EP1125005A1 - Cathode utilisable pour l'electrolyse de solutions aqueuses - Google Patents
Cathode utilisable pour l'electrolyse de solutions aqueusesInfo
- Publication number
- EP1125005A1 EP1125005A1 EP00958706A EP00958706A EP1125005A1 EP 1125005 A1 EP1125005 A1 EP 1125005A1 EP 00958706 A EP00958706 A EP 00958706A EP 00958706 A EP00958706 A EP 00958706A EP 1125005 A1 EP1125005 A1 EP 1125005A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- titanium
- cathode according
- cathode
- precious metal
- zirconium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007864 aqueous solution Substances 0.000 title claims abstract description 11
- 239000010936 titanium Substances 0.000 claims abstract description 43
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 239000010970 precious metal Substances 0.000 claims abstract description 24
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 18
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 10
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 9
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 9
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 8
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 6
- 239000000956 alloy Substances 0.000 claims abstract description 6
- 229910052742 iron Inorganic materials 0.000 claims abstract description 6
- 229910001514 alkali metal chloride Inorganic materials 0.000 claims abstract description 5
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 229910052707 ruthenium Inorganic materials 0.000 claims description 13
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- 150000002739 metals Chemical group 0.000 claims description 7
- 230000000737 periodic effect Effects 0.000 claims description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 229910052697 platinum Inorganic materials 0.000 claims description 5
- -1 nobium Chemical compound 0.000 claims description 4
- 229910052762 osmium Inorganic materials 0.000 claims description 4
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical class [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 3
- 239000011780 sodium chloride Substances 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000243 solution Substances 0.000 abstract description 33
- 229910052758 niobium Inorganic materials 0.000 abstract description 2
- 239000010955 niobium Substances 0.000 abstract description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 10
- 238000001354 calcination Methods 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 150000003839 salts Chemical class 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 150000001805 chlorine compounds Chemical class 0.000 description 4
- 229910052500 inorganic mineral Inorganic materials 0.000 description 4
- 239000011707 mineral Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 229910001902 chlorine oxide Inorganic materials 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000010431 corundum Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical class [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical class Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical group Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- XFVGXQSSXWIWIO-UHFFFAOYSA-N chloro hypochlorite;titanium Chemical class [Ti].ClOCl XFVGXQSSXWIWIO-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- WGRULTCAYDOGQK-UHFFFAOYSA-M sodium;sodium;hydroxide Chemical compound [OH-].[Na].[Na+] WGRULTCAYDOGQK-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
- C25B11/063—Valve metal, e.g. titanium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Definitions
- the present invention relates to a cathode which can be used for the electrolysis of aqueous solutions in which a water reduction reaction takes place.
- the present invention relates to an activated cathode usable for the electrolysis of aqueous alkaline solutions of alkali metal chlorides, and very particularly for the preparation of chlorine and sodium hydroxide.
- electrolytic cells each of them comprising several mild steel cathodes and several titanium anodes coated with a mixture of titanium and ruthenium oxides. They are generally supplied with an electrolytic solution consisting of approximately 200 to 300 g / l of sodium chloride.
- overvoltage is meant the difference between the thermodynamic potential of the redox couple concerned (H 2 0 / H 2 ) relative to a reference cathode and the potential actually measured in the medium concerned, compared to the same reference electrode.
- overvoltage will be used to denote the absolute value of the cathodic overvoltage.
- a cathode is described, the substrate of which is a plate of titanium, zirconium, niobium or an alloy essentially constituted by an association of these metals and on which a layer of metal oxide, essentially consisting of an oxide of one or more metals chosen from ruthenium, rhodium, palladium, osmium, iridium and platinum and optionally an oxide of one or more metals chosen from calcium , magnesium, strontium, barium, zinc, chromium, molybdenum, tungsten, selenium and tellurium.
- US Patent US 4,100,049 describes a cathode comprising a substrate made of iron, nickel, cobalt or an alloy of these metals and a coating of palladium oxide and zirconium oxide.
- a cathode consisting of an electrically conductive substrate of nickel, stainless steel or mild steel carrying a coating consisting of a plurality of layers of metal oxides, the surface layer consisting by a valve metal oxide, that is to say a metal chosen from groups 4b, 5b and 6b of the periodic table of the elements and the intermediate layer being constituted by a precious metal oxide from group VIII, it is ie ruthenium, rhodium, palladium, osmium, iridium and platinum.
- the intermediate and surface layers can be formed by the oxide of the only metal concerned or by a mixed oxide of the metal concerned and the second metal in small proportion.
- cathodes Although these cathodes have a satisfactory overvoltage, the applicant noted during the evaluation of said cathodes a modification of the polarization curve after the first scan showing a damage to the surface layer, which is detrimental for good protection of the substrate and therefore results in a limited lifetime of said electrodes.
- a cathode making it possible to reduce the overvoltage of the reaction for reducing water in an alkaline medium, characterized in that it is constituted by an electroconductive substrate coated with an intermediate layer of titanium-based oxides and a precious metal from group VIII of the periodic table of the elements and an outer layer of metal oxides comprising titanium, zirconium and a precious metal from group VIII of the periodic table of the elements.
- precious metal of group VIII of the periodic table of the elements is currently meant ruthenium, rhodium, palladium, osmium, iridium or platinum.
- ruthenium or iridium will be used and very particularly ruthenium.
- the intermediate layer contains oxides of titanium and ruthenium.
- the outer layer of metal oxides contains oxides of titanium, zirconium and ruthenium.
- the outer layer consists essentially of ZrTiO 4 accompanied by RuO 2 and possibly ZrO 2 and / or TiO 2 .
- the material constituting the substrate can be chosen from electrically conductive materials. It will advantageously be chosen from the group consisting of titanium, nickel, tantalum, zirconium, nobium, iron and their alloys.
- titanium, nickel, iron or their alloys will be used.
- the precious metal / titanium molar ratio in the intermediate layer is preferably between 0.4 and 2.4.
- the zirconium / titanium molar ratio in the outer layer is generally between 0.25 and 9 and, preferably, between 0.5 and 2.
- the precious metal in the outer layer is at least equal to 10 mol%, preferably between 30% and 50 mol% relative to the metals used in the composition of this layer.
- the cathode according to the present invention can be prepared according to a method which consists in carrying out the following steps: a) pretreatment of a substrate to impart roughness characteristics to the surface, b) coating of the pretreated substrate using a solution A essentially containing titanium and a precious metal, followed by drying, then calcination of the substrate thus coated, c) coating of the substrate obtained in (b) using a solution B comprising titanium, zirconium and a metal valuable, followed by drying, and the calcination of the substrate thus coated.
- the pretreatment generally consists in subjecting the substrate, either to a sandblasting followed optionally by an acid washing, or to a pickling using an aqueous solution of oxalic acid, hydrofluoric acid, a mixture of hydrofluoric acid and nitric acid, a mixture of hydrofluoric acid and glycerol, a mixture of hydrofluoric acid, nitric acid and glycerol or a mixture of hydrofluoric acid, nitric acid and hydrogen peroxide, followed by one or more washing (s) with degassed demineralized water.
- the substrate may be in the form of a solid plate, perforated plate, expanded metal or cathode basket made from the expanded or perforated metal.
- Solution A is generally prepared by bringing into contact at room temperature and with stirring, essentially a mineral or organic salt of titanium and a precious metal with water or in an organic solvent, optionally in the presence of an agent. chelating. The temperature can be raised above the ambient to facilitate the dissolution of the salts.
- a mineral or organic salt of titanium and a precious metal is brought into contact with water or in an organic solvent, optionally in the presence of a chelating agent. Titanium and the precious metal are preferably present in solution A at a concentration at most equal to 10 mole / l.
- Solution B is generally prepared by bringing into contact, at room temperature and with stirring, a mineral or organic salt of titanium, zirconium and a precious metal with water or in an organic solvent, optionally in the presence of 'a chelating agent.
- a mineral or organic salt of titanium, zirconium and a precious metal with water or in an organic solvent, optionally in the presence of 'a chelating agent.
- an ice bath is used to cool the reaction medium.
- a mineral or organic salt of titanium, zirconium and a precious metal is brought into contact with water or in an organic solvent, optionally in the presence of a chelating agent.
- the preferred titanium and precious metal salts are chlorides, oxychlorides, nitrates, oxynitrates, sulfates and alkoxides.
- the precious metal chlorides, ruthenium chlorides, titanium chlorides and titanium oxychlorides are used.
- zirconium salts there can be used chlorides, sulfates, zirconyl chloride, zirconyl nitrate, alkoxides such as butyl zirconate.
- Zirconium and zirconyl chlorides are particularly preferred.
- organic solvent there may be mentioned light alcohols, preferably isopropanol and ethanol, and better still isopropanol and absolute ethanol.
- Titanium and zirconium are generally present in solution B at a concentration ranging from 0.5 to 5 mol / l.
- concentration of precious metal in solution B is generally between 0.05 and 10 mole / l and preferably between 0.1 and 5 mole / l.
- Solution A can be deposited on the pretreated substrate using different techniques such as sol-gel, electrochemical deposition, galvanic plating, spraying or coating.
- the pretreated substrate is coated with solution A, for example using a brush.
- the substrate thus coated is then dried in air and / or in an oven at a temperature below 150 ° C.
- the substrate is calcined in air or in inert gases such as nitrogen, argon or else in inert gases enriched with oxygen at a temperature at least equal to 300 ° C. and preferably between 450 ° C and 550 ° C for a period ranging from 10 minutes to 2 hours.
- step (c) of the process the same deposition techniques can be used as well as the same operating conditions for drying and calcination as step (b) except that the deposition is carried out with solution B.
- Other techniques such as chemical vapor deposition
- CVD chemical vapor deposition
- PVD physical vapor deposition
- plasma spraying are also suitable for coating the pretreated substrate with an intermediate layer and an outer layer.
- Solution A can be deposited both on one side of the pretreated substrate and on both sides. It is also possible to deposit solution B on the two faces of the substrate coated with the intermediate layer.
- step (b) of the process can be repeated several times.
- step (c) of the process can be repeated several times.
- the mass of product deposited is at least equal to 2 g / m 2 , generally between 10 g / m 2 and 60 g / m 2 and, preferably, between 20 g / m 2 and 35 g / m 2 related to the geometric surface of the substrate.
- concentration of solution A is judiciously chosen so that this preferred deposited mass can be obtained by repeating step (b) a reasonable number of times and preferably between 1 and 10 times.
- the mass of product deposited is at least equal to 5 g / m 2 , generally between 5 g / m 2 and 70 g / m 2 and, preferably, between 25 g / m 2 and 50 g / m 2 , related to the geometric surface of the substrate.
- solution B is prepared so that its concentration makes it possible to obtain a preferred deposited mass by repeating step (c) at least 1 time and preferably between 2 and 10 times.
- the cathode of the present invention is particularly suitable for the electrolysis of aqueous solutions of alkali metal chlorides and in particular aqueous solutions of NaCl. The use of the cathode in combination with an anode makes it possible to electrolytically synthesize the chlorine and the hydroxide of an alkali metal with a high Faraday yield.
- DSA Dissionally Stable Anode
- anodes consisting of a titanium substrate coated with a layer of titanium and ruthenium oxides.
- the ruthenium / titanium molar ratio in this layer is advantageously between 0.4 and 2.4.
- the cathode of the present invention has the advantage of having a lower overvoltage than the cathodes of the prior art during operation in electrolysis.
- the cathode of the present invention does not undergo modification from the first characterization cycles and exhibits greater chemical stability with respect to aggressive alkaline media.
- the following examples illustrate the invention without limiting it. EXAMPLES 1. PREPARATION OF A CATHODE (according to the invention)
- a titanium plate 2 mm thick and 4 cm ⁇ 1 cm in size is sanded with corundum particles, to which a round rod for supplying current has been welded.
- a solution A is then prepared, containing ruthenium and titanium in an equimolar amount, by mixing at room temperature with stirring 2.45 g of RuCl 3 , of purity greater than or equal to 98%,
- the end of one of the faces of the pretreated plate is then coated with solution A using a brush, then it is left to air dry for 30 minutes. free and at room temperature.
- the coated plate is then dried additionally in an oven at 120 ° C for 30 minutes, then calcined in an oven in air at 500 ° C for 30 minutes.
- zirconium chloride or oxychloride, ruthenium chloride and titanium chloride or oxychloride are mixed with stirring with absolute ethanol.
- solution B is prepared cold and kept cold by a water / ice bath, with stirring, until use.
- solution B is prepared at 60 ° C and maintained at this temperature, with stirring, until its use.
- the coated plate is then coated in 1.1, with solution B using a brush.
- the coated plate is first dried
- polarization curve is meant the curve of variation of the cathode potential measured with respect to a reference electrode, for example a saturated calomel electrode (DHW), as a function of the current density.
- a reference electrode for example a saturated calomel electrode (DHW)
- the experimental setup consists of the cathode to be evaluated, a platinum counter electrode (surface 5 cm 2 ) and a DHW reference electrode elongated by a capillary, which is placed in the immediate vicinity of the cathode.
- Solution B is prepared by mixing, with stirring, in a glass bottle 1.07 g of RuCI 3 , 2.59 g of ZrOCI 2 , 8H 2 O, 1.55 ml of TiOCI 2 , 2HCI in 7 ml of absolute ethanol , or an overall molar composition of 0.3 Ru-0.7 (Ti, 2Zr).
- the plate coated with the intermediate layer is then coated with solution B thus prepared, then it is dried and calcined in air as indicated in the general procedure. These operations are repeated 8 times and at the end of the last calcination, the deposited mass is 39 g / m 2 related to the geometric surface of the plate.
- the cathode thus prepared was evaluated using the procedure described above.
- the cathodic potential is -1.375 V / DHW for a current density of -2 kA / m 2 .
- Solution B is prepared by mixing, with stirring, in a glass flask 2.49 g RuCI 3 , 2.59 g of ZrOCI 2 , 8H 2 O, 1.55 ml of TiOCI 2 , 2HCI in 10 ml of absolute ethanol or an overall molar composition of 0.5 Ru-0.5 (Ti, 2Zr).
- the plate coated with the intermediate layer is then coated with solution B thus prepared, then it is dried and calcined in air as indicated in the general procedure. These operations are repeated 8 times and at the end of the last calcination, the external deposited mass is 41 g / m 2 relative to the geometric surface of the plate.
- the cathode thus prepared was evaluated using the procedure described above.
- the cathodic potential is -1.195 V / DHW for a current density of -2 kA / m 2 .
- EXAMPLE 3 (ACCORDING TO THE INVENTION):
- Solution B is prepared by mixing, with stirring, in a glass container, cooled using an ice bath, 2.49 g of RuCI 3 , 2.80 g of ZrCI 4 , 1.32 ml of TiCI 4 in 10 ml of absolute ethanol, ie an overall molar composition of 0.5 Ru-0.5, (Ti, Zr).
- the plate coated with the intermediate layer is then coated with solution B thus prepared, then it is dried and calcined in air as indicated in the general procedure. These operations are repeated 8 times and at the end of the last calcination, the deposited mass is 45 g / m 2 of the plate, related to the geometric surface of the plate.
- the cathode thus prepared was evaluated using the procedure described above.
- the cathodic potential is -1.190 V / DHW for a current density of -2 kA / m 2 in a 1 M NaOH solution.
- EXAMPLE 4 (NOT CONFORMING TO THE INVENTION) A cathode is prepared according to patent application EP 209 427 and its evaluation is carried out.
- the substrate consists of a plate of 4 x 1 x 0.2 cm, to which a round current supply rod has been welded.
- a surface treatment is carried out using corundum.
- a solution of 2 g of RuCl 3 in 2 ml of ethanol is prepared at room temperature.
- the control plate is coated with this solution.
- the plate is dried in air at 120 ° C. for 30 minutes, followed by calcination in air (500 ° C, 30 minutes).
- a deposit of 1 6 mg / m 2 of RuO 2 is obtained.
- a solution in 2 cm 3 of ethanol, of 2.6 ml of TiOCI 2 , HCl at 2.5 mol / l in Ti is prepared at room temperature.
- the same coating / steaming / calcination treatments are carried out in air. 8.5 g / m 2 of TiO 2 is thus deposited.
- the cathodic potential of this electrode is -1.240 V / DHW for a current density of -2 kA / m 2 evaluated according to the procedure described above.
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- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
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Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9910659 | 1999-08-20 | ||
| FR9910659A FR2797646B1 (fr) | 1999-08-20 | 1999-08-20 | Cathode utilisable pour l'electrolyse de solutions aqueuses |
| PCT/FR2000/002341 WO2001014615A1 (fr) | 1999-08-20 | 2000-08-18 | Cathode utilisable pour l'electrolyse de solutions aqueuses |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1125005A1 true EP1125005A1 (fr) | 2001-08-22 |
| EP1125005B1 EP1125005B1 (fr) | 2005-04-06 |
Family
ID=9549257
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00958706A Expired - Lifetime EP1125005B1 (fr) | 1999-08-20 | 2000-08-18 | Cathode utilisable pour l'electrolyse de solutions aqueuses |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US6527924B1 (fr) |
| EP (1) | EP1125005B1 (fr) |
| JP (1) | JP4464023B2 (fr) |
| KR (1) | KR100735588B1 (fr) |
| CN (1) | CN1205359C (fr) |
| AT (1) | ATE292696T1 (fr) |
| AU (1) | AU7014300A (fr) |
| CA (1) | CA2347728C (fr) |
| DE (1) | DE60019256T2 (fr) |
| ES (1) | ES2240152T3 (fr) |
| FR (1) | FR2797646B1 (fr) |
| MX (1) | MXPA01003960A (fr) |
| NO (1) | NO322413B1 (fr) |
| PT (1) | PT1125005E (fr) |
| WO (1) | WO2001014615A1 (fr) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2852973B1 (fr) * | 2003-03-28 | 2006-05-26 | Atofina | Procede de formation d'un revetement d'oxydes metalliques sur un substrat electroconducteur; cathode activee en resultant et son utilisation pour l'electrolyse de solutions acqueuses de chorures de meteaux alcalins. |
| FR2853329B1 (fr) * | 2003-04-02 | 2006-07-14 | Onera (Off Nat Aerospatiale) | Procede pour former sur un metal un revetement protecteur contenant de l'aluminium et du zirconium |
| EP1620582B1 (fr) | 2003-05-07 | 2016-12-21 | De Nora Tech, Inc. | Revetement anodique au chlorate presentant une morphologie de surface lisse |
| ITMI20061974A1 (it) * | 2006-10-16 | 2008-04-17 | Industrie De Nora Spa | Anodo per elettrolisi |
| US20080115810A1 (en) * | 2006-11-20 | 2008-05-22 | Permelec Electrode Ltd. | Method of reactivating electrode for electrolysis |
| TW200846499A (en) * | 2007-05-24 | 2008-12-01 | Liung Feng Ind Co Ltd | Method of generating hydrogen using dissimilar metal |
| EP2085501A1 (fr) * | 2008-01-31 | 2009-08-05 | Casale Chemicals S.A. | Cathodes haute performance pour électrolyseurs d'eau |
| JP5456744B2 (ja) * | 2010-11-04 | 2014-04-02 | ペルメレック電極株式会社 | 金属電解採取方法 |
| ITMI20102354A1 (it) * | 2010-12-22 | 2012-06-23 | Industrie De Nora Spa | Elettrodo per cella elettrolitica |
| CN102352517B (zh) * | 2011-10-21 | 2014-04-30 | 重庆大学 | 一种高活性阴极及其制备方法 |
| US9062384B2 (en) | 2012-02-23 | 2015-06-23 | Treadstone Technologies, Inc. | Corrosion resistant and electrically conductive surface of metal |
| CN102677092B (zh) * | 2012-05-30 | 2015-01-14 | 浙江大学 | 一种钛阳极的制备方法 |
| CN102719859A (zh) * | 2012-07-07 | 2012-10-10 | 西安泰金工业电化学技术有限公司 | 一种电沉积镍用钛网阳极及其制备方法 |
| ITMI20122030A1 (it) * | 2012-11-29 | 2014-05-30 | Industrie De Nora Spa | Catodo per evoluzione elettrolitica di idrogeno |
| CN104973661B (zh) * | 2014-04-10 | 2017-09-29 | 中国石油化工股份有限公司 | 一种复合阴极电极及其制备方法和应用 |
| KR101949517B1 (ko) * | 2017-07-12 | 2019-02-19 | 경북대학교 산학협력단 | 혼합 금속 산화물 코팅층을 포함하는 전기화학적 수처리용 전극, 그 제조방법 및 이를 이용한 수처리 방법 |
| KR102043423B1 (ko) * | 2018-06-12 | 2019-11-11 | 경북대학교 산학협력단 | 복합 산화물을 코팅한 수처리용 전기전도성 분리막 및 이의 제조방법 |
| CN109097790B (zh) * | 2018-06-19 | 2020-04-21 | 重庆大学 | 体相析氢电极的制备方法及电解水制氢反应器 |
| US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
| US11075435B2 (en) | 2018-10-25 | 2021-07-27 | International Business Machines Corporation | Electroplating of niobium titanium |
| CN109553224A (zh) * | 2018-12-07 | 2019-04-02 | 杭州水处理技术研究开发中心有限公司 | 一种化学镀镍废水处理设备及其方法 |
| US20220243338A1 (en) * | 2019-06-12 | 2022-08-04 | Olin Corporation | Electrode coating |
| US11735802B2 (en) | 2020-04-27 | 2023-08-22 | International Business Machines Corporation | Electroplated metal layer on a niobium-titanium substrate |
| CN114250454B (zh) * | 2021-11-22 | 2023-08-04 | 广东省科学院资源利用与稀土开发研究所 | 一种金属氧化物电极用钛基体防护涂层及其制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4530742A (en) * | 1983-01-26 | 1985-07-23 | Ppg Industries, Inc. | Electrode and method of preparing same |
| MX169643B (es) * | 1985-04-12 | 1993-07-16 | Oronzio De Nora Impianti | Electrodo para procesos electroquimicos, procedimiento para su produccion y cuba de electrolisis conteniendo dicho electrodo |
| JPH09120820A (ja) * | 1990-02-09 | 1997-05-06 | Osaka Gas Co Ltd | 固体電解質燃料電池用電極及びその製造方法 |
| US5516598A (en) * | 1994-07-28 | 1996-05-14 | Polyplus Battery Company, Inc. | Secondary cell using organosulfur/metal charge transfer materials as positive electrode |
| US5582623A (en) * | 1994-11-23 | 1996-12-10 | Polyplus Battery Company, Inc. | Methods of fabricating rechargeable positive electrodes |
| JPH08279357A (ja) * | 1995-04-05 | 1996-10-22 | Sanyo Electric Co Ltd | リチウム二次電池及びその製造方法 |
| JPH1021898A (ja) * | 1996-07-04 | 1998-01-23 | Nippon Glass Fiber Co Ltd | リチウム電池 |
| FR2775486B1 (fr) * | 1998-03-02 | 2000-04-07 | Atochem Elf Sa | Cathode specifique, utilisable pour la preparation d'un chlorate de metal alcalin et son procede de fabrication |
-
1999
- 1999-08-20 FR FR9910659A patent/FR2797646B1/fr not_active Expired - Fee Related
-
2000
- 2000-08-18 WO PCT/FR2000/002341 patent/WO2001014615A1/fr not_active Ceased
- 2000-08-18 AU AU70143/00A patent/AU7014300A/en not_active Abandoned
- 2000-08-18 CN CNB00802314XA patent/CN1205359C/zh not_active Expired - Fee Related
- 2000-08-18 PT PT00958706T patent/PT1125005E/pt unknown
- 2000-08-18 EP EP00958706A patent/EP1125005B1/fr not_active Expired - Lifetime
- 2000-08-18 MX MXPA01003960A patent/MXPA01003960A/es active IP Right Grant
- 2000-08-18 ES ES00958706T patent/ES2240152T3/es not_active Expired - Lifetime
- 2000-08-18 KR KR1020017004951A patent/KR100735588B1/ko not_active Expired - Fee Related
- 2000-08-18 DE DE60019256T patent/DE60019256T2/de not_active Expired - Lifetime
- 2000-08-18 JP JP2001518480A patent/JP4464023B2/ja not_active Expired - Fee Related
- 2000-08-18 CA CA2347728A patent/CA2347728C/fr not_active Expired - Fee Related
- 2000-08-18 AT AT00958706T patent/ATE292696T1/de active
- 2000-08-18 US US09/807,915 patent/US6527924B1/en not_active Expired - Fee Related
-
2001
- 2001-04-19 NO NO20011931A patent/NO322413B1/no not_active IP Right Cessation
Non-Patent Citations (1)
| Title |
|---|
| See references of WO0114615A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1125005B1 (fr) | 2005-04-06 |
| CN1205359C (zh) | 2005-06-08 |
| JP4464023B2 (ja) | 2010-05-19 |
| US6527924B1 (en) | 2003-03-04 |
| NO20011931D0 (no) | 2001-04-19 |
| FR2797646A1 (fr) | 2001-02-23 |
| PT1125005E (pt) | 2005-08-31 |
| WO2001014615A1 (fr) | 2001-03-01 |
| AU7014300A (en) | 2001-03-19 |
| JP2003507580A (ja) | 2003-02-25 |
| DE60019256D1 (de) | 2005-05-12 |
| CN1348510A (zh) | 2002-05-08 |
| ES2240152T3 (es) | 2005-10-16 |
| DE60019256T2 (de) | 2006-03-09 |
| KR20010083919A (ko) | 2001-09-03 |
| KR100735588B1 (ko) | 2007-07-04 |
| ATE292696T1 (de) | 2005-04-15 |
| CA2347728C (fr) | 2010-10-19 |
| FR2797646B1 (fr) | 2002-07-05 |
| NO20011931L (no) | 2001-05-28 |
| MXPA01003960A (es) | 2002-04-24 |
| CA2347728A1 (fr) | 2001-03-01 |
| NO322413B1 (no) | 2006-10-02 |
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