EP2152939A1 - Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu - Google Patents

Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu

Info

Publication number
EP2152939A1
EP2152939A1 EP09757157A EP09757157A EP2152939A1 EP 2152939 A1 EP2152939 A1 EP 2152939A1 EP 09757157 A EP09757157 A EP 09757157A EP 09757157 A EP09757157 A EP 09757157A EP 2152939 A1 EP2152939 A1 EP 2152939A1
Authority
EP
European Patent Office
Prior art keywords
treatment
treatment liquid
goods
contacts
working container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP09757157A
Other languages
German (de)
English (en)
Other versions
EP2152939B1 (fr
Inventor
Mathias Gutekunst
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rena GmbH
Original Assignee
Rena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rena GmbH filed Critical Rena GmbH
Publication of EP2152939A1 publication Critical patent/EP2152939A1/fr
Application granted granted Critical
Publication of EP2152939B1 publication Critical patent/EP2152939B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/028Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005Contacting devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0621In horizontal cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current

Definitions

  • the invention relates to the transport or the promotion and the electrical contacting of flat material in electrolytic or wet-chemical continuous flow systems.
  • the estate is z.
  • solar cells made of silicon, printed circuit boards or hybrids that at least in one process only on one side using external power, for. B. are to treat electrolytically.
  • the not z ⁇ treated side of the goods should not be wetted or contaminated by the treatment liquid. Even the slightest wetting as traces must be avoided in order to avoid a rejection of the goods.
  • both the top and the bottom of the goods are intended wetted with the treatment liquid. Should or may only be wetted the underside of the goods, so it requires a much greater technical effort, at least in an electrolytic treatment of the goods. In this case, the treatment liquid reaches only to the bottom of the usually thin material zoom. For secure electrical contact, a contact force must be exerted on the flat material at least from one side. Such a galvanizing describes the document DE 10 2005 039 100 Al.
  • the tops of the goods z.
  • As substrates as solar cells are protected in a frame by means of seals against penetration of reaching up to the underside of the same treatment liquid treatment. Very soft proofing Roll press the solar cells for electrical contact against the contacts of the frame projections. The frame is used to hold several solar cells.
  • the means of transport or contact means roll on the top and bottom of the goods.
  • Means of transport serve only for the purpose of transporting the goods.
  • the contact means are used for transport and for electrical contacting of the goods or only for contacting them.
  • the upper still dry conveyor rolls on the lower wet conveyor for a short time, especially if the good is very thin and / or if this transverse gap has said length.
  • the upper conveyor takes up treatment liquid from the lower conveyor. This treatment liquid is then transferred to the surface of the top of the subsequent material.
  • a fürlaufanläge consists in the conveying direction z. B. from 100 or more rotating transport shafts, the following briefly be referred to as waves. These extend transversely to the transport direction over the entire transport path. On the waves many funds are arranged according to the width of the conveyor tracks. Because of the large number of waves, the effect of transferring the treatment liquid from the lower conveyor to the top of the item is repeated 100 times or more. As a result, the material is wetted by the conveying means at the top, at least in the region of the transport tracks, even if the level of the treatment liquid is not up to the level zoom ranges.
  • sealants are disclosed in DE 88 12 212 Ul, wherein the sealant already attack on the underside of the material to be treated, thus preventing a violation of an etching solution on the dry top to be held.
  • an arrangement of sealants at the bottom allows of course only an incomplete treatment thereof, which is presently undesirable.
  • the object of the invention is to enable the horizontal promotion of wet on one side, namely the bottom using external flow wet-chemically or electrolytically treated Good in continuous systems, being located at the top of the goods along the transport path contact means in contact with the good and that while not reaching down to the bottom of the flat material treatment liquid is not transferred to the dry top.
  • the object is achieved by the device according to claim 1 and by the method according to claim 13.
  • the dependent claims describe advantageous embodiments of the invention.
  • solar cells or hybrids concern in particular the galvanizing, the electrolytic etching and the electrolytic Polishing.
  • the invention is also suitable for other wet processes, such.
  • Such processes occur in goods that are produced in large quantities.
  • the continuous-flow systems are produced for the production of a good that is always consistent at least in terms of dimensions.
  • the required counterelectrodes may be anodic or cathodic and the contacts and the good cathodic or anodic.
  • the invention is described using the example of solar cells with the widespread dimensions 156 x 156 mm 2 . However, it also applies without restriction to other flat goods which are to be treated as sections in continuous flow systems.
  • the treatment of solar cells represents a very special technical challenge.
  • the thickness of this silicon ⁇ discs is such. B. 140 microns or less. Therefore, they are very break sensitive.
  • the surface of the upper surface to be kept dry during the wet treatment would usually react very violently with the treatment liquids, ie it must be safely protected against wetting. This means that upper conveying means and / or contact means in the transverse gaps described above may not be wetted by the lower conveying means or other constructional means. The same applies to products other than sections which are to be treated with a dry top.
  • z. B. solar cells in parallel, ie fed next to each other and retracted one after the other.
  • the waves which are arranged transversely to the transport direction, contain a corresponding number of conveyor tracks, z. B. 8 with the necessary transport mittein and / or contact means on each shaft.
  • the conveyor lanes are referred to below in capital letters, z. B. A to H for 8 conveyor tracks.
  • Each shaft is located in the conveying direction at a position of fürlaufanläge, which are to be referred to here with numbers, z. B. position Pos .1 for the p etting wave of fürlaufctuidge.
  • the invention provides on the bottom only funding, the longitudinal and transverse distances depend on the dimensions of the goods.
  • the invention provides contact means, which can also act as a conveyor at the same time.
  • the number of these means on the two sides of the good is preferably different sizes.
  • the level of the electrolyte reaches to the bottom of the material, so that this side can be treated wet.
  • the level of the electrolyte according to the invention is lowered at least so far that these contact and / or funding can not be wetted even if no good before the contact or funding is located. To reduce the level serve localized overflows.
  • the conveying means can be designed as transport wheels, transport rings, transport disks on rotating shafts.
  • the distance a of the shafts or rollers in the conveying direction is generally independent of the dimensions of the material and the transverse gap. It depends in particular on the length of the goods. To ensure a safe At least two shafts with conveying means in the conveying direction should always be engaged with the goods.
  • FIG. 1 shows, as a detail in plan view, the arrangement of the conveying means and the overflows in the working container.
  • FIG. 2 shows, in a side view, a passage for the electrolytic coating of solar cells.
  • Figure 3 shows a view in the direction of transport, the situation of a contact during the electrical contact.
  • FIG. 3 b shows this situation during a transverse gap in the area of the contact.
  • Rotationally driven shafts 3 serve as conveying means for this purpose. These shafts 3 can be provided, as shown, with rings 4 which give the final outside diameter of the conveyor. The material 1 rests on the rings 3 rotating with the shaft 4. It is used not least because of the suction occurring in the overflow pipe 5 described below to the rings 4, whereby a track-accurate transport of the goods 1 takes place. Also suitable as conveying means are wheel shafts or rollers. The rollers mainly have the correspondingly large outer diameter.
  • Each conveyor 3 may be assigned in the region of each conveyor track A, B, C, etc., at least one contact means. In the figure, 1, not shown, contact means is provided after every third conveyor 3.
  • the level of the electrolyte according to the invention is lowered so far that even a contact not in contact with the material is not wetted. This is achieved in the working ⁇ container by spatially limited overflows for the electrolyte.
  • downpipes 5 or downpipes for local lowering of the level These overflows reach up to near the level of the bottom of the goods 1, whereby the transport of the goods is not hindered.
  • the overflow edge of the overflow tube 5 is thus slightly below the general level of the treatment liquid of the working container. With this height difference, the amount of overflowing treatment liquid can be adjusted per overflow.
  • the other end of the overflow pipe 5 ends in a separate container from the working container as a collecting container and sump.
  • the number of contact means is chosen so large in the transport direction that always at least one contact per Good 1 is engaged.
  • the overflows and thus the contacts on the contact means and the rings 4 on the shafts 3 are preferably arranged offset transversely to the transport direction to avoid tracking from each position.
  • FIG. 2 shows the contacts 6 which are located on stationary contact means 7.
  • the contacts 6 are sliding contacts which slide along the electrically conductive upper side 9 of the material 1 and thereby transfer the electric current required for the electrolytic treatment to the material 1.
  • the contacts 6 consist z. B. of electrically conductive fine wire strands or thin elastic bands. Instead of the sliding contacts 6 and rotating contacts can be used. These are located on rotationally driven shafts on the upper side 9 of the goods 1 in the region of the respective contact tracks and the overflows.
  • the actual contact means of the contact wheel are z. B. also fine wire strands or thin elastic bands.
  • the contacts roll on the top 9 of the goods 1. They support the transport of the same, whereby a larger contact force can be realized. This is particularly advantageous if a good at the bottom is to be treated over its entire surface with a high current density. In this Trap is to transmit a larger current over each rotating contact, z. B. 10 amps.
  • overflow pipe 5 serves for this purpose.
  • the electrolyte 11 flows, separated from the liquid in the working container 12, laminar on the inner wall of the overflow pipe 5 through the bottom 14 of the working container 12 in the lower container 13, which serves as a collecting container and at the same time as a pump container.
  • the electrolyte 11 passes back by means of at least one pump 15 in the working container 12, whereby the electrolyte circuit is closed.
  • the fixed to the contact means 7 contacts 6 slide under a bias mechanically transmitting current through the top 9 of the goods 1.
  • This situation is shown on the left.
  • the sliding or rotating contact expands and extends underneath the plane of the underside 10 of the material 1. He touches neither the wetted inner wall of the overflow pipe 5 nor the shaft 3 and the funding, which may also be wetted with electrolyte.
  • This situation is shown at the right overflow.
  • the overflow tube 5 and elongated overflows may be arranged in the region of the contact means. An example of this is an overflow channel transversely to the transport direction.
  • the shafts 3 penetrate the overflow tube 5 in stock. This allows a very accurate adjustment of the height of the material from its underside 10 to the height of the opening of the overflow tubes 5 on this side. As a result, even with very large flow systems temperature-induced changes in the of the construction elements without affecting the distance between the good and the overflow pipe required for the overflow.
  • At least one soluble or insoluble anode 16 is disposed within the electrolyte 11 to form the electrolytic cell.
  • This anode 16 which is also commonly referred to as the counter electrode, is electrically connected to at least one galvanizing power source 17 or generally to a power source.
  • the electrical Galvanisierstrom Vietnamese closes on the contact means 7, the contacts 6, the Good 1, the electrolyte 11 in the working container 12 and the anode 16.
  • the condition for this circuit is that the material from the top 9 to the bottom 10 is electrically conductive.
  • a solar cell made of silicon, which is to be galvanized on the sunny side, is initially electrically non-conductive at the given polarity.
  • the solar cell is low-resistance generator and it can guide the Galvanisierstrom therethrough.
  • light is introduced into the electrolytic cell. This is done with light sources 18, which are preferably arranged between the conveying means transversely to the transport direction.
  • FIG. 3 a shows the section A - B of FIG. 2.
  • the elas- Table biased contact 6 is located on the top 9 of the goods 1 electrically contacting.
  • z. B. 1 amp. because of the surface to be treated electrolytically, which is small in solar cell on the sunny side, and the electrical current to be contacted small, z. B. 1 amp. Therefore, only a small contact force is required. It has been found in experiments that this contact force of the sliding contacts has no influence on the transport of the goods. Although there is no need for upper conveyors, the transport takes place precisely to the track even when the containers slide over the goods 1.
  • elastic contacts 6 are fine wire strands of copper, stainless steel or precious metal, the side by side as subjects of z. B. 10 mm width are arranged. Also, a wide elastic band made of an electrically conductive material, which slides over the top of the good like a spatula, is very well suited as a contact 6.
  • FIG. 3 b shows the section C - D of FIG. 2.
  • the contact means 7 and thus the contact 6 are present in the region of a transverse gap 8 between two goods 1.
  • the elastic contact 6 is relaxed. Although it may be located below the general level of the electrolyte in the working container with its lower edge, the contact is not wetted.
  • the cathodically poled contact 6 is kept free from the overflow 5. Therefore, it is not galvanized.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

L'invention concerne la mise en contact électrique de produit plat (1) en tant que sections dans des installation fonctionnant en continu pour le traitement électrolytique et/ou chimique par voie humide du côté à traiter (10) du produit par application de courant électrique extérieur en maintenant au sec le côté supérieur de contact (9) et en immergeant le côté à traiter (10) dans le liquide de traitement (11). Grâce aux systèmes de transports connus avec des moyens de transport et/ou de contact supérieurs et inférieurs, le liquide de traitement (11) est transféré des moyens inférieurs sur les moyens supérieurs, raison pour laquelle le côté supérieur du produit est souvent insuffisamment mouillé et les contacts supérieurs sont galvanisés et par conséquent démétallisés en continu, ce qui exige un plus gros investissement. Selon l'invention, le niveau est abaissé dans la région des contacts supérieurs (6). De ce fait, ceux-ci ne peuvent pas être mouillés, même quand aucun produit ne se trouve dans la région des contacts (6). On obtient cela grâce aux tuyaux de descente (5) qui sont associés à chaque contact (6). Même quand les contacts sont hors tension, ils ne touchent pas le liquide de traitement, raison pour laquelle le côté supérieur du produit reste sec et les contacts ne nécessitent aucun démétallisation.
EP09757157A 2008-05-30 2009-05-08 Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu Not-in-force EP2152939B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008026199A DE102008026199B3 (de) 2008-05-30 2008-05-30 Vorrichtung und Verfahren zur elektrischen Kontaktierung von ebenem Gut in Durchlaufanlagen
PCT/EP2009/003298 WO2009146773A1 (fr) 2008-05-30 2009-05-08 Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu

Publications (2)

Publication Number Publication Date
EP2152939A1 true EP2152939A1 (fr) 2010-02-17
EP2152939B1 EP2152939B1 (fr) 2012-07-11

Family

ID=41051722

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09757157A Not-in-force EP2152939B1 (fr) 2008-05-30 2009-05-08 Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu

Country Status (9)

Country Link
US (1) US8444832B2 (fr)
EP (1) EP2152939B1 (fr)
JP (1) JP5150727B2 (fr)
KR (1) KR101122707B1 (fr)
CN (1) CN101796222B (fr)
DE (1) DE102008026199B3 (fr)
RU (1) RU2440444C2 (fr)
TW (1) TWI414642B (fr)
WO (1) WO2009146773A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005480C2 (nl) * 2010-10-07 2012-04-11 Meco Equip Eng Inrichting voor het eenzijdig elektrolytisch behandelen van een vlak substraat.
DE102011111175B4 (de) * 2011-08-25 2014-01-09 Rena Gmbh Verfahren und Vorrichtung zur Flüssigkeits-Niveauregelung bei Durchlaufanlagen
DE102012210618A1 (de) * 2012-01-26 2013-08-01 Singulus Stangl Solar Gmbh Vorrichtung und Verfahren zum Behandeln von plattenförmigem Prozessgut
JP2013194242A (ja) * 2012-03-15 2013-09-30 Tokyo Kakoki Kk 板状ワークの片面めっき装置
AU2014241798B2 (en) * 2013-03-14 2016-12-08 Allison Transmission, Inc. Fluid bath cooled energy storage system
DE102013219886A1 (de) * 2013-10-01 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur kontinuierlichen Herstellung poröser Siliciumschichten
TW201827655A (zh) * 2016-12-09 2018-08-01 德商雷納科技有限公司 連續式分離器及其組件
CN107644828B (zh) * 2017-09-14 2024-03-22 中国科学院宁波材料技术与工程研究所 一种多孔硅薄膜的制备装置及其制备多孔硅薄膜的方法
CN109355635A (zh) * 2018-12-15 2019-02-19 湖南玉丰真空科学技术有限公司 一种连续镀膜生产线中基片框架偏压引入装置
US11713514B2 (en) 2019-08-08 2023-08-01 Hutchinson Technology Incorporated Systems for electroplating and methods of use thereof
WO2023179748A1 (fr) 2022-03-25 2023-09-28 苏州太阳井新能源有限公司 Procédé et appareil d'électroplacage d'une cellule

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636933Y2 (fr) * 1976-03-31 1981-08-31
US4364328A (en) * 1979-06-01 1982-12-21 Nippon Kokan Kabushiki Kaisha Apparatus for continuous dip-plating on one-side of steel strip
US4267024A (en) * 1979-12-17 1981-05-12 Bethlehem Steel Corporation Electrolytic coating of strip on one side only
IT1138370B (it) * 1981-05-20 1986-09-17 Brev Elettrogalvan Superfinitu Metodo e apparecchiatura a doppia vasca,per la cromatura in continuo di barre e di pezzi di grosse dimensioni,con riciclo per la eliminazione dell'idrogeno
JPS6311693A (ja) * 1986-07-02 1988-01-19 Fuji Plant Kogyo Kk 帯状物のメツキ装置
IT1227203B (it) * 1988-08-18 1991-03-27 Techint Spa Impianto a cella orizzontale di metallizzazione elettrolitica, ad anodi solubili, per trattamento elettrolitico in continuo di nastrid'acciaio su una o due facce, e procedimento
DE8812212U1 (de) * 1988-09-27 1988-11-24 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum einseitigen Ätzen einer Halbleiterscheibe
US4922938A (en) * 1989-09-06 1990-05-08 Siegmund, Inc. Apparatus for single side spray processing of printed circuit boards
DE19842974A1 (de) 1998-09-19 2000-03-23 Schmid Gmbh & Co Geb Einrichtung zur Behandlung von Gegenständen, insbesondere Galvanisiereinrichtung für Leiterplatten
KR20020074482A (ko) * 2000-01-24 2002-09-30 다이낑 고오교 가부시키가이샤 기재의 피복방법, 피복물품 및 피복장치
US7125477B2 (en) * 2000-02-17 2006-10-24 Applied Materials, Inc. Contacts for electrochemical processing
DE10313127B4 (de) 2003-03-24 2006-10-12 Rena Sondermaschinen Gmbh Verfahren zur Behandlung von Substratoberflächen
ES2352674T3 (es) * 2004-03-22 2011-02-22 Rena Sondermaschinen Gmbh Procedimiento de tratamiento de superficies de sustratos.
EP1698715A1 (fr) * 2005-03-03 2006-09-06 Applied Films GmbH & Co. KG machine de revêtement ayant des élèments sur un tiroir
DE102005038449B4 (de) 2005-08-03 2010-03-25 Gebr. Schmid Gmbh & Co. Einrichtung zur Behandlung von Substraten, insbesondere zur Galvanisierung von Leiterplatten, und Verfahren
DE102005039100A1 (de) 2005-08-09 2007-02-15 Gebr. Schmid Gmbh & Co. Einrichtung zur Aufnahme bzw. Halterung mehrerer Substrate und Galvanisiereinrichtung
DE102005057109A1 (de) * 2005-11-26 2007-05-31 Kunze-Concewitz, Horst, Dipl.-Phys. Vorrichtung und Verfahren für mechanisches Prozessieren flacher, dünner Substrate im Durchlaufverfahren
DE102005062527A1 (de) * 2005-12-16 2007-06-21 Gebr. Schmid Gmbh & Co. Vorrichtung und Verfahren zur Oberflächenbehandlung von Substraten
JP4710619B2 (ja) * 2006-01-13 2011-06-29 Jfeスチール株式会社 錫めっき鋼帯の製造方法および錫めっきセル
DE102006033353B4 (de) * 2006-07-19 2010-11-18 Höllmüller Maschinenbau GmbH Verfahren und Vorrichtung zum Behandeln von flachen, zerbrechlichen Substraten
DE102007054093B3 (de) * 2007-11-13 2009-07-23 Rena Sondermaschinen Gmbh Vorrichtung und Verfahren zum Transport von flachem Gut in Durchlaufanlagen

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2009146773A1 *

Also Published As

Publication number Publication date
TWI414642B (zh) 2013-11-11
KR101122707B1 (ko) 2012-03-27
KR20100030669A (ko) 2010-03-18
WO2009146773A1 (fr) 2009-12-10
DE102008026199B3 (de) 2009-10-08
US8444832B2 (en) 2013-05-21
CN101796222A (zh) 2010-08-04
TW201000681A (en) 2010-01-01
CN101796222B (zh) 2013-05-22
RU2010102905A (ru) 2011-08-10
JP5150727B2 (ja) 2013-02-27
US20100187068A1 (en) 2010-07-29
RU2440444C2 (ru) 2012-01-20
EP2152939B1 (fr) 2012-07-11
JP2010539324A (ja) 2010-12-16

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