EP2625258B1 - Composition de nettoyage de polymères - Google Patents

Composition de nettoyage de polymères Download PDF

Info

Publication number
EP2625258B1
EP2625258B1 EP11779790.2A EP11779790A EP2625258B1 EP 2625258 B1 EP2625258 B1 EP 2625258B1 EP 11779790 A EP11779790 A EP 11779790A EP 2625258 B1 EP2625258 B1 EP 2625258B1
Authority
EP
European Patent Office
Prior art keywords
dmso
polymer
meoa
mixture
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP11779790.2A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2625258A1 (fr
Inventor
Mélanie VAUTHRIN
Bernard Monguillon
Paul Guillaume Schmitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arkema France SA
Original Assignee
Arkema France SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France SA filed Critical Arkema France SA
Priority to PL11779790T priority Critical patent/PL2625258T3/pl
Priority to SI201131683T priority patent/SI2625258T1/sl
Publication of EP2625258A1 publication Critical patent/EP2625258A1/fr
Application granted granted Critical
Publication of EP2625258B1 publication Critical patent/EP2625258B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D11/00—Special methods for preparing compositions containing mixtures of detergents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2003—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2068—Ethers
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2093—Esters; Carbonates
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/30—Amines; Substituted amines ; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3445—Organic compounds containing sulfur containing sulfino groups, e.g. dimethyl sulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3227—Ethers thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/20—Industrial or commercial equipment, e.g. reactors, tubes or engines

Definitions

  • the present invention relates to the field of plastics processing, more specifically the field of molding, injection molding, injection molding, extrusion molding, extrusion molding, and other processing techniques. plastics.
  • the invention relates to the cleaning of various devices used in the plastics processing industries. These devices are for example molds, injection nozzles, extrusion screws, and, in general, all the parts, most often but not necessarily metal, which come into contact more or less prolonged with one or more plastics brought to higher or lower temperatures and cooled to allow their transformation.
  • polymer residues of various shapes and sizes more or less important, can remain in contact with the mold.
  • polymer residues can be torn off the molded object and adhere to the walls of the mold.
  • the patent application US2010 / 0104824 discloses a stripping composition containing DMSO (dimethylsulfoxide), a quaternary ammonium hydroxide, an alkanolamine, optionally an additional solvent and a surfactant for cleaning polymeric residues from the electronic substrates.
  • DMSO dimethylsulfoxide
  • the patent application US2010 / 0242999 discloses a cleaning composition comprising an isophthalic acid sulphonate or isophthalic diester acid sulfonate, a glycol, optionally DMSO and amines for cleaning organic resins of inorganic substrates.
  • the patent US6367486 discloses a cleaning composition comprising EDTA or its salt, optionally an amine or alkanolamine, optionally a solvent, optionally an ammonium salt, optionally a chelant and water for cleaning polymeric residues from electronic substrates.
  • the patent application US2003 / 0130149 discloses a stripping composition comprising a pyrrolidone and / or a piperidone, an alkanolamine, a sulfoxide and / or a sulfoxone for cleaning the polymer residues of the electronic substrates.
  • the patent application US2004 / 0259761 discloses a cleaning composition comprising a quaternary ammonium hydroxide, potassium hydroxide, a solvent such as an amine and / or DMSO, water and an anti-corrosive for cleaning polymer residues from substrates.
  • the patent US6475966 discloses a cleaning composition comprising a solvent such as DMSO, a quaternary ammonium hydroxide and a hydroxylamine and optionally organic additives for cleaning polymeric substrate residues.
  • the patent application US2003 / 0104960 discloses a composition comprising a dibasic acid diester, DMSO, a carbonate, a lactic acid ester and a tertiary amine for cleaning the polymeric residues.
  • the patent application US2002 / 0037820 discloses a composition comprising one or more fluorinated compounds, one or more solvents such as sulfoxides or sulfones, water, optionally basic amines, cosolvents, corrosion inhibitors, chelating agents, surfactants, acids and bases, to strip photoresists and clean organic and inorganic compounds present on a semiconductor substrate.
  • solvents such as sulfoxides or sulfones
  • water optionally basic amines, cosolvents, corrosion inhibitors, chelating agents, surfactants, acids and bases
  • DMF dimethylformamide
  • compositions for removing the polymer layers during the preparation of printed circuits (“photoresist stripper" in English), the compositions necessarily containing a quaternary ammonium hydroxide.
  • the document US 2003/0104960 A1 discloses a five-component composition capable of dissolving polymerization residues, the five components being dibasic acid esters, DMSO, a carbonate, a lactic acid ester and a tertiary amine with a boiling point between 130 ° C and 370 ° C under one (1) atmosphere.
  • a first objective of the present invention is to propose new products, formulations, compositions, cleaning of polymer residues which are less toxic and less harmful than the solvents used today, or even products, formulations, compositions, cleaning of non-toxic and non-harmful residues for the environment and users.
  • Another object of the present invention is to provide products, formulations, compositions, cleaning of polymer residues that are more effective than known solvents and used today.
  • the present invention relates to a composition consisting of 80% to 90% dimethylsulfoxide (DMSO), 2% to 9% monoethanolamine (MEoA) and 5% to 15%, for example about 8% water, and optionally from a few ppm by weight to 1% of a corrosion inhibitor.
  • DMSO dimethylsulfoxide
  • MEoA monoethanolamine
  • DMSO is a solvent considered to be non-harmful and non-toxic. In addition, it may be available in various degrees of purity, the high purity DMSO having virtually no odor, at least no foul odor. According to one variant, the DMSO used can advantageously be perfumed with at least one odorant.
  • compositions of the invention In addition to DMSO and monoethanolamine, the presence of a quantity of water in the compositions of the invention has been found to be advantageous in allowing even more efficient dissolution of polymer residues.
  • compositions of the invention has the additional advantage of lowering the crystallization point of said compositions.
  • compositions according to the present invention may comprise a corrosion inhibitor as an additive.
  • corrosion inhibitors mention may be made of catechol, sodium tolyltriazolate and morpholine, for example.
  • compositions of the present invention may comprise, instead of DMSO, a mixture of DMSO and at least one other non-nitrogenous solvent.
  • non-nitrogenous solvents mention may be made, by way of non-limiting examples, of alcohols, ethers, esters and other non-nitrogenous solvents compatible with the compositions as just described.
  • the mono-functional and / or di-functional esters are preferred.
  • alkyl denotes a hydrocarbon chain, linear or branched, comprising from 1 to 6 carbon atoms.
  • These esters advantageously come from mono- and / or dicarboxylic acids containing from 3 to 30 carbon atoms, in a linear or branched chain.
  • Methyl, ethyl, propyl and butyl esters of formic, acetic, propionic, butyric, maleic, succinic, glutaric, 2-methylglutaric and other acids and mixtures thereof in all proportions are particularly preferred.
  • compositions of the invention may be prepared by any method known in the art, and for example by simply mixing the various ingredients in any order. However, it is preferred to add MEoA in the DMSO / water mixture. The corrosion inhibitor is advantageously added to the final mixture DMSO / MEoA and water.
  • the subject of the present invention is the use of at least one of the compositions as they have just been defined, for the partial or total dissolution of polymers, and in particular for the cleaning of polymer residues. .
  • cleaning polymer residues is meant the partial or total dissolution of polymers with the compositions of the present invention.
  • the polymers that can be partially or completely dissolved are of all types, thermoplastic and thermosetting, in particular thermoplastics.
  • the polymers contemplated in the use of the present invention are, for example, chosen from, in a nonlimiting manner, fluorinated polymers, such as polyvinyl difluoride or PVDF, nitrogen-containing polycondensates, such as those carrying amide groups, imide, amido-amide, urethane, nitrile, sulfur-containing polycondensates, such as those bearing sulfone groups, and the like.
  • fluorinated polymers such as polyvinyl difluoride or PVDF
  • nitrogen-containing polycondensates such as those carrying amide groups, imide, amido-amide, urethane, nitrile
  • sulfur-containing polycondensates such as those bearing sulfone groups, and the like.
  • compositions of the invention are particularly suitable for cleaning polymers chosen from polyurethanes, polyamides, polyamide-imides, polyether sulfones, polyacrylonitriles and the like, and more particularly suitable for dissolving and cleaning polyurethanes. .
  • compositions of the invention are particularly effective for the cleaning of polyurethane residues for which the solvent of choice until now was DMF which is now proscribed, in particular by the European directives.
  • the compositions of the present invention are carried out in a temperature range from room temperature to 90 ° C.
  • the effectiveness of the compositions according to the invention decreases rapidly when the temperature decreases, and, below the ambient temperature, the time required for effective cleaning can be relatively long. Above 90 ° C, the cleaning composition can generate annoying vapors, but it is possible to work in ventilated or closed enclosure, thus allowing to work at the boiling temperature of the cleaning composition.
  • compositions according to the invention at a temperature of between 30 ° C. and 70 ° C., for example between 50 ° C. and 65 ° C.
  • the present invention relates to a method for cleaning polymer residues present on apparatus used in the transformation of plastics as defined above, said method comprising at least one step of contacting said apparatus contaminated with said polymer residues, with at least one composition according to the present invention, under the temperature conditions indicated above.
  • contacting is meant a partial or total immersion of the apparatus to be cleaned, with or without agitation, a spraying of the apparatus to be cleaned with a cleaning composition at various pressures, for example by means of a brush, a spray gun, and others.
  • the contacting can be simply wiping with a cloth, sponge or other absorbent / desorbent material soaked with the cleaning composition.
  • the placing in contact defined above can optionally be accompanied by a physical cleaning, for example using tools, such as spatulas, scrapers, and others.
  • the reference solvent is DMF; for cleaning the molds, they are usually immersed for a few hours in a DMF bath heated to 60 ° C.
  • the tests are carried out here in 20 ml glass bottles. 10 ml of the cleaning composition (in this case DMF on the one hand and DMSO alone on the other hand) preheated in an oven at approximately 60 ° C. is introduced into each flask. A sample of polyurethane (PU) of parallelepipedal shape (about 10 ⁇ 5 ⁇ 2 mm) is then introduced into each bottle. The flasks are closed and left without stirring in the oven at 60 ° C.
  • the cleaning composition in this case DMF on the one hand and DMSO alone on the other hand
  • PU polyurethane
  • the swelling of the samples is observed first after about 2 to 3 minutes of immersion. After 25 minutes, the PU is not dissolved in the DMF nor in the DMSO. The difference in efficacy between DMF and DMSO is observed over time: after 18 hours at 60 ° C, PU begins to solubilize in DMF while nothing happens in DMSO. DMF is therefore more efficient than DMSO alone.
  • Example 2 The same protocol as in Example 1 is repeated using a mixture of DMSO (95.5%) and diacetone alcohol (4.5%). As in DMSO, the DMSO / diacetone alcohol mixture is observed to swell the PU, but no dissolution, even after 18 hours immersion of the sample.
  • Example 2 The same protocol as in Example 1 is repeated using a mixture of DMSO (95.5%) and monoethanolamine (4.5%), immersion for 18 hours at 60 ° C.
  • a DMSO / MEoA mixture is therefore clearly more effective than DMF alone.
  • Example 2 The same protocol as in Example 1 is repeated by comparing a DMSO / MEoA composition (95.5% / 4.5%) and a DMSO / MEoA / Water composition (87.5% / 4.5% / 8%).
  • the PU After 4h at 60 ° C, the PU is completely dissolved in the DMSO / MEoA / water mixture, while it is not dissolved in the DMSO / MEoA mixture (95.5% / 4.5%).
  • a DMSO / MEoA / water mixture is therefore clearly more effective than a DMSO / MEoA mixture.
  • the PU sample dissolution tests are carried out, by varying the concentration of MEoA in DMSO, by 1 to 5%.
  • the DMSO + 1% MEoA mixture is more effective than the DMF alone, since already after 1 hour at 60 ° C, we start to see flakes of PU suspended in the mixture, whereas no effect (except swelling of the sample) is observed, neither the DMF nor in the DMSO.
  • Example 6 Lowering of the crystallization point in the presence of water in cleaning compositions based on DMSO
  • the crystallization point of DMSO is 18.5 ° C, which often poses storage and handling problems in winter.
  • the crystallization point of a DMSO (95%) + MEA (5%) mixture is about 15 ° C. This crystallization point can be further lowered by adding water to the composition.
  • a test is carried out by adding 8% by weight of water in DMSO, then the MEoA is added (5% by weight in the preceding mixture). The crystallization point of this mixture is measured at -2.9 ° C., whereas a DMSO / water mixture (92% / 8%) has a crystallization point close to 0 ° C.
  • dissolution tests are carried out on this DMSO / MEoA / water mixture (ie 87.6% / 4.8% / 7.6%).
  • the PU sample After 3 hours at 60 ° C, the PU sample is completely dissolved in this mixture, whereas it only begins to dissolve in the DMSO / MEoA mixture (95% / 5%) and no dissolution is still observed in DMF: the addition of water in the DMSO / MEA mixture accelerates the dissolution of the PU.
  • Example 7 Influence of the Water Content on the Dissolution of Polyurethane (PU) in a DMSO / MEoA / Water Mixture
  • Example 2 The same protocol as in Example 1 is repeated by comparing DMSO / MEoA / water compositions with variable water contents.
  • Example 8 Dissolution of Polyurethane (PU) in a DMSO / non-nitrogen solvent / MEoA / water mixture
  • Example 2 The same procedure as in Example 1 is repeated using a mixture of DMSO (50% by weight) and dimethyl glutarate (50% by weight). As in DMSO, dimethyl DMSO / 2-methylglutarate is observed to swell the PU, but no dissolution even after 18 hours immersion of the sample.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Detergent Compositions (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Paints Or Removers (AREA)
EP11779790.2A 2010-10-05 2011-10-04 Composition de nettoyage de polymères Active EP2625258B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PL11779790T PL2625258T3 (pl) 2010-10-05 2011-10-04 Kompozycja do czyszczenia z polimerów
SI201131683T SI2625258T1 (sl) 2010-10-05 2011-10-04 Sestavek za čiščenje polimerov

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1058050A FR2965567B1 (fr) 2010-10-05 2010-10-05 Composition de nettoyage de polymeres
PCT/FR2011/052309 WO2012045971A1 (fr) 2010-10-05 2011-10-04 Composition de nettoyage de polymères

Publications (2)

Publication Number Publication Date
EP2625258A1 EP2625258A1 (fr) 2013-08-14
EP2625258B1 true EP2625258B1 (fr) 2019-01-16

Family

ID=44122673

Family Applications (1)

Application Number Title Priority Date Filing Date
EP11779790.2A Active EP2625258B1 (fr) 2010-10-05 2011-10-04 Composition de nettoyage de polymères

Country Status (13)

Country Link
US (1) US9212340B2 (ja)
EP (1) EP2625258B1 (ja)
JP (1) JP5823524B2 (ja)
KR (2) KR20130060323A (ja)
CN (1) CN103119148B (ja)
AU (1) AU2011311433B2 (ja)
BR (1) BR112013008332A2 (ja)
CA (1) CA2809850C (ja)
FR (1) FR2965567B1 (ja)
PL (1) PL2625258T3 (ja)
SI (1) SI2625258T1 (ja)
TR (1) TR201903049T4 (ja)
WO (1) WO2012045971A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5937504B2 (ja) * 2012-12-26 2016-06-22 株式会社カネコ化学 樹脂除去用溶剤組成物
JP6122333B2 (ja) * 2013-04-12 2017-04-26 コーデックケミカル株式会社 洗浄剤組成物及び該組成物を含有する洗浄剤並びにそれらを用いた洗浄方法
DE102014206875A1 (de) * 2014-04-09 2015-10-15 Wacker Chemie Ag Verfahren zur Reinigung von technischen Anlagenteilen von Metallhalogeniden
CN106434044A (zh) * 2015-08-06 2017-02-22 盛德罗宝节能材料科技股份有限公司 一种用于装饰保温一体化板表面的聚氨酯污染清洗剂

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020037820A1 (en) * 2000-07-10 2002-03-28 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductor devices

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6492311B2 (en) * 1990-11-05 2002-12-10 Ekc Technology, Inc. Ethyenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal composition and process
US6475966B1 (en) * 2000-02-25 2002-11-05 Shipley Company, L.L.C. Plasma etching residue removal
US7456140B2 (en) * 2000-07-10 2008-11-25 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductor devices
KR20040032855A (ko) * 2001-07-13 2004-04-17 이케이씨 테크놀로지, 인코포레이티드 술폭시드 피롤리드(인)온 알칸올아민 박리 및 세정 조성물
US20030104960A1 (en) * 2001-11-30 2003-06-05 Opre James E. Liquid cleaning composition for polymer reactor scale
US7442675B2 (en) * 2003-06-18 2008-10-28 Tokyo Ohka Kogyo Co., Ltd. Cleaning composition and method of cleaning semiconductor substrate
US20070243773A1 (en) * 2005-10-28 2007-10-18 Phenis Michael T Dynamic multi-purpose composition for the removal of photoresists and method for its use
US20100104824A1 (en) * 2006-10-23 2010-04-29 Phenis Michael T Dynamic multi-purpose composition for the removal of photoresists
US8309502B2 (en) * 2009-03-27 2012-11-13 Eastman Chemical Company Compositions and methods for removing organic substances

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020037820A1 (en) * 2000-07-10 2002-03-28 Ekc Technology, Inc. Compositions for cleaning organic and plasma etched residues for semiconductor devices

Also Published As

Publication number Publication date
CA2809850A1 (fr) 2012-04-12
AU2011311433B2 (en) 2015-09-17
CN103119148A (zh) 2013-05-22
JP2014500161A (ja) 2014-01-09
PL2625258T3 (pl) 2019-05-31
KR101660199B1 (ko) 2016-09-26
AU2011311433A1 (en) 2013-06-20
BR112013008332A2 (pt) 2016-06-14
CN103119148B (zh) 2016-04-06
TR201903049T4 (tr) 2019-03-21
FR2965567A1 (fr) 2012-04-06
FR2965567B1 (fr) 2013-12-27
KR20130060323A (ko) 2013-06-07
CA2809850C (fr) 2017-07-25
SI2625258T1 (sl) 2019-07-31
KR20150070414A (ko) 2015-06-24
US9212340B2 (en) 2015-12-15
JP5823524B2 (ja) 2015-11-25
US20130310297A1 (en) 2013-11-21
EP2625258A1 (fr) 2013-08-14
WO2012045971A1 (fr) 2012-04-12

Similar Documents

Publication Publication Date Title
TWI386765B (zh) 用於除去光阻劑之動態多用途組成物及其使用方法
EP2625258B1 (fr) Composition de nettoyage de polymères
KR20090082252A (ko) 포토레지스트를 제거하기 위한 동적 다용도 조성물
CA2711205C (fr) Utilisation d'acide alcane sulfonique pour elimination de la rouille
FR2773812A1 (fr) Composition pour decaper les peintures a base d'un ether aromatique
EP0817830B1 (fr) Compositions comprenant un hydrofluorocarbure et procede d'elimination d'eau d'une surface solide
EP3795648A1 (fr) Formulation du diméthylsulfoxyde en melange avec un additif permettant d'abaisser le point de cristallisation de ce dernier, et applications de ce mélange
AU2011317424A1 (en) Carbon oxide capture
FR2566788A1 (fr) Composition de demouillage a base de fluorochlorohydrocarbure de tensio-actif et d'acide carboxylique
EP0887395B1 (fr) Mélange pour le séchage de solides par déplacement d'eau et procédé correspondant
FR2773813A1 (fr) Composition pour decaper les peintures a base d'une cetone cyclique
JP2780578B2 (ja) 洗浄液
JP2015013976A (ja) シリコン溶解洗浄剤組成物及びその溶解洗浄剤を用いた洗浄方法
CA2149083A1 (fr) Compositions comprenant du 1,1-dichloro-1-fluoroethane et procede d'elimination d'eau d'une surface solide

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20130321

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DAX Request for extension of the european patent (deleted)
STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20161107

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20180703

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAJ Information related to disapproval of communication of intention to grant by the applicant or resumption of examination proceedings by the epo deleted

Free format text: ORIGINAL CODE: EPIDOSDIGR1

GRAL Information related to payment of fee for publishing/printing deleted

Free format text: ORIGINAL CODE: EPIDOSDIGR3

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTC Intention to grant announced (deleted)
RIN1 Information on inventor provided before grant (corrected)

Inventor name: MONGUILLON, BERNARD

Inventor name: VAUTHRIN, MELANIE

Inventor name: SCHMITT, PAUL GUILLAUME

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

INTG Intention to grant announced

Effective date: 20181120

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602011055764

Country of ref document: DE

REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: VALIPAT S.A. GEVERS SA, CH

Ref country code: AT

Ref legal event code: REF

Ref document number: 1089710

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190215

REG Reference to a national code

Ref country code: RO

Ref legal event code: EPE

REG Reference to a national code

Ref country code: CH

Ref legal event code: PCAR

Free format text: NEW ADDRESS: RUE DES NOYERS 11, 2000 NEUCHATEL (CH)

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20190116

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190416

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190516

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190516

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190417

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190416

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602011055764

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

26N No opposition filed

Effective date: 20191017

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20191004

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20191004

REG Reference to a national code

Ref country code: AT

Ref legal event code: UEP

Ref document number: 1089710

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20111004

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190116

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CZ

Payment date: 20230926

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: PL

Payment date: 20230926

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20231025

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: TR

Payment date: 20231002

Year of fee payment: 13

Ref country code: SI

Payment date: 20230927

Year of fee payment: 13

Ref country code: RO

Payment date: 20231002

Year of fee payment: 13

Ref country code: IT

Payment date: 20231031

Year of fee payment: 13

Ref country code: FR

Payment date: 20231023

Year of fee payment: 13

Ref country code: DE

Payment date: 20231027

Year of fee payment: 13

Ref country code: CH

Payment date: 20231102

Year of fee payment: 13

Ref country code: AT

Payment date: 20231019

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 20231023

Year of fee payment: 13