EP1115912B1 - Vorrichtung zum partiellen elektrochemischen behandeln von stabförmigem behandlungsgut - Google Patents

Vorrichtung zum partiellen elektrochemischen behandeln von stabförmigem behandlungsgut Download PDF

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Publication number
EP1115912B1
EP1115912B1 EP99950440A EP99950440A EP1115912B1 EP 1115912 B1 EP1115912 B1 EP 1115912B1 EP 99950440 A EP99950440 A EP 99950440A EP 99950440 A EP99950440 A EP 99950440A EP 1115912 B1 EP1115912 B1 EP 1115912B1
Authority
EP
European Patent Office
Prior art keywords
diaphragm
treated
springs
holder
centering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP99950440A
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German (de)
English (en)
French (fr)
Other versions
EP1115912A2 (de
Inventor
Johann Falkner
Rudolf Kauper
Manfred Krepelka
Thomas Lummer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
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Atotech Deutschland GmbH and Co KG
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Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of EP1115912A2 publication Critical patent/EP1115912A2/de
Application granted granted Critical
Publication of EP1115912B1 publication Critical patent/EP1115912B1/de
Anticipated expiration legal-status Critical
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • C25D5/022Electroplating of selected surface areas using masking means
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/04Tubes; Rings; Hollow bodies

Definitions

  • the invention relates to a device and a method for partial Treat, namely electroplating, electrochemical etching or electrochemical Cleaning of rod-shaped items to be treated in immersion baths, namely electroplating, etching and cleaning systems.
  • the material to be treated is referred to as a rod.
  • Devices for electrochemical etching, electroplating and electrochemical cleaning of elongated cylinders, in particular of round bars are known. These rods can be on one or both Ends are tapered and / or threaded. An example of this are Cylinder for vehicle shock absorbers.
  • the invention is not restricted on the treatment of round bars. It is also suitable for treatment of bars with a different cross section.
  • the electrochemical treatment of the rods is used, for example, in shock absorber cylinders to improve wear and corrosion properties.
  • the rods are only used on those that are stressed during operation Surfaces electrolytically coated with hard chrome.
  • the other places of the Bars should remain uncoated or partially with a thin flash chrome layer can be provided as temporary surface protection.
  • the surface of the chrome layer becomes electrochemical before it can be bonded etched. Insolubles are preferred for both process steps Electrodes used. Between the individual treatment steps the rods rinsed in electroplating systems.
  • a transport device ensures the transport of the bars from treatment station to treatment station.
  • the ends For the partial treatment of the bars in the middle of the bar, the ends must be masked, i.e. be shielded in such a way that they are dimensionally precisely predetermined Areas of no metal or flash chrome as temporary protection is deposited.
  • the boundaries between the deposition area and the Areas not to be coated are generally closely tolerated.
  • the uncoated area pass into the coated area within only ⁇ 1 millimeter.
  • the the layer to be deposited must be uniformly thick up to this limit. Edge effects, i.e. a layer thickness increase or decrease at the area limits, must be avoided.
  • the aim of the precise coating is a to avoid subsequent smoothing.
  • the rods are attached to frames and treated, the racks in turn attached to transportable goods carriers are.
  • the frames are provided with individual masks so that both rod ends not be coated in the intended area.
  • bar diameters and coating areas must be specified A sufficient number of masks and frames are available in an electroplating system his. Because the frames also supply the bath current to the bars serve, you must be metallic conductive. The metal has to go through plastic coatings protected from galvanizing.
  • This embodiment has the disadvantage that each individual is to be galvanized Body individually attached and the protective varnish on one end of the body must be applied accurately. Also the peeling off of the protective lacquer after electroplating is expensive.
  • adjustable masks with sealants in the form of End cuffs on both rod ends to limit the ones to be treated Areas used.
  • a loading station several take electrically conductive grippers fastened to the goods carrier at the same time on each side a staff.
  • each rod into a single cell, consisting of the rod and one stationary tubular electrode is formed.
  • the upper and lower electrolytic effective electrode end is made of a tubular axially adjustable Mask determined.
  • the mask ends are each closed with a cuff.
  • the invention is therefore based on the problem, the disadvantages of the known Method and devices for shielding during electroplating Avoid bars and especially the work required to shield the areas not to be electroplated on bars if possible to keep small.
  • the process should also under production conditions work flawlessly.
  • the tubular membrane supports are preferably made of chemical resistant and at least electrically non-conductive on the surface Material.
  • the device points axially in accordance with the dimensions of the material to be treated adjustable, electrically non-conductive shielding devices.
  • at least one shielding device is provided.
  • the upper part of the Bar remain untreated in that this section is not in the Immersed treatment liquid.
  • Shielding devices can also be used be provided at both ends of the rod.
  • the shielding devices each comprise at least one cage within the tubular membrane support.
  • the cages are arranged so that the Treated goods can be pushed through them, and will be by at least one cage lid and at least one cage bottom educated.
  • In each cage is a membrane holder holding a membrane between the cage lid and the bottom of the cage are mounted so that they can move radially.
  • At least an inner centering spring for guiding the material to be treated and at least one outer centering spring for centering the membrane holder and the membrane in the cage are provided on each membrane holder.
  • the Membranes are preferably made of chemically stable, stretchable and electrically non-conductive material.
  • the cages are on the side of the shielding device facing the center of the rod arranged.
  • the outer centering springs are preferably rod-shaped formed as leaf springs and on the outer surfaces of the membrane holder fixed tangentially. They serve to center the membrane holder and the Membrane in the cage and have a radial pressure of one not centric held rod against the membrane and the membrane holder.
  • the Spring force of the outer centering springs is due to the strength of the elastic Adapted membranes. It should be chosen so large that the membranes by a lateral pressure of the material to be treated do not gap or in Extreme case tear and the shielding effect is lost at this point.
  • the spring force of the inner centering springs should be chosen smaller than the spring force of the holding pliers for the rods to secure them and do not endanger electrical contacting on the holding clamps. Is the lateral pressure of the bars, which the inner springs of the membrane holder absorb, too large, d. H. the centering effect is no longer sufficient around the rods to center, the membranes when the rods are inserted into the shielding device shifted to an eccentric position to avoid damage to prevent the membranes. This ensures the accurate dimming the field lines still possible. In contrast, the gap from elastic Material manufactured membranes in the known rigidly on the shielding device attached shielding membranes by the lateral pressure of the rods on, so that the dimming effect is prevented at this point.
  • the spring bars can in particular be elongated and formed by a membrane holder Level sloping with the free ends one with the center of the Form membrane holder aligned opening through which the rods can be pushed are.
  • Spring bars with a correspondingly twist-proof at the free end of the membrane holder fixed, centering guides can be used. This Spring bars are aligned such that one through by the membrane holder membrane held by push-through rod can be clamped by the spring rods is.
  • Each of the guides are prismatic and essentially parallel to the spring bars are provided guides for the bars.
  • the inner centering springs located within the upper diaphragm supports can in particular be elongated and on one of the membrane holder formed plane is essentially vertical with the free, by at least 45 °, preferably at least 90 ° and in particular at least 180 °, bent ends one with the center of the membrane holder Form an aligned opening through which the rods can be pushed.
  • the outer springs on the membrane holders ensure that the membranes center again for the bars entering with the next batch, d. H. spring back to the starting position.
  • FIG. 1a shows a vertical section through a bath tank with several conventional electrolytic individual cells for chrome-plating rods.
  • Fig. 1b a single conventional electrolytic single cell within the bath container of Fig. 1a is shown in detail and cut vertically.
  • a bath container 14 is filled with electrolyte up to the edge zone 33 .
  • Tubular electrodes 30 are installed in the bath container and are electrically conductively connected to a DC power source, not shown. Furthermore, in and on the bath container 14 there are two panel supports 17 and 25 which can be adjusted independently of one another in the vertical direction.
  • On the goods carrier 1 which is held in the correct position in the bathroom by the goods carrier support 2 , there are holding tongs 3 which contact and hold the rods 10 electrically.
  • the rods 10 attached cuffs 25 pierce the first rigidly to the vertically adjustable diaphragm carrier 27 in the upper membrane support 26 (Fig. 1b).
  • the rods 10 When the product carrier 1 is further lowered, the rods 10 also pierce the sleeve 24 of the lower membrane carrier 23 ( FIG. 1b ), which is fastened to the lower panel carrier 17 .
  • Both the lower diaphragm support 17 with the diaphragm support 23 and the sleeves 24 ( FIG. 1b ) and the upper diaphragm support 25 with the diaphragm support 26 and the sleeves 27 can be adjusted in height by the adjusting devices 20 and 28 in accordance with the requirements of the rods 10 .
  • conductive auxiliary cathodes 22 can be attached, which are pressed against the retracted material to be treated 10 by springs 21 and thus greatly increase the cathodic surface or the cathodic current density reduce that no deposition takes place in the lower shielded area.
  • Rods 10 with different dimensions and different requirements for the location of the partial coating / treatment on the bathroom can thus be processed.
  • FIGS. 1a and 1b also represent device features according to the invention.
  • the upper membrane support according to the invention 26 is in a vertical sectional view as a detail of a Einzelgalvanisierzelle within the plating tank 14 not shown (see Fig. 1a) is shown.
  • the tubular membrane support 26 is fastened to the upper diaphragm support 25 , which is adjusted to the correct position for the rods to be produced via a height adjustment device 28 (not shown here) (see FIG. 1a ).
  • the adjustment of the aperture support 25 simultaneously causes the electrically non-conductive tube of the membrane support 26 to be inserted into the insoluble electrode 30, which is shown in sections, and thus to blank the unnecessary length of the electrode.
  • the panel support 25 can advantageously be in the upper position.
  • the panel support 25 and all parts immersed in the bath are made of chemically resistant material.
  • electrically non-conductive materials such as B. PVC, PVDF, PTFE available.
  • As an electrically conductive material z. B. titanium or lead can be used.
  • the rod 10 When the goods carrier 1 , which is not shown here, is lowered, the rod 10 is first moved into the area of the inner centering springs 7 , which exert a centering pressure on the rod 10 and align it when it hangs downward in an off-center position. If the spring pressure is not sufficient for aligning the rod 10 , the membrane holder 5 held with the outer centering springs 19 is displaced in the horizontal direction so that it adapts to the rod position in order to prevent damage or expansion of the sensitive membrane 9 . In order to ensure the function of the membrane holder 5 , the cage cover 12 and the cage bottom 16 are attached to the tubular membrane support 26 in such a way that the membrane holder 5 can move freely in the horizontal (radial) direction, but is held sufficiently firmly in the vertical direction.
  • the upper diaphragm support 25 can be moved down into the shielding position specified by the rod construction.
  • the shielding membrane 9, which lies closely against the rod 10 curves conically upwards on the inside. This leads to a reduction in the bone effect (formation of a thickened electrodeposited layer) at the ends of the rod 10 .
  • the rod 10 is extended vertically upwards out of the electroplating cell. As soon as the rod 10 has moved out of the membrane 9 , the membrane holder 5 is centered again in the middle of the membrane carrier 26 via the outer springs 19 .
  • FIG. 3 shows the lower membrane carrier 23 according to the invention with a small section of the panel carrier 17 in a vertical section through an individual electroplating cell within the bath container 14 (not shown here) (see FIG. 1a ).
  • the tubular membrane carrier 23 is fastened to the lower diaphragm carrier 17 and can be brought to the correct lower setting for the rods 10 to be produced via the height adjustment device 20 (not shown here) (see FIG. 1a ).
  • the height of the membrane carrier 23 is preferably set before the sinking of the product carrier 1 , not shown.
  • the basic structure of the lower shielding device corresponds to the upper shielding device from FIG. 2 .
  • the membrane holder 4 with the outer centering springs 18, the cage cover 11, the cage bottom 15 and the inner centering springs 6 are also present here.
  • the inner centering springs 6 are, however, arranged below the membrane 8 in order to avoid a disruptive influence on the field line concentration in the electroplating area of the rod 10 . It is important here that the distance of the centering spring 6 from the membrane 8 is not chosen too large, in order to prevent damage to the membrane 8 by the rod 10 which has not yet been centered or the correct position of the membrane 8 .
  • the rod 10 After the rod 10 is retracted into the cell by the upper shielding device, when it is lowered further it first hits the membrane 8, passes through it against the inner centering spring 6 and becomes necessary (if the centering effect of the upper shielding device is not sufficient) ) centered. If the pressure on the spring 6 is too great, the diaphragm holder 4 with the diaphragm 8 is also displaced horizontally (radially) against the spring force of the outer centering springs 18 in order to open the diaphragm 8 on the side not pressed by the rod 10 or to damage it to prevent. This ensures that the rod end is shielded to the edge. As with the upper shielding device, the outer centering springs 18 after the rods 10 have been extended from the lower shielding device ensure that the membrane holder 4 moves back into its starting position, ie, centers itself again.
  • FIG. 4a shows a preferred embodiment of a lower membrane holder 4 in a top view and in a side view.
  • the outer rod-shaped centering springs 18 are attached tangentially to the outer circumference of the cylindrical membrane holder 4 .
  • the inner centering springs 29 are wing-shaped and crossed or inclined towards the center of the membrane holder 4 , so that there are three conical surfaces on the inside, against which the non-central hanging rod 10 (see FIG. 3 ) presses when entering the device.
  • the wing-shaped centering springs 29 spring downwards and outwards.
  • a membrane holder 4 is again shown in FIG. 4b .
  • the centering springs each consist of a spring bar 32, which is secured on the outside on the membrane holder 4 against rotation.
  • a prism-shaped guide 31 is attached, which is also secured against rotation.
  • the direction of installation of the spring rod 32 points obliquely downward away from the membrane holder.
  • both springs 32 bring about a good centering of the rods 10 (see FIG. 3 ).
  • the inner centering springs 29, 32 of FIGS. 4 a and 4 b are also suitable for use on the upper membrane holders 5 .
  • the centering springs 29, 32 must be arranged above the membrane holder 5 .

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Coating Apparatus (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
EP99950440A 1998-08-21 1999-07-23 Vorrichtung zum partiellen elektrochemischen behandeln von stabförmigem behandlungsgut Expired - Lifetime EP1115912B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19837973 1998-08-21
DE19837973A DE19837973C1 (de) 1998-08-21 1998-08-21 Vorrichtung zum partiellen elektrochemischen Behandeln von stabförmigem Behandlungsgut
PCT/DE1999/002311 WO2000011245A2 (de) 1998-08-21 1999-07-23 Vorrichtung zum partiellen elektrochemischen behandeln von stabförmigem behandlungsgut

Publications (2)

Publication Number Publication Date
EP1115912A2 EP1115912A2 (de) 2001-07-18
EP1115912B1 true EP1115912B1 (de) 2002-03-20

Family

ID=7878255

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99950440A Expired - Lifetime EP1115912B1 (de) 1998-08-21 1999-07-23 Vorrichtung zum partiellen elektrochemischen behandeln von stabförmigem behandlungsgut

Country Status (7)

Country Link
US (1) US6508926B1 (ja)
EP (1) EP1115912B1 (ja)
JP (1) JP4317661B2 (ja)
AT (1) ATE214746T1 (ja)
DE (2) DE19837973C1 (ja)
ES (1) ES2173001T3 (ja)
WO (1) WO2000011245A2 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4704451B2 (ja) * 2001-07-12 2011-06-15 株式会社不二工機 膨張弁用防振部材
AU2003226114A1 (en) * 2002-03-29 2003-10-13 Astropower, Inc. Method and apparatus for electrochemical processing
US20050265802A1 (en) 2004-05-27 2005-12-01 Alltrista Zinc Products, L.P. Environmentally protected reinforcement dowel pins and method of making
JP4511317B2 (ja) * 2004-11-09 2010-07-28 Ntn株式会社 樹脂製軸受部品とその製造方法
DE102007030311B4 (de) * 2007-06-29 2013-02-07 Knf Flodos Ag Membranpumpe
US8136475B2 (en) * 2009-01-06 2012-03-20 The Boeing Company Controlled environment chamber for applying a coating material to a surface of a member
DE102009013164A1 (de) 2009-03-07 2010-09-09 Hübel, Egon, Dipl.-Ing. (FH) Verfahren und Vorrichtung zum elektrolytischen Behandeln von ausgedehntem Gut
US8920617B1 (en) * 2010-07-06 2014-12-30 Greatbatch Ltd. Selective plating fixture
WO2013105420A1 (ja) * 2012-01-11 2013-07-18 本田技研工業株式会社 メッキ装置
JP5981193B2 (ja) 2012-03-30 2016-08-31 日立オートモティブシステムズ株式会社 めっき部品の製造方法およびシリンダ装置の製造方法
JP6282773B1 (ja) * 2017-06-30 2018-02-21 株式会社ショーワ マスキング治具、電気メッキ装置
EP3719180A1 (en) 2019-04-04 2020-10-07 ATOTECH Deutschland GmbH Apparatus and method for electrochemically isolating a section of a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1103103B (de) * 1958-11-13 1961-03-23 Daimler Benz Ag Vorrichtung zum galvanischen Verchromen der Aussenflaeche langgestreckter zylindrischer Koerper, insbesondere von Tellerventilschaeften
US4668369A (en) * 1986-06-26 1987-05-26 King Arthur S Reciprocating electrode cleaner for electric field liquid treater
DE19612555C2 (de) * 1996-03-29 1998-03-19 Atotech Deutschland Gmbh Verfahren zur selektiven elektrochemischen Behandlung von Leiterplatten und Vorrichtung zur Durchführung des Verfahrens
US6168691B1 (en) * 1996-08-09 2001-01-02 Atotech Deutschland Gmbh Device for electrochemical treatment of elongate articles
DE19632132C1 (de) * 1996-08-09 1997-11-20 Atotech Deutschland Gmbh Verfahren zur elektrochemischen Behandlung von stabförmigem Behandlungsgut und Vorrichtung zur Durchführung des Verfahrens

Also Published As

Publication number Publication date
JP4317661B2 (ja) 2009-08-19
DE59901033D1 (de) 2002-04-25
WO2000011245A3 (de) 2000-11-09
EP1115912A2 (de) 2001-07-18
US6508926B1 (en) 2003-01-21
DE19837973C1 (de) 2000-01-20
WO2000011245A2 (de) 2000-03-02
ES2173001T3 (es) 2002-10-01
ATE214746T1 (de) 2002-04-15
JP2002523625A (ja) 2002-07-30

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