EP2751826B1 - Dispositif de production de plasma micro-ondes thermodynamiquement froid - Google Patents

Dispositif de production de plasma micro-ondes thermodynamiquement froid Download PDF

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Publication number
EP2751826B1
EP2751826B1 EP12778597.0A EP12778597A EP2751826B1 EP 2751826 B1 EP2751826 B1 EP 2751826B1 EP 12778597 A EP12778597 A EP 12778597A EP 2751826 B1 EP2751826 B1 EP 2751826B1
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EP
European Patent Office
Prior art keywords
plasma chamber
microwave
accordance
plasma
resonant cavities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP12778597.0A
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German (de)
English (en)
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EP2751826A2 (fr
Inventor
Martin Weisgerber
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Individual
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00—Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/50—Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field
    • H01J25/52—Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field with an electron space having a shape that does not prevent any electron from moving completely around the cathode or guide electrode
    • H01J25/54—Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field with an electron space having a shape that does not prevent any electron from moving completely around the cathode or guide electrode having only one cavity or other resonator, e.g. neutrode tubes
    • H01J25/55—Coaxial cavity magnetrons
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4622—Microwave discharges using waveguides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure

Definitions

  • the invention relates to a device for generating a thermodynamically cold plasma by means of high-frequency microwaves in a suitable process space under standard atmospheric conditions.
  • plasmas are used in a variety of industrial, medical and other surface treatment applications. Almost all embodiments of plasma technology, however, take place under low pressure or vacuum conditions. It would be desirable to be able to perform these tasks also under standard atmospheric conditions.
  • the object of the invention is to present a scalable in both its energetic performance and application area plasma generation system, which operates under standard atmospheric conditions and due to the excitation by microwaves thermodynamically cold on the one hand and on the other hand no large technological and financial expenses generated, and compact and lightweight is executed.
  • the inventive design of the microwave-excited plasma source is such that the microwaves of high energy density generated in at least one separated microwave source are supplied by waveguides to a plasma chamber which is open to the environment and are superimposed there.
  • the plasma chamber has a polygonal cross section, which in the limit case lim n ⁇ ⁇ an n -gon has a circular shape.
  • the waveguides enter the interior of the plasma chamber orthogonally to the respective side surface, in the case of the circular form radially.
  • microwaveable windows eg of quartz glass, the microwaves leave the waveguides and propagate in the plasma chamber.
  • the exit surfaces of the waveguides are set back relative to the inner wall of the plasma chamber.
  • a matter flow preferably in gaseous form, such as ambient air or a desired process gas, can be introduced into the plasma chamber.
  • This material flow traverses the plasma chamber and is put into the plasma state by the excitation, before it leaves the plasma chamber again through a lower opening and is supplied to the desired application.
  • This lower opening is realized by a replaceable, the application according geometrically shaped structure, such as a round nozzle.
  • the plasma jet can be fluidically influenced and optimally adapted to the specific task, eg in the form of different flow cross sections.
  • The, preferably gaseous, stream of matter may contain minute particles of other substances, that is to say be an aerosol, for example. These particles contained in the material flow are also placed in excited states during the passage through the plasma chamber and subsequently used for special coating tasks.
  • a fundamental restriction to certain materials contained in the material flow is not given; In principle, all substances can be supplied. Which substances can be usefully used for applications must be determined on a case-by-case basis. Possible applications are the application of electrically conductive structures of e.g. Copper on e.g. Plastic or glass.
  • microwaves having a frequency of more than 3 GHz, preferably 30 GHz.
  • a metallic, preferably copper-shaped anode has in its interior a plurality, preferably 20, concentrically distributed around the central axis of the anode and the azimuth equidistantly distributed cavities, which act as electromagnetic resonance chambers.
  • These resonance chambers are cylindrically shaped and their respective axis of symmetry is aligned in the center of the chamber parallel to the azimuth.
  • the radius of the resonance chambers is equal to or smaller than 1 cm, preferably 3.87 mm.
  • the height of the cylindrical chambers is also equal to or less than 1 cm, preferably 1.5 mm.
  • the arbitrarily, preferably cylindrically shaped anode has in the center along the z- axis a cavity which is open at the top.
  • Each resonance chamber is connected by a radially aligned waveguide with the cavity of the anode. Due to this special arrangement and geometric shape of the resonance chamber, the powerful production of the microwave is made possible in a small footprint and weight.
  • a microwave generator has a volume of less than 10 cm 3 and a weight of less than 100 g (calculated without the electron source and guide magnets).
  • the microwave excitation is thermodynamically stable due to the concentric arrangement of the resonance chambers, i.
  • the length expansion when heating the system has no influence on the phase angles of the microwaves in the individual resonance chambers.
  • the coupling out of the microwave takes place from at least one or more, preferably three resonance chambers, which are each an odd number of resonance chambers away from each other, by radially outwardly directed waveguide.
  • the waveguides lead via differently curved paths to the plasma chamber.
  • Another specific embodiment has several, preferably four, microwave generators, of which in each case several, preferably in each case 3, waveguides supply the microwaves generated to the plasma chamber.
  • microwave generators of which in each case several, preferably in each case 3, waveguides supply the microwaves generated to the plasma chamber.
  • Another specific embodiment is represented by a square-shaped plasma chamber with uniformly distributed microwave couplings on each side.
  • This general diamond shape can be generated from outside to inside in its intensity variable plasma for special requirements.
  • the application of the plasma at the bottom of the plasma chamber can be carried out by slot-like or round nozzle-like structures in a different arrangement.
  • Another specific embodiment is represented by a rectangular shaped plasma chamber with at least on the longitudinal sides, generally on all sides, evenly distributed microwave couplings. As a result, a flat, uniform plasma intensity is achieved.
  • the application of the plasma at the bottom of the plasma chamber can be carried out by slot or series arranged round nozzles.
  • Illustration 1 shows a section of the microwave generator.
  • the here cylindrically shaped anode (1) contains along its axis center a cavity (2) into which the electron source (not shown) is inserted. Above and below the anode are the (not shown) guide magnets for the circular motion of the electrons.
  • Waveguides (3) lead from the central cavity to the individual resonance chambers (4) arranged concentrically around the central axis of the anode. From at least one resonance chamber then another waveguide (5) leads the microwave to the plasma chamber.
  • FIG. (2 ) shows a possible embodiment of the plasma chamber (6) with only one microwave source (7) .
  • the plasma chamber (6) is triangular in shape and the microwaves are introduced into the plasma chamber via three waveguides (5a), (5b) and (5c) on different curved paths orthogonal to the three side surfaces of the plasma chamber.
  • the microwave leaves the waveguide through the microwave-transparent "window” (8) and spreads out inside the plasma chamber.
  • Through the opening (9) Through the opening (9) , a stream of matter, process gas or aerosol can be introduced into the plasma chamber.
  • At the bottom of the plasma chamber can be formed according to the requirements of the application nozzle-like structure are mounted to ensure optimum application.
  • Figure (3 ) shows a possible embodiment of the plasma chamber (6) with 4 microwave sources (7) .
  • 3 waveguides (5a), (5b) and (5c) each guide the microwave into the plasma chamber.
  • the plasma chamber can be as in Figure (3 ) have a circular cross-section or as in an embodiment not shown here have a polygonal cross-section.
  • 4 microwave sources as in Figure (3 ) would be the polygonal cross section in the form of a dodecahedron.
  • three microwave sources of the cross-section would be a Nonagon, etc.
  • n i ⁇ j
  • Figure (3 ) can also be introduced through the opening (9) a matter flow in the plasma chamber. Due to the mountable nozzle-like structure (10) , the excited material flow is then optimally supplied to the application.
  • FIG (4 ) shows one possible embodiment of a rectangular plasma chamber in which two sides are longer than the other two sides. Plants of this form are intended, for example, for flat use in web goods.
  • the microwave sources (7) are arranged at a uniform distance.
  • the opposing microwave feeds in the form of a microwave-transparent "window" (8) , consisting for example of quartz glass, can be arranged both offset from each other and aligned with each other.
  • a material flow can also be supplied in this embodiment.
  • At the bottom of the rectangular plasma chamber can be mounted a nozzle shape adapted to the application (slot nozzle or row of round nozzles).

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)

Claims (9)

  1. Dispositif de production d'un plasma à l'aide de micro-ondes
    qui sont générées,
    par plusieurs chambres de résonance (4) disposées de façon homocentrique autour de l'axe moyen d'une anode qui correspond
    à l'axe z d'un système de coordonnées polaires,
    et qui sont conduites hors de la chambre de résonance (4) via au moins un ou plusieurs guide(s) d'ondes (5),
    processus au cours duquel le découplage des micro-ondes se fait à partir d'au moins une ou plusieurs chambre(s) de résonance,
    qui sont tous séparées entre elles par un nombre impair de chambres de résonance,
    où les chambres de résonance (4) sont réparties dans un bloc anodique dans lequel le vide a été fait et à conductibilité électrique,
    caractérisé en ce que,
    i) les chambres de résonance soient cylindriques et que
    ii) leurs axes de symétrie soient parallèles aux coordonnées angulaires du système de coordonnées polaires,
    iii) où chaque chambre de résonance (4) est reliée via des guides d'ondes rectangulaires à la cavité intérieure (2) de l'anode le long de l'axe moyen, et
    iv) que les micro-ondes sorties soient amenées en interférence dans une chambre à plasma (6) séparée et qu'un plasma y soit produit grâce aux micro-ondes dans des conditions atmosphériques standards.
  2. Dispositif selon la revendication 1,
    caractérisé en ce que,
    i) les chambres de résonance cylindriques (4) possèdent un rayon inférieur à 1 cm et
    ii) une hauteur inférieure à 1 cm et
    iii) qu'un rayonnement de micro-ondes d'une fréquence de plus de 3 GHz soit créé dans le cas de résonance.
  3. Dispositif selon la revendication 1,
    caractérisé en ce que,
    i) plusieurs, au minimum deux dispositifs générant des micro-ondes (7) soient disposés, selon la revendication 1,
    ii) autour d'une chambre à plasma (6) polygonale, dans le cas limite lim d'une section transversale circulaire n-gone de sorte
    iii) que les micro-ondes introduites dans la chambre à plasma (6) via le guide d'ondes (5) interfèrent entre elles,
    iv) permettant à un courant de matière d'être introduit sur un côté, le côté supérieur, (9) dans la chambre à plasma (6) et
    v) de ressortir par le côté opposé, le côté inférieur.
  4. Dispositif selon la revendication 3,
    caractérisé en ce que,
    i) la surface interne de la chambre à plasma (6) soit revêtue, totalement ou partiellement de façon à réfléchir les micro-ondes
    ii) ou totalement ou partiellement de façon à absorber les micro-ondes.
  5. Dispositif selon la revendication 3,
    caractérisé en ce que,
    i) le côté inférieur soit façonné par une buse (10) interchangeable, dont chaque façonnage géométrique crée différents profils de l'écoulement.
  6. Dispositif selon la revendication 3,
    caractérisé en ce que,
    i) le polygone forme un quadrilatère,
    ii) sur chaque côté duquel un ou plusieurs dispositif(s) générant des micro-ondes (7) est/sont disposé(s), selon la revendication 1, de telle sorte que
    iii) les ondes introduites par le guide d'ondes (5) pénètrent à l'intérieur en se répartissant uniformément le long des côtés et
    iv) y interfèrent entre elles.
  7. Dispositif selon la revendication 6,
    caractérisé en ce que,
    i) La face inférieure soit façonnée par une buse (10) interchangeable sous la forme de buse à fente.
  8. Dispositif selon la revendication 7,
    caractérisé en ce que,
    i) un alignement de buses rondes soit formé à la place d'une buse à fente
  9. Dispositif selon la revendication 3,
    caractérisé en ce que,
    i) à l'intérieur de la chambre à plasma (6) polygonale, des pièces guidant l'écoulement soient
    ii) introduites à partir du matériau réfléchissant les micro-ondes de sorte
    iii) qu'elles accèdent à l'un des courants de matière et
    iv) que les micro-ondes introduites se focalisent en même temps sur le courant de matière traversé.
EP12778597.0A 2011-08-31 2012-08-25 Dispositif de production de plasma micro-ondes thermodynamiquement froid Not-in-force EP2751826B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011111884A DE102011111884B3 (de) 2011-08-31 2011-08-31 Verfahren und Vorrichtung zur Erzeugung von thermodynamisch kaltem Mikrowellenplasma
PCT/DE2012/000865 WO2013029593A2 (fr) 2011-08-31 2012-08-25 Dispositif de production de plasma micro-ondes thermodynamiquement froid

Publications (2)

Publication Number Publication Date
EP2751826A2 EP2751826A2 (fr) 2014-07-09
EP2751826B1 true EP2751826B1 (fr) 2015-01-14

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Application Number Title Priority Date Filing Date
EP12778597.0A Not-in-force EP2751826B1 (fr) 2011-08-31 2012-08-25 Dispositif de production de plasma micro-ondes thermodynamiquement froid

Country Status (4)

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US (1) US9343271B2 (fr)
EP (1) EP2751826B1 (fr)
DE (1) DE102011111884B3 (fr)
WO (1) WO2013029593A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013215252A1 (de) * 2013-08-02 2015-02-05 Eeplasma Gmbh Vorrichtung und Verfahren zur Behandlung von Prozessgasen in einem Plasma angeregt durch elektromagnetische Wellen hoher Frequenz
CA3071408A1 (fr) * 2016-08-01 2018-02-08 Drexel University Compositions et methodes pour le traitement de troubles cutanes
DE102018000401A1 (de) * 2018-01-19 2019-07-25 Ralf Spitzl Mikrowellenplasmavorrichtung
CN111511090B (zh) * 2020-04-13 2022-05-10 北京工业大学 微波等离子体反应器

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Also Published As

Publication number Publication date
WO2013029593A2 (fr) 2013-03-07
EP2751826A2 (fr) 2014-07-09
US20140361689A1 (en) 2014-12-11
WO2013029593A3 (fr) 2013-04-25
US9343271B2 (en) 2016-05-17
DE102011111884B3 (de) 2012-08-30

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