EP2502469B1 - Dispositif et procédé pour générer un plasma au moyen d'un résonateur à ondes progressives - Google Patents

Dispositif et procédé pour générer un plasma au moyen d'un résonateur à ondes progressives Download PDF

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Publication number
EP2502469B1
EP2502469B1 EP10788269.8A EP10788269A EP2502469B1 EP 2502469 B1 EP2502469 B1 EP 2502469B1 EP 10788269 A EP10788269 A EP 10788269A EP 2502469 B1 EP2502469 B1 EP 2502469B1
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EP
European Patent Office
Prior art keywords
traveling wave
wave resonator
plasma
traveling
waves
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
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EP10788269.8A
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German (de)
English (en)
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EP2502469A1 (fr
Inventor
Horia-Eugen Porteanu
Roland Gesche
Silvio Kühn
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Forschungsverbund Berlin FVB eV
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Forschungsverbund Berlin FVB eV
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes

Definitions

  • the invention relates to a device for generating a plasma according to the preamble of claim 1 and to a method for producing a plasma according to the preamble of claim 14.
  • resonators are used for impedance transformation. These generate by the resonance transformation the high voltage required for the plasma ignition. In discrete implementations, this voltage is at a terminal point, in line resonators at a location on the line. The location dependence of the currents and voltages is linked to the wavelength and thus to the frequency. It is easily possible to perform a homogeneous plasma treatment over an area whose dimension is much smaller than the wavelength. For dimensions on the order of the wavelength or beyond, a homogeneous treatment is initially not possible. There are periodic structures, such. B. slot radiators based on standing waves and thus always have a periodic dependence of the intensity with the wavelength.
  • Plasma sources are known for a planar plasma treatment. However, these require a vacuum; It would be advantageous to operate at atmospheric pressure. In the known point-type atmospheric plasma sources, the plasma treatment of larger areas takes a long time since the plasma source must be moved over the sample.
  • US 6 161 501 A and WO 2004/062326 A2 ordinary waveguides or resonators for standing waves.
  • US 4 686 407 A For example, a general annular traveling wave resonator is known.
  • the object of the present invention is to specify an apparatus and a method for producing a plasma, which overcome the disadvantages described above in the prior art and in particular enable the generation of a plasma which is spatially homogeneous over as large distances as possible.
  • the object is achieved by means of a device for generating a plasma with the features mentioned in claim 1 and a method for producing a plasma having the features mentioned in claim 14.
  • the inventive device for generating a plasma comprises an AC voltage source, a traveling wave resonator and coupling means which are adapted to couple the AC voltage generated by the AC voltage source in the traveling wave resonator such that electromagnetic traveling waves are formed, wherein the traveling wave resonator comprises a self-contained waveguide.
  • the traveling wave resonator is designed to increase the electric field strength of the traveling electromagnetic waves in such a way that a plasma is ignited in a gas.
  • traveling waves are to be understood as running waves, ie waves which propagate in one direction, the points of vanishing or extreme field strength traveling in the propagation direction.
  • a standing wave has fixed points of vanishing or extreme field strength, which are called nodes or bellies.
  • a wave propagating on a waveguide has the character of a standing or a running wave can be quantified by the so-called standing wave ratio. This is defined by ( E 1 + E 2 ) / ( E 1 -E 2 ), where E 1 and E 2 are the amplitudes of the two wave components propagating in opposite directions. For a pure standing wave, the two wave components are equally present, and the standing wave ratio approaches infinity.
  • the decisive factor for the occurrence of traveling waves is the coupling with directional characteristic.
  • a traveling wave resonator is to be understood as a device in which traveling electromagnetic waves are brought to resonance. This presupposes that the traveling wave resonator is designed such that the traveling waves propagate in the direction of propagation in such a way that constructive interference occurs between traveling waves fed in at different times. While in standing waves, a resonance is typically achieved by the waves between two reflective elements back and forth, and preferably each lie an integer multiple of the wavelength, in a traveling wave resonator, a resonance can be achieved, for example, that the waves on a be guided in self-contained path and thereby preferably each cover an integer multiple of the wavelength.
  • traveling wave resonators To distinguish from traveling wave resonators are ordinary waveguides. In these, although at certain wavelengths constructive interference of the reflections on the sidewalls of the waveguide occurs perpendicular to the propagation direction, and at these wavelengths traveling waves can propagate in the waveguide. However, this is not a resonance in the sense described here, since the traveling waves propagate in this case only in the propagation direction individually and at different times fed traveling waves do not interfere with each other. Only by such a waveguide is closed in itself, it comes to interference between traveling at different times traveling waves and thus to the resonance in the sense described here.
  • the AC voltage source can be embodied, for example, as an oscillator which synchronizes with the traveling wave resonator.
  • the coupling means may be, for example, any directional coupler.
  • the gas may be, for example, air or any process gas.
  • the region in which a plasma is ignited in the gas is arranged in such a way that the plasma is accessible to the outside for the plasma treatment.
  • the traveling wave resonator comprises a self-contained waveguide or is designed as a self-contained waveguide. It is thereby achieved that traveling waves can propagate continuously in the traveling wave resonator without encountering a conclusion at which reflections and / or losses occur.
  • the orbital length of in Closed waveguide is preferably an integer multiple of the frequency corresponding to the frequency of the AC voltage source. It is thereby achieved that a wave circulating in the traveling wave resonator after one revolution constructively interferes with itself, so that the greatest possible resonance and field enhancement is achieved.
  • the traveling wave resonator in which the electric potential of the electromagnetic waves is substantially out of phase in the operative state, a distance small enough that in the operational state the electric field strength between the two regions is sufficient to enter in the gas Ignite plasma.
  • the two regions of the traveling-wave resonator in which the electrical potential of the electromagnetic waves is substantially in phase opposition in the operational state are preferably two regions in the cross-section of the resonator line.
  • the apparatus may further include a process gas supply for supplying a process gas into the region of the plasma ignition. This ensures that a plasma can be ignited in any process gas.
  • the traveling wave resonator comprises a tube with a slot which is dimensioned such that in the operative state, the electric potential of the electromagnetic waves at the two opposite edges of the slot is substantially in opposite phase. Due to this shape, a particularly high field elevation is achieved.
  • the circumference of the tube is preferably half of the frequency corresponding to the frequency of the alternating voltage source, which in turn results in a particularly high field increase.
  • the tube may for example be a round tube or a rectangular tube.
  • the coupling means may comprise two coaxially arranged conductor loops. This ensures that the coupling is easy to control. It is preferably provided that the distance between the two conductor loops amounts to a quarter of the wavelength corresponding to the frequency of the AC voltage source. This will be an optimal constructive Interference in the direction of propagation and destructive interference in the opposite direction is achieved, so that the purest possible traveling wave is excited without Stehwellenanteil.
  • the voltages applied to the two conductor loops preferably have a phase difference of ⁇ / 2 from one another.
  • the tube comprises four quarter-circular parts, wherein between each two quarter-circular parts each have a linear part is inserted.
  • a shape is achieved in a particularly simple manner in which long linear regions are available for generating a spatially homogeneous plasma.
  • One or both of the pairs of opposing linear parts may be missing;
  • the tube may be circular.
  • the coupling can take place in a linear part or in a quarter-circle-shaped part.
  • the two conductor loops can be arranged on one of the linear parts.
  • it may also be provided a coupling in several areas of the traveling wave resonator.
  • the traveling wave resonator comprises a stripline having at least two strips, wherein in the operational state, the electrical potential of the electromagnetic waves in two opposite regions of the at least two strips is substantially in opposite phase.
  • the traveling wave resonator includes a lead comprising an inner conductor and an outer conductor at least partially surrounding the inner conductor, wherein the inner conductor is not coaxial with the outer conductor.
  • the inventive method for generating a plasma comprises the following steps: generating an AC voltage, generating traveling electromagnetic waves in a traveling wave resonator by coupling the AC voltage in the traveling wave resonator, wherein the traveling wave resonator comprises a self-contained waveguide, and overshoots the electric field strength of the traveling electromagnetic waves in the traveling wave resonator to ignite a plasma in a gas.
  • Another aspect of the present invention relates to the use of the device according to the invention and / or the method according to the invention for plasma treatment.
  • each waveguide can be used.
  • the waveguide In order to allow the propagation of traveling waves and to avoid the occurrence of standing waves, the waveguide is self-contained.
  • the circulation length is preferably an integer multiple of the wavelength, which is determined by the frequency of the alternating voltage generated by the AC voltage source.
  • the plasma absorbs as high a proportion of the supplied energy as possible and forms a nearly homogeneous linear discharge along the line, which is supplied by the rotating shaft.
  • the effective attenuation of the line changes. This requires a compromise on customization.
  • the fed-in power during operation with plasma is optimally adapted to this, while at idle, on the other hand, enough power is available on the line to ignite the plasma.
  • Additional measures may be provided for switching the tuning between idling to ignition operation and plasma operation. It is also conceivable to work with different suggestions for the ignition and the plasma operation. Furthermore, the local variation of the field distribution can be exploited in operation with and without plasma in order to achieve a good adaptation for both operating states.
  • z. B. are given by different high-frequency power, different process gases or different working pressures during operation in the low pressure range.
  • traveling wave resonator described here outside the plasma technology as an electrical component. Suitable applications are the frequency-determining resonator in oscillator circuits as well as a multiplicity of signal couplers, filters, directional lines and branches.
  • FIG. 1 shows a block diagram of a device according to the invention for generating a plasma.
  • An AC voltage source 10 such as a high frequency generator, generates an AC voltage which is applied to one end of a line 12 whose other end is shorted.
  • a capacitor 14 is provided for impedance matching.
  • a directional coupler 16 couples the line 12 to a resonator line 18.
  • the resonator line 18 is self-contained and does not require a terminating resistor, so that dissipative losses in a terminating resistor are avoided.
  • the directional coupler 16 are any coupling elements with a directional characteristic in question.
  • directional couplers including hole couplers, line couplers, transversely or longitudinally extending couplers, waveguide couplers, and line branches.
  • This coupling elements can be provided once or arranged several times over the cable length.
  • a resonator can serve any self-contained waveguide. This may be, for example, a slotted tube, a stripline, a coaxial line, a ribbon cable or other hollow or two-wire cables.
  • two locations or areas are preferably provided, which lie close to each other and at which the electrical potential of the electromagnetic waves is in opposite phase.
  • two opposing strips can be placed at a small distance from each other.
  • the inner conductor may be brought close to the boundary of the outer conductor so that it no longer runs coaxially therewith.
  • FIG Fig. 2 An embodiment of a directional coupler and a traveling wave resonator according to the present invention is shown in FIG Fig. 2 shown.
  • the resonator line is formed here by a self-contained tube 20 having a slot 22.
  • the coupling takes place with two conductor loops 24a and 24b, which are arranged coaxially with each other approximately at a distance of a quarter-wavelength from each other and are acted upon by two signals mutually phase-shifted by approximately ⁇ / 2. Due to this phase relationship, the wave components excited by the conductor loops in both directions constructively interfere constructively in one direction and destructively in the other direction, so that a traveling wave is produced in the resonator.
  • the resonator line has a circular cross-section.
  • the cross section of the waveguide can be elliptical or rectangular.
  • the illustrated resonator line is in the form of an oval consisting of two semi-circular and two linear parts.
  • a linear plasma treatment with two treatment zones can be realized.
  • This embodiment is particularly advantageous for homogeneous treatment. There is some inhomogeneity as the wave becomes weaker as it circulates through the power delivered to the plasma and conduction losses. Since this effect occurs in both directions, it largely compensates. Thus, a long, homogeneous and linear plasma source can be realized. At this large substrates can be passed for treatment. Alternatively, the source can be moved over large substrates.
  • the coupling can also be carried out in the semicircular line parts as an alternative to the illustrated embodiment, so that both linear line parts are fully available for the plasma treatment. Also conceivable is a shape in which each quarter-circular and linear conduit parts alternate, each two opposite linear conduit parts have the same length. The coupling would in this case preferably take place in one of the shorter linear line parts so that the longer linear line parts are fully available for the plasma treatment.
  • the linear line parts used for the plasma treatment may have a length of several meters, for example a length between 2m and 5m. If a process gas supply is provided, this can also be attached, for example, to one of the semicircular parts or to one of the shorter linear parts.
  • a round, rotationally symmetrical cable routing there are further embodiments conceivable, for example, a round, rotationally symmetrical cable routing.
  • More treatment zones can be realized, for example, by meandering in a meandering way.
  • Flat treatment zones can also be realized by a meandering cable routing.
  • a part of the resonator line can not be designed as a plasma source zone, but as a normal waveguide without plasma. This makes it possible, for example, flat treatment zones as a round or square spirals and provide a plasma-free return to close the resonator circuit.
  • multiple points of the power feed may be provided to homogenize the distribution over the source.
  • FIG. 3 shows the electric field lines in the lowest mode of in FIG. 2 shown traveling wave resonator in the cross section of the tube 20.
  • the diameter of the tube 20 is in this example 2cm, the operating frequency 2.5 GHz.
  • the illustrated mode has a high electric field strength in the slot 22, which is particularly suitable for use as a plasma source.
  • the diameter of the line should be chosen such that at least one mode is capable of propagation at the operating frequency (the resonance frequency).
  • a large field peak is obtained when the diameter of the tube is chosen so that the circumference corresponds to about half an effective wavelength of the working frequency.
  • a short segment of this waveguide can then be interpreted as a ⁇ / 2 resonator again, at the open ends of which a maximum voltage difference occurs in the push-pull mode.
  • FIGS. 4a to 4h show different embodiments of the cross section of the resonator.
  • FIG. 4a shows a round tube with slot.
  • FIG. 4b shows a rectangular tube with slot.
  • Figure 4c shows a round tube with slot and inner conductor, wherein the inner conductor is not coaxial with the round tube, but is arranged in the vicinity of the slot.
  • FIG. 4d shows a rectangular tube with slot and inner conductor; Again, the inner conductor is located near the slot.
  • Figure 4e again shows a round tube with slot and inner conductor.
  • FIG. 4a shows a round tube with slot.
  • FIG. 4b shows a rectangular tube with slot.
  • Figure 4c shows a round tube with slot and inner conductor, wherein the inner conductor is not coaxial with the round tube, but is arranged in the vicinity of the slot.
  • FIG. 4d shows a rectangular tube
  • FIG. 4f again shows a rectangular tube with slot and inner conductor, whereby here by the opposite to the in FIG. 4d Shown embodiment shown changed shape of the inner conductor a higher capacity is achieved.
  • Figure 4g shows a round tube with slot and triangle inner conductor.
  • Figure 4h shows a ridge waveguide with slot, which is also referred to as "ridge waveguide”.
  • FIGS. 4a and 4b Structures shown are basic structures.
  • the emission of electromagnetic energy to the outside can be reduced if no high potential difference occurs at the outer slot.
  • This can also be built up to an inner further electrode part, such as in the FIGS. 4c to 4h shown.
  • Waveguide with two electrodes, such as in the FIGS. 4c to 4g shown are interesting because the resonance properties can be adjusted by varying the geometry. Some such variations of geometry are in FIGS. 4e to 4g shown.
  • FIG. 5 are the simulated quantities in the block diagram of FIG. 1 characterized.
  • the reference impedance is given by the internal resistance Z 0 of the AC voltage source 10, for which a value of 50 ⁇ was assumed here, in the case of the input and output impedances Z in and Z out by the characteristic impedance Z L of the resonator line, for which a value of 22 ⁇ was assumed.
  • FIG. 6 shows the reflection factors R source , R in and R out as a function of the frequency f of the AC voltage source.
  • R source is very low, ie the source is well matched.
  • the coupling structure looks in the line into it is also a good match (R in is low), and also the output of the line is well matched to the coupler (R out is low). There are therefore few reflections and standing waves in the system.
  • FIG. 7 shows the active power flows, ie the real parts of the powers P source , P in and P out , again as a function of the frequency f.
  • the source is well adjusted to 50 ⁇
  • the input voltage at the coupler is 1V
  • the power output from the source is 0.02W.
  • an active power of 0.46W flows out, 0.44W flows out ; the losses on the line are 0.02 W, which corresponds to the power delivered by the source. It is thus achieved for the power losses selected here a power increase by a factor of 20; the power circulating in the resonator line is 20 times higher than the input power.
  • FIG. 8 shows the reactive power flows, ie the imaginary parts of the powers P source , P in and P out , again as a function of the frequency f. At the resonance frequency, the reactive power disappears, ie only active power flows. This confirms that this is a rotating performance.
  • FIG. 9 shows the voltages U in , U 1 , U 2 , U 3 , U out and U source , again as a function of the frequency f.
  • the voltage at the input of the coupler is 1V; all voltages on the line are close together at 3.2V. This confirms that it is a rotating wave with a standing wave ratio of nearly 1.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)

Claims (15)

  1. Dispositif pour générer un plasma, comprenant:
    une source de tension alternative (10) ;
    un résonateur à ondes progressives (18) ; et
    des moyens de couplage (16) conçus pour injecter la tension alternative générée par la source de tension alternative (10) dans le résonateur à ondes progressives (18) de telle manière que des ondes progressives soient engendrées,
    le résonateur à ondes progressives (18) étant conçu pour suramplifier l'intensité du champ électrique des ondes électromagnétiques progressives de telle manière qu'un plasma soit allumé dans un gaz,
    caractérisé en ce que
    le résonateur à ondes progressives (18) comprend un guide d'ondes à boucle fermée.
  2. Dispositif selon la revendication 1,
    caractérisé en ce que
    le résonateur à ondes progressives (18) est formé en tant que guide d'ondes à boucle fermée.
  3. Dispositif selon l'une des revendications précédentes,
    caractérisé en ce qu'
    entre deux zones du résonateur à ondes progressives (18) dans lesquelles le potentiel électrique des ondes électromagnétiques est sensiblement en opposition de phase dans l'état opérationnel, il existe une distance qui est suffisamment petite pour que l'intensité du champ électrique entre les deux zones suffisse pour allumer un plasma dans le gaz.
  4. Dispositif selon l'une des revendications précédentes,
    caractérisé en ce que
    le dispositif comprend en outre un dispositif d'alimentation en gaz de traitement pour alimenter une zone de l'allumage de plasma en un gaz de traitement.
  5. Dispositif selon l'une des revendications précédentes,
    caractérisé en ce que
    le résonateur à ondes progressives (18) comprend un tube (20) présentant une fente (22) qui est dimensionné de telle manière que le potentiel électrique des ondes électromagnétiques est sensiblement en opposition de phase sur les deux bords opposés de la fente (22) dans l'état opérationnel.
  6. Dispositif selon la revendication 5,
    caractérisé en ce que
    la circonférence du tube (20) est la moitié de la longueur d'onde correspondant à la fréquence de la source de tension alternative (10).
  7. Dispositif selon la revendication 5 ou 6,
    caractérisé en ce que
    les moyens de couplage (16) comprennent deux boucles conductrices (24a, 24b) disposées coaxialement.
  8. Dispositif selon la revendication 7,
    caractérisé en ce que
    la distance entre les deux boucles conductrices (24a, 24b) est un quart de la longueur d'onde correspondant à la fréquence de la source de tension alternative (10).
  9. Dispositif selon l'une des revendications 5 à 8,
    caractérisé en ce que
    le tube (20) comprend quatre parties en forme de quart de cercle, une partie linéaire respective étant introduite entre respectivement deux parties en forme de quart de cercle.
  10. Dispositif selon la revendication 9 et une des revendications 7 ou 8,
    caractérisé en ce que
    les deux boucles conductrices (24a, 24b) sont disposées sur une des parties linéaires.
  11. Dispositif selon l'une des revendications précédentes,
    caractérisé en ce qu'
    une injection dans plusieurs zones du résonateur à ondes progressives est prévue.
  12. Dispositif selon l'une des revendications 1 à 6,
    caractérisé en ce que
    le résonateur à ondes progressives (18) comprend une ligne à rubans ayant au moins deux rubans, le potentiel électrique des ondes électromagnétiques étant sensiblement en opposition de phase dans deux zones opposées des au moins deux rubans dans l'état opérationnel.
  13. Dispositif selon l'une des revendications 1 à 6,
    caractérisé en ce que
    le résonateur à ondes progressives (18) comprend une ligne qui comprend un conducteur interne et un conducteur externe entourant au moins partiellement le conducteur interne, le conducteur interne n'étant pas coaxial avec le conducteur externe.
  14. Dispositif pour générer un plasma, comprenant
    la génération d'une tension alternative ;
    la génération d'ondes électromagnétiques progressives dans un résonateur à ondes progressives (18) selon la revendication 1 par injection de la tension alternative dans le résonateur à ondes progressives (18) ; et
    la suramplification de l'intensité du champ électrique des ondes électromagnétiques progressives dans le résonateur à ondes progressives (18) pour allumer un plasma dans un gaz.
  15. Utilisation du dispositif selon l'une des revendication 1 à 13 et/ou du procédé selon la revendication 14 pour le traitement au plasma.
EP10788269.8A 2009-11-19 2010-11-19 Dispositif et procédé pour générer un plasma au moyen d'un résonateur à ondes progressives Not-in-force EP2502469B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009046881.1A DE102009046881B4 (de) 2009-11-19 2009-11-19 Vorrichtung und Verfahren zur Erzeugung eines Plasmas mittels eines Wanderwellenresonators
PCT/EP2010/067815 WO2011061283A1 (fr) 2009-11-19 2010-11-19 Dispositif et procédé pour générer un plasma au moyen d'un résonateur à ondes progressives

Publications (2)

Publication Number Publication Date
EP2502469A1 EP2502469A1 (fr) 2012-09-26
EP2502469B1 true EP2502469B1 (fr) 2017-10-18

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US (1) US9210789B2 (fr)
EP (1) EP2502469B1 (fr)
DE (1) DE102009046881B4 (fr)
WO (1) WO2011061283A1 (fr)

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US8508057B2 (en) * 2009-08-03 2013-08-13 David J. Schulte Power generator
US20120250527A1 (en) * 2011-03-28 2012-10-04 International Business Machines Corporation Determining Connectivity Of A High Speed Link That Includes An AC-Coupling Capacitor
US8888995B2 (en) * 2011-08-12 2014-11-18 Harris Corporation Method for the sublimation or pyrolysis of hydrocarbons using RF energy to break covalent bonds
US8674785B2 (en) 2011-11-11 2014-03-18 Harris Corporation Hydrocarbon resource processing device including a hybrid coupler and related methods
DE102012204447B4 (de) 2012-03-20 2013-10-31 Forschungsverbund Berlin E.V. Vorrichtung und Verfahren zur Erzeugung eines Plasmas

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US5029173A (en) * 1990-03-19 1991-07-02 Seguin Herb J J Laser system with multiple radial discharge channels
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US20120285934A1 (en) 2012-11-15
EP2502469A1 (fr) 2012-09-26
DE102009046881A1 (de) 2011-05-26
WO2011061283A1 (fr) 2011-05-26
DE102009046881B4 (de) 2015-10-22
US9210789B2 (en) 2015-12-08

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