EP2191936A3 - Bague de retenue avec surface inférieure convexe - Google Patents

Bague de retenue avec surface inférieure convexe Download PDF

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Publication number
EP2191936A3
EP2191936A3 EP10153712A EP10153712A EP2191936A3 EP 2191936 A3 EP2191936 A3 EP 2191936A3 EP 10153712 A EP10153712 A EP 10153712A EP 10153712 A EP10153712 A EP 10153712A EP 2191936 A3 EP2191936 A3 EP 2191936A3
Authority
EP
European Patent Office
Prior art keywords
retaining ring
lapping
machine
characteristic
carrier head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP10153712A
Other languages
German (de)
English (en)
Other versions
EP2191936B1 (fr
EP2191936A2 (fr
Inventor
Hung Chih Chen
Steven M. Zuniga
Charles C. Garretson
Douglas R. Mcallister
Stacy Meyer
Jian Lin
Sidney P. Huey
Jeonghoon Oh
Trung T. Doan
Jeffrey Schmidt
Martin S. Wohlert
Kerry F. Hughes
James C. Wang
Daniel Cam Toan Lu
Romain Beau Delamenie
Venkata R. Balagani
Aden Martin Allen
Michael Jon Fong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to EP15150653.2A priority Critical patent/EP2883656B1/fr
Publication of EP2191936A2 publication Critical patent/EP2191936A2/fr
Publication of EP2191936A3 publication Critical patent/EP2191936A3/fr
Application granted granted Critical
Publication of EP2191936B1 publication Critical patent/EP2191936B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B24B37/32—Retaining rings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49815—Disassembling

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
EP10153712.4A 2003-11-13 2004-11-12 Bague de retenue avec surface inférieure convexe Active EP2191936B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP15150653.2A EP2883656B1 (fr) 2003-11-13 2004-11-12 Bague de retenue avec surface inférieure tronconique

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US52055503P 2003-11-13 2003-11-13
US55656904P 2004-03-26 2004-03-26
US58075904P 2004-06-17 2004-06-17
US58075804P 2004-06-17 2004-06-17
US60306804P 2004-08-19 2004-08-19
EP04801058A EP1694464B1 (fr) 2003-11-13 2004-11-12 Bague de retenue a surface faconnee

Related Parent Applications (2)

Application Number Title Priority Date Filing Date
EP04801058.1 Division 2004-11-12
EP04801058A Division EP1694464B1 (fr) 2003-11-13 2004-11-12 Bague de retenue a surface faconnee

Related Child Applications (1)

Application Number Title Priority Date Filing Date
EP15150653.2A Division EP2883656B1 (fr) 2003-11-13 2004-11-12 Bague de retenue avec surface inférieure tronconique

Publications (3)

Publication Number Publication Date
EP2191936A2 EP2191936A2 (fr) 2010-06-02
EP2191936A3 true EP2191936A3 (fr) 2012-05-09
EP2191936B1 EP2191936B1 (fr) 2015-01-21

Family

ID=34624074

Family Applications (3)

Application Number Title Priority Date Filing Date
EP10153712.4A Active EP2191936B1 (fr) 2003-11-13 2004-11-12 Bague de retenue avec surface inférieure convexe
EP04801058A Active EP1694464B1 (fr) 2003-11-13 2004-11-12 Bague de retenue a surface faconnee
EP15150653.2A Active EP2883656B1 (fr) 2003-11-13 2004-11-12 Bague de retenue avec surface inférieure tronconique

Family Applications After (2)

Application Number Title Priority Date Filing Date
EP04801058A Active EP1694464B1 (fr) 2003-11-13 2004-11-12 Bague de retenue a surface faconnee
EP15150653.2A Active EP2883656B1 (fr) 2003-11-13 2004-11-12 Bague de retenue avec surface inférieure tronconique

Country Status (9)

Country Link
US (9) US7344434B2 (fr)
EP (3) EP2191936B1 (fr)
JP (2) JP5296985B2 (fr)
KR (1) KR101252751B1 (fr)
CN (1) CN1910012B (fr)
AT (1) ATE468941T1 (fr)
DE (1) DE602004027412D1 (fr)
TW (2) TWI355984B (fr)
WO (1) WO2005049274A2 (fr)

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DE602004027412D1 (de) 2003-11-13 2010-07-08 Applied Materials Inc Haltering mit geformter fläche
US11260500B2 (en) 2003-11-13 2022-03-01 Applied Materials, Inc. Retaining ring with shaped surface
WO2006114854A1 (fr) * 2005-04-12 2006-11-02 Nippon Seimitsu Denshi Co., Ltd. Bague de retenue pour dispositif de polissage chimico-mecanique, procede de fabrication de ladite bague et dispositif de polissage chimico-mecanique
JP2007027166A (ja) * 2005-07-12 2007-02-01 Renesas Technology Corp 半導体装置の製造方法および半導体製造装置
US7530153B2 (en) * 2005-09-21 2009-05-12 Applied Materials, Inc. Attaching components of a carrier head
JP2008062355A (ja) * 2006-09-08 2008-03-21 Fujitsu Ltd 研磨装置及び電子装置の製造方法
US7699688B2 (en) * 2006-11-22 2010-04-20 Applied Materials, Inc. Carrier ring for carrier head
US7727055B2 (en) 2006-11-22 2010-06-01 Applied Materials, Inc. Flexible membrane for carrier head
US8033895B2 (en) * 2007-07-19 2011-10-11 Applied Materials, Inc. Retaining ring with shaped profile
JP2010201534A (ja) * 2009-03-02 2010-09-16 Fujibo Holdings Inc 保持具
DE102009025243B4 (de) * 2009-06-17 2011-11-17 Siltronic Ag Verfahren zur Herstellung und Verfahren zur Bearbeitung einer Halbleiterscheibe aus Silicium
US8517803B2 (en) * 2009-09-16 2013-08-27 SPM Technology, Inc. Retaining ring for chemical mechanical polishing
KR101160266B1 (ko) * 2009-10-07 2012-06-27 주식회사 엘지실트론 웨이퍼 지지 부재, 그 제조방법 및 이를 포함하는 웨이퍼 연마 유닛
US8298046B2 (en) * 2009-10-21 2012-10-30 SPM Technology, Inc. Retaining rings
US8746750B2 (en) 2011-02-08 2014-06-10 The Gates Corporation Variable curvature clip for quick connect coupling
US9193027B2 (en) 2012-05-24 2015-11-24 Infineon Technologies Ag Retainer ring
JP5976522B2 (ja) * 2012-05-31 2016-08-23 株式会社荏原製作所 研磨装置および研磨方法
US10702972B2 (en) 2012-05-31 2020-07-07 Ebara Corporation Polishing apparatus
US9105516B2 (en) * 2012-07-03 2015-08-11 Ebara Corporation Polishing apparatus and polishing method
US9067295B2 (en) * 2012-07-25 2015-06-30 Applied Materials, Inc. Monitoring retaining ring thickness and pressure control
CN103624674A (zh) * 2012-08-27 2014-03-12 深圳富泰宏精密工业有限公司 研磨机升降机构及应用该升降机构的研磨机
US8998676B2 (en) 2012-10-26 2015-04-07 Applied Materials, Inc. Retaining ring with selected stiffness and thickness
US9604339B2 (en) 2012-10-29 2017-03-28 Wayne O. Duescher Vacuum-grooved membrane wafer polishing workholder
US9199354B2 (en) 2012-10-29 2015-12-01 Wayne O. Duescher Flexible diaphragm post-type floating and rigid abrading workholder
US9233452B2 (en) 2012-10-29 2016-01-12 Wayne O. Duescher Vacuum-grooved membrane abrasive polishing wafer workholder
US9434047B2 (en) * 2012-11-14 2016-09-06 Taiwan Semiconductor Manufacturing Company, Ltd. Retainer ring
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US20150021498A1 (en) * 2013-07-17 2015-01-22 Applied Materials, Inc. Chemical mechanical polishing retaining ring methods and apparatus
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CN104681472A (zh) * 2013-12-02 2015-06-03 有研新材料股份有限公司 一种载片圈
JP6336893B2 (ja) * 2014-11-11 2018-06-06 株式会社荏原製作所 研磨装置
US10105812B2 (en) * 2014-07-17 2018-10-23 Applied Materials, Inc. Polishing pad configuration and polishing pad support
CN104308537B (zh) * 2014-08-27 2017-01-25 北京蓝爱迪电力技术有限公司 一种l型汽封片成型装置及生产方法
US10252397B2 (en) * 2014-10-30 2019-04-09 Applied Materials, Inc. Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes
CN105729298A (zh) * 2014-12-11 2016-07-06 宁波江丰电子材料股份有限公司 化学机械研磨用保持环的剥离方法
JP2016155188A (ja) * 2015-02-24 2016-09-01 株式会社荏原製作所 リテーナリング、基板保持装置、研磨装置およびリテーナリングのメンテナンス方法
SG10201601379WA (en) * 2015-03-19 2016-10-28 Applied Materials Inc Retaining ring for lower wafer defects
JP1546801S (fr) * 2015-06-12 2016-03-28
TWD179095S (zh) * 2015-08-25 2016-10-21 荏原製作所股份有限公司 基板保持環
JP1556433S (fr) * 2015-10-06 2016-08-15
JP6392193B2 (ja) * 2015-10-14 2018-09-19 株式会社荏原製作所 基板保持装置および基板研磨装置ならびに基板保持装置の製造方法
US9744640B2 (en) 2015-10-16 2017-08-29 Applied Materials, Inc. Corrosion resistant retaining rings
KR102535628B1 (ko) 2016-03-24 2023-05-30 어플라이드 머티어리얼스, 인코포레이티드 화학적 기계적 연마를 위한 조직화된 소형 패드
US10926378B2 (en) 2017-07-08 2021-02-23 Wayne O. Duescher Abrasive coated disk islands using magnetic font sheet
CN109420969B (zh) * 2017-08-29 2020-12-01 中芯国际集成电路制造(上海)有限公司 一种研磨头和化学机械研磨装置
US11400560B2 (en) * 2017-10-04 2022-08-02 Applied Materials, Inc. Retaining ring design
CN109693174A (zh) * 2017-10-23 2019-04-30 中芯国际集成电路制造(上海)有限公司 一种研磨头和化学机械研磨装置
JP7219009B2 (ja) * 2018-03-27 2023-02-07 株式会社荏原製作所 基板保持装置およびドライブリングの製造方法
KR101952829B1 (ko) * 2018-08-13 2019-02-27 최유섭 금속부품의 연마가공장치 및 이를 이용한 연마가공방법
EP3708300A1 (fr) * 2019-03-15 2020-09-16 SABIC Global Technologies B.V. Bague de retenue pour processus de polissage chimicomécanique, son procédé de fabrication et système de polissage chimicomécanique comprenant la bague de retenue
JP1651623S (fr) * 2019-07-18 2020-01-27
US11691241B1 (en) * 2019-08-05 2023-07-04 Keltech Engineering, Inc. Abrasive lapping head with floating and rigid workpiece carrier
KR102304948B1 (ko) * 2020-01-13 2021-09-24 (주)제이쓰리 반도체 웨이퍼 형상을 제어하는 웨이퍼 가공용 헤드 장치
CN111347345B (zh) * 2020-04-16 2020-10-16 华海清科股份有限公司 一种用于化学机械抛光的保持环和承载头
CN115151376B (zh) 2020-07-08 2024-05-24 应用材料公司 多齿磁控保持环
US11565367B2 (en) * 2020-07-09 2023-01-31 Applied Materials, Inc. Retaining ring
CN113478390B (zh) * 2021-07-27 2022-11-11 京东方杰恩特喜科技有限公司 抛光治具及抛光装置
CN113524027A (zh) * 2021-08-09 2021-10-22 北京烁科精微电子装备有限公司 晶圆保持件及研磨机
CN115106932B (zh) * 2021-11-10 2024-03-05 华海清科股份有限公司 一种化学机械抛光头和抛光设备
CN114952610B (zh) * 2021-11-10 2024-02-09 华海清科股份有限公司 一种用于化学机械抛光的承载头和抛光设备

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Also Published As

Publication number Publication date
WO2005049274A2 (fr) 2005-06-02
JP2013056416A (ja) 2013-03-28
CN1910012A (zh) 2007-02-07
JP5296985B2 (ja) 2013-09-25
TW200526353A (en) 2005-08-16
ATE468941T1 (de) 2010-06-15
TWI496660B (zh) 2015-08-21
US8585468B2 (en) 2013-11-19
US20230182261A1 (en) 2023-06-15
EP2191936B1 (fr) 2015-01-21
KR101252751B1 (ko) 2013-04-09
KR20070011250A (ko) 2007-01-24
TW201136708A (en) 2011-11-01
TWI355984B (en) 2012-01-11
EP2883656B1 (fr) 2016-12-21
US20120071067A1 (en) 2012-03-22
EP2191936A2 (fr) 2010-06-02
US11577361B2 (en) 2023-02-14
US20220152778A1 (en) 2022-05-19
US20180185979A1 (en) 2018-07-05
US7927190B2 (en) 2011-04-19
US11850703B2 (en) 2023-12-26
EP1694464A2 (fr) 2006-08-30
US20050191947A1 (en) 2005-09-01
US9937601B2 (en) 2018-04-10
US20140053981A1 (en) 2014-02-27
US9186773B2 (en) 2015-11-17
JP5506894B2 (ja) 2014-05-28
US7344434B2 (en) 2008-03-18
US20160045997A1 (en) 2016-02-18
US8066551B2 (en) 2011-11-29
US20080196833A1 (en) 2008-08-21
DE602004027412D1 (de) 2010-07-08
EP1694464B1 (fr) 2010-05-26
EP2883656A1 (fr) 2015-06-17
JP2007511377A (ja) 2007-05-10
WO2005049274B1 (fr) 2005-12-29
US10766117B2 (en) 2020-09-08
WO2005049274A3 (fr) 2005-11-03
US20110195639A1 (en) 2011-08-11
CN1910012B (zh) 2012-03-21

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