EP2444528A2 - Procédé et dispositif destinés au revêtement galvanisé de substrats et cellules solaires - Google Patents

Procédé et dispositif destinés au revêtement galvanisé de substrats et cellules solaires Download PDF

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Publication number
EP2444528A2
EP2444528A2 EP11184987A EP11184987A EP2444528A2 EP 2444528 A2 EP2444528 A2 EP 2444528A2 EP 11184987 A EP11184987 A EP 11184987A EP 11184987 A EP11184987 A EP 11184987A EP 2444528 A2 EP2444528 A2 EP 2444528A2
Authority
EP
European Patent Office
Prior art keywords
substrate
coating liquid
tampon
coating
absorbent material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP11184987A
Other languages
German (de)
English (en)
Other versions
EP2444528A3 (fr
Inventor
Lothar Lippert
Marcus Caseday
Sascha Reime
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Schott Solar AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Solar AG filed Critical Schott Solar AG
Publication of EP2444528A2 publication Critical patent/EP2444528A2/fr
Publication of EP2444528A3 publication Critical patent/EP2444528A3/fr
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/011—Electroplating using electromagnetic wave irradiation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/028—Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating

Definitions

  • the invention relates to a device for the galvanic coating of substrates according to the preamble of patent claim 1.
  • the invention also relates to a process for the galvanic coating of substrates and solar cells according to claims 9 and 10.
  • WO 2008/065069 A1 is the partial galvanization of printed circuits described, whereby via a roller contact conductor tracks can be partially galvanized.
  • the disadvantage of this method is in that the complete contacting technique is immersed in an electrolyte liquid and the roller contacts as well as in the DE 10 2005 038 449 A1 at least partially co-coated. If the galvanic coating is carried out using light, the solar cell would be completely coated with this known method because the incident light would have a potential everywhere on the solar cell.
  • a device for tampon plating which has a hand-operated electrode.
  • the electrode has a handle, which is provided with a cloth of 75% polypropylene fibers and 25% nylon fibers, which is connected via an electrically conductive wire to the positive pole of a voltage source.
  • the electrode is immersed with this cloth in an electrolyte and thus impregnated with this electrolyte. Subsequently, the electrode is contacted at the location of a substrate connected to the negative pole of the voltage source. Mass production is not possible with this device.
  • a device for electroplating substrates in particular solar cells, having a reservoir comprising an electrolytic coating liquid and comprising a lower transport device and an upper transport device for the substrate, wherein a transport device comprises means for contacting and Connecting the substrate to a voltage source.
  • the device is characterized in that at least one transport device has at least one pad of an absorbent material and that means are provided so that the pad receives the electrolytic coating liquid and contacts the surface of the substrate to be plated.
  • the advantage of the device is that the substrate does not have to be immersed in the electrolytic coating liquid. An undesirable coating at locations other than the sites that are targeted and partially coated, such. As the tracks in solar cells, can be avoided. Through the use of tampons z. B. in a solar cell, a coating on a surface, in particular on the front, and there are only partially carried out in a simple manner.
  • Busbars Due to the fact that galvanic deposition takes place only where the pad contacts the surface of the substrate, structures such as printed conductors, in particular main printed conductors (busbars), can be produced particularly advantageously on the front side of solar cells. Busbars must have a certain thickness, which is always associated with a corresponding broadening of the busbar and therefore with an undesirable shading of the surface of the solar cell in conventional methods. Such shadowing leads to power losses of the solar cells.
  • the structures e.g. As the busbar, as before applied by means of a paste or an ink-jet process and then To increase the thickness of the structures in a targeted manner by means of tampon plating without significantly broadening the structures.
  • the device allows a continuous, partial coating of the substrates, whereby a cost-effective coating of a plurality of substrates and thus a mass production is made possible.
  • the dimensions of the tampon define the size of the contact surface and thus the size of the coated area on the substrate.
  • the absorbency of the material used for the tampon refers to the absorbency of electrolytic coating liquids.
  • This absorbent material is preferably also flexible to z. B. via the contact pressure against the substrate to adjust the size of the contact surface or to remove after the contact the spent electrolyte liquid by compression from the tampon.
  • the negative pole of the voltage source is preferably electrically connected to the substrate via corresponding means of the upper transport device, in the case of a solar cell with the rear side.
  • the positive pole of the voltage source may be connected to an electrode which forms the anode and is in the coating liquid. Through the voltage source connected in this way, a galvanic current can be applied.
  • the electrode may also be connected cathodically and the solar cell connected anodically.
  • the electrode may be disposed at any position in the coating liquid. This assumes that during the coating process, the tampon both at least partially contacts the coating liquid and the substrate surface.
  • the coating liquid is in a reservoir.
  • This reservoir may be a container from which the coating liquid the tampon z. B. is supplied or immersed in the tampon, for example.
  • a coating trough in which the coating liquid is located is preferred.
  • the tampon plating has the advantage that a significantly lower amount of electrolytic coating liquid is required than in galvanic devices in which the substrate is immersed in the coating liquid.
  • the amount of coating liquid can be reduced to 1/6 to 1/10 of the usual amount.
  • Conventional amounts of coating liquid in known galvanic coating plants for solar cells are in the range of 300 l to 500 l.
  • Vorzugsseise the transport devices lead the substrate at a distance over the coating tray.
  • Coating pans are open at the top, so that during the Tampongalvanmaschine dripping coating liquid can be caught. In addition, the contact of the tampon with the coating liquid is facilitated.
  • the lower transport device preferably has at least one tampon.
  • This tampon can be easily immersed in the coating liquid of the coating trough and subsequently or simultaneously brought into contact with the substrate surface.
  • coating liquid can be selectively supplied to the tampon from the coating tray, e.g. B. by means of pumps.
  • At least one transport device preferably the lower transport device, at least one transport roller or transport roller, which is provided with the pad of absorbent material or forms the tampon and thus consists of the absorbent material.
  • the transport roller or the transport roller may have a base body of electrically conductive material which can be connected to the voltage source.
  • the galvanic coating can be carried out continuously during unwinding of the roll or roller on the substrate, so that coated strips, such as. B. traces, can be easily produced.
  • this transport roller preferably partially dips into the coating liquid.
  • the transport device in particular the lower transport device, at least one conveyor belt, which with the tampon is made of absorbent material or forms the tampon and thus consists of the absorbent material.
  • Width and thickness and the cross-sectional shape of the tampon on the roll, roller or conveyor belt can be suitably selected according to the particular application.
  • square, rectangular, trapezoidal or triangular cross sections are possible.
  • the substrate to be coated rests on the conveyor belt during transport.
  • the conveyor belt is a closed conveyor belt. About pulleys at the beginning and end of the transport route, the conveyor belt is guided. In this case, the conveyor belt at least partially immersed in the coating liquid.
  • the conveyor belt which may also be referred to as a tampon belt, guided in at least one guide element.
  • This guide element can be arranged outside the coating liquid or outside the coating trough and / or in the coating liquid or in the coating trough.
  • the guide element may be a guide rail.
  • the guide element is designed such that it can also absorb coating liquids.
  • the supply of the guide element with coating liquid can be done for example by means of a feed pump which is connected to the reservoir.
  • At least one guide element can be electrically connected to the positive pole of the voltage source.
  • the guide element forms the anode of the electroplating circuit.
  • the guide rail can for example also be designed U-shaped, wherein the two legs of the U preferably protrude. As a result, a channel is formed in which the leading conveyor belt can be guided. This channel can also be supplied with the coating liquid, z. By suitable supply means associated with the coating bath as a reservoir.
  • the coating liquid can flow down from the guide rail, for example at its open ends. If a coating trough is preferably arranged below the transport device, it can receive the used coating liquid from the guide element.
  • At least one radiation source in particular a light source, may be arranged in the coating liquid, preferably in the coating trough, for irradiating the surface to be coated.
  • the light-assisted galvanic coating can significantly increase the deposition rate and thus the throughput of substrates.
  • the absorbent material for electromagnetic radiation in the range from 550 nm to 1200 nm has a transmittance of 0.05 to 0.2.
  • the absorbent material may be sponge rubber, polyester foam or polyurethane foam. Such materials have a very good suction and absorption capacity of electrolyte fluid, are wear-resistant and available in any dimensions. Even with small dimensions in the millimeter range, these materials are dimensionally stable.
  • the absorbent material preferably has 50 to 300 cells / cm 2 .
  • the cells of the material are optically determined by counting the pores (cells) in a given area.
  • the object is achieved by a process for the galvanic coating of solar cells, wherein at least one surface of the solar cell is partially coated by means of a Tampongalvanmaschinesvons.
  • the substrate is preferably connected to the negative pole of the voltage source.
  • the positive terminal of the voltage source is electrically connected to an electrode in the coating liquid and / or the tampon.
  • the substrate is preferably arranged at a distance above a coating trough which comprises an electrolytic coating liquid comprising at least one metal.
  • the substrate is preferably moved over the coating trough at a distance. This enables a continuous coating by means of the Tampongalvanmaschine and achieves a correspondingly high throughput.
  • the tampon may also partially contact the coating liquid during contact with the substrate. This means that a part of the tampon is immersed in the coating liquid and a part of the tampon protrudes from the coating liquid and contacts the surface of the substrate.
  • the tampon may also be completely outside the coating liquid.
  • the tampon is supplied with coating liquid from a reservoir.
  • the substrate is coated along a predetermined path. This can be done for example with a roll on the substrate tampon roll or a tampon ribbon. This makes it possible to produce printed conductors of a solar cell.
  • the method provides that at least one surface of the substrate is coated directly with a structure.
  • the partial structures are conductor tracks of solar cells.
  • These interconnects may preferably be busbar and / or contact fingers.
  • the surface to be coated can be irradiated continuously or discontinuously with light in the visible range during the coating process.
  • Preferred is a pulsed irradiation. It is preferably used electromagnetic radiation in the range of 300 nm to 1200 nm, in particular in the range of 380 nm to 780 nm.
  • a device for the electroplating of substrates 1 which comprises a reservoir 12 in the form of a coating trough 10, in which an electrolytic coating liquid 13 is located.
  • the substrate 1 is a solar cell 1a.
  • the substrate 1 is disposed between an upper conveyor 30 and a lower conveyor 40 and is moved in the direction of the arrow.
  • the two transport devices 30, 40 are arranged such that the substrate 1 is located above the upwardly open coating trough 10.
  • the upper transport device 30 has upper transport rollers 32, of which only two are drawn.
  • the substrate 1 has on the back 2 a metallic coating 3, which is contacted by the upper right roll 32, which is connected to the negative pole of a voltage source 21 via the electrical connection line 24.
  • the positive pole of the voltage source 21 is connected via an electrical connecting line 26 to an electrode 22, which forms the anode and is arranged in the coating trough 10. Overall, a rectifier circuit is thus formed.
  • the lower transport device 40 has transport rollers 42, which have a roller body 43, which is covered with an absorbent material 44.
  • the axes of the lower transport rollers lie approximately at the level of the bath level 14.
  • the rollers 42 can also dip deeper into the coating liquid 13 or protrude further from the coating liquid 13. Since the lower transport rollers 42 are equipped with the tampon similar to a tire, is the Tampon at the same time partly in the coating liquid and partly outside.
  • An essential component of the lower transport rollers is the absorbent material 44, which forms the pad 41, which contacts the underside of the substrate 2.
  • absorbent materials based on rubber can be used: material Hardness [kg / m 3 ] Porosity [cells / cm 2 ] ISO number (polymer) Sponge rubber HW 160 ⁇ 40 50-300 1629
  • the compressive strength according to ISO 3386-2 was chosen because it is a common measure for the characterization of foams and allows conclusions about the aging state of the material.
  • the compressive stress in the fourth load cycle at 40% compression serves as a characteristic for the compression hardness.
  • the bulk density of the absorbent polymer materials is 18-130 kg / m 3 .
  • the compressive strength is in the range of 2 to 35 kPa, the tensile strength is in the range of 100 to 300 kPa, the elongation at break in the range of 150 to 400% and the compression set in the range of 1 to 20.
  • the substrate 1 on the front side 4 is already provided with conductor tracks 5, which have been applied, for example in the form of a paste by means of an ink-jet process.
  • the conductor tracks are formed from silver or a silver alloy.
  • the reworking shown here is about making these prepared strip conductors 5 thicker by the tampon plating without widening them.
  • Such interconnects may be the so-called Busbare, which can thus be thickened without broadening the conductor.
  • the roller 45 is disposed adjacent to the roller 42 of the lower conveyor 40 and also partially immersed in the coating liquid 13. The roller 45 presses against the pad 41 of the roller 42 so that it is squeezed out and can then receive fresh electrolytic coating liquid.
  • FIG. 2a is a schematic sectional view of FIG. 1 to see, with the solar cell is connected anodically.
  • a light source 15 (here below the coating trough 10) is also shown schematically, in fact the light source is located in the coating trough 10), with which the front side 4 of the substrate 1 can be irradiated during the galvanic coating. This irradiation can be continuous or discontinuous.
  • a cathodic circuit of the electrode 22 is shown.
  • the solar cell 1 a is connected anodically, wherein the front side 4 of the solar cell 1 a is anorialiert.
  • FIG. 3 another embodiment is shown, which shows a lower transport roller 42, the roller body 43 is covered with an absorbent material 44.
  • the substrate 1 does not yet have any conductor tracks. These are applied directly to the front side 4 by means of the transport roller 42, which dips almost completely into the coating bath 12 and protrudes only slightly from the coating bath.
  • the rear side 2 of the substrate 1 is connected to the rectifier circuit 20, wherein the positive pole is connected to the anode 22, which dips into the coating bath 12.
  • the positive pole of the voltage source 21 can also be connected to the lower transport roller 42.
  • FIG. 4 shows a sectional view through the FIG. 3 ,
  • the light source 15 is arranged between the two adjacent transport rollers 42.
  • FIG. 5 is a perspective view of a system with upper and lower transport means 30 and 40, wherein the lower transport means comprises circulating conveyor belts 46.
  • the upper transport device has a plurality of transport rollers 32, while the lower transport device has only two conveyor belts 46, with which two strip-shaped areas can be coated on a substrate.
  • the conveyor belts 46 consist of a carrier belt 49, on which the pad 41 is adhered. These conveyor belts 46 run over a deflection roller 48 and are guided in a guide element in the form of a U-shaped guide rail 50, which is arranged above the coating trough 10.
  • the conveyor belt does not dip into the coating liquid 13, but the electrolytic coating liquid is supplied with the electrolytic coating liquid via supply pipes 52 immersed in the coating bath. About these tubes 52, the electrolytic coating liquid is pumped by a pump 54 in the U-shaped guide rails, in which the conveyor belt 46 receives the coating liquid 13.
  • the guide rails 50 are connected to the rectifier circuit 20 via electrical lines, not shown.
  • the guide rails 50 form the anode 22.

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  • Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Coating Apparatus (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Hybrid Cells (AREA)
EP11184987.3A 2010-10-19 2011-10-13 Procédé et dispositif destinés au revêtement galvanisé de substrats et cellules solaires Withdrawn EP2444528A3 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102010042642A DE102010042642B4 (de) 2010-10-19 2010-10-19 Verfahren und Vorrichtung zur galvanischen Beschichtung von Substraten und Solarzellen

Publications (2)

Publication Number Publication Date
EP2444528A2 true EP2444528A2 (fr) 2012-04-25
EP2444528A3 EP2444528A3 (fr) 2013-05-22

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EP11184987.3A Withdrawn EP2444528A3 (fr) 2010-10-19 2011-10-13 Procédé et dispositif destinés au revêtement galvanisé de substrats et cellules solaires

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Country Link
EP (1) EP2444528A3 (fr)
CN (1) CN102453940A (fr)
DE (1) DE102010042642B4 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103382566A (zh) * 2012-05-04 2013-11-06 库特勒自动化系统(苏州)有限公司 太阳能电池电镀装置及其供电模组
CN110117805A (zh) * 2019-05-16 2019-08-13 浙江宝利特新能源股份有限公司 一种用于分段焊带的单面屏蔽电镀装置及其生产方法
CN114959848A (zh) * 2022-06-08 2022-08-30 苏州晶洲装备科技有限公司 一种光伏电池的水平电镀装置、水平电镀方法及用途

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US9362440B2 (en) * 2012-10-04 2016-06-07 International Business Machines Corporation 60×120 cm2 prototype electrodeposition cell for processing of thin film solar panels
KR101575068B1 (ko) * 2014-09-16 2015-12-07 주식회사 호진플라텍 광유도 도금 및 순방향 바이어스 도금을 병행하는 태양전지 기판용 도금장치
CN107771360B (zh) * 2015-06-17 2019-10-22 株式会社钟化 晶体硅太阳能电池模块及其制造方法
CN105369307B (zh) * 2015-12-08 2017-12-05 厦门冠通电子科技有限公司 一种引线框架的点镀机构
CN108336183A (zh) * 2017-04-13 2018-07-27 苏州中芯原微电子有限公司 太阳能电池板镀铝膜复合装置
CN111254482A (zh) * 2020-02-26 2020-06-09 泰州隆基乐叶光伏科技有限公司 一种单面电镀设备及方法

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WO2008065069A1 (fr) 2006-11-28 2008-06-05 Basf Se Dispositif et procédé de revêtement par électrolyse
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US2540602A (en) * 1946-07-03 1951-02-06 Lockheed Aircraft Corp Method and apparatus for the surface treatment of metals
EP0003680A1 (fr) 1978-02-09 1979-08-22 Weldex A.G. Procédé pour dépôt électrolytique à tampon; électrode et électrolyte à cet effet
DE102005038449A1 (de) 2005-08-03 2007-02-08 Gebr. Schmid Gmbh & Co. Einrichtung zur Behandlung von Substraten, insbesondere zur Galvanisierung von Leiterplatten, und Verfahren
WO2008065069A1 (fr) 2006-11-28 2008-06-05 Basf Se Dispositif et procédé de revêtement par électrolyse
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WO2009152896A1 (fr) * 2008-06-19 2009-12-23 Rena Gmbh Dispositif et procédé pour le traitement unilatéral par voie chimique humide et/ou électrolytique d'une matière

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103382566A (zh) * 2012-05-04 2013-11-06 库特勒自动化系统(苏州)有限公司 太阳能电池电镀装置及其供电模组
CN103382566B (zh) * 2012-05-04 2016-05-11 库特勒自动化系统(苏州)有限公司 太阳能电池电镀装置及其供电模组
CN110117805A (zh) * 2019-05-16 2019-08-13 浙江宝利特新能源股份有限公司 一种用于分段焊带的单面屏蔽电镀装置及其生产方法
CN114959848A (zh) * 2022-06-08 2022-08-30 苏州晶洲装备科技有限公司 一种光伏电池的水平电镀装置、水平电镀方法及用途
CN114959848B (zh) * 2022-06-08 2024-03-26 苏州晶洲装备科技有限公司 一种光伏电池的水平电镀装置、水平电镀方法及用途

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Publication number Publication date
EP2444528A3 (fr) 2013-05-22
CN102453940A (zh) 2012-05-16
DE102010042642B4 (de) 2013-12-12
DE102010042642A1 (de) 2012-04-19

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