EP2598449A1 - Corps en verre de quartz, et procédé et corps gélifié pour la fabrication d'un corps en verre de quartz - Google Patents

Corps en verre de quartz, et procédé et corps gélifié pour la fabrication d'un corps en verre de quartz

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Publication number
EP2598449A1
EP2598449A1 EP11723354.4A EP11723354A EP2598449A1 EP 2598449 A1 EP2598449 A1 EP 2598449A1 EP 11723354 A EP11723354 A EP 11723354A EP 2598449 A1 EP2598449 A1 EP 2598449A1
Authority
EP
European Patent Office
Prior art keywords
quartz glass
gel
cavities
sol
displacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP11723354.4A
Other languages
German (de)
English (en)
Inventor
Thomas Kreuzberger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
QSIL GmbH Quarzschmelze Ilmenau
Original Assignee
QSIL GmbH Quarzschmelze Ilmenau
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Application filed by QSIL GmbH Quarzschmelze Ilmenau filed Critical QSIL GmbH Quarzschmelze Ilmenau
Publication of EP2598449A1 publication Critical patent/EP2598449A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/08—Logistics, e.g. warehousing, loading or distribution; Inventory or stock management
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00—Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/40—Business processes related to the transportation industry
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/20—Wet processes, e.g. sol-gel process
    • C03C2203/22—Wet processes, e.g. sol-gel process using colloidal silica sols
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/04—Opaque glass, glaze or enamel
    • C03C2204/06—Opaque glass, glaze or enamel opacified by gas

Definitions

  • the invention relates to a method for producing a quartz glass body from a gel body, wherein the gel body produced from a sol is at least shaped and compacted into the quartz glass body.
  • the invention further relates to a gel body for the preparation of a
  • Quartz glass body and a quartz glass body are quartz glass bodies and quartz glass bodies.
  • Translucent and opaque quartz glasses are known from the prior art which, in contrast to clear and transparent quartz glasses, have microscopically small gas inclusions in high concentrations. These gas pockets cause light scattering and thus give the glasses a white appearance.
  • Translucency is understood to mean the partial translucency of a body, the quartz glasses, also called silica glasses, being referred to as translucent if light striking the glass is little absorbed despite scattering in the material.
  • Opacity is understood as a reciprocal property of translucency. That is, if a substance has a high translucency, it has a low opacity and vice versa.
  • the opacity is a measure of the
  • the material properties of opaque or translucent quartz glass vary within wide limits, since they are determined both by the particular base glass and by the gas inclusions finely distributed therein. In this case, properties such as spectral absorption, viscosity and chemical purity of the quartz glass are determined by a selection of the base glass.
  • the gas inclusions determine material properties such as density, light scattering, ie the so-called scattering index matrix, and the thermal insulation effect.
  • the behavior of the material during thermal shaping and welding with clear quartz glass is also influenced.
  • the gas inclusions in the material are characterized by parameters, the parameters being a size distribution, a number of gas inclusions per
  • Volume element a typical shape, such as round bubbles or tubes, and a spatial distribution, that is, a homogeneity include. Further parameters are an orientation or isotropy, a gas composition, a gas pressure as well as a relationship between an open and a closed porosity.
  • the base glass is made of silicon dioxide.
  • sources of the silica quartz crystal granules of natural or synthetic origin, quartz glass granules of natural or synthetic raw materials, flocks of quartz glass granules and nanoscale silica, such as fumed silica, and combinations of these silicon dioxide sources are used.
  • the sources of gases for the gas inclusions are the gas inclusions in the silica grains themselves, gases of the melting atmosphere and / or special additives to the melt, which produce the gas during a reflow process of the silicon dioxide, such additive being silicon nitride or silicon carbide powder.
  • the gas sources themselves and / or inter-granular spaces of the melting granules act. Furthermore, it is known that for the production of opaque quartz glasses of coarse Siliziumdioxid- grains with about 100 ⁇ high temperatures are required to at least the so-called Softening Point or
  • Such glasses have densities in the range of 1.9 to 2.1 g / cm 3 and contain relatively large bubbles of about 20 ⁇ to 200 ⁇ at concentrations of about 0.3 million bubbles per cm 3 to 1 million bubbles per cm 3 .
  • Opaque quartz glasses with significantly smaller bubbles are produced by the use of fine silica grits. Fine silicon dioxide grains require much lower densification temperatures when processed.
  • a molded body made of quartz glass with at least one surface area made of transparent quartz glass is produced by the slip casting method, wherein quartz glass of a purity of at least 99.9% is comminuted to a powder having a particle size below 70 ⁇ .
  • a slip is produced and stabilized by continuous running for a period of 1 hour to 240 hours, the stabilized slurry being filled in a porous mold corresponding to the base body and left therein for a predetermined time.
  • the obtained base body blank is dried and then sintered in an oven. During a period of at least 40 minutes, the base body blank is exposed to a temperature of over 1300 ° C and the sintered body is cooled. Subsequently, a
  • DE 102 43 953 A1 discloses a method for producing a component made of opaque quartz glass. In the process, a first
  • Quartz glass component is sintered.
  • at least part of the granulation is as a porous granule particles consisting of agglomerates of nanoscale, amorphous, synthetically generated silica primary particles with a middle
  • Primary particles large of less than 100 nm are formed, wherein the particle size of the granulation is less than 1 mm.
  • sol-gel method for producing simpler and clearer, d. H. transparent optical lenses known.
  • the sol-gel method is essentially characterized in that in a first process step for producing a quartz glass body or
  • Kieselglas stresses the so-called sol prepared and then filled in a second process step in a casting in a corresponding mold and gelled there. Subsequently, a stabilization of the gel body takes place in a third process step, before further demolding, then drying, purification of the gel body by means of oxidizing gases and sintering and compression to a clear silica glass body are carried out in further process steps.
  • the sol is preferably poured into a mold before gelling, so that a so-called wet gel body is formed.
  • Drying method becomes an open pore from this wet gel body
  • Dry gel body produced the subsequent heating to temperatures of up to 1500 ° C due to the collapse of the pores leads to the compaction of the body.
  • the result of the heating is a clear quartz glass body, which has predetermined dimensions. The specification of the dimension is based on the
  • Casting mold taking into account the shrinkage of the wet gel body.
  • JP 5070175 A discloses a method for producing porous glasses from a gel body formed from a sol.
  • the gel body is formed into the porous glass and compacted, and displacers present in the gel body are burned so that they are in positions at the
  • Displacement body in the glass cavities form.
  • JP 1079028 A describes a process for the production of glass, wherein material for the production of the glass is burned within pores of a porous starting material.
  • the invention is based on the object, an improved over the prior art method for producing a quartz glass body, a
  • the object is achieved by the features specified in claim 1, in terms of the gel body by the features specified in claim 7 and in terms of the quartz glass body by the features specified in claim 10.
  • the gel body generated from a sol is at least molded and compacted into the quartz glass body.
  • the sol prior to gelling, the sol is added to the gel body displacement bodies, which are completely removed from the gel body after gelling, wherein at the positions of the removed displacement body voids are generated.
  • a translucent or opaque quartz glass body is produced, wherein after the removal of the displacement body, the gel body is compressed such that pores collapse within the gel body and forms a dense and clear glass between the cavities.
  • the cavities of the desired opaque quartz glass are already produced in the silicon dioxide framework in the process stage of gelation, wherein the displacement body temporary substitutes for the Represent cavities.
  • the displacement body behave inert in the sol-gel process and are removed in further steps after solidification of the silica backbone.
  • formation of the cavities is advantageously decoupled from the formation of the quartz glass, resulting in the possibility of producing a variety of quartz glasses with different geometries. From the homogeneous Compaction of the gel body after its gelation further results in the risk of the occurrence of so-called voids, ie of
  • the method it is possible in a particularly advantageous manner to produce cavities in a size of 0.5 ⁇ to 30 ⁇ .
  • the size of the cavities is very precisely predetermined, since the shrinkage of the gel body is known until the production of the quartz glass body.
  • the size of the introduced displacement body is selected.
  • the displacement body are homogeneously distributed within the sol, so that a homogeneous distribution of the cavities in
  • a shape of the cavities is given by a shape of the displacers.
  • the displacement body and consequent cavities may have any shape, such as a spherical shape, a cylindrical shape, a conical shape, a polygonal shape or a mixture of these. This results in a further simplification of the specification of optical properties of the quartz glass body.
  • the displacement body after the gel of the sol to the gel body and before the compression of the same to quartz glass are removed therefrom, wherein the removal takes place in particular by chemical reactions in which the Displacer be converted into gases.
  • the displacers are completely burned, so that residues which impair the desired optical properties are effectively avoided.
  • the cavities are filled with a gas before the gel body is compacted. This filling takes place in particular by means of permeation of the gas through the
  • the gas may be any gas which remains stable in the manufacture of the quartz glass body.
  • the gas is, for example, helium, argon, xenon, water, hydrogen, nitrogen, oxygen, carbon monoxide and carbon dioxide.
  • the material properties of the quartz glass body can be specified. Also, a behavior of the material in a thermal shaping and welding with other materials, in particular when welding with clear quartz glass, and mechanical properties of the quartz glass body, such as its viscosity, can be specified.
  • the gel body After filling the cavities with the gas, the gel body is compacted by increasing the temperature to such an extent that the pores within the pores
  • Quartz glass body arises. Each gas inclusion is in the opaque
  • Quartz glass body traceable to an impression of the corresponding displacement body The structure of the gas inclusions is clearly determined by the structure of the displacers in the wet gel.
  • the cavities are not filled with gas prior to compaction. After the removal, especially the burning of the
  • the sol is particularly preferably formed from a finely dispersed silicic acid, water and tetraethyl orthosilicate. Furthermore, by the formation of the sol from these components a simple assurance of the material properties, such. As the spectral transmittance, the spectral light scattering, inclusions or bubbles, the surface quality, such. B. the micro-roughness and the light scattering and the geometric tolerances of the produced quartz glass body possible.
  • a gel body for producing a quartz glass body is characterized in that in the gel body displacement bodies are introduced, which are so completely removed from the gel body that arise at the positions of the displacement body cavities.
  • the gel body has pores which collapse at a defined compression in such a way that a dense and clear glass forms between the cavities.
  • the displacers are made of plastic, the plastic being polyethylene, polystyrene and / or polymethyl methacrylate. These plastics are on the one hand designed such that a shrinkage of the displacement body is avoided during aging and drying of the gel. On the other hand, they are characterized
  • Plastics characterized in that they are completely combustible in oxygen.
  • the gel body preferably has a porous structure which is designed in such a way that, when the displacement body is burned within the gel body, gas exchange takes place with an environment.
  • the porous structure also contributes to the complete combustion of the displacement body, since an unhindered gas exchange with the environment can take place.
  • a quartz glass body produced in a process according to the invention has vacuoles or cavities filled with a gas.
  • the cavities have a defined size, are arranged in a defined structure, and a dense and clear glass is formed between the cavities.
  • this quartz glass body is also particularly suitable for use as an optical element, for example as a diffuser in UV light applications for the defined scattering of UV light. Since quartz glass, in contrast to conventional glasses and plastic glasses, is resistant to UV light, in addition to the reliable scattering of the UV light, a reduction of maintenance costs for the devices is achieved, in which the quartz glass body is integrated as an optical element.
  • a method for producing a quartz glass body from a gel body and
  • Figure 2 schematically a sectional view of a detail
  • FIG. 1 shows a flowchart of a method according to the invention
  • this hollow space H shown in more detail in FIG. 2 has H, which are filled with a gas.
  • the sol S for producing the quartz glass body Q is produced according to the methods and compositions specified in EP 0 131 057 A1 or DE 33 90 375 C2.
  • Other formulations which contain only colloidal silicic acid as the silica source can produce gels of high silica concentration and relatively low shrinkage. Due to the gelling genetics, rapid processing of the sol is required.
  • Liquid content especially fine-grained silicon dioxide framework and high internal surface.
  • the sol S is finely disperse in a first method step VS1
  • Displacer V added and mixed with this. The mixing takes place in such a way that a homogeneous distribution of
  • the displacement bodies V are introduced into the sol S as liquid droplets or as solid particles. To generate the liquid droplets as
  • Displacer V in the sol S a liquid is added to the sol S, which is not miscible with Sol S.
  • this fluid is an oil.
  • An emulsion is then formed from the sol S and the liquid so that the liquid droplets are distributed in the sol S.
  • preferred use finds solid particles because of their higher stability. A density difference between the particle and the sol S must be made so small that it comes in a further processing of the mixture of the sol S and the displacement bodies V no segregation.
  • the composition of the sols S is chosen such that short
  • Sol S has a molar input water to TEOS to silica ratio of "10 to 1 to 0" to "25 to 1 to 6". For the hydrolyzed and titrated sol S arise at these ratios
  • Density values between 0.97 g / cm 3 and 1.25 g / cm 3 . In order to avoid segregation of the displacement body V and the sol S, particles are selected whose material densities are in this range.
  • Displacement body V from the sol S after its gelation that is, from the resulting gel body, are completely removed.
  • the displacement bodies V are made of high-purity plastics which are completely combustible in oxygen.
  • the plastics used are polyethylene, polystyrene or
  • a selection of the displacement body V according to size and size distribution is performed depending on the demands made on the opaque product. If a very fine structure of the gas inclusions to be generated in the quartz glass body Q is to be produced, displacement bodies V with a small volume will be produced Size selected. For coarser structures, larger displacement bodies V are used.
  • the Sol S with a volume of 1 liter and a silicon dioxide content of 275 g / liter about 1.25 10 10 particles as displacement body V
  • the particles used are microbeads or powders.
  • a powder polydisperse acrylic powder is used in one embodiment of the method.
  • microbeads allows a simple calculation of the quantity to achieve the desired one compared to the use of powder
  • Cavities H feasible. In order to narrow a desired particle size range, classification methods are used. As microbeads monodisperse PMMA spheres are used in one embodiment of the method.
  • sol S with a particularly high chemical purity is used.
  • displacers V are cleaned prior to addition to sol S.
  • the displacement body V are then admixed to the sol S in a defined amount and defined sizes distribution immediately before a casting process and homogeneously distributed in this. This admixing takes place after the pH of the sols S has been adjusted to values between 4 and 5. By adjusting the pH to these values, the gelation process is initiated.
  • the displacement bodies V are introduced into the sol S in such a way that no inadmissibly high shear forces occur during the homogenization. Thus, a change in the size distribution of the displacement body is avoided.
  • Displacement body V to Sol S in the form of a particle dispersion, so that a drying process of the displacement body V can be omitted after the cleaning.
  • the pH adjustment of the sols S to initiate gel formation by means of the addition of the particle dispersion.
  • the particle dispersion is mixed with ammonia solution and in the same molar amount with acetic acid.
  • the particle dispersion is admixed with the untitrated Sol S so that it has a pH of about 5.
  • the quantities for the ammonia solution and acetic acids determine the gelation times and are determined experimentally. As a guideline, at a temperature of 20 ° C and a desired gelling time of 30 minutes approximately 5 times the molar amount of the acid contained in the Sol S must be added.
  • the mixture is poured in a second process step VS2 in a mold, not shown.
  • the casting mold is designed so that its inner contour corresponds to a contour of the quartz glass body Q to be produced in an enlarged scale.
  • the scale is selected such that, despite a shrinkage of the sol S or of the gel body formed, a quartz glass body Q with the desired dimensions is produced.
  • the wet gel body is removed in a fourth method step VS4 from the mold and dried in a fifth method step VS5 in air to form a so-called xerogel.
  • the volume of the displacement body V and its size remain constant in this compression phase of the silica skeleton, that is, from the addition to the sol S until reaching the dry gel state.
  • the displacement bodies V are removed from the xerogel in a sixth method step VS6.
  • Plastic formed displacement body V takes place in an oven below
  • Holes H in the xerogel body whose size and shape corresponds to the size and shape of the respectively displaceable displacement body V, thus arise at the positions of the displacement bodies V.
  • the displacer V After removing the displacer V from the xerogel body, it is cleaned by means of chlorine-containing gases.
  • the temperature is chosen such that the open pores of the xerogel body do not collapse. In an alternative embodiment, no purification of the xerogel body takes place.
  • the cavities H are filled within the xerogel body in a seventh method step VS7 with a gas by the furnace chamber is first evacuated and then filled with the desired gas.
  • a gas by the furnace chamber is first evacuated and then filled with the desired gas.
  • opaque quartz glass body which are characterized by a high viscosity and thermally stable cavities H, also called bubbles, and thus by a special high-temperature stability, is particularly suitable as a gas nitrogen.
  • the production of the quartz glass body Q is not limited to those shown
  • the sol S can be generated by any desired method. Also, the amounts added to the Sol S are on
  • the sol S according to the in the
  • the washed PMMA microspheres are stirred with diameters of about 10 ⁇ in an amount of 1 g by means of a whisk. Subsequently, the mixture is placed in a cylindrical vessel of 30 mm
  • the wet gel fraction produced is removed and dried in air at constant room temperature and elevated air humidity within a week to a Xerogelstab with a diameter of 20 mm.
  • the Xerogel rod is exposed to purify a hydrogen chloride atmosphere while increasing the temperature to 800 ° C for several hours. After completion of the cleaning process will be multiple
  • Quartz glass rod with a diameter of 15 mm is present.
  • the quartz glass rod is characterized by a homogeneous bubble image, d. H. a homogeneous distribution of the cavities H, with uniform bubbles large, d. H. Size of the cavities H, from about 6 ⁇ . Also, the material of the quartz glass rod is characterized by a homogeneous bubble image, d. H. a homogeneous distribution of the cavities H, with uniform bubbles large, d. H. Size of the cavities H, from about 6 ⁇ . Also, the material of the
  • Quarzglasstabes a high purity with a very low concentration of foreign substances on.
  • concentrations of selected elements are given in Table 1 in ppb, with the density of the material being 2.18 g / cm 3 .
  • Directed direct transmission of a 1 mm thick and mechanically polished sample in the spectral range from 200 nm to 3200 nm is between 0.2 and 0.4%.
  • the compaction of the xerogel is carried out deviating from the embodiment 1 at the same temperature, but under a nitrogen atmosphere.
  • the resulting opaque quartz glass rod has a density of 2.18 g / cm 3 .
  • Heating the quartz glass rod to temperatures that are customary for welding quartz parts does not lead to dissolution of the microbubbles.
  • the material remains almost unchanged opaque. Responsible for this is the filling of the cavities H with nitrogen, which can not escape from the cavities H and prevents collapse of the bubbles as a result of adjusting gas pressure.
  • the sol S gels within half an hour to a disc-shaped gel body with a diameter of 18 cm. After drying the gel body, its diameter is 12 cm.
  • the xerogel disk is heated in a quartz glass-lined oven within 8 hours to a temperature of 1350 ° C. In the temperature range of 200 to 500 ° C is provided for a sufficient change of air in the furnace chamber. After 10 minutes of heating at 1350 ° C, the disc is slowly cooled to room temperature.
  • the resulting opaque quartz glass disc has a diameter of 9 cm and appears completely homogeneous when viewed under an intense light sources.
  • the material of the quartz glass disc is characterized by a high purity, with no metal exceeds a concentration of 1 ppm.
  • the production of the quartz glass body Q according to the third embodiment is characterized by a particularly low production cost and consequently very low production costs.
  • Example titrated Sol S prepared in an amount of 600 g. 200 g of this sols S 6.2 g PMMA balls are added with diameters of about 6 ⁇ and stirred.
  • a density of the produced quartz glass body Q can be specified very accurately.
  • the remaining mixture is diluted with titrated Sol S to give a quantity of 200 g. Of this, a portion of 100 g is added to another vessel and forms a sample 2.
  • the quartz glasses formed from the samples have cavities H with them
  • Embodiment shows Figure 2 in a sectional view.
  • Quartz glass body Q has a plurality of cavities H whose diameter

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  • Glass Compositions (AREA)

Abstract

L'invention concerne un procédé de fabrication d'un corps en verre de quartz (Q) à partir d'un corps gélifié, le corps gélifié formé à partir d'un sol (S) étant au moins façonné et comprimé pour former le corps en verre de quartz (Q). Selon l'invention, des corps de refoulement (V) sont ajoutés au sol (S) avant la gélification pour former le corps gélifié, et sont entièrement éliminés du corps gélifié après la gélification, des cavités (H) étant formées aux positions des corps de refoulement (V) éliminés, de manière à former un corps en verre de quartz (Q) translucide ou opaque. L'invention concerne également un corps gélifié pour la fabrication d'un corps en verre de quartz (Q), des corps de refoulement (V) étant introduits dans le corps gélifié, qui sont entièrement éliminables du corps gélifié, de manière à former des cavités (H) aux positions des corps de refoulement (V). L'invention concerne également un corps en verre de quartz qui comprend des vacuoles ou des cavités (H) remplies de gaz.
EP11723354.4A 2010-06-02 2011-05-13 Corps en verre de quartz, et procédé et corps gélifié pour la fabrication d'un corps en verre de quartz Withdrawn EP2598449A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010022534.7A DE102010022534B4 (de) 2010-06-02 2010-06-02 Verfahren zur Herstellung eines Quarzglaskörpers
PCT/EP2011/057773 WO2011151154A1 (fr) 2010-06-02 2011-05-13 Corps en verre de quartz, et procédé et corps gélifié pour la fabrication d'un corps en verre de quartz

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EP2598449A1 true EP2598449A1 (fr) 2013-06-05

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EP11723354.4A Withdrawn EP2598449A1 (fr) 2010-06-02 2011-05-13 Corps en verre de quartz, et procédé et corps gélifié pour la fabrication d'un corps en verre de quartz

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Country Link
US (1) US20130085056A1 (fr)
EP (1) EP2598449A1 (fr)
DE (2) DE202010018292U1 (fr)
WO (1) WO2011151154A1 (fr)

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CN104903266A (zh) * 2013-12-26 2015-09-09 信越石英株式会社 波长变换用石英玻璃构件及其制造方法
TWI652240B (zh) * 2014-02-17 2019-03-01 日商東曹股份有限公司 不透明石英玻璃及其製造方法
JP6252257B2 (ja) * 2014-03-03 2017-12-27 東ソー株式会社 不透明石英ガラスおよびその製造方法
JP6273997B2 (ja) * 2014-04-30 2018-02-07 東ソー株式会社 不透明石英ガラスおよびその製造方法
JP6379508B2 (ja) * 2014-02-17 2018-08-29 東ソー株式会社 不透明石英ガラスおよびその製造方法
DE102015102858B4 (de) 2015-02-20 2019-04-18 Iqs Gmbh Verfahren zur Herstellung eines Licht absorbierenden Quarzglases
EP3205630B1 (fr) * 2016-02-12 2020-01-01 Heraeus Quarzglas GmbH & Co. KG Materiau diffuseur en verre de quartz synthetique et procede de fabrication d'un corps de moulage en etant totalement ou partiellement constitue
US20210039978A1 (en) * 2018-03-09 2021-02-11 Tosoh Quartz Corporation Opaque quartz glass and method for manufacturing the same
WO2020129174A1 (fr) * 2018-12-19 2020-06-25 東ソー・クォーツ株式会社 Verre de quartz opaque et procédé de production s'y rapportant
JP7480659B2 (ja) 2020-09-23 2024-05-10 三菱ケミカル株式会社 透明ガラスの製造方法
JP7148720B1 (ja) * 2021-01-30 2022-10-05 東ソー・クォーツ株式会社 不透明石英ガラス及びその製造方法

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Also Published As

Publication number Publication date
US20130085056A1 (en) 2013-04-04
DE102010022534A1 (de) 2011-12-08
DE102010022534B4 (de) 2015-05-28
DE202010018292U1 (de) 2015-07-14
WO2011151154A1 (fr) 2011-12-08

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