EP1228668B1 - Chauffage par rayonnement a haut pouvoir de rayonnement infrarouge destine a des chambres de traitement - Google Patents

Chauffage par rayonnement a haut pouvoir de rayonnement infrarouge destine a des chambres de traitement Download PDF

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Publication number
EP1228668B1
EP1228668B1 EP00987096A EP00987096A EP1228668B1 EP 1228668 B1 EP1228668 B1 EP 1228668B1 EP 00987096 A EP00987096 A EP 00987096A EP 00987096 A EP00987096 A EP 00987096A EP 1228668 B1 EP1228668 B1 EP 1228668B1
Authority
EP
European Patent Office
Prior art keywords
infrared radiation
radiant heating
tube
quartz glass
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
EP00987096A
Other languages
German (de)
English (en)
Other versions
EP1228668A1 (fr
Inventor
Hans-Peter VÖLK
Johann Georg Reichart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centrotherm Thermal Solutions GmbH and Co KG
Original Assignee
Centrotherm Elektrische Anlagen GmbH and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8081389&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP1228668(B1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Centrotherm Elektrische Anlagen GmbH and Co filed Critical Centrotherm Elektrische Anlagen GmbH and Co
Priority to DK00987096T priority Critical patent/DK1228668T3/da
Publication of EP1228668A1 publication Critical patent/EP1228668A1/fr
Application granted granted Critical
Publication of EP1228668B1 publication Critical patent/EP1228668B1/fr
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/42—Heating elements having the shape of rods or tubes non-flexible
    • H05B3/44—Heating elements having the shape of rods or tubes non-flexible heating conductor arranged within rods or tubes of insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating

Definitions

  • the invention relates to a radiant heater with a high Infrared radiation power for processing chambers.
  • Such radiant heaters for example, within of processing chambers, e.g. Vacuum chambers, used to in a given working range a required working temperature to create.
  • processing chambers e.g. Vacuum chambers
  • Such temperatures can in Spotlight range can reach 3,000 ° C, with large area Work areas also a spotlight array for use can come to a uniform over a larger area To reach working temperature.
  • US-A-5 551 670 describes a high-intensity infrared heater in which the life of the infrared emitters is thereby to be increased.
  • each infrared emitter is arranged in a transparent quartz tube, through which cooling air can be passed.
  • copper tubes are provided which extend through the electrical connection contacts of the infrared emitters.
  • EP-A-0 848 575 shows a heater with an array of tungsten-halogen lamps, each arranged in a concentric arrangement of quartz, silicon or sapphire tubes.
  • one of the tubes is provided with a reflector in the form of a gold coating which partially surrounds the tube.
  • US-A-5,196,674 discloses an oven with protection for a heating element disposed in a quartz tube.
  • the protection against contact provided here consists of a multiply slotted U-shaped housing made of sheet metal, which surrounds the quartz tube at a distance. The invention is therefore based on the object to realize a vacuum-suitable radiant heating, in which the disadvantages of the prior art are avoided.
  • the object underlying the invention is achieved by the use of a radiant heater with a high infrared radiation power, wherein the infrared radiation unit consists of an infrared radiation source, which is disposed within an infrared radiation-transmissive quartz glass tube, wherein the infrared radiation source in the Quartz glass tube is connected to a cooling device which generates an air flow within the quartz glass tube, wherein the infrared radiation source is associated with a radiation reflector and wherein the infrared radiation source is connectable to a source of energy dissolved in a vacuum chamber in which the Quartz glass tube extends into the vacuum processing chamber and penetrates the wall at least one end and wherein the interior of the quartz glass tubes to the atmosphere within the vacuum processing chamber is isolated by the passage of the quartz glass tubes sealed by the wall gas-tight are.
  • each infrared radiation source is separately connectable to a power source to a simple adjustment of the radiation power to the respective requirements, eg by switching on the respectively required number of infrared radiation sources.
  • the invention makes it possible that the infrared radiation source with any operating voltages, so even at high operating voltages can be operated without the risk of electrical flashovers in the processing chamber would exist.
  • the invention makes it possible to achieve particularly high operating temperatures or radiation powers, since the atmosphere inside the tube is completely independent of the atmosphere in the processing chamber.
  • the array is arranged within the processing chamber, wherein each tube of the array is guided at least one end through the wall of the processing chamber.
  • the end of each tube of the array extending into the processing chamber must be closed.
  • these tubes can be connected to a cooling circuit, so that the cooling medium can flow through the tubes.
  • the radiant heater according to the invention consists of FIG. 1 an infrared-radiation-permeable tube 1, which extends through a processing chamber 3 extends and its wall 6 at both ends penetrates in a wall opening 4. Within the Pipe 1 is arranged an infrared radiation source 2, the to the atmosphere within the processing chamber 3 is isolated.
  • This tube 1 consists of a high temperature resistant Material, preferably of quartz glass.
  • a cooling circuit not shown.
  • the pipe 1 with a means for generating an air flow within the tube 1 are connected. In this way, long-term high radiation power can be used be driven, without affecting the life the infrared radiation source 2 would be adversely affected.
  • the infrared radiation source 1 assign a radiation reflector to a maximum Radiation power towards a work area within reach the processing chamber 3.
  • the radiation reflector should work together with the infrared radiation source 2 are arranged in the tube 1 to unwanted thermal effects, or even contamination to avoid the atmosphere in the processing chamber 3, the caused by the material of the radiation reflector could.
  • each tube 1 with infrared radiation sources 2 may be separate switchably connected to an energy source. The allows e.g. a simple adjustment of the radiant power to the respective requirements. This will over the entire Emitter area of the array uniform irradiation of the reached irradiating objects.
  • a variant is shown, in which the infrared radiation-transmissive Tube 1 only passed through a wall 6 is, wherein the free end of the tube 1 in the processing chamber 3 is closed.
  • This variant is less Effort can be realized and offers the same advantages as the Variant in which both ends of the tube 1 through the wall 6 of the processing chamber are guided. Also can be easily realize an array of infrared radiation sources 2, in which all tubes 1 only through a wall 6 of the processing chamber 3 are guided.

Landscapes

  • Resistance Heating (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Furnace Details (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
  • Yarns And Mechanical Finishing Of Yarns Or Ropes (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)

Claims (3)

  1. Utilisation d'un chauffage radiant, à rayonnement infrarouge de grande puissance, dans lequel l'unité à rayonnement infrarouge se compose d'une source de rayonnement infrarouge (2) disposée à l'intérieur d'un tube en verre de quartz (1) laissant passer le rayonnement infrarouge, sachant que la source de rayonnement infrarouge dans le tube en verre de quartz (1) est reliée à un dispositif de refroidissement qui génère un flux d'air à l'intérieur du tube en verre de quartz (1), sachant qu'à la source de rayonnement infrarouge (2) est affecté un réflecteur de rayonnement et que la source de rayonnement infrarouge (2) est reliable à un source d'énergie dans une chambre sous vide dans laquelle le tube en verre de quartz (1) s'étend dans la chambre de traitement sous vide (3) et traverse sa paroi (6) au moins par une extrémité et sachant que le compartiment l'intérieur du tube en verre de quartz (1) est isolé du contact avec l'atmosphère à l'intérieur de la chambre de traitement sous vide (3) du fait que les orifices de passage du tube en verre de quartz (1) à travers la paroi (6) sont étanchés hermétiques aux gaz.
  2. Utilisation d'un chauffage radiant selon la revendication 1, comprenant une batterie d'unités à rayonnement infrarouge avec sources de rayonnement infrarouge (2).
  3. Utilisation d'un chauffage radiant selon la revendication 2, dans laquelle chaque source de rayonnement infrarouge (2) est reliable séparément avec une source d'énergie.
EP00987096A 1999-11-09 2000-11-08 Chauffage par rayonnement a haut pouvoir de rayonnement infrarouge destine a des chambres de traitement Revoked EP1228668B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DK00987096T DK1228668T3 (da) 1999-11-09 2000-11-08 Strålingsopvarmning ved hjælp af en höj infraröd strålingseffekt til bearbejdningskamre

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE29919685U 1999-11-09
DE29919685 1999-11-09
PCT/DE2000/003908 WO2001035699A1 (fr) 1999-11-09 2000-11-08 Chauffage par rayonnement a haut pouvoir de rayonnement infrarouge destine a des chambres de traitement

Publications (2)

Publication Number Publication Date
EP1228668A1 EP1228668A1 (fr) 2002-08-07
EP1228668B1 true EP1228668B1 (fr) 2005-02-09

Family

ID=8081389

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00987096A Revoked EP1228668B1 (fr) 1999-11-09 2000-11-08 Chauffage par rayonnement a haut pouvoir de rayonnement infrarouge destine a des chambres de traitement

Country Status (7)

Country Link
US (1) US7067770B1 (fr)
EP (1) EP1228668B1 (fr)
AT (1) ATE289154T1 (fr)
AU (1) AU2348301A (fr)
DE (1) DE50009507D1 (fr)
ES (1) ES2237483T3 (fr)
WO (1) WO2001035699A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008063677A1 (de) 2008-12-19 2010-07-08 Heraeus Noblelight Gmbh Infrarotstrahler-Anordnung für Hochtemperatur-Vakuumprozesse
DE102010064141A1 (de) * 2010-12-23 2012-06-28 Von Ardenne Anlagentechnik Gmbh Heizeinrichtung für Substratbehandlungsanlagen und Substratbehandlungsanlage

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007048564A1 (de) * 2007-10-09 2009-04-23 Heraeus Noblelight Gmbh Vorrichtung für eine Bestrahlungseinheit
TWM413957U (en) * 2010-10-27 2011-10-11 Tangteck Equipment Inc Diffusion furnace apparatus
DE102011081749B4 (de) 2011-04-29 2016-04-14 Von Ardenne Gmbh Substratbehandlungsanlage
UA111631C2 (uk) * 2011-10-06 2016-05-25 Санофі Пастер Са Нагрівальний пристрій для роторної барабанної ліофільної сушарки
US20130208459A1 (en) * 2012-02-09 2013-08-15 Bryan L. Ackerman Lamp assembly
DE102015102665A1 (de) 2015-02-25 2016-08-25 Heraeus Noblelight Gmbh Bestrahlungsvorrichtung zur Einkopplung von Infrarot-Strahlung in eine Vakuum-Prozesskammer mit einem einseitig gesockelten Infrarotstrahler
KR102244854B1 (ko) * 2020-08-13 2021-04-27 주식회사 세원전자 열수축 튜브에 대한 차별적 가열이 가능한 가열장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1515086A (en) * 1975-05-22 1978-06-21 Sun Chemical Corp Ultraviolet lamp assembly
GB2136937A (en) * 1983-03-18 1984-09-26 Philips Electronic Associated A furnace for rapidly heating semiconductor bodies
US5551670A (en) 1990-10-16 1996-09-03 Bgk Finishing Systems, Inc. High intensity infrared heat treating apparatus
FR2671859B1 (fr) 1991-01-17 1999-01-22 Moulinex Sa Appareil de cuisson, par exemple four comportant un protecteur pour un element chauffant electrique.
US5951896A (en) * 1996-12-04 1999-09-14 Micro C Technologies, Inc. Rapid thermal processing heater technology and method of use
US6600138B2 (en) * 2001-04-17 2003-07-29 Mattson Technology, Inc. Rapid thermal processing system for integrated circuits

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008063677A1 (de) 2008-12-19 2010-07-08 Heraeus Noblelight Gmbh Infrarotstrahler-Anordnung für Hochtemperatur-Vakuumprozesse
DE102008063677B4 (de) * 2008-12-19 2012-10-04 Heraeus Noblelight Gmbh Infrarotstrahler und Verwendung des Infrarotstrahlers in einer Prozesskammer
DE102010064141A1 (de) * 2010-12-23 2012-06-28 Von Ardenne Anlagentechnik Gmbh Heizeinrichtung für Substratbehandlungsanlagen und Substratbehandlungsanlage

Also Published As

Publication number Publication date
US7067770B1 (en) 2006-06-27
DE50009507D1 (de) 2005-03-17
ATE289154T1 (de) 2005-02-15
AU2348301A (en) 2001-06-06
EP1228668A1 (fr) 2002-08-07
WO2001035699A1 (fr) 2001-05-17
ES2237483T3 (es) 2005-08-01

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