytic reaction Methods 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000005494 tarnishing Methods 0.000 description 2
- 241001080024 Telles Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 235000015243 ice cream Nutrition 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/26—Inlaying with ornamental structures, e.g. niello work, tarsia work
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B19/00—Indicating the time by visual means
- G04B19/06—Dials
- G04B19/18—Graduations on the crystal or glass, on the bezel, or on the rim
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B37/00—Cases
- G04B37/22—Materials or processes of manufacturing pocket watch or wrist watch cases
- G04B37/225—Non-metallic cases
- G04B37/226—Non-metallic cases coated with a metallic layer
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
- G04B45/0076—Decoration of the case and of parts thereof, e.g. as a method of manufacture thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12063—Nonparticulate metal component
Definitions
- the invention relates to an encrusted element of at least one metallic decoration and more specifically to such an element comprising a device for anchoring said at least one metallic decoration.
- spectacles at least partially synthetic sapphire to show, by transparency, a deposit made in a hollow under the bezel forming for example a graduation or trade name.
- This configuration has the advantage of protecting the deposit from any mechanical degradation by total recovery of the sapphire part.
- this configuration can make it difficult to read the decoration by the altered transmission of the coloration of the deposit but also by the lack of difference in the hue of the sapphire with respect to that of the deposit.
- the document EP 2,380,864 discloses a ceramic element inlaid with one or more metal decorations.
- the object of the present invention is to overcome all or part of the aforementioned drawbacks while keeping the advantage of mechanical strength and bringing that of an improved visual quality.
- the invention relates to an element comprising a body comprising at least one recess forming the imprint of a decoration, said at least one recess being completely filled by a galvanic deposit to form an inlay element.
- a metallic decor to the quality improved visual characterized in that it comprises a device for anchoring said at least one metallic decoration comprising at least one hole passing through said element, communicating with said at least one recess and being at least partially filled with said galvanic deposit in order to improve the anchoring said at least one decor against said element.
- the decorations are thus much more resistant to tearing without being aesthetically modified.
- the invention relates to a part of the cladding of a timepiece or more generally to a timepiece or a article of jewelery, characterized in that it comprises at least one element according to one of the preceding variants.
- the decorations are manufactured in a great depth of the element which makes them much more resistant to tearing without aesthetically modified.
- a timepiece generally annotated 1 having at least one element 10 encrusted.
- Each element 10 inlaid is intended to form a very wear-resistant part comprising at least a metal decoration 13 whose visual quality is improved in particular in terms of contrast.
- the element 10 inlaid according to the invention can in particular form all or part of the cladding of the timepiece 1.
- it could form all or part of a housing 2, a bracelet 3, a bezel 4, a dial 5, an ice cream 6, a pusher 7 and / or a crown 8.
- the explanation of the invention will be given from a ring 10 having inlaid decorations 13 forming the graduations of a telescope 4.
- inlaid elements 10 belonging to a watchmaking movement such as, for example, a bridge and / or a plate and / or a oscillating weight.
- the inlaid ceramic element 10 comprises a body 11 comprising at least one recess 12 forming the impression of a decoration 13.
- each decoration 13 may, advantageously according to the invention, be of any shape, such as, for example, a geometric figure or an alphanumeric character.
- each recess 12 is completely filled by a galvanic deposit 16 formed by a metallic material. This configuration makes it possible to protect each decoration 13 in the body 11.
- the body 11 is electrically conductive ceramic like a cermet.
- a cermet is a material formed by a mixture of ceramic and metal. It may, for example, comprise TiC, SiN or ZrC to form all or part of the body 11.
- the body 11 may also be of a material that is not electrically conductive.
- the decoration 13 further comprises at least one electrically conductive layer of substantially 50 nm between the body 11 and the galvanic deposit 16.
- the body 11 can then be formed for example of ceramic or zirconia for its mechanical properties, its polishing ability and, to a lesser extent, its ability to offer a wide range of hues.
- the body 11 can be formed from an electrically conductive material or not. Therefore, the body 11 can be obtained from a wide variety of materials.
- the recess 12 preferably comprises a depth of between 80 ⁇ m and 200 ⁇ m .
- each recess 12 has a continuous surface at least partially radiated, that is to say that their inner surface has no edges.
- the inlaid element 10 further comprises a device for anchoring said at least one metallic decoration 13 communicating with said at least one recess 12 in order to improve the anchoring of said at least one decoration 13 against said element 10.
- the anchoring device comprises at least one hole 14 passing through said element 10 and being at least partially filled by said galvanic deposit 16 and, optionally, said at least one electrically conductive layer 15 in order to increase the contact surface with said element .
- the diameter of the hole 14 can flare as it moves away from said at least one recess 12 in order to maintain said galvanic deposit 16 and, optionally, said at least one layer 15 electrically conductive, against said element 10.
- the hole 14 is substantially conical, the diameter of the hole 14 opening into the recess 12 being smaller than the remainder of the hole 14, the decorations 13 can no longer be removed .
- the galvanic deposit 16 can also completely fill the said at least one hole 14 in order to maximize the area of contact with the body 18, 18 'of the element.
- the thickness of the body 18, 18 ' is substantially equal to or less than four times the depth of the recesses 12 such as for example a dial 5 of a timepiece.
- the body 18 comprises at least one recess 12 communicating with at least one hole 14 which opens on the face P opposite to the face F intended to receive said at least one recess 12. It is therefore clear that the body 18 is hollowed from side to side. go.
- the galvanic deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposite to that communicating with said at least one recess 12 in order to block any displacement of said at least one decor 13 relative to to the body 18. It is therefore understood that the galvanic deposit 16 protrudes with respect to said opposite face P.
- the body 18 ' has at least one recess 12 communicating with at least one hole 14 which opens on a recess 20 of the face P opposite to the face F for receiving said at least one recess 12. It is therefore understood that the body 18 is dug through.
- the galvanic deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposite to that communicating with said at least one recess 12 in order to block any displacement of said at least one decor 13 relative to to the body 18 '. It is therefore understood that the galvanic deposit 16 is intended to remain only in the recess 20, that is to say not to project relative to said opposite face P.
- a layer for improving the gripping force of the future decoration 13 on the body 11 may be used.
- a layer for example of substantially 50 nm, can be deposited between the galvanic deposit 16 and, optionally, the layer Electrically conductive, and the body 11, 18, 18 '.
- materials such as, for example, Cr, Cr 2 N, TiN, TiW, Ni, NiP, Cu, Ti or Zr.
- the galvanic plating 16 and, optionally, said at least one electrically conductive layer 15 may also be formed from a wide variety of materials.
- the electrically conductive layer 15 is chosen for its adhesion capacity and its good electrical conductivity necessary for electroforming.
- the visual rendering of each decoration 13 is mainly obtained by the color of the galvanic deposit 16. Therefore, the material used for the galvanic deposition 16 will preferably be guided by its hue or more generally its aesthetic rendering.
- the metallic galvanic deposit 16 and, incidentally, the layer 15 comprise gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel.
- the decorations 13 can be formed with the same metal to provide an appearance homogeneous or with several different metals to, for example, give a different hue between two decorations as a hue for the indexes and another for alphanumeric characters in the case of the figure 1 .
- decorations 13 of the same material as that surrounding the body 11, 18, 18 ' could thus, in an exemplary embodiment of the figure 1 , having decorations 13 of bezel 4 of the same material as the case 2, the bracelet 3, the rest of the telescope 4, the dial 5, the pushers 7 and / or the crown 8.
- the element 10 inlaid may, according to the invention, also provide an optional substantially transparent layer to protect the decorations 13 of aging.
- a layer may, for example, comprise silicon nitride which makes it possible in particular to combat the tarnishing of the galvanic deposit 16 and, possibly, of said at least one electrically conductive layer 15, especially when these are mainly formed of silver. .
- the manufacturing method 21 of an inlaid element 10 will now be explained from the Figures 2 to 9 with the example of a body 11 electrically non-conductive ceramic.
- the body 11 may be made from a material other than electrically non-conductive ceramic as explained above.
- a first step 22 illustrated in the figure 9 the method 21 consists in forming the body 11, for example made of zirconia.
- the final body 11 of step 22 is preferably obtained by sintering, that is to say from a preformed green body 17 using an injection process.
- the body 11 visible to the figure 4 has its final dimensions.
- the method 21 comprises a second step 23 intended to etch at least one blind recess 12 in a face F of the ceramic body 11, the recesses 12 forming the imprint of the future decorations 13 as visible at Figures 2 and 5 .
- each recess 12 has a depth of between 80 and 200 ⁇ m .
- each recess 12 has a continuous surface at least partially radiated to facilitate the setting implementation of the electroforming step 26 explained below.
- Step 23 is preferably obtained by destructive radiation using a laser to obtain a good accuracy of the etchings.
- the method 21 continues in a third step 24 for engraving at least one hole 14 communicating with each recess 12 to form an anchoring device.
- a third step 24 for engraving at least one hole 14 communicating with each recess 12 to form an anchoring device.
- one or more holes 14 are made for each recess 12.
- the step 24 is preferably obtained by destructive radiation by means of a laser to obtain a good accuracy of the engravings.
- each one hole 14 passes through the body 11 of the element 10 so that it can be at least partially filled during the step 26 by the metal material 16 and, optionally, during the steps 25 and 25 ' by said at least one electrically conductive layer to increase the area of contact with said element.
- the electrolyte can thus flow "in front of” and “behind” the recess 12, that is to say that it can be deposited in each recess 12 and in each hole 14 at any time of the electroforming step 26.
- each hole 14 becomes smaller as it moves away from said at least one recess 12 in order to block the future metal material 16 and, possibly, said at least one electrically conductive layer 15 against the element 10.
- each hole 14 may thus comprise a diameter substantially equal to 100 ⁇ m at the bottom of the recess 12 and finish with a diameter substantially equal to 120 ⁇ m or more at the opposite face P of the body 11.
- step 24 is, advantageously according to the invention, carried out by orienting the laser beam from the opposite face P in order to directly form said at least one hole 14 in a conical manner, that is to say in which the largest diameter is at the junction with the opposite P face.
- step 24 continues with step 25 'of the method 21 of depositing at least one electrically conductive layer of substantially 50 nm on the entire face F having said at least one recess 12 and said at least one hole 14.
- the step 25 ' can be carried out wet, such as for example a chemical autocatalysis (also known as "electroless") or dry, such as a physical vapor deposition.
- the method 21 continues with step 26.
- such a layer 15 may, for example, be gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel.
- step 24 continues with step 25 of the method 21 of depositing an intermediate layer as explained above.
- the intermediate layer is then preferably carried out by the dry route, such as, for example, by physical vapor deposition.
- the method 21 continues, either with step 25 'of the first embodiment before going to step 26, or directly with step 26. .
- step 24 continues directly with step 26.
- This embodiment relates to the first variant which preferably uses an electrically conductive ceramic as a material for the body 11.
- Step 26 consists in depositing galvanically a metal material 16 from the face F of the body 11 and, possibly, the conductive layer 15, in order to completely fill each recess 12 and at least partially each hole 14 as visible in FIG. figure 7 . Moreover, as explained in the two alternatives of anchoring device Figures 10 and 11 during step 26, the metal deposit 16 can completely fill said at least one hole 14. Finally, during this same step 26, the metal deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposed to that communicating with said at least one recess 12 in order to block any displacement of at least one decor 13 relative to the body 18, 18 '.
- the holes 14 and, optionally, the recesses 20 is forced by agitation, that is to say the installation of a forced displacement of the fluids of the electroplating bath, in order to avoid problems of filling the recesses 12, the holes 14 and, possibly, the recesses 20.
- the metallic material deposited during step 26 comprises gold and / or copper and / or silver and / or silver. indium and / or platinum and / or palladium and / or nickel.
- a sixth step 27 the process 21 ends by removing any deposit 16 and, possibly 15, the surface F of the body 11, 18, 18 'so as to leave only at the level of each recess 12 and holes 14 as visible to the figure 8 , 10 or 11 .
- the element 10 inlaid is thus completed and possibly has only to be mounted on a final part.
- This step 27 can be achieved by a conventional surfacing method such as grinding or lapping to remove excess material followed by polishing.
- the method 21 according to the invention may also provide a last optional step intended to deposit a layer substantially transparent to protect the decorations 13 of aging.
- a layer may, for example, comprise silicon nitride making it possible, in particular, to combat the tarnishing of the metallic material 16 and, possibly, of said at least one electrically conductive layer, especially when these are mainly formed on the basis of money.
- the present invention is not limited to the illustrated example but is susceptible of various variations and modifications that will occur to those skilled in the art.
- the application of the element 10 inlaid according to the invention can not be limited to a timepiece 1.
- the element 10 inlaid could, for example, be applied to a jewelry item or jewelery or the arts of the table.
- step 23 could be interchanged with that of the holes 14 of step 24 without reducing the advantages of the invention. It is also conceivable to substitute the laser etching of step 23 and / or step 24 by another type of etching if its accuracy and its scrap rate is acceptable.
- step 25 or step 25 ' is not limited to chemical autocatalysis or physical vapor deposition but may alternatively be performed, for example, by chemical vapor deposition. , atomic layer deposition or ion bombardment.
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Adornments (AREA)
- Electroplating Methods And Accessories (AREA)
- Physical Vapour Deposition (AREA)
Claims (25)
- Element (10), das einen Körper (11, 18, 18') umfasst, der wenigstens eine Vertiefung (12) aufweist, die eine Prägung einer Verzierung (13) bildet, wobei die wenigstens eine Vertiefung vollständig mit einem galvanischen Niederschlag (16) gefüllt ist, um ein Element (10) zu bilden, das mit wenigstens einer metallischen Verzierung (13) mit verbesserter visueller Qualität inkrustiert ist, dadurch gekennzeichnet, dass es eine Vorrichtung für die Verankerung der wenigstens einen metallischen Verzierung umfasst, die wenigstens ein durch das Element (10) verlaufendes Loch (14) aufweist, das mit der wenigstens einen Vertiefung (12) kommuniziert, und wenigstens teilweise mit dem galvanischen Niederschlag (16) gefüllt ist, um die Verankerung der wenigstens einen Verzierung an dem Element zu verbessern.
- Element (10) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass sich der Durchmesser des wenigstens einen Lochs (14) mit zunehmender Entfernung von der wenigstens einen Vertiefung (12) erweitert, um den metallischen Niederschlag (16) an dem Element zu halten.
- Element (10) nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass der galvanische Niederschlag (16) das wenigstens eine Loch (14) vollständig füllt.
- Element (10) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass der galvanische Niederschlag die Schulter (19) des Endes des wenigstens einen Lochs (14), das sich gegenüber jenem befindet, das mit der wenigstens einen Vertiefung (12) kommuniziert, abdeckt, um jegliche Verschiebung der wenigstens einen Verzierung (13) in Bezug auf den Körper (18, 18') zu blockieren.
- Element (10) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der metallische galvanische Niederschlag (16) Gold und/oder Kupfer und/oder Silber und/oder Indium und/oder Platin und/oder Palladium und/oder Nickel enthält.
- Element (10) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass jede der wenigstens einen Vertiefung (12) eine Tiefe besitzt, die im Bereich von 80 µm bis 200 µm liegt, um die Verankerungskraft zu verbessern.
- Element (10) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Körper (11, 18, 18') aus elektrisch leitender Keramik besteht.
- Element (10) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass der Körper (11, 18, 18') ganz oder teilweise aus Cermet besteht.
- Element (10) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Körper (11, 18, 18') nicht elektrisch leitend ist und dass die Verzierung (13) außerdem zwischen dem Körper (11, 18, 18') und dem galvanischen Niederschlag (16) wenigstens eine elektrisch leitende Schicht (15) von im Wesentlichen 50 nm aufweist.
- Element (10) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass der Körper (11, 18, 18') auf Zirkonoxid-Basis gebildet ist.
- Zeitmessgerät (1), dadurch gekennzeichnet, dass es wenigstens ein Element (10) nach einem der vorhergehenden Ansprüche umfasst.
- Zeitmessgerät (1) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass der Körper (11, 18, 18') des Elements ein Gehäuse (2) und/oder ein Armband (3) und/oder einen Glasreif (4) und/oder ein Zifferblatt (5) und/oder ein Uhrenglas (6) und/oder einen Drücker (7) und/oder eine Krone (8) ganz oder teilweise bildet.
- Juwelier- oder Schmuckartikel, dadurch gekennzeichnet, dass er wenigstens ein Element (10) nach einem der Ansprüche 1 bis 10 enthält.
- Verfahren (21) zum Herstellen eines Elements (10), das die folgenden Schritte umfasst:a) Bilden (22) eines Körpers (11, 18, 18');b) Ätzen (23) wenigstens einer Vertiefung (12) in eine Fläche (F) des Körpers (11, 18, 18'), wobei jede der wenigstens einen Vertiefung eine Prägung einer Verzierung (13) bildet;c) Ätzen (24) wenigstens eines durch den Körper (11, 18, 18') verlaufenden Lochs (14), das mit der wenigstens einen Vertiefung (12) kommuniziert, um eine Verankerungsvorrichtung zu bilden;d) galvanisches Ablagern (26) eines metallischen Materials (16), um die wenigstens eine Vertiefung vollständig und das wenigstens eine Loch wenigstens teilweise zu füllen;e) Entfernen (27) jeglichen Niederschlags (16) von der Oberfläche des Körpers (11, 18, 18'), damit er nur in dem Hohlraum der wenigstens einen Vertiefung und des wenigstens einen Lochs zurückbleibt.
- Verfahren (21) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass sich der Durchmesser des wenigstens einen Lochs (14) mit zunehmender Entfernung von der wenigstens einen Vertiefung (12) erweitert, um den galvanischen Niederschlag (16) an dem Element zu halten.
- Verfahren (21) nach einem der Ansprüche 14 oder 15, dadurch gekennzeichnet, dass im Schritt d) der metallische Niederschlag (16) das wenigstens eine Loch (14) vollständig füllt.
- Verfahren (21) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass im Schritt d) der metallische Niederschlag (16) die Schulter (19) des Endes des wenigstens einen Lochs (14), das sich gegenüber jenem befindet, das mit der wenigstens einen Vertiefung (12) kommuniziert, abdeckt, um jegliche Verlagerung der wenigstens einen Verzierung (13) in Bezug auf den Körper (18, 18') zu blockieren.
- Verfahren (21) nach einem der Ansprüche 14 bis 17, dadurch gekennzeichnet, dass der Körper (11) aus einer elektrisch leitenden Keramik besteht.
- Verfahren (21) nach einem der Ansprüche 14 bis 17, dadurch gekennzeichnet, dass der Körper (11, 18, 18') aus einer nicht elektrisch leitenden Keramik besteht und dass das Verfahren (21) außerdem zwischen dem Schritt c) und dem Schritt d) den folgenden Schritt umfasst:f) Ablagern (25') wenigstens einer elektrisch leitenden Schicht (15) von im Wesentlichen 50 nm auf der gesamten Fläche (F), die die wenigstens eine Vertiefung und das Loch aufweist.
- Verfahren (21) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass der Schritt f) durch chemische Autokatalyse oder durch physikalische Abscheidung aus der Dampfphase ausgeführt wird.
- Verfahren (21) nach einem der Ansprüche 18 bis 20, dadurch gekennzeichnet, dass der Schritt a) durch Sintern ausgeführt wird.
- Verfahren (21) nach einem der Ansprüche 14 bis 21, dadurch gekennzeichnet, dass der Schritt b) durch einen Laser bis zu einer Tiefe im Bereich von 80 µm bis 200 µm ausgeführt wird, um die Verankerungskraft zu verbessern.
- Verfahren (21) nach einem der Ansprüche 14 bis 22, dadurch gekennzeichnet, dass der Schritt c) durch einen Laser ausgeführt wird, wobei der Strahl ausgehend von der Fläche (P) gegenüber jener (F), die die wenigstens eine Vertiefung (12) aufnehmen soll, orientiert wird.
- Verfahren (21) nach einem der Ansprüche 14 bis 23, dadurch gekennzeichnet, dass die Schritte b) und c) vertauscht sind.
- Verfahren (21) nach einem der Ansprüche 14 bis 24, dadurch gekennzeichnet, dass jede der wenigstens einen Vertiefung (12) eine wenigstens teilweise bestrahlte (R) ununterbrochene Oberfläche aufweist, um die Ausführung des Schrittes (d) zu erleichtern.
Priority Applications (7)
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EP12155635.1A EP2628607B1 (de) | 2012-02-15 | 2012-02-15 | Verankerungsvorrichtung einer Metall-Einlegearbeit |
IN544CH2013 IN2013CH00544A (de) | 2012-02-15 | 2013-02-08 | |
CN2013100506786A CN103253067A (zh) | 2012-02-15 | 2013-02-08 | 用于固定地紧固金属镶嵌物的装置 |
CN201810612134.7A CN108749459A (zh) | 2012-02-15 | 2013-02-08 | 用于固定地紧固金属镶嵌物的装置 |
US13/764,961 US9150978B2 (en) | 2012-02-15 | 2013-02-12 | Device for fixedly securing a metallic inlay |
RU2013106520A RU2620941C2 (ru) | 2012-02-15 | 2013-02-14 | Средство для неподвижного крепления металлической вставки |
JP2013027497A JP2013167628A (ja) | 2012-02-15 | 2013-02-15 | 金属嵌め込み細工を確実に固定する素子 |
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EP12155635.1A EP2628607B1 (de) | 2012-02-15 | 2012-02-15 | Verankerungsvorrichtung einer Metall-Einlegearbeit |
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EP (1) | EP2628607B1 (de) |
JP (1) | JP2013167628A (de) |
CN (2) | CN103253067A (de) |
IN (1) | IN2013CH00544A (de) |
RU (1) | RU2620941C2 (de) |
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2012
- 2012-02-15 EP EP12155635.1A patent/EP2628607B1/de active Active
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2013
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JP2013167628A (ja) | 2013-08-29 |
EP2628607A1 (de) | 2013-08-21 |
IN2013CH00544A (de) | 2015-08-07 |
RU2620941C2 (ru) | 2017-05-30 |
RU2013106520A (ru) | 2014-08-20 |
US20130208577A1 (en) | 2013-08-15 |
CN108749459A (zh) | 2018-11-06 |
US9150978B2 (en) | 2015-10-06 |
CN103253067A (zh) | 2013-08-21 |
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