Classifications

• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
  • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
  • C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
  • C03C17/3671—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use as electrodes
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K50/00—Organic light-emitting devices
  • H10K50/80—Constructional details
  • H10K50/805—Electrodes
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K50/00—Organic light-emitting devices
  • H10K50/80—Constructional details
  • H10K50/85—Arrangements for extracting light from the devices
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K50/00—Organic light-emitting devices
  • H10K50/80—Constructional details
  • H10K50/85—Arrangements for extracting light from the devices
  • H10K50/854—Arrangements for extracting light from the devices comprising scattering means
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
  • H10K50/00—Organic light-emitting devices
  • H10K50/80—Constructional details
  • H10K50/85—Arrangements for extracting light from the devices
  • H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/77—Coatings having a rough surface
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase

Definitions

• a method for manufacturing an organic light-emitting diode device with a surface textured structure having a mineral glass substrate forming the carrier of the organic light-emitting diode device and an organic light-emitting diode device with such a device. structure
• An OLED for "Organic Light Emitting Diodes” in English comprises a material or a stack of organic electroluminescent materials, and is framed by two electrodes, one of the electrodes, generally the anode, being constituted by that associated with the glass substrate and the Another electrode, the cathode, being arranged on the organic materials opposite the anode.
• OLED is a device that emits light by electroluminescence using the recombination energy of holes injected from the anode and electrons injected from the cathode.
• the emitted photons pass through the transparent anode as well as the glass substrate supporting the OLED to provide light outside the device.
• An OLED generally finds its application in a display screen or more recently in a particularly general lighting device, with different constraints.
• the light extracted from the OLED is a "white” light emitting in some or all wavelengths of the spectrum. It must be so in a homogeneous way.
• Lambertian emission that is to say obeying Lambert's law, being characterized by a photometric luminance equal in all directions.
• an OLED has a low light extraction efficiency: the ratio between the light that actually leaves the glass substrate and that emitted by the electroluminescent materials is relatively low, of the order of 0.25.
• US 2004/0227462 shows for this purpose an OLED whose transparent support substrate of the anode and the organic layer is textured.
• the surface of the substrate thus has an alternation of excrescences and recesses whose profile is followed by the anode and the organic layer deposited on it.
• the profile of the substrate is obtained by applying a photoresist mask on the surface of the substrate whose pattern corresponds to the desired one of the growths, then etching the surface through the mask.
• a photoresist mask on the surface of the substrate whose pattern corresponds to the desired one of the growths
• the object of the invention is therefore to provide a method for manufacturing a support for OLED that simultaneously provides extraction gain over a wide range of wavelengths, a sufficiently homogeneous white light and increased reliability.
• the method of manufacturing an organic electroluminescent diode device of a textured outer surface structure comprising a mineral glass substrate constituting the support of the organic light-emitting diode device which comprises:
• said manufacture of said textured outer surface structure comprising: depositing on the mineral glass substrate a first dielectric layer at least 300 nm thick, preferably greater than 500 nm, or even greater than 1 ⁇ m, at a temperature greater than or equal to 100 0 C so as to form growths (and therefore a first textured surface),
• the method incorporates a step of controlling the roughness.
• a surface texturing by the first layer is obtained in a simple manner, and the profile is adjusted by the smoothing layer to provide the profile that is perfectly adapted to the use of the structure in an OLED.
• the network of the prior art optimizes the extraction gain around a certain wavelength but on the other hand does not promote a white light emission, on the contrary, it tends to select certain lengths of light. wave and will emit for example more in blue or red.
• the method according to the invention provides on the contrary a random texturing (preserved after smoothing) to obtain an extraction gain for a wide band of wavelengths (no visible colorimetric effect), and an angular distribution of light issued almost Lambertian.
• the choice of the refractive index of the smoothing layer being greater than the refractive index of the substrate allows, in the use of the structure in an OLED for which the first electrode has a more refractive index. large than that of the substrate, to generate less reflection of the light reaching the glass substrate, and instead to promote the continuity of the path of light through the substrate.
• the smooth textured surface of the structure is defined by a roughness parameter Rdq of less than 1.5 °, preferably less than 1 °, or even less than or equal to 0.7 ° , and a roughness parameter Rmax less than or equal to 100 nm, and preferably greater than 20 nm, on an analysis surface of 5 ⁇ m by 5 ⁇ m, for example with 512 measurement points.
• the analysis surface is thus suitably chosen according to the roughness to be measured.
• the roughness parameters of the surface are thus preferably measured by atomic force microscopy (AFM).
• Another method for defining the softening of the outer surface is to say that the angle formed by the tangent to the normal to the substrate is greater than or equal to 30 °, and preferably at least 45 °, for the majority of the given points of this surface.
• At least 50%, even 70% and even 80%, of the textured surface of the first dielectric layer which is to be covered by the active layer (s) of the OLED (for forming one or more zones of light), has an outer surface with submicron texturing and sufficiently softened (typically rounded, corrugated) by the smoothing layer according to the overlying invention.
• N of active light-emitting area (s) of an OLED preferably at least 70% or even at least 80% of the N active area (s) comprises a softened textured outer surface according to the invention.
• the smoothing layer substantially covers the entire first dielectric layer.
• the first dielectric layer may be substantially all over the main face in play.
• the deposition of the first layer is done by a pyrolysis technique, especially in the gas phase (technique often referred to as the CVD abbreviation for "Chemical Vapor Deposition”) preferably at a temperature greater than or equal to 500 ° C., or in particular at low pressure by LPCVD ("Low Pressure CVD”), preferably at a temperature greater than or equal to 150 ° C. or even 200 ° C. 0 C, or magnetron sputtering.
• LPCVD Low Pressure CVD
• This first layer preferably comprises a layer deposited by CVD, for example SnO 2 or SnZn x Oy, or deposited by magnetron sputtering or LPCVD, for example ZnO.
• the smoothing layer may comprise, preferably, a layer deposited by plasma enhanced chemical vapor deposition (Plasma Enhanced CVD) which is a multidirectional deposit, with diffuse impacts, or alternatively a dielectric layer deposited by magnetron sputtering at a temperature below 100 0 C, preferably at room temperature.
• Plasma enhanced chemical vapor deposition Plasma Enhanced CVD
• the smoothing layer may comprise, or even consist of, a layer of Si 3 N 4 deposited by PECVD or TiO 2 deposited by PECVD, or a dielectric layer deposited by magnetron sputtering at a temperature below 100 ° C., preferably at room temperature, and selected from SnO 2 , SnZnO, AlN, TiN, NbN.
• Si 3 N 4 may make it possible to form the first layer of a multilayer electrode, this material being in fact preferred as the underlayer of the electrode stack because it forms an alkaline barrier. It is recalled that it is imperative to avoid the migration of alkali from the glass to the electrode (over time or during OLED manufacturing heat treatments) in order to prevent the electrode from oxidizing and does not deteriorate.
• a barrier layer is systematically deposited beforehand on the glass substrate, in particular of the Si 3 N 4 type .
• the deposition of the electrode in the form of a layer (s), in particular of transparent conductive oxides and / or with at least one metal layer (silver stack for example, between dielectric layers in particular), may be physical vapor deposition (s), for example by magnetron sputtering, by evaporation.
• the method makes it possible to obtain an OLED device carrying a structure with a textured external surface forming the support of the organic light-emitting diode device, in particular obtained by the manufacturing method of the invention, structure comprising on a substrate in mineral glass:
• a first textured dielectric layer with protrusions, in the form of crystallites, having a thickness of at least 300 nm, preferably greater than 500 nm, or even greater than 1 ⁇ m, with preferably a refractive index greater than refractive index of the glass substrate, a second so-called smoothing layer (essentially) amorphous, of refractive index greater than or equal to that of the first layer, deposited directly on said first layer, the smoothing layer being adapted to soften enough growths and to form the textured outer surface, and the device comprising an electrode in the form of a layer (s) forming deposit (s) conform (s) to the textured surface of the smoothing layer.
• the textured outer surface can thus be defined by the roughness parameter Rdq less than 1.5 ° and the roughness parameter Rmax less than or equal to 100 nm on an analysis surface of 5 ⁇ m by 5 ⁇ m, and / or the angle formed by the tangent of the textured surface softened with the normal to the glass substrate is greater than or equal to 30 °, in a majority of point of the surface.
• the first textured dielectric layer may typically have an RMS roughness parameter greater than or equal to 30 nm, or even greater than or equal to 50 nm on an analysis surface of 5 ⁇ m by 5 ⁇ m.
• the RMS parameter for Root Mean Square ie the mean square deviation of the roughness, therefore quantifies on average the height of the peaks and troughs of roughness, compared to the average height.
• RMS roughness of 2 nm means an average amplitude of double peak.
• the surface of the smoothing layer may typically have an RMS roughness parameter greater than or equal to 30 nm and / or a roughness parameter Rmax greater than 20 nm, on an analysis surface of 5 ⁇ m by 5 ⁇ m, for example with 512 measuring points.
• the first electrode of the OLED in the form of a thin layer (s) intended to be deposited directly on the smoothing layer, may be substantially conformal to the surface (and preferably thus reproduce the texturing after flattening ), for example by deposition (s) in the vapor phase, in particular by magnetron sputtering, by evaporation.
• the first electrode is generally index (average) from 1, 7 or even beyond (1, 8 even 1, 9).
• the organic layer (s) of the OLED are generally index (average) from 1, 8 or even beyond (1, 9 even more).
• the first layer and the smoothing layer deposited on the glass substrate are dielectric (in the non-metallic sense), preferably electrically insulating (generally electrical resistivity in the solid state, as known in the literature, greater than 10 9 ⁇ . cm), or semiconductors (usually electrical resistivity in the massive, as known in the literature, greater than 10 "3 ⁇ .cm and less than
• the first layer and / or the smoothing layer are identical to each other.
• the substrate coated with the first (and even the smoothing layer) may have a light transmission T L greater than or equal to 70%, preferably greater than or equal to 80%.
• the first layer on the glass substrate advantageously has a refractive index greater than the refractive index of the glass substrate.
• the first layer may comprise, or even consist of a layer of SnO 2 , ZnO or SnZn x Oy.
• the smoothing layer comprises, or consists of, a layer, essentially mineral, preferably at least one of the following materials: Si 3 N 4 , TiO 2 or ZnO, SnO 2 , SnZnO, AlN, TiN, NbN.
• the thickness of the smoothing layer may be at least 100 nm, preferably less than 1 ⁇ m, or even less than 500 nm.
• the structure comprises an electrode in the form of layer (s) forming deposit (s) conform (s) to the underlying textured surface (surface of the smoothing layer).
• a low-cost industrial glass for example a silicate, for example a silicosodium-calcium glass, is preferably chosen.
• the refractive index is typically about 1.5. You can also choose a high index glass.
• the subject of the invention is an organic light-emitting diode (OLED) device incorporating the structure obtained by the process of the invention or defined above, the textured surface of the structure being arranged on the organic electroluminescent layer (s) side. (s) (OLED system), that is to say inside the device, on the opposite side to the emitting light side outside the device, the textured outer surface structure being under a first electrode underlying the ( x) organic electroluminescent layer (s).
• the OLED can form a lighting panel, or backlight (substantially white and / or uniform) including surface (full) electrode greater than or equal to 1x1 cm 2 , or even up to 5x5 cm 2 even 10x10 cm 2 and beyond.
• the OLED can be designed to form a single illuminating pad (with a single electrode surface) in polychromatic light (substantially white) or a multitude of illuminating patches (with multiple electrode surfaces) in polychromatic light (substantially white ), each illuminating pad having a (full) electrode surface greater than or equal to 1x1 cm 2 , or even 5x5 cm 2 , 10x10 cm 2 and beyond.
• a non-pixelated electrode differs from a display screen electrode (“LCD” ”) formed of three juxtaposed pixels, generally of very small dimensions, and each emitting a given almost monochromatic radiation (typically red, green or blue).
• LCD display screen electrode
• the OLED system above the lower electrode as defined above, can be provided to emit a polychromatic radiation defined at 0 ° by coordinates (x1, y1) in the CIE XYZ 1931 colorimetric diagram, thus given coordinates for a radiation to normal.
• the OLED can be emission from the bottom and possibly also from the top depending on whether the upper electrode is reflective or respectively semi-reflective, or even transparent (in particular TL comparable to the anode typically from 60% and preferably greater than or equal to 80%).
• the OLED may further include an upper electrode above said OLED system.
• the OLED system can be adapted to emit (substantially) white light, as close as possible to the coordinates (0.33, 0.33) or coordinates (0.45, 0.41), especially at 0 °.
• mixture of compounds green red emission, blue
• stack on the face of the electrodes of three organic structures green red emission, blue
• two organic structures yellow and blue
• the OLED can be adapted to output (substantially) white light, as close as possible to coordinates (0.33, 0.33), or coordinates (0.45, 0.41), especially at 0 ° .
• the OLED can be part of a multiple glazing, including a vacuum glazing or with air knife or other gas.
• the device can also be monolithic, include a monolithic glazing to gain compactness and / or lightness.
• the OLED may be glued or preferably laminated with another flat substrate said cover, preferably transparent such as a glass, using a lamination interlayer, especially extra-clear.
• the invention also relates to the various applications that can be found in these OLEDs, forming one or more transparent and / or reflecting luminous surfaces (mirror function) arranged both outside and inside.
• the device can form (alternative or cumulative choice) an illuminating, decorative, architectural system, etc.), a signaling display panel - for example of the type drawing, logo, alphanumeric signaling, including an emergency exit sign.
• the OLED can be arranged to produce a uniform polychromatic light, especially for uniform illumination, or to produce different light areas of the same intensity or distinct intensity.
• an illuminating window can in particular be produced. Improved lighting of the room is not achieved at the expense of light transmission. By also limiting the light reflection, especially on the outside of the illuminating window, this also makes it possible to control the level of reflection, for example to comply with the anti-glare standards in force for the facades of buildings.
• the device in particular transparent part (s) or entirely, may be: intended for the building, such as an external light glazing, an internal light partition or a (part of) light glass door including sliding, for a transport vehicle, such as a bright roof, a (part of) side window light, an internal light partition of a land vehicle, aquatic or aerial (car, truck train, plane, boat, etc.), for furniture urban or professional such as a bus shelter panel, a wall of a display, a jewelery or showcase display, a wall of a greenhouse, an illuminated slab, for interior furnishings, a shelf or furniture element, a furniture front, an illuminating slab, a ceiling lamp, an illuminated refrigerator shelf, an aquarium wall, - for backlighting electronic equipment, including a display screen or display, possibly dual screen, such as a television or computer screen, a touch screen.
• a transport vehicle such as a bright roof, a (part of) side window light, an internal light partition of a land vehicle, aquatic or aerial (car, truck train, plane, boat,
• OLEDs are generally dissociated into two major families depending on the organic material used. If the electroluminescent layers are small molecules, it is called SM-OLED ("Small Molecule Organic Light Emitting Diodes").
• an SM-OLED consists of a stack of hole injection layers or "HIL” for "HoIe Injection Layer” in English, hole transport layer or “HTL” for "HoIe Transporting” Layer "in English, emissive layer, electron transport layer or” ETL “for” Electron Transporting Layer "in English.
• HIL hole injection layers
• HTL hole transport layer
• ETL Electron Transporting Layer
• organic electroluminescent stacks are for example described in the document entitled "oven wavelength white organic light emitting diodes using 4, 4'-bis- [carbazoyl- (9)] - stilbene as a deep blue emissive layer" of CH. Jeong et al., Published in Organics Electronics 8 (2007) pages 683-689.
• organic electroluminescent layers are polymers, it is called PLED ("Polymer Light Emitting Diodes" in English).
• FIG. 1 represents a schematic sectional view of an OLED whose glass carries a first textured layer and a second smoothing layer in accordance with the manufacturing method of the invention
• FIG. 2 is an SEM view of the surface of the first textured layer
• FIG. 1 which is not to scale for a better understanding, shows an organic light-emitting diode device 1 which comprises successively, a structure with a textured outer surface 30 formed
• a glass 10 for example silico-soda-lime glass, which has two opposite faces 10a and 10b, the face 10a being arranged facing the first electrode 1 1; a first transparent layer 2 deposited so as to form excrescences, and therefore a first textured surface 20;
• first transparent electro-conductive coating 11 which forms a first electrode (generally referred to as anode), of surface conforming to the surface 30,
• a second electroconductive coating 13 which forms a second electrode, and preferably has, facing the organic layer 12, a (semi) reflecting surface (intended to return the light emitted by the organic layer towards the opposite direction, that of the substrate transparent 10),
• the inventors have demonstrated that it is essential that the outer surface of the structure to receive the electrode is free of sharp points.
• a smoothing layer with a textured surface defined by a roughness parameter Rdq of less than 1.5 °, and a roughness parameter Rmax of less than or equal to 100 nm on an analysis surface of 5. ⁇ m by 5 ⁇ m, preferably by AFM.
• the tangent may also form in a majority of points of the textured surface with the normal to the opposite planar face, an angle greater than or equal to 30 °, and preferably at least 45 °.
• the textured outer surface can also be defined by a roughness parameter Rmax greater than or equal to 20 nm on an analysis surface of 5 ⁇ m by 5 ⁇ m, by AFM.
• the first layer 2 is deposited directly on the glass 10 at a temperature greater than or equal to 100 ° C., with a thickness greater than 300 nm and with a deposition method suitable for forming nanometric excrescences, typically crystallites.
• the material constituting the first layer 2 has a refractive index that is substantially different and greater than that of the glass 10 by a variation of the order of 0.4. It is for example SnO 2 (undoped) having a refractive index of 1, 9, or even ZnO of index 1, 9.
• the material once deposited makes it possible to obtain excrescences (large crystallites) giving a surface area of RMS parameter of at least 50 nm, for example over a thickness of 1.4 ⁇ m.
• a layer of ZnO deposited by magnetron sputtering at high temperature or LPCVD at high temperature is chosen as the first layer.
• LPCVD deposition conditions for example, it is possible to use the publication entitled "rough ZnO layers by LP-CVD process and their effect in improving performance of amorphous microcrystalline silicon solar cells" by S.Fay and others, Solar Energy Materials & Solar those 90 (2006) pages 2960-2967, without doping the ZnO.
• a layer of ZnO deposited at ambient temperature has an RMS of the order of 2 nm.
• a ZnO layer according to the invention has an RMS of about 10 nm.
• a layer of SnZnO deposited by CVD at high temperature is chosen as the first layer.
• Figure 2 is an SEM scanning electron microscope view at an angle of 50000 magnification of the surface of the first SNO 2 textured layer 2 by CVD deposition.
• this layer 2 The deposition conditions of this layer 2 are here described.
• a 40 cm long nozzle is sprayed onto the glass with precursors of oxygen at 7.5 l / min, 3.1 l / min of carrier nitrogen, resulting in monobutyl trichloro-tin vapors heated at 150 ° C., 51 cm 3 / min of nitrogen vector, which carries the acid vapors.
• trifluoroacetic acid cooled to 5 ° C, and 8 l / min of nitrogen vector entraining the vapors of water heated to 40 ° C.
• the smoothing layer 3 is for example a layer of Si 3 N 4 which covers the first layer 2. Its thickness is for example 400 nm. This layer flattens sufficiently the excrescences to obtain the textured surface whose profile has been characterized above.
• the constituent material of the smoothing layer 3 has a higher refractive index than that of the first textured layer 2, preferably between 1.8 and 2.0.
• the Si 3 N 4 layer is deposited by PECVD with a cathode supplied with radio frequency at 13.56 MHz, a pressure at 150 mTorr and at room temperature, with the precursors silane (SiH4) at 37 sccm, ammonia (NH3) at 100 sccm and helium at 100 sccm, and according to a deposit for 30 minutes.
• the smoothing layer 3 has a refractive index less than or equal to the (average) index of the first electrode (typically 1, 9-2).
• a layer of TiO 2 is chosen as smoothing layer 3 .
• the first electrode 1 1 by one or more conventional deposition techniques, typically by vapor deposition (s), in particular magnetron sputtering or by evaporation.
• a conductive transparent oxide layer (“TCO” for "Transparent Conductive Oxide” in English) is chosen for example: NTO with a thickness of about 100 nm or a stack with silver (silver between dielectric layers) especially) for example as described in WO2008 / 029060 and WO2008 / 059185.
• the stack of the electrode 11 comprises for example: a possible bottom layer (and / or) wet etch stop layer, which may be the Si 3 N 4 already deposited, a possible mixed oxide underlayer zinc and optionally doped tin or a layer of mixed indium tin oxide (ITO) or a layer of mixed indium zinc oxide (IZO), a contact layer based on of metal oxide, chosen from ZnO x doped or non-doped, Sn y Zn z O x , ITO or IZO, a metallic functional layer, for example silver, with intrinsic property of electrical conductivity, a possible thin layer of overblocking directly on the functional layer, the thin blocking layer comprising a metal layer of thickness less than or equal to 5 nm and / or a layer with a thickness of less than or equal to 10 nm, which is based on sub stoichiometric metal oxide, stoichiometric metal oxynitride or stoichiometric metal nitride (
• ZnO Al / Ag / Ti or NiCr / ZnO: Al / ITO, respective thicknesses, 5 to 20 nm for ZnO: Al, 5 to 15 nm for silver, 0.5 to 2 nm for Ti or NiCr, 5 to 20 nm, for ZnO: Al, 5 to 20 nm for NTO.
• On the possible bottom layers and / or wet etch stop layer and / or sub-layers can be arranged n times the following structure, with n an integer greater than or equal to 1: the contact layer, possibly the thin blocking layer, the functional layer, the thin layer of blocking, optionally the protective layer with water and / or oxygen.
• the final layer of the electrode remains the overlay.

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