EP2152939B1 - Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu - Google Patents

Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu Download PDF

Info

Publication number
EP2152939B1
EP2152939B1 EP09757157A EP09757157A EP2152939B1 EP 2152939 B1 EP2152939 B1 EP 2152939B1 EP 09757157 A EP09757157 A EP 09757157A EP 09757157 A EP09757157 A EP 09757157A EP 2152939 B1 EP2152939 B1 EP 2152939B1
Authority
EP
European Patent Office
Prior art keywords
treatment
treatment liquid
goods
contacts
contacting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP09757157A
Other languages
German (de)
English (en)
Other versions
EP2152939A1 (fr
Inventor
Mathias Gutekunst
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rena GmbH
Original Assignee
Rena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rena GmbH filed Critical Rena GmbH
Publication of EP2152939A1 publication Critical patent/EP2152939A1/fr
Application granted granted Critical
Publication of EP2152939B1 publication Critical patent/EP2152939B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/028—Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0621—In horizontal cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Definitions

  • the invention relates to the transport or the promotion and the electrical contacting of flat material in electrolytic or wet-chemical continuous flow systems.
  • the estate is z.
  • solar cells made of silicon, printed circuit boards or hybrids that at least in one process only on one side using external power, for. B. are to be treated electrolytically.
  • the non-treated side of the material should not be wetted or contaminated by the treatment liquid. Even the slightest wetting as traces must be avoided in order to avoid a rejection of the goods.
  • the pamphlets DE 10 2005 038 449 A1 and EP 0 992 617 A2 show widespread flow systems with typical driven conveyors as rollers with rings and shafts with rollers and wheels.
  • both the top and the bottom of the goods are intended wetted with the treatment liquid. Should or may only be wetted the underside of the goods, so it requires a much greater technical effort, at least in an electrolytic treatment of the goods. In this case, the treatment liquid reaches only to the bottom of the usually thin material zoom. For secure electrical contact, a contact force must be exerted on the flat material at least from one side.
  • a galvanizing describes the document DE 10 2005 039 100 A1 , The tops of the goods, z.
  • substrates as solar cells are protected in a frame by means of seals against ingress of the reaching up to the bottom of the same treatment liquid. Very soft pressure rollers Press the solar cells for making electrical contact against the contacts of the frame protrusions.
  • the frame is used to hold several solar cells.
  • the means of transport or contact means roll on the top and bottom of the goods.
  • Means of transport serve only for the purpose of transporting the goods.
  • the contact means are used for transport and for electrical contacting of the goods or only for contacting them.
  • the upper still dry conveyor rolls on the lower wet conveyor for a short time, especially if the good is very thin and / or if this transverse gap has said length.
  • the upper conveyor takes up treatment liquid from the lower conveyor. This treatment liquid is then transferred to the surface of the top of the subsequent material.
  • a continuous system consists in the conveying direction z. B. from 100 or more rotating transport shafts, the following briefly be referred to as waves. These extend transversely to the transport direction over the entire transport path. On the waves many funds are arranged according to the width of the conveyor tracks. Because of the large number of waves, the effect of transferring the treatment liquid from the lower conveyor to the top of the item is repeated 100 times or more. The good is thereby wetted at the top at least in the field of transport traces by the funding, even if the level of the treatment liquid does not reach to the top.
  • sealants are used in the DE 88 12 212 U1 disclosed, wherein the sealing means already attack on the underside of the material to be treated, thus preventing the passage of an etching solution to the top surface to be kept dry.
  • an arrangement of sealants at the bottom allows of course only an incomplete treatment thereof, which is presently undesirable.
  • the pamphlets DE 103 13 127 B4 and WO 2005/093788 describe wet-chemical etching processes for substrates which can be carried out in continuous flow systems, in which the liquid height is adjusted so that only the underside of the substrates, including the edges, is wetted. Because the flat good rests alone on lower funding, the top is not wetted in this case. However, this method for keeping the topside dry is not intended for the electrolytic treatment of goods.
  • a possible electrical contacting on the cathodic underside, ie on the side to be electroplated in the electrolyte requires a continuous anodic demetallization of the contact means in this electrolyte. This is z. B. in the occurring in practice precious metals not possible.
  • the object of the invention is to enable the horizontal promotion of wet on one side, namely the bottom using external flow wet-chemically or electrolytically treated Good in continuous systems, being located at the top of the goods along the transport path contact means in contact with the good , And that while not reaching down to the bottom of the flat material treatment liquid is not transferred to the dry top.
  • the object is achieved by the device according to claim 1 and by the method according to claim 12.
  • the dependent claims describe advantageous embodiments of the invention.
  • solar cells or hybrids concern in particular the electroplating, the electrolytic etching and the electrolytic Polishing.
  • the invention is also suitable for other wet processes, such.
  • Such processes occur in goods that are produced in large quantities.
  • the continuous-flow systems are produced for the production of a good that is always consistent at least in terms of dimensions.
  • the invention will now be described by the example of electroplating and the anodes required for this purpose. However, it also applies to the other processes when using external current.
  • the required counterelectrodes may be anodic or cathodic and the contacts and the good cathodic or anodic.
  • the invention is described using the example of solar cells with the widespread dimensions 156 x 156 mm 2 . However, it also applies without restriction to other flat goods which are to be treated as sections in continuous flow systems.
  • the treatment of the solar cells represents a very special technical challenge.
  • the thickness of these silicon wafers is z. B. 140 microns or less. Therefore, they are very break sensitive.
  • the surface of the top which is to be kept dry during the wet treatment would usually react very violently with the treatment liquids, i. H. it must be protected against wetting. This means that upper conveying means and / or contact means in the transverse gaps described above may not be wetted by the lower conveying means or other constructional means. The same applies to products other than sections which are to be treated with a dry top.
  • z. B solar cells in parallel, d. H. fed side by side and retracted one after the other.
  • the waves which are arranged transversely to the transport direction, contain a corresponding number of conveyor tracks, z. B. 8 with the necessary means of transport and / or contact means on each shaft.
  • the conveyor lanes are referred to below in capital letters, z. B. A to H for 8 conveyor tracks.
  • Each shaft is located in the conveying direction on a position of the continuous system, which should be referred to here with numbers, z. B. Position Pos.1 for the first wave of the continuous system.
  • the invention provides on the bottom only funding, the longitudinal and transverse distances depend on the dimensions of the goods.
  • the invention provides contact means, which can also act as a conveyor at the same time.
  • the number of these means on the two sides of the good is preferably different sizes.
  • the level of the electrolyte reaches to the bottom of the material, so that this side can be treated wet.
  • the level of the electrolyte according to the invention is lowered at least so far that these contact and / or funding can not be wetted even if no good before the contact or funding is located. To reduce the level serve localized overflow regions in the form of downpipes.
  • the conveying means can be designed as transport wheels, transport rings, transport disks on rotating shafts.
  • the distance a of the shafts or rollers in the conveying direction is generally independent of the dimensions of the material and the transverse gap. It depends in particular on the length of the goods.
  • At least two shafts with conveying means in the conveying direction should always be engaged with the goods.
  • FIG. 1 shows a section in plan view of the arrangement of the funding and the downpipes in the working container.
  • FIG. 2 shows in side view a continuous system for the electrolytic treatment of solar cells.
  • FIG. 3 a shows in the direction of transport the situation of a contact during electrical contacting.
  • FIG. 3 b shows this situation during a cross gap in the area of contact.
  • FIG. 1 the good 1 is conveyed in the direction of the transport direction arrow 2.
  • Rotationally driven shafts 3 serve as conveying means for this purpose. These shafts 3 can be provided, as shown, with rings 4 which give the final outside diameter of the conveyor. The material 1 rests on the rings 3 rotating with the shaft 4. It is used not least because of the suction occurring in the overflow pipe 5 described below to the rings 4, whereby a track-accurate transport of the goods 1 takes place.
  • wheel shafts or rollers are also suitable as conveying means. The rollers mainly have the correspondingly large outer diameter.
  • Each conveyor 3 may be assigned in the region of each conveyor track A, B, C, etc., at least one contact means. In the FIG. 1 is provided after every third conveyor 3 a not shown contact means.
  • the level of the electrolyte according to the invention is lowered so far that even a contact not in contact with the material is not wetted.
  • FIG. 1 serve overflow pipes 5 or downpipes for local lowering of the level.
  • These overflows reach up to near the level of the bottom of the goods 1, whereby the transport of the goods is not hindered.
  • the overflow edge of the overflow pipes 5 is thus slightly below the general level of the treatment liquid of the working container. With this height difference, the amount of overflowing treatment liquid per downpipe can be adjusted.
  • the other end of the overflow pipe 5 ends in a separate container from the working container as a collecting container and sump.
  • the number of contact means is chosen so large in the transport direction that always at least one contact per Good 1 is engaged.
  • the downpipes 5 and thus the contacts on the contact means and the rings 4 on the shafts 3 are preferably offset transversely to the transport direction to avoid tracking from each position.
  • the FIG. 2 shows the contacts 6, which are located on stationary contact means 7.
  • the contacts 6 are sliding contacts which slide along the electrically conductive upper side 9 of the material 1 and thereby transfer the electric current required for the electrolytic treatment to the material 1.
  • the contacts 6 consist z. B. of electrically conductive fine wire strands or thin elastic bands. Instead of the sliding contacts 6 and rotating contacts can be used. These are located on rotationally driven shafts on the upper side 9 of the goods 1 in the region of the respective contact tracks and the downpipes 5.
  • the actual contact means of the contact wheel are z. B. also fine wire strands or thin elastic bands.
  • the contacts roll on the top 9 of the goods 1. They support the transport of the same, whereby a larger contact force can be realized. This is particularly advantageous if a good at the bottom is to be treated over its entire surface with a high current density. In this Trap is to transmit a larger current over each rotating contact, z. B. 10 amps.
  • overflow pipe 5 An overflow, which is shown here as overflow pipe 5 is used.
  • the electrolyte 11 flows, separated from the liquid in the working container 12, laminar on the inner wall of the overflow pipe 5 through the bottom 14 of the working container 12 in the lower container 13, which serves as a collecting container and at the same time as a pump container.
  • the electrolyte 11 passes back by means of at least one pump 15 in the working container 12, whereby the electrolyte circuit is closed.
  • the fixed to the contact means 7 contacts 6 slide under a bias mechanically transmitting current through the top 9 of the goods 1. This situation is shown on the left. In the region of a transverse gap 8, the sliding or rotating contact expands and extends underneath the plane of the underside 10 of the material 1. He touches neither the wetted inner wall of the overflow pipe 5 nor the shaft 3 and the funding, which may also be wetted with electrolyte. This situation is shown at the right overflow.
  • overflow pipes 5 elongated overflows can also be arranged in the area of the contact means.
  • An example of this is an overflow channel transversely to the transport direction.
  • the shafts 3 penetrate the overflow pipes 5 in stock. This allows a very accurate adjustment of the height of the goods from its underside 10 to the height of the opening of the overflow pipes 5 on this side. As a result, temperature-related changes in the dimensions of the construction elements remain unaffected by the overflow distance between the material and the overflow pipe, even with very large flow systems.
  • At least one soluble or insoluble anode 16 is disposed within the electrolyte 11 to form the electrolytic cell.
  • This anode 16 which is also commonly referred to as the counter electrode, is electrically connected to at least one galvanizing power source 17 or generally to a power source.
  • the electrical Galvanisierstrom Vietnamese closes on the contact means 7, the contacts 6, the Good 1, the electrolyte 11 in the working container 12 and the anode 16.
  • the condition for this circuit is that the material from the top 9 to the bottom 10 is electrically conductive.
  • This is z. B. in a metallic substrate of the case.
  • a solar cell made of silicon, which is to be galvanized on the sunny side, is initially electrically non-conductive at the given polarity.
  • the solar cell is low-resistance generator and it can guide the Galvanisierstrom therethrough.
  • light is introduced into the electrolytic cell. This is done with light sources 18, which are preferably arranged between the conveying means transversely to the transport direction.
  • FIG. 3 a shows the section A - B of FIG. 2 ,
  • the elastic preloaded contact 6 is located on the top 9 of the goods 1 electrically contacting.
  • z. B. 1 amp. because of the surface to be treated electrolytically, which is small in solar cell on the sunny side, and the electrical current to be contacted small, z. B. 1 amp. Therefore, only a small contact force is required. It has been found in experiments that this contact force of the sliding contacts has no influence on the transport of the goods. Although no need for upper conveyor, the transport is accurate to track and then; when the contacts slide over the material 1.
  • elastic contacts 6 are fine wire strands of copper, stainless steel or precious metal, the side by side as subjects of z. B. 10 mm width are arranged. Also, a wide elastic band made of an electrically conductive material, which slides over the top of the good like a spatula, is very well suited as a contact 6.
  • FIG. 3 b shows the section C - D of the FIG. 2 ,
  • the contact means 7 and thus the contact 6 in the region of a transverse gap 8 between two goods 1.
  • the elastic contact 6 is relaxed. Although it may be located below the general level of the electrolyte in the working container with its lower edge, the contact is not wetted.
  • the cathodically poled contact 6 is kept free from the overflow 5. Therefore, it is not galvanized.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

L’invention concerne la mise en contact électrique de produit plat (1) en tant que sections dans des installation fonctionnant en continu pour le traitement électrolytique et/ou chimique par voie humide du côté à traiter (10) du produit par application de courant électrique extérieur en maintenant au sec le côté supérieur de contact (9) et en immergeant le côté à traiter (10) dans le liquide de traitement (11). Grâce aux systèmes de transports connus avec des moyens de transport et/ou de contact supérieurs et inférieurs, le liquide de traitement (11) est transféré des moyens inférieurs sur les moyens supérieurs, raison pour laquelle le côté supérieur du produit est souvent insuffisamment mouillé et les contacts supérieurs sont galvanisés et par conséquent démétallisés en continu, ce qui exige un plus gros investissement. Selon l’invention, le niveau est abaissé dans la région des contacts supérieurs (6). De ce fait, ceux-ci ne peuvent pas être mouillés, même quand aucun produit ne se trouve dans la région des contacts (6). On obtient cela grâce aux tuyaux de descente (5) qui sont associés à chaque contact (6). Même quand les contacts sont hors tension, ils ne touchent pas le liquide de traitement, raison pour laquelle le côté supérieur du produit reste sec et les contacts ne nécessitent aucun démétallisation.

Claims (17)

  1. Dispositif pour le transport horizontal et pour le contact électrique de biens (1) comme des sections avec une surface de contact supérieure (9) et une surface à traiter inférieure (10) dans des chaînes continues pour le traitement électrolytique ou pour le traitement chimique par voie aqueuse assisté par électricité de la surface à traiter (10) du bien par l'utilisation d'un courant électrique externe en maintenant sèche la surface de contact (9) et en plongeant la surface à traiter (10) dans un liquide de traitement (11), comprenant
    - un récipient de travail (12) avec des régions de mouillage pour obtenir un niveau plus élevé du liquide de traitement (11), avec plusieurs dispositifs de transport (3) rotatifs inférieurs, lesquels sont positionnés horizontalement et perpendiculairement à une direction de transport (2) de telle manière que la surface à traiter (10) du bien (1) peut être mouillée avec le liquide de traitement (11) en même temps que la surface de contact (9) est soumise à un contact électrique, avec des régions de surverse en forme de tube de descente (5) pour obtenir un niveau plus bas du liquide de traitement (11), et avec un plancher (14);
    - plusieurs contacts (6) pour établir un contact à la surface de contact supérieure (9) du bien (1); et
    - un réservoir inférieur (13) pour recueillir le liquide de traitement à la sortie des tubes de descente (5) au travers du plancher (14) du récipient de travail (12);
    les contacts (6) étant positionnés dans les régions de surverse au dessus des tubes de descente (5).
  2. Dispositif selon la revendication 1, caractérisé en ce que les tubes de descente (5) présentent des rebords de surverse à leurs extrémités supérieures, lesquelles atteignent la proximité de la surface inférieure (10) à traiter du bien mais de telle manière que le transport de celui-ci ne soit pas bloqué, l'extrémité inférieure des tubes de descente traversant le plancher (14) du récipient de travail (12) et débouchant dans le réservoir inférieur (13).
  3. Dispositif selon la revendication 1 ou la revendication 2, caractérisé en ce que le niveau du liquide de traitement dans les régions de mouillage du récipient de travail (12) est plus haut que les rebords de surverse des tubes de descente (5).
  4. Dispositif selon une des revendications 1 à 3, caractérisé en ce que les contacts (6) sont glissants ou rotatifs, ceux-ci, même en position de repos dans la région d'un intervalle intermédiaire (8), ne touchent pas le liquide de traitement et les surfaces des éléments constitutifs de la chaîne en continu mouillées par celui-ci.
  5. Dispositif selon une des revendications 1 à 4, caractérisé en ce que les contacts sont constitués par un fin fil de câble laminé ou une bande élastique souple.
  6. Dispositif selon une des revendications 1 à 5, caractérisé en ce que les dispositifs de transport inférieurs rotatifs (3) sont calés en relation avec leur niveau sur ou dans les tubes de descente (5).
  7. Dispositif selon une des revendications 1 à 6, caractérisé en ce que les dispositifs de transport (3) sont pourvus de bagues (4) qui sont positionnées décalées les unes par rapport aux autres de position en position le long d'une bande de transport et perpendiculaires par rapport à la direction du transport.
  8. Dispositif selon une des revendications 1 à 7, caractérisé en ce que au moins un contact (6) est assigné à chaque tube de descente (5).
  9. Dispositif selon une des revendications 1 à 8, caractérisé en ce que des sources lumineuses (18) sont positionnées dans le récipient de travail (12) pour éclairer des biens comme des cellules photovoltaïques.
  10. Dispositif selon une des revendications 1 à 9, caractérisé en ce que des anodes (16) solubles ou insolubles pour galvaniser sont installées dans le récipient de travail (12).
  11. Dispositif selon une des revendications 1 à 10, caractérisé en ce que des contre-électrodes qui sont alimentées par une source électrique sont installées dans le récipient de travail (12) pour influencer le procédé.
  12. Procédé pour le transport horizontal et pour le contact électrique de biens (1) comme des sections avec une surface de contact supérieure (9) et une surface à traiter inférieure (10) dans des chaînes continues pour le traitement électrolytique ou pour le traitement chimique par voie aqueuse assisté par électricité de la surface à traiter (10) du bien par l'utilisation d'un courant électrique externe en maintenant sèche la surface de contact (9) et en plongeant la surface à traiter (10) dans un liquide de traitement (11), en utilisant le dispositif selon la définition d'une des revendications 1 à 11, caractérisé en ce que le niveau du liquide de traitement (11) dans la zone où se produit le contact supérieur du bien est réglé par des tubes de descente (5) plus bas que le niveau restant dans le récipient de travail (12), de par quoi également les contacts glissants ou rotatifs à l'état de repos, quand ils ne font pas contact momentanément avec un bien, ne sont pas mouillés par le liquide de traitement (11).
  13. Procédé selon la revendication 12, caractérisé en ce que une assise du dispositif de transport (3) sur les tubes de descente (5) ajuste constamment une modification momentanée constitutive de la distance de la surface inférieure (10) du bien au bord supérieur du tube de descente et maintient cette distance constante.
  14. Procédé selon la revendication 12 ou la revendication 13, caractérisé en ce que les biens sont transportés surement par aspiration sur le dispositif de transport inférieur (3, 4) par le liquide de traitement (11) qui déborde hors du récipient de travail (12) par les tubes de descente (5).
  15. Procédé selon la revendication 14, caractérisé en ce que un changement de liquide du coté de la surface à traiter inférieure (10) se produit lors du débordement du liquide de traitement (11) hors du récipient de travail (12) par les tubes de descente.
  16. Procédé selon une des revendications 12 à 15, caractérisé en ce que pour traiter le coté exposé au soleil des cellules photovoltaïques, celui-ci est éclairé dans le récipient de travail (12) par au moins une source lumineuse (18).
  17. Procédé selon une des revendications 12 à 16, caractérisé en ce que le traitement humide concerne une galvanisation des cellules photovoltaïques.
EP09757157A 2008-05-30 2009-05-08 Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu Not-in-force EP2152939B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008026199A DE102008026199B3 (de) 2008-05-30 2008-05-30 Vorrichtung und Verfahren zur elektrischen Kontaktierung von ebenem Gut in Durchlaufanlagen
PCT/EP2009/003298 WO2009146773A1 (fr) 2008-05-30 2009-05-08 Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu

Publications (2)

Publication Number Publication Date
EP2152939A1 EP2152939A1 (fr) 2010-02-17
EP2152939B1 true EP2152939B1 (fr) 2012-07-11

Family

ID=41051722

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09757157A Not-in-force EP2152939B1 (fr) 2008-05-30 2009-05-08 Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu

Country Status (9)

Country Link
US (1) US8444832B2 (fr)
EP (1) EP2152939B1 (fr)
JP (1) JP5150727B2 (fr)
KR (1) KR101122707B1 (fr)
CN (1) CN101796222B (fr)
DE (1) DE102008026199B3 (fr)
RU (1) RU2440444C2 (fr)
TW (1) TWI414642B (fr)
WO (1) WO2009146773A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2005480C2 (nl) * 2010-10-07 2012-04-11 Meco Equip Eng Inrichting voor het eenzijdig elektrolytisch behandelen van een vlak substraat.
DE102011111175B4 (de) * 2011-08-25 2014-01-09 Rena Gmbh Verfahren und Vorrichtung zur Flüssigkeits-Niveauregelung bei Durchlaufanlagen
DE102012210618A1 (de) * 2012-01-26 2013-08-01 Singulus Stangl Solar Gmbh Vorrichtung und Verfahren zum Behandeln von plattenförmigem Prozessgut
JP2013194242A (ja) * 2012-03-15 2013-09-30 Tokyo Kakoki Kk 板状ワークの片面めっき装置
CA2898234C (fr) * 2013-03-14 2021-07-27 Allison Transmission, Inc. Systeme de stockage d'energie refroidi par un bain de fluide
DE102013219886A1 (de) * 2013-10-01 2015-04-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur kontinuierlichen Herstellung poröser Siliciumschichten
CN110234799A (zh) * 2016-12-09 2019-09-13 雷纳技术有限责任公司 连续淀积设备及用于它的组件
CN107644828B (zh) * 2017-09-14 2024-03-22 中国科学院宁波材料技术与工程研究所 一种多孔硅薄膜的制备装置及其制备多孔硅薄膜的方法
CN109355635A (zh) * 2018-12-15 2019-02-19 湖南玉丰真空科学技术有限公司 一种连续镀膜生产线中基片框架偏压引入装置
US11713514B2 (en) 2019-08-08 2023-08-01 Hutchinson Technology Incorporated Systems for electroplating and methods of use thereof

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636933Y2 (fr) * 1976-03-31 1981-08-31
US4364328A (en) * 1979-06-01 1982-12-21 Nippon Kokan Kabushiki Kaisha Apparatus for continuous dip-plating on one-side of steel strip
US4267024A (en) * 1979-12-17 1981-05-12 Bethlehem Steel Corporation Electrolytic coating of strip on one side only
IT1138370B (it) * 1981-05-20 1986-09-17 Brev Elettrogalvan Superfinitu Metodo e apparecchiatura a doppia vasca,per la cromatura in continuo di barre e di pezzi di grosse dimensioni,con riciclo per la eliminazione dell'idrogeno
JPS6311693A (ja) * 1986-07-02 1988-01-19 Fuji Plant Kogyo Kk 帯状物のメツキ装置
IT1227203B (it) * 1988-08-18 1991-03-27 Techint Spa Impianto a cella orizzontale di metallizzazione elettrolitica, ad anodi solubili, per trattamento elettrolitico in continuo di nastrid'acciaio su una o due facce, e procedimento
DE8812212U1 (fr) * 1988-09-27 1988-11-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen, De
US4922938A (en) * 1989-09-06 1990-05-08 Siegmund, Inc. Apparatus for single side spray processing of printed circuit boards
DE19842974A1 (de) 1998-09-19 2000-03-23 Schmid Gmbh & Co Geb Einrichtung zur Behandlung von Gegenständen, insbesondere Galvanisiereinrichtung für Leiterplatten
EP1252937A4 (fr) * 2000-01-24 2007-10-24 Daikin Ind Ltd Procede de revetement de substrat, article revetu et dispositif de revetement
US7125477B2 (en) * 2000-02-17 2006-10-24 Applied Materials, Inc. Contacts for electrochemical processing
DE10313127B4 (de) 2003-03-24 2006-10-12 Rena Sondermaschinen Gmbh Verfahren zur Behandlung von Substratoberflächen
US7943526B2 (en) * 2004-03-22 2011-05-17 Rena Sondermaschinen Gmbh Process for the wet-chemical treatment of one side of silicon wafers
EP1698715A1 (fr) * 2005-03-03 2006-09-06 Applied Films GmbH & Co. KG machine de revêtement ayant des élèments sur un tiroir
DE102005038449B4 (de) 2005-08-03 2010-03-25 Gebr. Schmid Gmbh & Co. Einrichtung zur Behandlung von Substraten, insbesondere zur Galvanisierung von Leiterplatten, und Verfahren
DE102005039100A1 (de) 2005-08-09 2007-02-15 Gebr. Schmid Gmbh & Co. Einrichtung zur Aufnahme bzw. Halterung mehrerer Substrate und Galvanisiereinrichtung
DE102005057109A1 (de) * 2005-11-26 2007-05-31 Kunze-Concewitz, Horst, Dipl.-Phys. Vorrichtung und Verfahren für mechanisches Prozessieren flacher, dünner Substrate im Durchlaufverfahren
DE102005062527A1 (de) * 2005-12-16 2007-06-21 Gebr. Schmid Gmbh & Co. Vorrichtung und Verfahren zur Oberflächenbehandlung von Substraten
JP4710619B2 (ja) * 2006-01-13 2011-06-29 Ｊｆｅスチール株式会社 錫めっき鋼帯の製造方法および錫めっきセル
DE102006033353B4 (de) * 2006-07-19 2010-11-18 Höllmüller Maschinenbau GmbH Verfahren und Vorrichtung zum Behandeln von flachen, zerbrechlichen Substraten
DE102007054093B3 (de) 2007-11-13 2009-07-23 Rena Sondermaschinen Gmbh Vorrichtung und Verfahren zum Transport von flachem Gut in Durchlaufanlagen

Also Published As

Publication number Publication date
JP2010539324A (ja) 2010-12-16
KR101122707B1 (ko) 2012-03-27
KR20100030669A (ko) 2010-03-18
RU2010102905A (ru) 2011-08-10
US8444832B2 (en) 2013-05-21
RU2440444C2 (ru) 2012-01-20
CN101796222A (zh) 2010-08-04
CN101796222B (zh) 2013-05-22
EP2152939A1 (fr) 2010-02-17
US20100187068A1 (en) 2010-07-29
WO2009146773A1 (fr) 2009-12-10
TWI414642B (zh) 2013-11-11
TW201000681A (en) 2010-01-01
JP5150727B2 (ja) 2013-02-27
DE102008026199B3 (de) 2009-10-08

Similar Documents

Publication Publication Date Title
EP2152939B1 (fr) Dispositif et procédé pour la mise en contact électrique de produit plat dans des installations fonctionnant en continu
DE3624481C2 (fr)
EP1733418B1 (fr) Procede de traitement de surfaces de substrats
DE102006049488A1 (de) Vorrichtung zum Behandeln von flachen, zerbrechlichen Substraten
EP2841628B1 (fr) Procédé et dispositif de dépôt électrolytique de métal sur une pièce
EP1051886A2 (fr) Dispositif de traitement electrolytique de carte de circuits et de feuilles conductrices
EP0741804B1 (fr) Procede et dispositif de metallisation ou d'attaque electrolytiques d'articles a traiter
DE102006033353B4 (de) Verfahren und Vorrichtung zum Behandeln von flachen, zerbrechlichen Substraten
WO1999010568A2 (fr) Dispositif et procede pour egaliser l'epaisseur de couches metalliques au niveau des points de mise en contact electriques sur un produit a traiter
DE102007020449A1 (de) Vorrichtung und Verfahren zur einseitigen nasschemischen und elektrolytischen Behandlung von Gut
DE102006033354B4 (de) Vorrichtung zum Behandeln von flachen, zerbrechlichen Substraten
DE102005030546A1 (de) Einrichtung zur Behandlung von flachen und flächigen Gegenständen
DE19633797B4 (de) Vorrichtung zum Galvanisieren von elektronischen Leiterplatten oder dergleichen
WO2011066824A1 (fr) Dispositif et procédé de mise en contact électrique d'un article à traiter dans des installations de galvanisation
DE10065643C2 (de) Vorrichtung und Verfahren zum elektrochemischen Behandeln von bandförmigem und plattenförmigem Gut
DE19936569B4 (de) Herstellung von porösem Silicium
DE60302560T2 (de) Durchlaufmetallisierungsanlage und verfahren zum elektrolytischen metallisieren von werkstücken
DE102004025827B3 (de) Vorrichtung zum elektrischen Kontaktieren von ebenem Behandlungsgut in Durchlaufanlagen
DE102013100805B4 (de) Nasschemische Behandlungsanlage zum elektrochemischen Beschichten von flachen Substraten
DE10043815C2 (de) Verfahren und Vorrichtung zur elektrischen Kontaktierung von zu behandelndem Gut in elektrolytischen Anlagen
EP3190212B1 (fr) Dispositif de traitement de surface d'un matériau continu et son utilisation
DE10043814C1 (de) Verfahren und Vorrichtungen zum elektrochemischen Behandeln von Gut
DE1596733C (de) Vorrichtung zur elektrochemischen Beschichtung von Glasplatten mit Kupfer vermittels löslicher Anoden bei der Spiegelfabnkation
DE10207941A1 (de) Verfahren und Vorrichtung zur elektrischen Kontaktierung von flachem Gut in elektrolytischen Anlagen
DE1596733B1 (de) Vorrichtung zur elektrochemischen Beschichtung von Glasplatten mit Kupfer vermittels loeslicher Anoden bei der Spiegelfabrikation

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20091221

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA RS

DAX Request for extension of the european patent (deleted)
17Q First examination report despatched

Effective date: 20110905

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 566194

Country of ref document: AT

Kind code of ref document: T

Effective date: 20120715

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 502009004081

Country of ref document: DE

Effective date: 20120906

REG Reference to a national code

Ref country code: NL

Ref legal event code: VDEP

Effective date: 20120711

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

Effective date: 20120711

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20121111

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20121011

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20121012

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20121112

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20121022

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

26N No opposition filed

Effective date: 20130412

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20121011

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20130522

Year of fee payment: 5

Ref country code: CH

Payment date: 20130522

Year of fee payment: 5

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 502009004081

Country of ref document: DE

Effective date: 20130412

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20130604

Year of fee payment: 5

BERE Be: lapsed

Owner name: RENA G.M.B.H.

Effective date: 20130531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20131203

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130531

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 502009004081

Country of ref document: DE

Effective date: 20131203

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130508

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20140508

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20140531

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20140531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20150130

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20140602

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20140508

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

REG Reference to a national code

Ref country code: AT

Ref legal event code: MM01

Ref document number: 566194

Country of ref document: AT

Kind code of ref document: T

Effective date: 20140508

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130508

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20090508

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20120711

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20140508