EP2143306B1 - Électrode pour générateur de plasma - Google Patents

Électrode pour générateur de plasma Download PDF

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Publication number
EP2143306B1
EP2143306B1 EP08718192A EP08718192A EP2143306B1 EP 2143306 B1 EP2143306 B1 EP 2143306B1 EP 08718192 A EP08718192 A EP 08718192A EP 08718192 A EP08718192 A EP 08718192A EP 2143306 B1 EP2143306 B1 EP 2143306B1
Authority
EP
European Patent Office
Prior art keywords
electrode
slot
electrode according
plasma
closed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP08718192A
Other languages
German (de)
English (en)
Other versions
EP2143306A1 (fr
Inventor
Roland Gesche
Andreea Cristina Andrei
Stephan Buchholz
Silvio Kühn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungsverbund Berlin FVB eV
Original Assignee
Forschungsverbund Berlin FVB eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungsverbund Berlin FVB eV filed Critical Forschungsverbund Berlin FVB eV
Publication of EP2143306A1 publication Critical patent/EP2143306A1/fr
Application granted granted Critical
Publication of EP2143306B1 publication Critical patent/EP2143306B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/463—Microwave discharges using antennas or applicators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/30—Medical applications
    • H05H2245/34—Skin treatments, e.g. disinfection or wound treatment
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2277/00—Applications of particle accelerators
    • H05H2277/10—Medical devices
    • H05H2277/11—Radiotherapy

Definitions

  • the invention relates to an electrode for a plasma generator for producing plasmas at atmospheric pressure or atmospheric pressures by excitation with microwaves.
  • Plasmas are used in many sedimentation, etching and layering processes.
  • vacuum-operated plasma reactors Apart from the costs associated with vacuum-operated plasma reactors, the use of vacuum is often prohibitive in this area, so the use of plasma at atmospheric pressure is a prerequisite. Also, treatment of vacuum sensitive materials such as certain polymers or sensitive foods is possible with low temperature plasmas at atmospheric or near atmospheric pressure.
  • the invention has for its object to provide an electrode for a plasma generator, which ignites safely especially in the near-atmospheric pressure range at low power and is able to generate a plasma with sufficiently high density, so that a penetrating gas flow is activated with high efficiency.
  • the electrode consists of a metal strip, in the longitudinal direction of which at least one slot is introduced having a length which is one or more times a quarter of the wavelength of the open circuit voltage of the microwave, so that form at least two partial electrodes, wherein the voltage supply to the sub-electrodes takes place in the region of the closed slot end or the closed slot ends.
  • the structure of the electrode exploits frequency-dependent, resonant properties of the structure and generates at a defined location a high electric field strength, at which the ignition of the plasma is made possible.
  • the strong field is typically formed by at least two electrodes physically close to each other. If electric power in the form of microwaves is introduced into the structure at a suitable point, a high alternating potential difference arises at the end of the slot. Due to the short distance between the opposing electrodes, the resulting field strength is very high. At the point of the highest electric field, the ignition of a plasma at atmospheric pressure or at atmospheric pressure is possible with sufficiently high feed power. After ignition, only a fraction of the required ignition power is required to operate.
  • the frequency of the feed-in power depends on the physical dimensions of the electrode. In particular, the length of the slot has a significant influence on the frequency and is approximately the multiple of the quarter wavelength.
  • the feed takes place in the case of a unilaterally open slot, for example by a coaxial line, wherein the Inner conductor is guided on one side of the slot to the point in which there is approximately in idle adjustment.
  • the electrode is bent in this case U-shaped or circular.
  • the feed takes place in the latter case, for example, by a coaxial line, wherein the inner conductor branches in a T-shape and is guided on both sides in the region of the two slot ends to the electrode.
  • the electrode is preferably powered by a free-running oscillator circuit, the electrode itself being the frequency-determining element.
  • the oscillator circuit can be constructed integrated with the electrode.
  • the electrode may be preferred for medical treatment purposes, especially the treatment of human skin, as well be used for modifying the surface energy of workpieces or for plasma-chemical deposition of layers.
  • Fig. 1 shows an example of a resonator of a plasma generator.
  • a slot 2 is introduced in a metal strip 1, which serves as an electrode.
  • the slot 2 separates the sheet metal strip 1 into two sub-electrodes 3, which generate a high electric field strength during operation with a high-frequency voltage which is conducted via the inner conductor 4 of a coaxial line 5 to the sheet metal strip 1.
  • the slot 2 is typically ⁇ / 4 long. In a real running design for a supply voltage with a frequency of 2 GHz, this resulted in a slot 2 of 37.5 mm. Its width was 0.1 mm.
  • the inner conductor 4 of the coaxial line 5 is guided in the region of the slot end to the outside edge of the metal strip 1, to a point at the resonance is generated with an oscillator.
  • the outer conductor 6 of the coaxial line 5 is guided on the opposite side of the metal strip 1 at its outer edge.
  • Fig. 2 shows an electrode of a U-shaped bent sheet metal strip 1 with a slot 2.
  • the slot 2 in this case ⁇ / 2 long.
  • the inner conductor 4 of the coaxial line 5 is branched in a T-shape and guided on the two opposite sides of the sheet metal strip 1 in the region of the slot end.
  • the outer conductor 6 is connected to the opposite sides of the sheet metal strip 1.
  • the highest field strength arises in this embodiment in the middle of the slot 2, that is at the leading edge of the sheet metal strip 1. After the ignition of the plasma at this point, the plasma expands at least over the entire region of the front edge of the sheet metal strip 1.
  • Fig. 3 schematically shows the structure of a completed by a housing 7 resonator.
  • the housing 7 (shown here in the quasi-open state) has a reflective effect and thus prevents electromagnetic radiation to the outside.
  • a gas feed line 8 is provided in the rear housing wall and a slot-shaped gas outlet 9 is provided in the front wall.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Claims (11)

  1. Electrode pour un générateur de plasma pour la production de plasmas à la pression atmosphérique ou à des pressions proches de la pression atmosphérique par excitation avec des micro-ondes,
    caractérisée en ce
    qu'elle est composée d'une bande de tôle (1) dans la direction longitudinale de laquelle est mise en place au moins une fente (2) d'une longueur qui est égale à un quart ou à un multiple du quart de la longueur d'onde de la tension à circuit ouvert de la micro-onde, de sorte qu'il se forme au moins deux électrodes partielles (3), l'amenée de tension vers les électrodes partielles (3) s'effectuant dans la zone de l'extrémité fermée de fente ou des extrémités fermées de fente.
  2. Electrode selon la revendication 1,
    caractérisée en ce que
    la fente (2) est fermée à une extrémité et ouverte à l'autre extrémité.
  3. Electrode selon la revendication 1,
    caractérisée en ce que
    la fente (2) est fermée aux deux extrémités.
  4. Electrode selon la revendication 3,
    caractérisée en ce
    qu'elle est courbée en forme de U.
  5. Electrode selon la revendication 3,
    caractérisée en ce
    qu'elle est courbée en forme de cercle.
  6. Electrode selon la revendication 1 ou 2,
    caractérisée en ce
    qu'elle est alimentée par une alimentation (5) coaxiale, le conducteur intérieur (4) étant conduit, sur un côté de la fente (2), à l'emplacement dans lequel règne approximativement une adaptation dans le circuit ouvert.
  7. Electrode selon une des revendications 3 à 5,
    caractérisée en ce
    qu'elle est alimentée par une alimentation (5) coaxiale, le conducteur intérieur (4) se ramifiant en forme de T et étant conduit à l'électrode sur les deux côtés dans la zone des deux extrémités de fente.
  8. Electrode selon une des revendications précédentes,
    caractérisée en ce
    qu'elle est entourée d'un boîtier de blindage (7).
  9. Electrode selon la revendication 8,
    caractérisée en ce que,
    dans le boîtier de blindage (7), il y a une ouverture pour la conduite de gaz de processus et une autre ouverture pour l'extraction des gaz de processus activés par le plasma.
  10. Electrode selon une des revendications précédentes,
    caractérisée en ce
    qu'elle est alimentée par un circuit d'oscillateur à circuit ouvert, l'électrode représentant elle-même l'élément déterminant la fréquence.
  11. Electrode selon une des revendications précédentes,
    caractérisée en ce
    qu'elle est intégrée en même temps qu'un circuit d'oscillateur.
EP08718192A 2007-04-27 2008-03-25 Électrode pour générateur de plasma Not-in-force EP2143306B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007020419A DE102007020419A1 (de) 2007-04-27 2007-04-27 Elektrode für Plasmaerzeuger
PCT/EP2008/053507 WO2008131997A1 (fr) 2007-04-27 2008-03-25 Électrode pour générateur de plasma

Publications (2)

Publication Number Publication Date
EP2143306A1 EP2143306A1 (fr) 2010-01-13
EP2143306B1 true EP2143306B1 (fr) 2011-08-17

Family

ID=39534997

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08718192A Not-in-force EP2143306B1 (fr) 2007-04-27 2008-03-25 Électrode pour générateur de plasma

Country Status (7)

Country Link
US (1) US8339047B2 (fr)
EP (1) EP2143306B1 (fr)
JP (1) JP5683262B2 (fr)
KR (1) KR101555385B1 (fr)
AT (1) ATE521217T1 (fr)
DE (1) DE102007020419A1 (fr)
WO (1) WO2008131997A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3042091B1 (fr) * 2015-10-05 2017-10-27 Sairem Soc Pour L'application Ind De La Rech En Electronique Et Micro Ondes Dispositif elementaire d’application d’une energie micro-onde avec applicateur coaxial
KR102190524B1 (ko) * 2020-02-24 2020-12-14 이엠코어텍 주식회사 저전압 플라즈마 이오나이저

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3848196A (en) 1973-11-08 1974-11-12 Rca Corp Broadband trapatt diode amplifier
JPS6011417B2 (ja) * 1979-10-23 1985-03-26 株式会社東芝 ホロ−カソ−ド放電装置
JPS6087200U (ja) * 1983-11-15 1985-06-15 新日本無線株式会社 マイクロ波プラズマ発生装置
JPS62115700A (ja) * 1985-11-15 1987-05-27 キヤノン株式会社 気相励起装置
DE3830430A1 (de) * 1987-09-11 1989-03-23 Japan Synthetic Rubber Co Ltd Verfahren zur herstellung von ueberzuegen
JPH01109699A (ja) * 1987-10-23 1989-04-26 Japan Synthetic Rubber Co Ltd プラズマ処理装置
JPH0719674B2 (ja) * 1992-06-24 1995-03-06 徳芳 佐藤 マイクロ波放電反応装置の電極装置
US5537004A (en) * 1993-03-06 1996-07-16 Tokyo Electron Limited Low frequency electron cyclotron resonance plasma processor
US5838111A (en) * 1996-02-27 1998-11-17 Matsushita Electric Industrial Co., Ltd. Plasma generator with antennas attached to top electrodes
KR20010012617A (ko) * 1998-03-16 2001-02-26 마츠시타 덴끼 산교 가부시키가이샤 무전극 방전에너지 공급장치 및 무전극 방전램프장치
US6350417B1 (en) * 1998-11-05 2002-02-26 Sharper Image Corporation Electrode self-cleaning mechanism for electro-kinetic air transporter-conditioner devices
JP2000299199A (ja) * 1999-04-13 2000-10-24 Plasma System Corp プラズマ発生装置およびプラズマ処理装置
DE19955671B4 (de) * 1999-11-19 2004-07-22 Muegge Electronic Gmbh Vorrichtung zur Erzeugung von Plasma
US6576202B1 (en) * 2000-04-21 2003-06-10 Kin-Chung Ray Chiu Highly efficient compact capacitance coupled plasma reactor/generator and method
US6759808B2 (en) * 2001-10-26 2004-07-06 Board Of Trustees Of Michigan State University Microwave stripline applicators
WO2004062326A2 (fr) 2002-12-30 2004-07-22 Northeastern University Generateur de plasma a faible consommation d'energie
DE10335523B4 (de) * 2003-07-31 2009-04-30 Koch, Berthold, Dr.-Ing. Vorrichtung zur Plasmaerregung mit Mikrowellen
JP4631046B2 (ja) * 2004-10-01 2011-02-16 国立大学法人 東京大学 マイクロ波励起プラズマ装置及びシステム
JP4035568B2 (ja) * 2004-11-29 2008-01-23 株式会社エーイーティー 大気圧大面積プラズマ発生装置
EP2007175A4 (fr) * 2006-03-07 2014-05-14 Univ Ryukyus Generateur de plasma et procede de production de plasma utilisant celui-ci
JP4967784B2 (ja) * 2007-04-25 2012-07-04 凸版印刷株式会社 マイクロ波プラズマ発生装置

Also Published As

Publication number Publication date
US8339047B2 (en) 2012-12-25
ATE521217T1 (de) 2011-09-15
US20100171425A1 (en) 2010-07-08
KR20100015978A (ko) 2010-02-12
JP2010525534A (ja) 2010-07-22
JP5683262B2 (ja) 2015-03-11
EP2143306A1 (fr) 2010-01-13
WO2008131997A1 (fr) 2008-11-06
DE102007020419A1 (de) 2008-11-06
KR101555385B1 (ko) 2015-09-23

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