EP2027307A2 - Verfahren zur herstellung von porösen metallorganischen gerüstmaterialien - Google Patents
Verfahren zur herstellung von porösen metallorganischen gerüstmaterialienInfo
- Publication number
- EP2027307A2 EP2027307A2 EP07729006A EP07729006A EP2027307A2 EP 2027307 A2 EP2027307 A2 EP 2027307A2 EP 07729006 A EP07729006 A EP 07729006A EP 07729006 A EP07729006 A EP 07729006A EP 2027307 A2 EP2027307 A2 EP 2027307A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- acid
- organic compound
- reaction
- metal ion
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012621 metal-organic framework Substances 0.000 title abstract description 21
- 238000004519 manufacturing process Methods 0.000 title abstract description 6
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 78
- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 42
- 238000006243 chemical reaction Methods 0.000 claims abstract description 32
- 239000012429 reaction media Substances 0.000 claims abstract description 29
- 239000007806 chemical reaction intermediate Substances 0.000 claims abstract description 28
- 230000003647 oxidation Effects 0.000 claims abstract description 24
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 24
- 150000000000 tetracarboxylic acids Chemical class 0.000 claims abstract description 16
- 150000003628 tricarboxylic acids Chemical class 0.000 claims abstract description 16
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 14
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 12
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims abstract description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 10
- 229930195734 saturated hydrocarbon Natural products 0.000 claims abstract description 10
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- 125000003367 polycyclic group Chemical group 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 98
- 239000010949 copper Substances 0.000 claims description 36
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 30
- 229910052802 copper Inorganic materials 0.000 claims description 24
- 238000002360 preparation method Methods 0.000 claims description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 20
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 claims description 18
- 125000002524 organometallic group Chemical group 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 150000002739 metals Chemical class 0.000 claims description 12
- 239000000725 suspension Substances 0.000 claims description 11
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 9
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 8
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 8
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 claims description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 claims description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 claims description 6
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052725 zinc Inorganic materials 0.000 claims description 6
- NEQFBGHQPUXOFH-UHFFFAOYSA-N 4-(4-carboxyphenyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C=C1 NEQFBGHQPUXOFH-UHFFFAOYSA-N 0.000 claims description 5
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 claims description 5
- 239000011575 calcium Substances 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- 239000011572 manganese Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 230000035484 reaction time Effects 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 claims description 3
- GPNNOCMCNFXRAO-UHFFFAOYSA-N 2-aminoterephthalic acid Chemical compound NC1=CC(C(O)=O)=CC=C1C(O)=O GPNNOCMCNFXRAO-UHFFFAOYSA-N 0.000 claims description 3
- RLHGFJMGWQXPBW-UHFFFAOYSA-N 2-hydroxy-3-(1h-imidazol-5-ylmethyl)benzamide Chemical compound NC(=O)C1=CC=CC(CC=2NC=NC=2)=C1O RLHGFJMGWQXPBW-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- LSPHULWDVZXLIL-QUBYGPBYSA-N camphoric acid Chemical compound CC1(C)[C@H](C(O)=O)CC[C@]1(C)C(O)=O LSPHULWDVZXLIL-QUBYGPBYSA-N 0.000 claims description 3
- ABMFBCRYHDZLRD-UHFFFAOYSA-N naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1 ABMFBCRYHDZLRD-UHFFFAOYSA-N 0.000 claims description 3
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 238000010626 work up procedure Methods 0.000 claims description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 2
- 150000002602 lanthanoids Chemical class 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052706 scandium Inorganic materials 0.000 claims description 2
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract description 15
- 125000002619 bicyclic group Chemical group 0.000 abstract 1
- 125000002950 monocyclic group Chemical group 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 57
- 239000002904 solvent Substances 0.000 description 46
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 37
- 150000003839 salts Chemical class 0.000 description 35
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 34
- 150000001875 compounds Chemical class 0.000 description 31
- -1 steels Chemical compound 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 21
- 239000000463 material Substances 0.000 description 18
- 239000000047 product Substances 0.000 description 17
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 15
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- 239000000203 mixture Substances 0.000 description 13
- 125000001424 substituent group Chemical group 0.000 description 13
- 239000003792 electrolyte Substances 0.000 description 12
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 11
- 238000005868 electrolysis reaction Methods 0.000 description 11
- 239000001257 hydrogen Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000004215 Carbon black (E152) Substances 0.000 description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- 125000001931 aliphatic group Chemical group 0.000 description 10
- 150000001491 aromatic compounds Chemical class 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 10
- 229930195733 hydrocarbon Natural products 0.000 description 10
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 9
- 230000028161 membrane depolarization Effects 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 150000007824 aliphatic compounds Chemical class 0.000 description 8
- 238000000605 extraction Methods 0.000 description 8
- 229910000831 Steel Inorganic materials 0.000 description 7
- 239000010959 steel Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000003446 ligand Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 238000001354 calcination Methods 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 125000002091 cationic group Chemical group 0.000 description 5
- 150000001768 cations Chemical class 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 125000000542 sulfonic acid group Chemical group 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 229920002266 Pluriol® Polymers 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 4
- 150000001991 dicarboxylic acids Chemical class 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000000543 intermediate Substances 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 4
- GJAWHXHKYYXBSV-UHFFFAOYSA-N quinolinic acid Chemical compound OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 description 4
- 238000001291 vacuum drying Methods 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 3
- 238000006056 electrooxidation reaction Methods 0.000 description 3
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- 239000001177 diphosphate Substances 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
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- FIMHASWLGDDANN-UHFFFAOYSA-M methyl sulfate;tributyl(methyl)azanium Chemical compound COS([O-])(=O)=O.CCCC[N+](C)(CCCC)CCCC FIMHASWLGDDANN-UHFFFAOYSA-M 0.000 description 1
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- OLAPPGSPBNVTRF-UHFFFAOYSA-N naphthalene-1,4,5,8-tetracarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O OLAPPGSPBNVTRF-UHFFFAOYSA-N 0.000 description 1
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- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- WDAISVDZHKFVQP-UHFFFAOYSA-N octane-1,2,7,8-tetracarboxylic acid Chemical compound OC(=O)CC(C(O)=O)CCCCC(C(O)=O)CC(O)=O WDAISVDZHKFVQP-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- LAHAPBJSVSVFGR-UHFFFAOYSA-N oxane-4,4-dicarboxylic acid Chemical compound OC(=O)C1(C(O)=O)CCOCC1 LAHAPBJSVSVFGR-UHFFFAOYSA-N 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- GUVXZFRDPCKWEM-UHFFFAOYSA-N pentalene Chemical compound C1=CC2=CC=CC2=C1 GUVXZFRDPCKWEM-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- WSRHMJYUEZHUCM-UHFFFAOYSA-N perylene-1,2,3,4-tetracarboxylic acid Chemical class C=12C3=CC=CC2=CC=CC=1C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C2=C1C3=CC=C2C(=O)O WSRHMJYUEZHUCM-UHFFFAOYSA-N 0.000 description 1
- KIZSMODMWVZSNT-UHFFFAOYSA-N perylene-1,2-dicarboxylic acid Chemical compound C1=CC(C2=C(C(C(=O)O)=CC=3C2=C2C=CC=3)C(O)=O)=C3C2=CC=CC3=C1 KIZSMODMWVZSNT-UHFFFAOYSA-N 0.000 description 1
- FVDOBFPYBSDRKH-UHFFFAOYSA-N perylene-3,4,9,10-tetracarboxylic acid Chemical compound C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O FVDOBFPYBSDRKH-UHFFFAOYSA-N 0.000 description 1
- SDPOODQJUWAHOW-UHFFFAOYSA-N perylene-3,9-dicarboxylic acid Chemical compound C=12C3=CC=CC2=C(C(O)=O)C=CC=1C1=CC=CC2=C1C3=CC=C2C(=O)O SDPOODQJUWAHOW-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
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- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 239000013309 porous organic framework Substances 0.000 description 1
- GMIOYJQLNFNGPR-UHFFFAOYSA-N pyrazine-2,5-dicarboxylic acid Chemical compound OC(=O)C1=CN=C(C(O)=O)C=N1 GMIOYJQLNFNGPR-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- JPGZDTDZZDLVHW-UHFFFAOYSA-N quinoline-2,4-dicarboxylic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC(C(O)=O)=C21 JPGZDTDZZDLVHW-UHFFFAOYSA-N 0.000 description 1
- SXXBQGWQCRMKHR-UHFFFAOYSA-N quinoline-3,4-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CN=C21 SXXBQGWQCRMKHR-UHFFFAOYSA-N 0.000 description 1
- WCHKKUMRGPRZOG-UHFFFAOYSA-N quinoline-7,8-dicarboxylic acid Chemical compound C1=CC=NC2=C(C(O)=O)C(C(=O)O)=CC=C21 WCHKKUMRGPRZOG-UHFFFAOYSA-N 0.000 description 1
- CQZDWYYGOZOTHY-UHFFFAOYSA-N quinoxaline-2,3-dicarboxylic acid Chemical compound C1=CC=C2N=C(C(O)=O)C(C(=O)O)=NC2=C1 CQZDWYYGOZOTHY-UHFFFAOYSA-N 0.000 description 1
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- 238000013341 scale-up Methods 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001694 spray drying Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- MBDNRNMVTZADMQ-UHFFFAOYSA-N sulfolene Chemical compound O=S1(=O)CC=CC1 MBDNRNMVTZADMQ-UHFFFAOYSA-N 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- HQHCYKULIHKCEB-UHFFFAOYSA-N tetradecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCC(O)=O HQHCYKULIHKCEB-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 description 1
- ZWWLLYJRPKYTDF-UHFFFAOYSA-N thiophene-3,4-dicarboxylic acid Chemical compound OC(=O)C1=CSC=C1C(O)=O ZWWLLYJRPKYTDF-UHFFFAOYSA-N 0.000 description 1
- TXXHDPDFNKHHGW-ZPUQHVIOSA-N trans,trans-muconic acid Chemical compound OC(=O)\C=C\C=C\C(O)=O TXXHDPDFNKHHGW-ZPUQHVIOSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- HJHUXWBTVVFLQI-UHFFFAOYSA-N tributyl(methyl)azanium Chemical compound CCCC[N+](C)(CCCC)CCCC HJHUXWBTVVFLQI-UHFFFAOYSA-N 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- 239000001226 triphosphate Substances 0.000 description 1
- 235000011178 triphosphate Nutrition 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 239000010981 turquoise Substances 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B3/00—Electrolytic production of organic compounds
- C25B3/01—Products
- C25B3/13—Organo-metallic compounds
Definitions
- the present invention relates to processes for preparing a porous organometallic framework comprising at least two organic compounds coordinating to at least one metal ion.
- MOF metal-organic frameworks
- US Pat. No. 5,648,508 describes microporous organometallic materials prepared under mild reaction conditions from a metal ion and a ligand in the presence of a template compound.
- WO-A-02/088148 discloses the preparation of a series of compounds having the same framework topology. These so-called IRMOF (isoreticular metal-organic framework) structures represent monocrystalline and mesoporous framework materials that have a very high storage capacity for gases.
- IRMOF isoreticular metal-organic framework
- MOF-5 which is based on a zinc salt, i. Zinc nitrate, wherein this salt and 1,4-benzenedicarboxylic acid (BDC) are dissolved in N, N'-diethylformamide (DEF) for the synthesis of the MOF material.
- BDC 1,4-benzenedicarboxylic acid
- DEF N, N'-diethylformamide
- MOF-14 in which starting from a copper salt (copper nitrate) and for the synthesis of MOF this salt and 4,4 ', 4 "-Benzol-1, 3,5-triyltribenzoeklare (H 3 BTC) in N, N'-dimethylformamide (DMF) and water are dissolved.
- a most cost-effective and highly scalable method should be provided.
- the object is achieved by a process for the preparation of a porous organometallic framework material comprising at least two organic compounds coordinately bonded to at least one metal ion, comprising the steps:
- step (a) the oxidation can be limited to a minimum of reaction time, which is advantageous because of the comparatively high expenditure on equipment for the electrochemical oxidation.
- the process according to the invention also makes it possible to use polybasic carboxylic acids which do not withstand the conditions of electrochemical oxidation.
- a plurality of porous organometallic frameworks can be easily represented, in which the polybasic carboxylic acid is varied in the simpler second step.
- Step (a) of the process according to the invention is the anodic oxidation of the at least one metal, which enters the reaction medium as a cation and reacts with a first organic compound to form a reaction intermediate.
- This reaction intermediate can be separated, for example, by filtration and then reacted further with the second organic compound.
- the reaction intermediate is used without further workup in step (b) of the process according to the invention.
- this is the reaction intermediate in a suspension.
- the reaction intermediate may contain a salt and / or a porous organometallic framework and / or a non-porous organometallic framework.
- the salt may be formed by reaction of the solvent or one of its components (for example, as an alcoholate using a solvent containing at least one alcohol). It has surprisingly been found that the presence of the first organic compound contributes to a better or more controlled resolution of the anode.
- Step (a) of the process according to the invention can preferably be carried out as described in WO-A 2005/049812.
- electrochemical preparation refers to a production process in which the formation of at least one reaction product is associated with the migration of electrical charges or the occurrence of electrical potentials in at least one process step.
- At least one metal ion refers to embodiments according to which at least one ion of a metal or at least one ion of a first metal and at least one ion of at least one second metal different from the first metal by anodic oxidation to be provided.
- the present invention also encompasses embodiments in which at least one ion of at least one metal is provided by anodic oxidation and at least one ion of at least one metal via a metal salt, wherein the at least one metal in the metal salt and the at least one metal which has anodic oxidation. can be provided as metal ion, may be the same or different from each other.
- the present invention encompasses an embodiment in which the reaction medium contains one or more different salts of a metal and the metal ion contained in that salt or salts is additionally provided by anodic oxidation of at least one anode containing that metal.
- the present invention comprises an embodiment in which the reaction medium contains one or more different salts of at least one metal and at least one metal different from these metals is provided via anodic oxidation as the metal ion in the reaction medium.
- the at least one metal ion is provided by anodic oxidation of at least one of the at least one metal-containing anode, wherein no further metal is provided via a metal salt.
- the present invention includes an embodiment in which the at least one anode contains a single or two or more metals, wherein if the anode contains a single metal, that metal is provided by anodic oxidation, and in case the anode is two or more metals, at least one of these metals is provided by anodic oxidation.
- the present invention comprises an embodiment according to which at least two anodes are used, wherein the two may be the same or different from each other.
- Each of the at least two anodes may in this case contain a single or two or more metals. In this case, it is possible, for example, for two different anodes to contain the same metals but these in different proportions.
- a first anode contains a first metal and a second anode contains a second metal, wherein the first anode does not contain the second metal and / or the second anode does not contain the first metal.
- the metal or metals are elements of Groups 2 to 15 of the Periodic Table of the Elements.
- preferred metal ions are selected from the group of metals consisting of copper, iron, aluminum, zinc, magnesium, zirconium, titanium, vanadium, molybdenum, tungsten, indium, calcium, strontium, cobalt, nickel, platinum, Rhodium, ruthenium, palladium, scandium, yttrium, a lanthanide, manganese and rhenium.
- iron, copper, zinc, nickel and cobalt Particularly preferred is copper.
- Cu 2+ , Cu + , Ni 2+ , Ni + , Fe 3+ , Fe 2+ , Co 3+ , Co 2+ , Zn 2+ are metal ions which are provided via anodic oxidation in the reaction medium , Mn 3+ , Mn 2+ , Al 3+ , Mg 2+ , Sc 3+ , Y 3+ , Ln 3+ , Re 3+ , V 3+ , In 3+ , Ca 2+ , Sr 2+ , Pt 2+ , TiO 2+ , Ti 4+ , ZrO 2+ , Zr 4+ , Ru 3+ , Ru 2+ , Mo 3+ , W 3+ , Rh 2+ , Rh + , Pd 2+ and Pd + , Particularly preferred are Zn 2+ , Cu 2+ , Cu + , Fe 2+ , Fe 3+ , Ni 2+ , Ni + , Co 3+ and Co 2+ . Particularly preferred are Cu 2+ and
- step a) also describes a method as described above, wherein a copper and / or a nickel and / or a cobalt and / or a zinc and / or an iron-containing anode is used as metal ion source.
- the present invention also relates to a method as described above, wherein a copper-containing anode is used as the metal ion source.
- the structure of the anode used in step a) of the process according to the invention can in principle be chosen arbitrarily, as long as it is ensured that the at least one metal ion can be provided in the reaction medium to form the reaction intermediate by a nodal oxidation.
- anodes in the form of a rod and / or a ring and / or a disc such as an annular disc and / or a plate and / or a pipe and / or a bed and / or a cylinder and / or a cone and / or a truncated cone.
- the method according to the invention is carried out using at least one sacrificial anode in step a).
- sacrificial anode refers to an anode which at least partially dissolves in the course of the process according to the invention, and also covers embodiments in which at least part of the dissolved anode material replaces in the course of the process This can be done, for example, by introducing at least one new anode into the reaction system or, according to a preferred embodiment, introducing an anode into the reaction system and continuously or discontinuously feeding it into the reaction system in the course of the process according to the invention.
- anodes which consist of the at least one metal serving as metal ion source or which contain at least one metal applied to at least one suitable carrier material.
- the geometry of the at least one carrier material is subject to essentially no restrictions.
- support materials in the form of a fabric and / or a film and / or a felt and / or a screen and / or rod and / or a candle and / or a cone and / or a cone stump and / or a ring and / or a disc and / or a plate and / or a pipe and / or a bed and / or a cylinder.
- Suitable support materials according to the invention for example, metals such as at least one of the above metals, alloys such as steels or bronzes or brass, graphite, felt or foams into consideration.
- anodes which consist of the at least one metal which serves as source of metal ions.
- the structure of the cathode used in step a) of the process according to the invention can in principle be chosen arbitrarily, as long as it is ensured that the at least one metal ion can be provided in the reaction medium by a nodonic oxidation.
- the electrically conductive electrode material of the at least one cathode is selected such that no disturbing secondary reaction takes place in the reaction medium.
- the preferred cathode materials include graphite, copper, zinc, tin, manganese, silver, gold, platinum or alloys such as steels, bronzes or brass.
- anode material serving as the metal ion source and the electrically conductive cathode material are:
- the geometry of the at least one cathode is subject to essentially no restrictions.
- the use of cathodes in the form of a rod and / or a ring and / or a disc and / or a plate and / or a tube is possible.
- any of the common cell types used in electrochemistry can be used in the present invention.
- electrolysis cell which is suitable for the use of sacrificial electrodes.
- ion exchange membranes for example, ion exchange membranes, microporous membranes, diaphragms, filter fabrics of non-electron conducting materials, glass frits and / or porous ceramics can be used as separation medium between the cell compartments.
- ion exchange membranes in particular cation exchange membranes, are used, whereby among these, in turn, such membranes are preferably used, which consist of a copolymer of tetrafluoroethylene and a perfluorinated monomer containing sulfonic acid groups.
- one or more undivided cells are preferably used in step a).
- the present invention also relates to a method as described above, wherein the method is carried out in an undivided electrolysis cell.
- the electrodes are preferably arranged plane-parallel, the electrode gap having a homogeneous thickness, for example in the range from 0.5 mm to 30 mm, preferably in the range from 0.75 mm to 20 mm and particularly preferably in the range from 1 up to 10 mm.
- an electrode gap with a homogeneous thickness in the range of 0.5 to 30 mm, preferably in the range of 1 to 20 mm, in the resulting cell is preferably formed in the range of 5 to 15 mm and more preferably in the range of 8 to 12 mm, for example in the range of about 10 mm.
- This type of cell is referred to in the context of the present invention by the term "gap cell".
- the cell described above is used as a bipolar switched cell.
- the electrodes are applied individually or in a stacked manner.
- these are so-called stacked electrodes, which are preferably connected in series bipolar in the so-called plate stack cell.
- preference is given to using at least one pot cell and, in particular, series-connected plate-stack cells whose basic structure is described in DE 195 33 773 A1.
- the plate stacking cell it is preferred, for example, to arrange disks of suitable materials, such as copper disks, in a plane-parallel manner, such that a gap with a homogeneous thickness in the range of 0.5 to 30 mm, preferably in the range of 0, is provided between the individual disks , 6 to 20 mm, more preferably in the range of 0.7 to 10 mm, more preferably in the range of 0.8 to 5 mm and in particular in the range of 0.9 to 2 mm such as formed in the range of about 1 mm.
- the distances between the individual panes may be the same or different, wherein according to a particularly preferred embodiment, the distances between the panes are substantially equal.
- the material of one slice of the plate stack cell may be different from the material of another slice of the plate stack cell.
- pencil sharpener cells, as described, for example, in J. Chaussard et al., J. Appl. Electrochem., 19 (1989) 345-348, whose In the process according to the invention, pencil sharpener electrodes with rod-shaped, traceable electrodes are particularly preferably used in the process according to the invention.
- step a) also relates to a method as described above, wherein the method is carried out in a gap cell or plate stack cell.
- capillary gap cells Cells in which the electrode spacing is in the range of less than or equal to 1 mm are referred to as capillary gap cells.
- electrolysis cells in step a) electrolysis cells can be used with, for example, porous electrodes made of metal fillings or with, for example, porous electrodes made of metal meshes or with, for example, electrodes both of metal fillings and metal meshes.
- electrolysis cells are used in the process according to the invention, which have at least one sacrificial anode with a round disc-shaped cross section and at least one cathode with an annular cross section, wherein particularly preferably the diameter of the preferably cylindrical anode is smaller than the inner diameter of the cathode and the Anode is mounted in the cathode such that between the outer surface of the cylinder jacket of the anode and the inner surface of the cathode at least partially surrounding the anode, a gap of homogeneous thickness is formed.
- the original anode to the cathode and the original cathode to the anode by reversing the polarity.
- the process in batch mode or continuously or in mixed mode.
- the process is carried out continuously in at least one flow cell.
- the voltages used in the method according to the invention can be adapted to the respective at least one metal of the at least one anode which serves as metal ion source for the reaction intermediate and / or to the properties of the first organic compound and / or optionally to the properties of the at least one solvent and / or optionally the properties of the at least one conducting salt described below and / or the properties of the at least one cathodic depolarization compound described below.
- the voltages per electrode pair are in the range of 0.5 to 100 V, preferably in the range of 2 to 40 V, and more preferably in the range of 4 to 20 V.
- Examples of preferred ranges are about 4 to 10 V or 10 to 20 V. or 20 to 25 V or 10 to 25 V or 4 to 20 V or 4 to 25 V.
- the stress may be constant or change continuously or discontinuously in the course of the process.
- the voltages are generally in the range of 3 to 20 V, preferably in the range of 3.5 to 15 V, and more preferably in the range of 4 to 15 V.
- the current densities which occur in the context of the preparation of the porous organic frameworks according to the invention are generally in the range from 0.01 to 1000 imA / cm 2 , preferably in the range from 0.1 to 1000 imA / cm 2 , more preferably in the range from 0.2 to 200 imA / cm 2 , more preferably in the range of 0.3 to 100 imA / cm 2 and particularly preferably in the range of 0.5 to 50 mA / cm 2 .
- the process according to the invention is generally carried out at a temperature in the range from 0 ° C. to the boiling point, preferably in the range from 20 ° C. to the boiling point of the particular reaction medium or of the at least one solvent used, preferably under atmospheric pressure. It is also possible that Process under pressure, wherein pressure and temperature are preferably chosen so that the reaction medium is preferably at least partially liquid.
- the process according to the invention is carried out at a pressure in the range from 0.5 to 50 bar, preferably in the range from 1 to 6 bar and particularly preferably at atmospheric pressure.
- the electrochemical preparation of the reaction intermediate according to the invention in step a) can in principle also be carried out without additional solvent. This is the case, for example, when the first organic compound acts as a solvent in the reaction medium.
- the reaction medium contains at least one suitable solvent in addition to the first organic compound and optionally to the at least one conducting salt and optionally to the at least one cathodic depolarization compound.
- the chemical nature and the amount of this at least one solvent can be adapted to the first organic compound and / or to the at least one conductive salt and / or to the at least one cathodic depolarization compound and / or to the at least one metal ion.
- solvents or all solvent mixtures in which the starting materials used in step a) of the process according to the invention can be at least partially dissolved or suspended under the chosen reaction conditions, such as pressure and temperature, are conceivable as solvents.
- solvents used include
- Alcohols having 1, 2, 3 or 4 carbon atoms such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, tert-butanol;
- Carboxylic acids having 1, 2, 3 or 4 carbon atoms such as formic acid, acetic acid, propionic acid or butanoic acid; Nitriles such as acetonitrile or cyanobenzene; Ketones such as acetone; At least one halogen-substituted lower alkanes such as methylene chloride or 1, 2-dichloroethane; Acid amides such as amides of lower carboxylic acids such as carboxylic acids having 1, 2, 3 or 4 carbon atoms such as amides of formic acid, acetic acid, propionic acid or butyric acid such as formamide, dimethylformamide (DMF), diethylformamide (DEF), t-butylformamide,
- DMF dimethylformamide
- DEF diethylformamide
- Amines such as ethanolamine, triethylamine or ethylenediamine
- solvent includes both pure solvents and solvents which contain in small amounts at least one further compound such as preferably water.
- the water contents of the abovementioned solvents are in the range of up to 1% by weight, preferably in the range of up to 0.5% by weight, particularly preferably in the range from 0.01 to 0.5% by weight .-% and particularly preferably in the range of 0.1 to 0.5 wt .-%.
- methanol or “ethanol” or “acetonitrile” or “DMF” or “DEF” is understood as meaning, for example, a solvent which in each case particularly preferably contains water in the range from 0.1 to 0.5% by weight .-% may contain.
- the preferred solvents used in step a) of the process according to the invention are methanol, ethanol, acetonitrile, DMF and DEF or a mixture of two or more of these compounds.
- Very particularly preferred solvents are methanol, ethanol, DMF, DEF and a mixture of two or more of these compounds. In particular, methanol is preferred.
- At least one protic solvent is used as the solvent.
- the temperature in step a) of the process according to the invention under normal pressure is generally in the range from 0 to 90 ° C .; preferably in the range from 0 to 65 ° C and especially preferably in the range from 25 to 65 ° C.
- the temperature in the process according to the invention under normal pressure is generally in the range from 0 to 100 ° C .; preferably in the range from 0 to 78 ° C and especially preferably in the range from 25 to 78 ° C.
- the pH of the reaction medium is adjusted in the process according to the invention so that it is favorable for the synthesis or the stability or preferably for the synthesis and the stability of the framework.
- the pH can be adjusted via the at least one conductive salt.
- the reaction time is generally in the range of up to 30 hours, preferably in the range of up to 20 hours. more preferably in the range of 1 to 10 hours, and more preferably in the range of 1 to 5 hours.
- the ratio of the reaction time for step (b) to step (a) is at least 1: 1. More preferably, the ratio is at least 2: 1, more preferably at least 5: 1, and most preferably at least 10: 1.
- the first organic compound is a mono-, bi- or polycyclic saturated or unsaturated hydrocarbon in which at least two ring carbon atoms have been replaced by heteroatoms selected from the group consisting of N, O and S.
- the first organic compound contains at least nitrogen as the ring atom, more preferably nitrogen occurs as the heteroatom.
- the hydrocarbon may be unsubstituted or substituted. If more than one substituent occurs, the substituents may be the same or different. Substituents may be independently phenyl, amino, hydroxy, thio, halogen, pseudohalogen, formyl, amide, an acyl having an aliphatic saturated or unsaturated hydrocarbon radical having 1 to 4 carbon atoms and an aliphatic branched or unbranched saturated or unsaturated hydrocarbon having 1 to 4 be lenstoffatomen. If the substituents contain one or more hydrogen atoms, each of these independently can also be replaced by an aliphatic branched or unbranched saturated or unsaturated hydrocarbon having 1 to 4 carbon atoms.
- Halogen may be fluorine, chlorine, bromine or iodine.
- Pseudohalogens are, for example, cyano, cyanato or isocyanato.
- An aliphatic branched or unbranched saturated or unsaturated hydrocarbon having 1 to 4 carbon atoms is, for example, methyl, ethyl, n-propyl, i-propyl, n-butyl, i-butyl, t-butyl, vinyl, ethynyl or allyl.
- acyl with an aliphatic saturated or unsaturated hydrocarbon radical having 1 to 4 carbon atoms is, for example, acetyl or ethylcarbonyl.
- the first organic compound is unsubstituted or has a substituent which is methyl or ethyl.
- the mono-, bi- or polycyclic hydrocarbon has 5 or 6 rings, more preferably 6 rings.
- the at least two heteroatoms are nitrogen.
- the first organic compound has exactly two heteroatoms, preferably nitrogen.
- the hydrocarbon has a 6-membered ring in which two heteroatoms, preferably nitrogen, are present, these are preferably in para position to each other.
- the first organic compound can be derived from an unsaturated hydrocarbon that is aromatic or fully saturated. If the first organic compound has more than one ring, at least one ring is preferably aromatic.
- the monocyclic hydrocarbon from which the first organic compound is derived is, for example, cyclobutane, cyclobutene, cyclobutadiene, cyclopentane, cyclopentadiene, cyclopentadiene, benzene, cyclohexane or cyclohexene.
- the monocyclic hydrocarbon from which the second organic compound is derived is benzene or cyclohexane.
- the bicyclic hydrocarbon from which the first organic compound derives for example, may consist of two rings which are linked together via a single covalent bond or via a group R.
- bicyclic hydrocarbon from which the first organic compound derives and which consists of two rings linked together via a covalent single bond or via a group R are biphenyl, stilbene, biphenyl ether, N-phenylbenzamide and azobenzene. Preference is given to biphenyl.
- bicyclic hydrocarbon from which the first compound is derived may be fused ring systems.
- decalin examples of these are decalin, tetralin, naphthalene, indene, indane, pentalen. Preference is given to tetralin and naphthalene.
- the bicyclic hydrocarbon from which the first organic compound is derived may have a bridging ring system.
- bicyclo [2.2.1] heptane or bicyclo [2.2.2] octane examples of these are bicyclo [2.2.1] heptane or bicyclo [2.2.2] octane, the latter being preferred.
- the polycyclic hydrocarbon from which the first organic compound derives may contain fused and / or bridged ring systems.
- Examples thereof are biphenylene, indacene, fluorene, phenalen, phenanthrene, anthracene, naphthacene, pyrene, crysene, triphenylene, 1,4-dihydro-1,4-ethanonaphthalene and 9,10-dihydro-9,10-ethanoanthracene. Preference is given to pyrene, 1,4-dihydro-1,4-ethanaphthalene and 9,10-dihydro-9,10-ethanoanthracene.
- the at least two heteroatoms may be on one or more rings.
- the first organic compound is selected from the group consisting of
- Suitable substituents are the substituents generally listed above for the first organic compound. Particularly preferred substituents are methyl and ethyl. Most preferably, the substituted derivatives have only one substituent. Very particularly preferred substituted derivatives are 2-methylimidazole and 2-ethylimidazole.
- the second organic compound is derived from a di-, tri- or tetracarboxylic acid.
- At least bidentate organic compounds involved in the construction of the framework, which can be used in step (b) of the method according to the invention.
- at least bidentate organic compounds are contained in the framework material.
- These may, for example, be derived from a monocarboxylic acid and be present both in step (a) and in step (b) of the process according to the invention.
- the term "derive" in the context of the present invention means that the di-, tri- or tetracarboxylic acid can be present in the framework material in partially deprotonated or completely deprotonated form.
- the di-, tri- or tetracarboxylic acid can contain a substituent or independently of one another several substituents.
- substituents are -OH, -NH 2 , -OCH 3 , -CH 3 , -NH (CH 3 ), -N (CH 3 ) 2 , -CN and halides.
- the term "derive" in the context of the present invention means that the di-, tri- or tetracarboxylic acid can also be present in the form of the corresponding sulfur analogs.
- the term "derive" in the context of the present invention means that one or more carboxylic acid functions can be replaced by a sulfone group (-SO 3 H).
- a sulfonic acid group may also occur in addition to the 2, 3 or 4 carboxylic acid functions.
- the di-, tri- or tetracarboxylic acid has, in addition to the abovementioned functional groups, an organic main body or an organic compound to which these are bonded.
- the abovementioned functional groups can in principle be bound to any suitable organic compound, as long as it is ensured that the organic compound having these functional groups is capable of forming the coordinative bond for the preparation of the framework.
- the second organic compound is preferably derived from a saturated or unsaturated aliphatic compound or an aromatic compound or an aliphatic as well as an aromatic compound.
- the aliphatic compound or the aliphatic portion of the both aliphatic and aromatic compound may be linear and / or branched and / or cyclic, wherein also several cycles per compound are possible. More preferably, the aliphatic compound or the aliphatic portion of the both aliphatic and aromatic compound contains 1 to 18, more preferably 1 to 14, further preferably 1 to 13, further preferably 1 to 12, further preferably 1 to 11 and particularly preferably 1 to 10 C atoms such as 1, 2, 3, 4, 5, 6, 7, 8, 9 or 10 C atoms. In particular, methane, adamantane, acetylene, ethylene or butadiene are preferred.
- the aromatic compound or the aromatic part of both the aromatic and the aliphatic compound may have one or more nuclei, for example two, three, four or five nuclei, wherein the nuclei may be present separately from each other and / or at least two nuclei in condensed form , Especially Preferably, the aromatic compound or the aromatic moiety of the both aliphatic and aromatic compounds has one, two or three nuclei, with one or two nuclei being particularly preferred. Independently of each other, furthermore, each nucleus of the compound mentioned may contain at least one heteroatom, such as, for example, N, O, S, B, P, Si, preferably N, O and / or S.
- the aromatic compound or the aromatic moiety of the both aromatic and aliphatic compounds contains one or two C 6 cores, the two being either separately or in condensed form.
- Benzene, naphthalene and / or biphenyl and / or bipyridyl and / or pyridyl may in particular be mentioned as aromatic compounds.
- the second organic compound is an aliphatic or aromatic, acyclic or cyclic hydrocarbon having from 1 to 18, preferably 1 to 10 and in particular 6 carbon atoms, which additionally has only 2, 3 or 4 carboxyl groups as functional groups.
- the second organic compound is derived from a dicarboxylic acid such as oxalic acid, succinic acid, tartaric acid, 1,4-butanedicarboxylic acid, 1,4-butenedicarboxylic acid, 4-oxo-pyran-2,6-dicarboxylic acid, 1, 6 Hexanedicarboxylic acid, decanedicarboxylic acid, 1,8-heptadecane dicarboxylic acid, 1,9-heptadecane dicarboxylic acid, heptadecane dicarboxylic acid, acetylenedicarboxylic acid, 1,2-benzenedicarboxylic acid, 1,3-benzenedicarboxylic acid, 2,3-pyridinedicarboxylic acid, pyridine-2,3-dicarboxylic acid.
- a dicarboxylic acid such as oxalic acid, succinic acid, tartaric acid, 1,4-butanedicarboxylic acid, 1,4-but
- dicarboxylic acid 1, 3-butadiene-1, 4-dicarboxylic acid, 1,4-benzenedicarboxylic acid, p-benzenedicarboxylic acid, imidazole-2,4-dicarboxylic acid, 2-methylquinoline-3,4-dicarboxylic acid, quinoline-2,4-dicarboxylic acid.
- 2,8-dicarboxylic acid diimide dicarboxylic acid, pyridine-2,6-dicarboxylic acid, 2-methylimidazole-4,5-dicarboxylic acid, thiophene-3,4-dicarboxylic acid, 2-isopr opylimidazole-4,5-dicarboxylic acid, tetrahydropyran-4,4-dicarboxylic acid, perylene-3,9-dicarboxylic acid, perylenedicarboxylic acid, pluriol E 200-dicarboxylic acid, 3,6-dioxaoctanedicarboxylic acid, 3,5-cyclohexadiene-1,2-dicarboxylic acid, Octadicarboxylic acid, pentane-3,3-carboxylic acid, 4,4'-diamino-1, 1'-diphenyl-3,3'-dicarboxylic acid, 4,4'-diaminodiphenyl-3,3'-
- the second organic compound is one of the above exemplified dicarboxylic acid as such.
- the second organic compound may be derived from a tricarboxylic acid, such as
- the second organic compound is one of the above exemplified tricarboxylic acids as such.
- a second organic compound derived from a tetracarboxylic acid such as
- the second organic compound is one of the above exemplified tetracarboxylic acids as such.
- each of the cores can contain at least one heteroatom, where two or more nuclei have identical or different heteroatoms may contain.
- Suitable heteroatoms are, for example, N, O, S, B, P. Preferred heteroatoms here are N, S and / or O.
- a suitable substituent in this regard is, inter alia, -OH, a nitro group, an amino group or an alkyl or alkoxy group.
- At least bidentate organic compounds are acetylenedicarboxylic acid (ADC), campherdicarboxylic acid, fumaric acid, succinic acid, benzenedicarboxylic acids, naphthalenedicarboxylic acids, biphenyldicarboxylic acids such as 4,4'-biphenyldicarboxylic acid (BPDC), pyrazinedicarboxylic acids such as 2,5-pyrazinedicarboxylic acid, bipyridinedicarboxylic acids such as 2, 2'-bipyridine dicarboxylic acids such as 2,2'-bipyridine-5,5'-dicarboxylic acid, benzenetricarboxylic acids such as 1, 2,3-, 1, 2,4-benzenetricarboxylic acid or 1, 3,5-Benzoltricar- benzenesulfonic acid (BTC), benzene tetracarboxylic acid, adamantane tetracarboxylic acid, a
- phthalic acid isophthalic acid, terephthalic acid, 2-aminoterephthalic acid, 5-aminoisophthalic acid, 4,4'-biphenyldicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, (+) - camphoric acid, succinic acid, 1,4-naphthalenedicarboxylic acid are very particularly preferred , 1, 5-naphthalenedicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 1, 2,3-benzenetricarboxylic acid, 1, 2,4-benzenetricarboxylic acid, 1, 3,5-benzenetricarboxylic acid, 1, 2,3,4-benzenetetracarboxylic acid or 1,2 , 4,5-benzene tetracarboxylic acid.
- the organometallic framework material may also comprise one or more monodentate ligands and / or one or more at least bidentate ligands which are not derived from a di-, tri-or tetracarboxylic acid.
- the at least one at least bidentate organic compound preferably contains no hydroxy or phosphonic acid groups.
- one or more carboxylic acid functions can be replaced by a sulfonic acid function.
- a sulfonic acid group may additionally be present.
- all carboxylic acid functions are replaced by a sulfonic acid function.
- Such sulfonic acids or their salts are, for example, 4-amino-5-hydroxynaphthalene-2,7-disulfonic acid, 1-amino-8-naphthol-3,6-disulfonic acid, 2-hydroxynaphthalene-3, 6-disulfonic acid, benzene-1,3-disulfonic acid, 1,8-dihydroxynaphthalene-3,6-disulfonic acid, 1,2-dihydroxybenzene-3,5-disulfonic acid, 4,5-dihydroxynaphthalene-2,7- disulfonic acid, 2,9-dimethyl-4,7-diphenyl-1,10-phenanthrolinedisulfonic acid, 4,7-diphenyl-1,10-phenanthrolinedisulfonic acid, ethane-1,2-disulfonic acid, naphthalene-1, 5 disulfonic acid, 2- (4-nitrophenylazo) -1,
- the first organic compound is used in a concentration which is generally in the range of 0.1 to 30 wt .-%, preferably in the range of 0.5 to 20% by weight and particularly preferably in the range of 2 to 10 wt. -%, each based on the total weight of the reaction system minus the weight of the anode and the cathode. Accordingly, the term "concentration" in this case includes both the amount of the first organic compound dissolved in the reaction system and, for example, the amount of the first organic compound optionally suspended in the reaction system.
- the first organic compound is formed as a function of the progress of the electrolysis and in particular as a function of the decomposition of the anode or free tion of the at least one metal ion and / or depending on the formation of the reaction intermediate added continuously and / or discontinuously.
- the reaction medium contains at least one suitable electrolyte salt.
- the reaction medium contains at least one suitable electrolyte salt.
- conductive salts which can be used in step a) of the process according to the invention.
- salts of mineral acids, sulfonic acids, phosphonic acids, boronic acids, alkoxysulfonic acids or carboxylic acids or of other acidic compounds such as sulfonic acid amides or imides are preferably used.
- Possible anionic components of the at least one conductive salt are accordingly, inter alia, sulfate, nitrate, nitrite, sulfite, disulfite, phosphate, hydrogen phosphate, dihydrogen phosphate, diphosphate, triphosphate, phosphite, chloride, chlorate, bromide, bromate, iodide, iodate, carbonate or bicarbonate.
- Alkali metal ions such as Li + , Na + , K + or Rb + , alkaline earth metal ions such as Mg 2+ , Ca 2+ , Sr 2+ or Ba 2+ , ammonium ions or phosphonium ions may be mentioned as cation component of the conductive salts which can be used according to the invention.
- ammonium ions With regard to the ammonium ions, mention may be made of quaternary ammonium ions and protonated mono-, di- and triamines.
- quaternary ammonium ions in step a) of the method according to the invention include
- symmetrical ammonium ions such as tetraalkylammonium with preferably C 1 -C 4 -alkyl, for example methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl.
- tert-butyl such as tetramethylammonium, tetraethylammonium, tetrapropylammonium, tetrabutylammonium or
- unsymmetrical ammonium ions such as unsymmetrical tetraalkylammonium with preferably C 1 -C 4 -alkyl, for example methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl.
- tert-butyl such as methyltributylammonium or Ammonium ions with at least one aryl such as phenyl or naphthyl or at least one alkaryl such as benzyl or at least one aralkyl and at least one alkyl, preferably CrC 4 alkyl, for example methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso Tert-butyl, such as aryl trialkyl such as benzyltrimethylammonium or benzyltriethylammonium.
- step a) of the process according to the invention at least one conducting salt is used which contains a methyltributylammonium ion as at least one cationic component.
- methyltributylammonium methylsulfate is used as conductive salt in the process according to the invention in step a).
- Conductive salts which can also be used in the process according to the invention are ionic liquids such as, for example, methylethylimidazolium chloride or methylbutylimidazolium chloride.
- methanesulfonate is used as conductive salt in the process according to the invention.
- Protonated or quaternary heterocycles such as, for example, the imidazolium ion, may also be mentioned as the cation component of the at least one conducting salt.
- the cationic and / or anionic component of the at least one conducting salt it is possible, via the cationic and / or anionic component of the at least one conducting salt, to introduce into the reaction medium compounds which are used for the construction of the reaction intermediate. These compounds are those which influence the formation of the structure of the reaction intermediate, but are not contained in the resulting intermediate, and also those contained in the resulting intermediate.
- at least one compound can be introduced via at least one conducting salt which is contained in the resulting reaction intermediate.
- step a) in addition to the at least one anode as metal ion source, to introduce the metal ion into the reaction medium via the cationic component of the at least one conducting salt. It is likewise possible, via the cationic component of the at least one conducting salt, to introduce at least one metal ion into the reaction mixture.
- dium which is different from the at least one introduced via anodic oxidation metal ion, this difference may relate to the valency of the cation and / or the nature of the metal.
- the present invention also describes a method as described above, characterized in that the at least one conducting salt contains a salt of the first organic compound.
- the concentration of the at least one conducting salt in the context of the process according to the invention is generally in the range from 0.01 to 10% by weight, preferably in the range from 0.05 to 5% by weight and particularly preferably in the range from 0, 1 to 3 wt .-%, each based on the sum of the weights of all present in the reaction system Leitsalze and further based on the total weight of the reaction system without regard to the anodes and cathodes.
- step a) of the process is carried out in batch mode, the reaction medium with the starting materials is generally first provided, then current is applied and then pumped around.
- step a) of the process according to the invention is carried out in such a way that the redeposition of the metal ion liberated by anodic oxidation at the cathode is prevented.
- this redeposition is preferably prevented according to the invention by using a cathode which has a suitable hydrogen overvoltage in a given reaction medium.
- cathodes are, for example, the above-mentioned graphite, copper, zinc, tin, manganese, silver, gold, platinum cathodes or cathodes containing alloys such as steels, bronzes or brass.
- the redeposition is preferably further prevented according to the invention by using an electrolyte in the reaction medium which favors the cathodic formation of hydrogen.
- an electrolyte is preferred which contains at least one protic solvent.
- Preferred examples of such solvents are listed above.
- Particularly preferred are alcohols, more preferably methanol and ethanol.
- the redeposition is preferably further prevented by the reaction medium containing at least one compound which leads to a cathodic depolarization.
- a compound which leads to a cathodic depolarization means any compound which is reduced under given reaction conditions at the cathode.
- Preferred cathodic depolarizers include compounds which are hydrodimerized at the cathode.
- acrylonitrile, acrylic acid esters and maleic acid esters are particularly preferred, for example, dimethyl maleate, for example, more preferably.
- cathodic depolarizers further compounds are preferred, among other things, containing at least one carbonyl group, which is reduced at the cathode.
- examples of such compounds containing carbonyl groups are, for example, ketones, for example acetone.
- Preferred cathodic depolarizers include compounds which have at least one nitrogen-oxygen bond, one nitrogen-nitrogen bond and / or one nitrogen-carbon bond which are reduced at the cathode.
- Examples of such compounds are compounds with a nitro group, with an azo group, with an azoxy group, oximes, pyridines, imines, nitriles and / or cyanates.
- both an electrolyte which promotes the cathodic formation of hydrogen and at least one compound which leads to a cathodic depolarization It is also possible to add at least one compound which leads to a cathodic depolarization, as well as to use a cathode with a suitable hydrogen overvoltage.
- the present invention also relates to a method as described above, wherein in step a) the cathodic redeposition of the at least one measurement tallions is at least partially prevented by at least one of the following measures:
- the present invention therefore also relates to a process as described above, wherein the electrolyte according to (i) contains at least one protic solvent, in particular an alcohol, more preferably methanol and / or ethanol.
- the electrolyte according to (i) contains at least one protic solvent, in particular an alcohol, more preferably methanol and / or ethanol.
- the process according to the invention for step a) is operated in a circular circulation manner.
- this "electrolysis cycle” is understood as any process procedure in which at least part of the reaction system located in the electrolysis cell is discharged from the electrolysis cell, optionally at least one intermediate treatment step such as at least one temperature treatment or addition and / or separation of at least one component subjected to the discharged stream and returned to the electrolysis cell.
- Such an electrolysis circuit is particularly preferably carried out in the context of the present invention in combination with a plate-stack cell, a tube cell or a pencil-Sharpener cell.
- reaction intermediate containing the at least one metal ion and the first organic compound.
- solvents may still be present.
- the reaction intermediate is present as a suspension.
- the reaction intermediate can be separated from its mother liquor. This separation process can be carried out in principle according to all suitable methods.
- the intermediate product is preferably carried out by solid-liquid separation, centrifugation, extraction, filtration, membrane filtration, crossflow filtration, diafiltration, ultrafiltration, flocculation using flocculation aids such as, for example, nonionic, cationic and / or anionic auxiliaries, pH stick Addition of additives such as salts, acids or bases, flotation, spray drying, spray granulation, or evaporation of the mother liquor at elevated temperatures and / or separated in vacuo and concentration of the solid.
- at least one additional washing step, at least one additional drying step and / or at least one additional calcining step can follow.
- washing is preferably carried out with at least one solvent used in the synthesis.
- step a) if appropriate after at least one washing step, at least one drying step follows, then the furnish solid at temperatures generally in the range of 20 to 120 ° C, preferably in the range of 40 to 100 ° C and more preferably dried in the range of 56 to 60 ° C.
- drying in vacuo the temperatures generally being selectable so that the at least one detergent is at least partially, preferably substantially completely removed from the crystalline porous organometallic framework and at the same time the framework structure is not destroyed.
- the drying time is generally in the range of 0.1 to 15 hours, preferably in the range of 0.2 to 5 hours and more preferably in the range of 0.5 to 1 hour.
- At least one washing step and optionally at least one drying step may be followed by at least one calcination step in step a), in which the temperatures are preferably chosen so that the structure of the framework material is not destroyed.
- reaction intermediate is used without work-up in step (b).
- step b) of the process according to the invention as stated above, either the uninsulated reaction intermediate is reacted with a second organic compound or the intermediate product is separated and preferably reacted in a solvent with the second organic compound.
- This reaction is typically carried out as in classical production processes for porous metal-organic frameworks (ie not electrochemically).
- the reaction in step (b) of the process according to the invention for producing a porous organometallic framework can accordingly be carried out in an aqueous medium. In this case, hydrothermal conditions or general solvothermal conditions can be used.
- thermal is to be understood as meaning a preparation process in which the conversion to the porous organometallic framework according to the invention is carried out in a pressure vessel in such a way that it is closed during the reaction and elevated temperature is applied, so that Vapor pressure of existing solvent, a pressure builds up within the reaction medium in the pressure vessel.
- reaction in step (b) does not occur in an aqueous medium and also not under solvothermal conditions.
- step (b) of the process according to the invention is preferably carried out in the presence of a nonaqueous solvent.
- the reaction in step (b) is preferably carried out at a pressure of at most 2 bar (absolute). However, the pressure is preferably at most 1230 mbar (absolute). Most preferably, the reaction takes place at atmospheric pressure. However, this may result in slight overpressure or underpressure due to the apparatus. Therefore, in the context of the present invention, the term "atmospheric pressure" is to be understood as the pressure range which results from the actual atmospheric pressure of ⁇ 150 mbar.
- the reaction can be carried out at room temperature. Preferably, however, this takes place at temperatures above room temperature.
- the temperature is more than 100 ° C. Further preferably, the temperature is at most 180 ° C, and more preferably at most 150 ° C. Suitable ranges for given temperatures are 0 ° C to 250 ° C, more preferably in the range of 50 ° C to 200 ° C, especially 100 ° C to 150 ° C.
- step (b) of the process according to the invention for producing a porous organometallic framework in water is carried out as a solvent with the addition of another base.
- a solvent for the process according to the invention can be such be chosen that this reacts as such basic, but this does not necessarily have to be for the implementation of the method according to the invention.
- a base can be used. However, it is preferred that no additional base is used.
- reaction can take place with stirring, which is also advantageous in a scale-up.
- the non-aqueous organic solvent is preferably a Ci -6 alkanol, dimethyl sulfoxide (DMSO), N, N-dimethylformamide (DMF), N, N-diethylformamide (DEF), acetonitrile, toluene, dioxane, benzene, Chlorobenzene, methyl ethyl ketone (MEK), pyridine, tetrahydrofuran (THF), ethyl acetate, optionally halogenated Ci_ 2 oo alkane, sulfolane, glycol, N-methylpyrrolidone (NMP), ⁇ -butyrolactone, alicyclic alcohols such as cyclohexanol, ketones, such as acetone or acetylacetone, cycloketones such as cyclohexanone, sulfolene or mixtures thereof.
- DMSO dimethyl sulfoxide
- DMF N-
- a d- 6- alkanol refers to an alcohol having 1 to 6 carbon atoms. Examples of these are methanol, ethanol, n-propanol, i-propanol, n-butanol, i-butanol, t-butanol, pentanol, hexanol and mixtures thereof.
- Ci -2 oo-alkane is an alkane having 1 to 200 carbon atoms in which one or more can be up to all hydrogen atoms substituted by halogen, preferably chlorine or fluorine, in particular chlorine, or replaced can.
- halogen preferably chlorine or fluorine, in particular chlorine, or replaced can. Examples of these are chloroform, dichloromethane, carbon tetrachloride, dichloroethane, hexane, heptane, octane and mixtures thereof.
- Preferred solvents are DMF, DEF and NMP. Particularly preferred is DMF.
- non-aqueous preferably refers to a solvent having a maximum water content of 10% by weight, more preferably 5% by weight, still more preferably 1% by weight, further preferably 0.1% by weight. , particularly preferably 0.01 wt .-% based on the total weight of the solvent does not exceed.
- the maximum water content during the reaction is 10% by weight, more preferably 5% by weight, and still more preferably 1% by weight.
- solvent refers to pure solvents as well as mixtures of different solvents. If solvents are used, it is preferred that the same solvent is used for step (a) and step (b) of the process according to the invention.
- the process step of reacting the at least one metal compound with the at least one at least bidentate organic compound is followed by a calcination step.
- the temperature set here is typically more than 250 ° C, preferably 300 to 400 ° C.
- the at least bidentate organic compound present in the pores can be removed.
- the removal of the at least bidentate organic compound (ligand) from the pores of the porous organometallic framework material can be carried out by treating the resulting framework material with a nonaqueous solvent.
- the ligand is removed in a kind of "extraction process” and optionally replaced in the framework by a solvent molecule. This gentle method is particularly suitable when the ligand is a high-boiling compound.
- the treatment is preferably at least 30 minutes and may typically be carried out for up to 2 days. This can be done at room temperature or elevated temperature. This is preferably carried out at elevated temperature, for example at at least 40 ° C., preferably 60 ° C. Further preferably, the extraction takes place at the boiling point of the solvent used instead (under reflux).
- the treatment can be carried out in a simple boiler by slurrying and stirring the framework material. It is also possible to use extraction apparatuses such as Soxhlet apparatuses, in particular technical extraction apparatuses.
- the above-mentioned can be used, that is, for example, d-6-alkanol, dimethyl sulfoxide (DMSO), N, N-dimethylformamide (DMF), N, N-diethylformamide (DEF), acetonitrile, toluene, dioxane, benzene, chlorobenzene , Methyl ethyl ketone (MEK), pyridine, tetrahydrofuran (THF), ethyl acetate, optionally halogenated d-oo-alkane, sulfolane, glycol, N-methylpyrrolidone (NMP), gamma-butyrolactone, alicyclic alcohols such as cyclohexanol, ketones, such as acetone or Acetyl acetone, cycloketones, such as cyclohexanone or mixtures thereof.
- Preferred are methanol, ethanol,
- a most preferred extraction solvent is methanol.
- the solvent used for the extraction may be the same as or different from that for the reaction of the at least one metal compound with the at least one at least bidentate organic compound. In particular, it is not absolutely necessary in the “extraction” but preferred that the solvent is anhydrous.
- TEDA triethylenediamine
- MTBS Methyltributylammoniummethylsulfat
- 14.5 A are applied at a voltage of 7 to 18 V, thereby dissolving 19 g of copper.
- the experiment is repeated and both discharges combined. 3641.5 g of a TEDA-containing Cu-methylate suspension are obtained.
- the product has a N 2 surface (Langmuir) of 1892 m 2 / g.
- the MOF can be identified as the Cu 2 (terephthalate) 2 (TEDA) structure.
- Example 1 The synthesis of Example 1 is repeated, but 6.1 g of 4,4'-biphenyl dicarboxylic acid are used instead of the terephthalic acid. There are obtained 10.9 g of a light blue powder.
- the product has a N 2 surface (Langmuir) of 2631 m 2 / g.
- the MOF can be identified as a Cu 2 (biphenyldicarboxylate) 2 (TEDA) structure.
- Example 1 The synthesis of Example 1 is repeated, but 4.5 g of aminoterephthalic acid are used instead of terephthalic acid. There are obtained 9.5 g of a powder. The product has a N 2 surface (Langmuir) of 1545 m 2 / g.
- Example 1 The synthesis of Example 1 is repeated, but 2.9 g of 1, 2,3,4-butanetetracarboxylic acid are used instead of the terephthalic acid. There are obtained 7.5 g of a light blue powder.
- an electrolyte consisting of 1802.6 g of methanol, 30.2 g of TE-DA, 17 , 2 g Methyltributylammoniummethylsulfat (MTBS) at 46 ° C recirculated (700 l / h).
- MTBS Methyltributylammoniummethylsulfat
- 14.5 A are applied at a voltage of 8.5 to 20.1 V, thereby dissolving 17.5 g of copper.
- the experiment is repeated and both discharges are united. There are obtained 3664.3 g of a TEDA-containing Cu-methylate suspension.
- the product has a N 2 surface (Langmuir) of 215 m 2 / g.
- Example 5 The synthesis of Example 5 is repeated except that 2.95 g of succinic acid are used instead of the aminoisophthalic acid. There are obtained 7.6 g of a greenish blue powder.
- Example 5 The synthesis of Example 5 is repeated, but instead of the aminoisophthalic acid 4.4 g of cyclohexane-i ⁇ dicarboxylic acid are used. There are obtained 9.3 g of a greenish blue powder. Product has a N 2 surface (Langmuir) of 780 m 2 / g.
- an electrolyte consisting of 1802.6 g of methanol, 30.2 g of TE-DA, 17 , 2 g Methyltributylammoniummethylsulfat (MTBS) at 46 ° C recirculated (700 l / h).
- MTBS Methyltributylammoniummethylsulfat
- 14.5 A are applied at a voltage of 6.7 to 8.6 V, thereby dissolving 16.5 g of copper.
- the experiment is repeated and both discharges combined. There are obtained 3678.8 g of a TEDA-containing Cu-methylate suspension.
- the product has a N 2 surface (Langmuir) of 746 m 2 / g.
- an electrolyte consisting of 1814.3 g of methanol, 18.5 g imidazole, 17 , 2 g Methyltributylammoniummethylsulfat (MTBS) at 44 ° C recirculated (700 l / h).
- MTBS Methyltributylammoniummethylsulfat
- 14.5 A are applied at a voltage of 6.8 to 6.5 V, thereby dissolving 26 g of copper.
- the experiment is repeated and both discharges combined. There are obtained 3662.8 g of a Cu imidazolide-containing Cu-methylate suspension.
- the product has a N 2 surface (Langmuir) of 514 m 2 / g.
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
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Description
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| Application Number | Priority Date | Filing Date | Title |
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| EP07729006A EP2027307B1 (de) | 2006-05-16 | 2007-05-11 | Verfahren zur herstellung von porösen metallorganischen gerüstmaterialien |
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| EP06114002 | 2006-05-16 | ||
| PCT/EP2007/054554 WO2007131948A2 (de) | 2006-05-16 | 2007-05-11 | Verfahren zur herstellung von porösen metallorganischen gerüstmaterialien |
| EP07729006A EP2027307B1 (de) | 2006-05-16 | 2007-05-11 | Verfahren zur herstellung von porösen metallorganischen gerüstmaterialien |
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| EP2027307B1 EP2027307B1 (de) | 2009-11-04 |
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| US (1) | US7879221B2 (de) |
| EP (1) | EP2027307B1 (de) |
| JP (1) | JP2009537695A (de) |
| KR (1) | KR20090031358A (de) |
| CN (1) | CN101473069A (de) |
| AT (1) | ATE447632T1 (de) |
| CA (1) | CA2651948A1 (de) |
| DE (1) | DE502007001918D1 (de) |
| ES (1) | ES2333915T3 (de) |
| MX (1) | MX2008014465A (de) |
| WO (1) | WO2007131948A2 (de) |
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| CN111454464A (zh) * | 2020-06-16 | 2020-07-28 | 湖北大学 | 一种MOFs材料及其制备方法 |
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| CN120138650B (zh) * | 2025-03-21 | 2025-12-12 | 齐鲁工业大学(山东省科学院) | 一种绿色高效电催化水中氢原子转移电化学合成烯烃的方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT324352B (de) | 1972-10-05 | 1975-08-25 | Studiengesellschaft Kohle Mbh | Verfahren zur herstellung von organischen metallverbindungen durch elektrochemische umsetzung von metallen und h-aciden verbindungen |
| US5648508A (en) | 1995-11-22 | 1997-07-15 | Nalco Chemical Company | Crystalline metal-organic microporous materials |
| ATE334992T1 (de) | 2001-04-30 | 2006-08-15 | Univ Michigan | Isoretikuläre organometallische grundstrukturen, verfahren zu deren bildung und systematische entwicklung von deren porengrösse und funktionalität, mit anwendung für die gasspeicherung |
| DE10355087A1 (de) * | 2003-11-24 | 2005-06-09 | Basf Ag | Verfahren zur elektrochemischen Herstellung eines kristallinen porösen metallorganischen Gerüstmaterials |
| DE102005023856A1 (de) | 2005-05-24 | 2006-11-30 | Basf Ag | Verfahren zur Herstellung poröser metall-organischer Gerüstmaterialien |
| CN101443482A (zh) * | 2006-05-16 | 2009-05-27 | 巴斯夫欧洲公司 | 基于吡咯和吡啶酮的多孔金属有机骨架 |
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2007
- 2007-05-11 JP JP2009510420A patent/JP2009537695A/ja not_active Withdrawn
- 2007-05-11 US US12/300,902 patent/US7879221B2/en not_active Expired - Fee Related
- 2007-05-11 MX MX2008014465A patent/MX2008014465A/es unknown
- 2007-05-11 AT AT07729006T patent/ATE447632T1/de active
- 2007-05-11 DE DE502007001918T patent/DE502007001918D1/de active Active
- 2007-05-11 CA CA002651948A patent/CA2651948A1/en not_active Abandoned
- 2007-05-11 WO PCT/EP2007/054554 patent/WO2007131948A2/de not_active Ceased
- 2007-05-11 CN CNA2007800225906A patent/CN101473069A/zh active Pending
- 2007-05-11 ES ES07729006T patent/ES2333915T3/es active Active
- 2007-05-11 EP EP07729006A patent/EP2027307B1/de active Active
- 2007-05-11 KR KR1020087030506A patent/KR20090031358A/ko not_active Withdrawn
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| See references of WO2007131948A2 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111454464A (zh) * | 2020-06-16 | 2020-07-28 | 湖北大学 | 一种MOFs材料及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007131948A2 (de) | 2007-11-22 |
| MX2008014465A (es) | 2008-11-26 |
| CN101473069A (zh) | 2009-07-01 |
| KR20090031358A (ko) | 2009-03-25 |
| ES2333915T3 (es) | 2010-03-02 |
| JP2009537695A (ja) | 2009-10-29 |
| CA2651948A1 (en) | 2007-11-22 |
| ATE447632T1 (de) | 2009-11-15 |
| WO2007131948A3 (de) | 2008-02-07 |
| DE502007001918D1 (de) | 2009-12-17 |
| EP2027307B1 (de) | 2009-11-04 |
| US7879221B2 (en) | 2011-02-01 |
| US20090171107A1 (en) | 2009-07-02 |
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