EP1228668B1 - Strahlungsheizung mit einer hohen infrarot-strahlungsleistung für bearbeitungskammern - Google Patents
Strahlungsheizung mit einer hohen infrarot-strahlungsleistung für bearbeitungskammern Download PDFInfo
- Publication number
- EP1228668B1 EP1228668B1 EP00987096A EP00987096A EP1228668B1 EP 1228668 B1 EP1228668 B1 EP 1228668B1 EP 00987096 A EP00987096 A EP 00987096A EP 00987096 A EP00987096 A EP 00987096A EP 1228668 B1 EP1228668 B1 EP 1228668B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- infrared radiation
- radiant heating
- tube
- quartz glass
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 12
- 230000005855 radiation Effects 0.000 claims abstract description 43
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 6
- 239000010453 quartz Substances 0.000 description 5
- 244000089486 Phragmites australis subsp australis Species 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/42—Heating elements having the shape of rods or tubes non-flexible
- H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/0038—Heating devices using lamps for industrial applications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/032—Heaters specially adapted for heating by radiation heating
Definitions
- the invention relates to a radiant heater with a high Infrared radiation power for processing chambers.
- Such radiant heaters for example, within of processing chambers, e.g. Vacuum chambers, used to in a given working range a required working temperature to create.
- processing chambers e.g. Vacuum chambers
- Such temperatures can in Spotlight range can reach 3,000 ° C, with large area Work areas also a spotlight array for use can come to a uniform over a larger area To reach working temperature.
- US-A-5 551 670 describes a high-intensity infrared heater in which the life of the infrared emitters is thereby to be increased.
- each infrared emitter is arranged in a transparent quartz tube, through which cooling air can be passed.
- copper tubes are provided which extend through the electrical connection contacts of the infrared emitters.
- EP-A-0 848 575 shows a heater with an array of tungsten-halogen lamps, each arranged in a concentric arrangement of quartz, silicon or sapphire tubes.
- one of the tubes is provided with a reflector in the form of a gold coating which partially surrounds the tube.
- US-A-5,196,674 discloses an oven with protection for a heating element disposed in a quartz tube.
- the protection against contact provided here consists of a multiply slotted U-shaped housing made of sheet metal, which surrounds the quartz tube at a distance. The invention is therefore based on the object to realize a vacuum-suitable radiant heating, in which the disadvantages of the prior art are avoided.
- the object underlying the invention is achieved by the use of a radiant heater with a high infrared radiation power, wherein the infrared radiation unit consists of an infrared radiation source, which is disposed within an infrared radiation-transmissive quartz glass tube, wherein the infrared radiation source in the Quartz glass tube is connected to a cooling device which generates an air flow within the quartz glass tube, wherein the infrared radiation source is associated with a radiation reflector and wherein the infrared radiation source is connectable to a source of energy dissolved in a vacuum chamber in which the Quartz glass tube extends into the vacuum processing chamber and penetrates the wall at least one end and wherein the interior of the quartz glass tubes to the atmosphere within the vacuum processing chamber is isolated by the passage of the quartz glass tubes sealed by the wall gas-tight are.
- each infrared radiation source is separately connectable to a power source to a simple adjustment of the radiation power to the respective requirements, eg by switching on the respectively required number of infrared radiation sources.
- the invention makes it possible that the infrared radiation source with any operating voltages, so even at high operating voltages can be operated without the risk of electrical flashovers in the processing chamber would exist.
- the invention makes it possible to achieve particularly high operating temperatures or radiation powers, since the atmosphere inside the tube is completely independent of the atmosphere in the processing chamber.
- the array is arranged within the processing chamber, wherein each tube of the array is guided at least one end through the wall of the processing chamber.
- the end of each tube of the array extending into the processing chamber must be closed.
- these tubes can be connected to a cooling circuit, so that the cooling medium can flow through the tubes.
- the radiant heater according to the invention consists of FIG. 1 an infrared-radiation-permeable tube 1, which extends through a processing chamber 3 extends and its wall 6 at both ends penetrates in a wall opening 4. Within the Pipe 1 is arranged an infrared radiation source 2, the to the atmosphere within the processing chamber 3 is isolated.
- This tube 1 consists of a high temperature resistant Material, preferably of quartz glass.
- a cooling circuit not shown.
- the pipe 1 with a means for generating an air flow within the tube 1 are connected. In this way, long-term high radiation power can be used be driven, without affecting the life the infrared radiation source 2 would be adversely affected.
- the infrared radiation source 1 assign a radiation reflector to a maximum Radiation power towards a work area within reach the processing chamber 3.
- the radiation reflector should work together with the infrared radiation source 2 are arranged in the tube 1 to unwanted thermal effects, or even contamination to avoid the atmosphere in the processing chamber 3, the caused by the material of the radiation reflector could.
- each tube 1 with infrared radiation sources 2 may be separate switchably connected to an energy source. The allows e.g. a simple adjustment of the radiant power to the respective requirements. This will over the entire Emitter area of the array uniform irradiation of the reached irradiating objects.
- a variant is shown, in which the infrared radiation-transmissive Tube 1 only passed through a wall 6 is, wherein the free end of the tube 1 in the processing chamber 3 is closed.
- This variant is less Effort can be realized and offers the same advantages as the Variant in which both ends of the tube 1 through the wall 6 of the processing chamber are guided. Also can be easily realize an array of infrared radiation sources 2, in which all tubes 1 only through a wall 6 of the processing chamber 3 are guided.
Landscapes
- Resistance Heating (AREA)
- Yarns And Mechanical Finishing Of Yarns Or Ropes (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Furnace Details (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Description
In der US-A-5 551 670 wird eine hochintensive Infrarot-Heizvorrichtung beschrieben, bei der die Lebensdauer der Infrarot-Strahler dadurch erhöht werden soll. Um dies zu erreichen, ist jeder Infrarot-Strahler in einem transparenten Quarz-Rohr angeordnet, durch das Kühlluft geleitet werden kann. Zu diesem Zweck sind Kupferröhrchen vorgesehen, die sich durch die elektrischen Anschlusskontakte der Infrarot-Strahler erstrecken. Um den Wirkungsgrad der Infrarot-Strahler nicht negativ zu beeinflussen, wird die Umgebungsluft erst bei Temperaturen über 1.500 °F (793 °C) in die Quarz-Rohre eingeleitet.
Weiterhin zeigt die EP-A-0 848 575 eine Heizvorrichtung mit einem Array von Wolfram-Halogen-Strahlern, die jeweils in einer konzentrischen Anordnung von Quarz-, Silizium- oder Saphir-Rohren angeordnet sind. Um die erzeugte Strahlung zu konzentrieren und in eine Vorzugsrichtung auszurichten, sind ist eines der Rohre mit einem Reflektor in Form von einer Goldbeschichtung versehen, die das Rohr teilweise umgibt. Schließlich wird in der US-A-5 196 674 ein Ofen mit einem Schutz für ein Heizelement beschrieben, das in einem Quarz-Rohr angeordnet ist. Der hier vorgesehene Schutz gegen Berührung besteht aus einem mehrfach geschlitzten u-förmigen Gehäuse aus Blech, welches das Quarz-Rohr in einem Abstand umgibt.
Der Erfindung liegt daher die Aufgabe zugrunde, eine vakuumtaugliche Strahlungsheizung zu realisieren, bei der die aufgezeigten Nachteile des Standes der Technik vermieden werden.
Durch die Erfindung wird ermöglicht, dass die Infrarot-Strahlungsquelle mit beliebigen Betriebsspannungen, also auch bei hohen Betriebsspannungen betrieben werden kann, ohne dass die Gefahr von elektrischen Überschlägen in der Bearbeitungskammer bestehen würde. Darüber hinaus ermöglicht die Erfindung das Erreichen besonders hoher Arbeitstemperaturen bzw. Strahlungsleistungen, da die Atmosphäre innerhalb des Rohres völlig unabhängig von der Atmosphäre in der Bearbeitungskammer ist.
Um dies realisieren zu können, ist das Array innerhalb der Bearbeitungskammer angeordnet, wobei jedes Rohr des Arrays wenigstens mit einem Ende durch die Wandung der Bearbeitungskammer geführt ist. In diesem Fall muss dann natürlich das sich in die Bearbeitungskammer erstreckende Ende jedes Rohres des Arrays verschlossen sein. Im Falle dass sich die Rohre des Arrays durch beidends durch die Wandung der Bearbeitungskammer erstrecken, können diese Rohre mit einem Kühlkreislauf verbunden werden, so dass das Kühlmedium durch die Rohre strömen kann.
- Fig. 1
- eine erfindungsgemäße Strahlungsheizung, bei der sich das infrarot-strahlungsdurchlässige Rohr durch beide gegenüberliegenden Wandungen der Bearbeitungskammer erstreckt; und
- Fig. 2
- eine Variante, bei der das infrarot-strahlungsdurchlässige Rohr nur durch eine Wandung geführt ist und das freie Ende des Rohres in der Bearbeitungskammer verschlossen ist.
- 1
- Rohr
- 2
- Infrarot-Strahlungsquelle
- 3
- Bearbeitungskammer
- 4
- Wanddurchbruch
- 5
- Verschluß
- 6
- Wand
- 7
- Dichtung
Claims (3)
- Verwendung einer Strahlungsheizung mit einer hohen Infrarot-Strahlungsleistung, bei der die Infrarot-Strahlungseinheit aus einer Infrarot-Strahlungsquelle (2) besteht, die innerhalb eines infrarot-strahlungsdurchlässigen Quarzglas-Rohres (1) angeordnet ist, wobei die Infrarot-Strahlungsquelle in dem Quarzglas-Rohr (1) mit einer Kühleinrichtung verbunden ist, die innerhalb des Quarzglas-Rohres (1) einen Luftstrom erzeugt, wobei der Infrarot-Strahlungsquelle (2) ein Strahlungsreflektor zugeordnet ist und wobei die Infrarot-Strahlungsquelle (2) mit einer Energiequelle verbindbar ist in einer Vakuum-Kammer bei der sich das Quarzglas-Rohr (1) in die Vakuum-Bearbeitungskammer (3) erstreckt und deren Wand (6) zumindest mit einem Ende durchdringt und wobei der Innenraum der Quarzglas-Rohre (1) gegenüber der Atmosphäre innerhalb der Vakuum-Bearbeitungskammer (3) isoliert ist, indem die Durchgänge der Quarzglas-Rohre (1) durch die Wand (6) gasdicht abgedichtet sind.
- Verwendung einer Strahlungsheizung nach Anspruch 1 mit einem Array von Infrarot-Strahlungseinheiten mit Infrarot-Strahlungsquellen (2).
- Verwendung einer Strahlungsheizung nach Anspruch 2 bei der jede Infrarot-Strahlungsquelle (2) separat mit einer Energiequelle verbindbar ist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DK00987096T DK1228668T3 (da) | 1999-11-09 | 2000-11-08 | Strålingsopvarmning ved hjælp af en höj infraröd strålingseffekt til bearbejdningskamre |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE29919685 | 1999-11-09 | ||
| DE29919685U | 1999-11-09 | ||
| PCT/DE2000/003908 WO2001035699A1 (de) | 1999-11-09 | 2000-11-08 | Strahlungsheizung mit einer hohen infrarot-strahlungsleistung für bearbeitungskammern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1228668A1 EP1228668A1 (de) | 2002-08-07 |
| EP1228668B1 true EP1228668B1 (de) | 2005-02-09 |
Family
ID=8081389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00987096A Revoked EP1228668B1 (de) | 1999-11-09 | 2000-11-08 | Strahlungsheizung mit einer hohen infrarot-strahlungsleistung für bearbeitungskammern |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7067770B1 (de) |
| EP (1) | EP1228668B1 (de) |
| AT (1) | ATE289154T1 (de) |
| AU (1) | AU2348301A (de) |
| DE (1) | DE50009507D1 (de) |
| ES (1) | ES2237483T3 (de) |
| WO (1) | WO2001035699A1 (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008063677A1 (de) | 2008-12-19 | 2010-07-08 | Heraeus Noblelight Gmbh | Infrarotstrahler-Anordnung für Hochtemperatur-Vakuumprozesse |
| DE102010064141A1 (de) * | 2010-12-23 | 2012-06-28 | Von Ardenne Anlagentechnik Gmbh | Heizeinrichtung für Substratbehandlungsanlagen und Substratbehandlungsanlage |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007048564A1 (de) | 2007-10-09 | 2009-04-23 | Heraeus Noblelight Gmbh | Vorrichtung für eine Bestrahlungseinheit |
| TWM413957U (en) * | 2010-10-27 | 2011-10-11 | Tangteck Equipment Inc | Diffusion furnace apparatus |
| DE102011081749B4 (de) * | 2011-04-29 | 2016-04-14 | Von Ardenne Gmbh | Substratbehandlungsanlage |
| UA111631C2 (uk) * | 2011-10-06 | 2016-05-25 | Санофі Пастер Са | Нагрівальний пристрій для роторної барабанної ліофільної сушарки |
| KR20140116969A (ko) * | 2012-02-09 | 2014-10-06 | 잘트 에너지 엘엘씨 | 램프 조립체 |
| DE102015102665A1 (de) | 2015-02-25 | 2016-08-25 | Heraeus Noblelight Gmbh | Bestrahlungsvorrichtung zur Einkopplung von Infrarot-Strahlung in eine Vakuum-Prozesskammer mit einem einseitig gesockelten Infrarotstrahler |
| KR102244854B1 (ko) * | 2020-08-13 | 2021-04-27 | 주식회사 세원전자 | 열수축 튜브에 대한 차별적 가열이 가능한 가열장치 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1515086A (en) * | 1975-05-22 | 1978-06-21 | Sun Chemical Corp | Ultraviolet lamp assembly |
| GB2136937A (en) * | 1983-03-18 | 1984-09-26 | Philips Electronic Associated | A furnace for rapidly heating semiconductor bodies |
| US5551670A (en) | 1990-10-16 | 1996-09-03 | Bgk Finishing Systems, Inc. | High intensity infrared heat treating apparatus |
| FR2671859B1 (fr) | 1991-01-17 | 1999-01-22 | Moulinex Sa | Appareil de cuisson, par exemple four comportant un protecteur pour un element chauffant electrique. |
| US5951896A (en) | 1996-12-04 | 1999-09-14 | Micro C Technologies, Inc. | Rapid thermal processing heater technology and method of use |
| US6600138B2 (en) * | 2001-04-17 | 2003-07-29 | Mattson Technology, Inc. | Rapid thermal processing system for integrated circuits |
-
2000
- 2000-11-08 DE DE50009507T patent/DE50009507D1/de not_active Expired - Fee Related
- 2000-11-08 ES ES00987096T patent/ES2237483T3/es not_active Expired - Lifetime
- 2000-11-08 AT AT00987096T patent/ATE289154T1/de not_active IP Right Cessation
- 2000-11-08 WO PCT/DE2000/003908 patent/WO2001035699A1/de not_active Ceased
- 2000-11-08 AU AU23483/01A patent/AU2348301A/en not_active Abandoned
- 2000-11-08 EP EP00987096A patent/EP1228668B1/de not_active Revoked
- 2000-11-08 US US10/129,340 patent/US7067770B1/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008063677A1 (de) | 2008-12-19 | 2010-07-08 | Heraeus Noblelight Gmbh | Infrarotstrahler-Anordnung für Hochtemperatur-Vakuumprozesse |
| DE102008063677B4 (de) * | 2008-12-19 | 2012-10-04 | Heraeus Noblelight Gmbh | Infrarotstrahler und Verwendung des Infrarotstrahlers in einer Prozesskammer |
| DE102010064141A1 (de) * | 2010-12-23 | 2012-06-28 | Von Ardenne Anlagentechnik Gmbh | Heizeinrichtung für Substratbehandlungsanlagen und Substratbehandlungsanlage |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2348301A (en) | 2001-06-06 |
| ATE289154T1 (de) | 2005-02-15 |
| US7067770B1 (en) | 2006-06-27 |
| DE50009507D1 (de) | 2005-03-17 |
| ES2237483T3 (es) | 2005-08-01 |
| WO2001035699A1 (de) | 2001-05-17 |
| EP1228668A1 (de) | 2002-08-07 |
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