EP0694088B1 - Verfahren zur herstellung einer muttermatrize für die galvanische erzeugung von nahtlosen rotations-siebdruckschablonen, insbesondere aus nickel - Google Patents
Verfahren zur herstellung einer muttermatrize für die galvanische erzeugung von nahtlosen rotations-siebdruckschablonen, insbesondere aus nickel Download PDFInfo
- Publication number
- EP0694088B1 EP0694088B1 EP95908917A EP95908917A EP0694088B1 EP 0694088 B1 EP0694088 B1 EP 0694088B1 EP 95908917 A EP95908917 A EP 95908917A EP 95908917 A EP95908917 A EP 95908917A EP 0694088 B1 EP0694088 B1 EP 0694088B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- indentations
- grid
- sensitive layer
- process according
- base mould
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000010022 rotary screen printing Methods 0.000 title claims abstract description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 26
- 229910052759 nickel Inorganic materials 0.000 title claims description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 238000007373 indentation Methods 0.000 claims abstract 15
- 239000011231 conductive filler Substances 0.000 claims abstract 3
- 238000007650 screen-printing Methods 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 9
- 238000009826 distribution Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 3
- 229920003002 synthetic resin Polymers 0.000 claims description 2
- 239000000057 synthetic resin Substances 0.000 claims description 2
- 230000000063 preceeding effect Effects 0.000 claims 2
- 229910010293 ceramic material Inorganic materials 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 239000011159 matrix material Substances 0.000 description 48
- 238000000576 coating method Methods 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 230000002093 peripheral effect Effects 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910000480 nickel oxide Inorganic materials 0.000 description 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 210000001331 nose Anatomy 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/14—Forme preparation for stencil-printing or silk-screen printing
- B41C1/142—Forme preparation for stencil-printing or silk-screen printing using a galvanic or electroless metal deposition processing step
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
Definitions
- the invention relates to a method for producing a Mother matrix for the galvanic generation of seamless Rotary screen printing stencils, especially made of Nickel, being a metallic mother matrix base body with a cylindrical outer surface on its outer circumference with depressions distributed in a regular grid is provided that a round or polygonal Have an outline and a regular network between them grid webs remain, and the depressions then with an electrically non-conductive Filling compound filled flush to the height of the grid bars are then repeated by galvanic application of metal and axially pulling off the resulting Sleeve screen printing stencils can be generated.
- mother matrices are used for the above Previously used for so-called moletting manufactured.
- the desired one is made using a molette Deepening grid in the outer surface of the mother matrix base body indented.
- the Molette is a relatively small roller on the circumference of the mother matrix base body along a helix below strong pressure force is unrolled.
- the molette carries arranged on its peripheral surface in the desired grid Projections that are a negative image of the desired Show recesses for the mother matrix.
- the depressions that can be produced by the mettling can only truncated pyramid or truncated cone with relative be flat inclined flanks. This leads to the disadvantage that the lying in the wells electrically non-conductive filling compound at the edges of the depressions becomes very thin and breaks out easily there. Later galvanic application of metal to the mother matrix The screen printing stencil is then formed when peeling off the finished galvanized template to damage through the surface of the mother matrix Stencil protruding metal noses, which are in could form the breakouts of the filling compound.
- the mother matrix is made of relatively soft copper, over which, for example, nickel is preferred
- Screen printing stencil material is relatively hard to form themselves despite the chrome plating, which is only very thin can be slight striations in the longitudinal direction of the mother matrix, their usability on relatively few production runs for the production of screen printing stencils limit.
- the invention has the advantage that all the mettling tools and not the devices required for this are more needed. This will save a lot in terms of technical, personnel and time Effort reached. Because the outline of the depressions and the grid in which these depressions are arranged are now electronically stored, the Outline shape of the wells and their distribution within of the grid made very precisely and with little Effort changed and adapted to the respective needs without, as was previously required, would be to produce new filleting tools.
- the depressions get a contour that improves Hold the electrically non-conductive filling compound offers.
- the wells are not now more truncated cones or with flanks Are truncated pyramids, but viewed in cross section rather get the shape of oval bowls.
- This keeps the filling mass within the wells also in whose edge areas have a comparatively large thickness, so that breakouts of the filling compound are avoided.
- the later electroplating of the screen printing stencil form what better quality stencils results and damage to the mother matrix when axially pulling off the template avoids. This gives the mother matrix has a longer service life, which in the Practice can be two to three times as long as this previously used mother matrices was accessible.
- an ultraviolet laser beam is used as the beam or a thermal laser beam or an electron beam is used.
- the mentioned rays can be comparatively easily generate and focus so that, in cooperation with a correspondingly selected coating with a suitable Sensitivity, deepening and grid with a high Resolution and accuracy as well as large MESH numbers let generate.
- nickel Since no mechanical Press the depressions into the mother matrix base body more takes place, this no longer has to be relative soft copper, but can also consist of one harder metal exist, this preferably nickel is.
- the metal nickel offers the advantage of a high Hardness, high strength and a high structural density. It also has good electrical conductivity and is easy to galvanize. As a result, a Chromium plating of the surface of the mother matrix is eliminated, what is the recycling of mother matrices that can no longer be used facilitated.
- Another by using Nickel more accessible as a material for the mother matrix The advantage is that the nickel surface of the Mother die automatically through the formation of a nickel oxide layer protects, but remains electrically conductive. At the same time, this nickel oxide layer ensures that the screen printing stencil galvanized onto the mother die slightly pull off the mother matrix leaves, because the nickel oxide layer on the mother matrix as Release agent works.
- a mother matrix base body can as a mother matrix base body also a hollow cylindrical one Nickel sleeve are used. This is straightforward possible because of the elimination of mechanical Pressure forces between the Molette and the base matrix body the latter does not have a particularly high mechanical stability must have more. The use also allows a hollow cylindrical nickel sleeve easier handling and a lighter and cheaper one Transport or shipping between the manufacturer of the mother matrix and generally not the same Manufacturer of screen printing stencils.
- the electrically non-conductive filling compound a curable synthetic resin or a curable ceramic Mass used.
- These materials offer the advantage that on the one hand it was initially still a viscous mass can be introduced into the recesses and that they are on the other side after hardening very firm in the wells adhere and have high strength and surface quality.
- these materials are after curing also by mechanical methods, e.g. Rotate or loops, editable without them coming out of the Loosen depressions or break out at the edge of the depressions.
- the wells are preferably made with a regular generated hexagonal outline; the deepening continues preferably honeycomb in a hexagonal grid distributed.
- This has the advantage that the screen printing stencils produced on this mother die high strength and stability with low weight and have a good web-to-passage ratio. Because of the electronic storability of the outline form the wells and their distribution in the grid is of course, every freedom in the design of this Given parameters.
- FIG. 1 to 5 of the drawing show a section from the peripheral area of a mother matrix base body during various process steps; the figure 6 the drawing shows a section of the peripheral area a finished mother matrix.
- the mother matrix base body 1 made of metal and has a cylindrical outer surface 10 on.
- the base body 1 can be a cylinder or hollow cylindrical sleeve.
- a sensitive is on the lateral surface 10 of the base body 1
- Coating 2 in the form of a comparatively thin Layer applied, which is exaggerated in the drawing is shown in bold.
- this coating 2 can it is a photo, thermo or electro sensitive material act as is known per se. Also order process for achieving such coatings a uniform layer thickness are known and need not to be explained in more detail here.
- Figure 2 of the drawing shows the mother matrix base body 1 during a process step in which of a laser 30 which controls a laser beam 3 emits an exposure of the sensitive coating 2, here with the negative image of the desired wells he follows.
- the mother matrix base body 1 and the laser 30 in two directions relative to one another, preferably the axial direction and the circumferential direction moved, so that gradually the entire peripheral surface of the mother matrix base body 1 is covered.
- the Beam 3 in accordance with electronically stored data on and off to the positive or negative image to expose a desired grid onto the coating 2, depending on whether this is photopositive or photonegative responds.
- the coating 2 by the Exposure in areas 20 changed so that they are for a subsequent chemical and / or physical Removal process becomes insoluble. Between the exposed areas 20 remain unexposed areas 21 which Correspond to areas in which later specializations in the base body 1 are to be generated.
- Figure 3 of the drawing shows the mother matrix base body 1 after going through the removal process in which the unexposed areas 21 of the coating 2 are removed have been. Now the coating remains 2 only the exposed ones on the lateral surface 10 Areas 20 that have a grid-like pattern from protruding webs form outside, each regular Include hexagons.
- a suitable Removal process of the remaining part 20 of the coating 2 also removed, after which the mother matrix base body the surface shape shown in Figure 5 having. This is characterized by a grid of recesses 11 hexagonal in outline, between which are webs 12 distributed webs. The outer The surface of the webs 12 corresponds to the lateral surface 10 of the base body 1.
- Figure 6 of the drawing finally shows the finished mother matrix 1 ', in which the recesses 11 are now complete with a filling compound 4 up to the level of the upper edge the webs 12 and thus up to the original lateral surface 10 of the mother matrix base body 1 filled are.
- the mother matrix is on the lateral surface 10 1 'in the desired distribution areas different electrical properties formed, namely electrically in the area of the surface of the filling compound 4 non-conductive areas and in the area of the surface the webs 12 electrically conductive areas.
- This screen printing sleeve thus formed can then in the axial direction of the mother die 1 ', i.e. parallel to Shell surface 10, deducted from the mother die 1 ' become.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Adornments (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
Claims (8)
- Verfahren zur Herstellung einer Muttermatrize (1') für die galvanische Erzeugung von nahtlosen Rotations-Siebdruckschablonen, insbesondere aus Nickel, wobei ein metallischer Muttermatrizen-Grundkörper (1) mit zylindrischer Mantelfläche (10) auf seinem Außenumfang mit in einem regelmäßigen Raster verteilten Vertiefungen (11) versehen wird, die einen runden oder mehreckigen Umriß aufweisen und zwischen denen ein regelmäßiges Netz bildende Rasterstege (12) verbleiben, und wobei die Vertiefungen (11) anschließend mit einer elektrisch nichtleitenden Füllmasse (4) bündig bis zur Höhe der Rasterstege (12) verfüllt werden, wonach dann wiederholt durch galvanisches Auftragen von Metall und axiales Abziehen der so entstandenen Hülse Siebdruckschablonen erzeugbar sind,
gekennzeichnet durch
folgende Verfahrensschritte:a) die Mantelfläche (10) des Muttermatrizen-Grundkörpers (1) wird mit einer photo- oder thermooder elektrosensitiven Beschichtung (2) überzogen,b) die Beschichtung (2) wird mittels eines nach Maßgabe elektronisch gespeicherter Daten gesteuerten Strahls (3) mit dem Positiv- oder Negativbild des gewünschten Vertiefungsrasters belichtet, wobei in den Daten die Umrißform der Vertiefungen (11) und deren Verteilung im Raster frei gestaltbar gespeichert sind, und die Beschichtung (2) wird unmittelbar oder nach Durchlaufen eines Entwicklungsprozesses in den Bereichen (21), in denen die Vertiefungen (11) vorgesehen sind, mittels eines chemischen und/oder physikalischen Entfernungsprozesses abgetragen,c) in den von der Beschichtung (2) befreiten Bereichen der Mantelfläche (10) des Muttermatrizen-Grundkörpers (1) werden durch Ätzen oder elektrolytischen Metallabtrag die Vertiefungen (11) gebildet,d) die verbliebenen Teile (20) der Beschichtung (2) werden vollständig entfernt unde) die Vertiefungen (11) werden mit der elektrisch nichtleitenden Füllmasse (4) verfüllt. - Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß der Verfahrensschritt b) wie folgt ausgeführt wird:b) die Beschichtung (2) wird mittels eines nach Maßgabe elektronisch gespeicherter Daten gesteuerten Strahls (3) in den Bereichen (21), in denen die Vertiefungen (11) vorgesehen sind, unmittelbar abgetragen, wobei in den Daten die Umrißform der Vertiefungen (11) und deren Verteilung im Raster frei gestaltbar gespeichert sind.
- Verfahren nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß als Strahl (3) ein Ultraviolett-Laserstrahl oder ein thermisch wirkender Laserstrahl oder ein Elektronenstrahl verwendet wird.
- Verfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß als Muttermatrizen-Grundkörper (1) ein Nickelzylinder eingesetzt wird.
- Verfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß als Muttermatrizen-Grundkörper (1) eine hohlzylindrische Nickelhülse eingesetzt wird.
- Verfahren nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, daß als elektrisch nichtleitende Füllmasse (4) ein aushärtbares Kunstharz oder eine aushärtbare keramische Masse eingesetzt wird.
- Verfahren nach einem der vorangehenden Ansprüche, dadurch gekennzeichnet, daß die Vertiefungen (11) mit einem regelmäßigen sechseckigen Umriß erzeugt werden.
- Verfahren nach Anspruch 7, dadurch gekennzeichnet, daß die Vertiefungen (11) wabenförmig in einem Hexagonalraster verteilt angeordnet werden.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4404560A DE4404560C1 (de) | 1994-02-12 | 1994-02-12 | Verfahren zur Herstellung einer Muttermatrize für die galvanische Erzeugung von nahtlosen Rotations-Siebdruckschablonen, insbesondere aus Nickel |
DE4404560 | 1994-02-12 | ||
PCT/EP1995/000458 WO1995021951A1 (de) | 1994-02-12 | 1995-02-09 | Verfahren zur herstellung einer muttermatrize für die galvanische erzeugung von nahtlosen rotations-siebdruckschablonen, insbesondere aus nickel |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0694088A1 EP0694088A1 (de) | 1996-01-31 |
EP0694088B1 true EP0694088B1 (de) | 1999-05-19 |
Family
ID=6510148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95908917A Expired - Lifetime EP0694088B1 (de) | 1994-02-12 | 1995-02-09 | Verfahren zur herstellung einer muttermatrize für die galvanische erzeugung von nahtlosen rotations-siebdruckschablonen, insbesondere aus nickel |
Country Status (9)
Country | Link |
---|---|
US (1) | US5972194A (de) |
EP (1) | EP0694088B1 (de) |
CN (1) | CN1095881C (de) |
AT (1) | ATE180291T1 (de) |
AU (1) | AU1706195A (de) |
DE (2) | DE4404560C1 (de) |
ES (1) | ES2133736T3 (de) |
GR (1) | GR3031024T3 (de) |
WO (1) | WO1995021951A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1851060B (zh) * | 2006-04-10 | 2011-05-04 | 南京航空航天大学 | 中空零件电铸成形中沟槽的填充方法 |
CN101271275B (zh) * | 2008-04-28 | 2011-08-10 | 彩虹集团电子股份有限公司 | 一种喇叭网的蚀刻法生产工艺 |
CN101373334B (zh) * | 2008-10-13 | 2011-02-16 | 彩虹集团电子股份有限公司 | 一种栅网半蚀刻连接点人工抖料方法 |
KR100903962B1 (ko) * | 2008-11-21 | 2009-06-25 | 주식회사 센트랄 | 볼 시트의 제조방법 |
DE102009017686A1 (de) | 2009-04-16 | 2010-10-28 | Steinemann Technology Ag | Siebdruckmaschine mit Greifertransport |
DE102011015456A1 (de) | 2011-03-30 | 2012-10-04 | Thomas Walther | Siebdruckverfahren und dazu gehörige Vorrichtung |
CN111051575B (zh) * | 2017-09-04 | 2022-03-15 | 富士胶片株式会社 | 电铸用原盘及使用了该电铸用原盘的电铸模的制造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2166366A (en) * | 1935-11-30 | 1939-07-18 | Edward O Norris Inc | Means and method of producing metallic screens |
BE788470A (fr) * | 1971-11-12 | 1973-01-02 | Buckbee Mears Co | Procede ameliore d'accroissement de la rigidite des ecrans d'impressio |
AT311294B (de) * | 1972-05-23 | 1973-11-12 | Zimmer Johannes | Schablonenhülse |
US3960675A (en) * | 1975-04-17 | 1976-06-01 | Motter Printing Press Co. | Method for deplating and replating rotogravure cylinders |
DE2544603A1 (de) * | 1975-10-04 | 1977-04-14 | Kabel Metallwerke Ghh | Verfahren zur herstellung eines zylindrischen matrizenkoerpers |
IN155834B (de) * | 1976-10-05 | 1985-03-16 | Iten K Ag | |
JPS54156880A (en) * | 1978-05-04 | 1979-12-11 | Kenseido Kagaku Kogyo Kk | Production of sleeve for rotary screen printing |
DE2965624D1 (en) * | 1978-09-26 | 1983-07-14 | Wallace Watson Sword | The production of rotary screen printing cylinders |
NL7909089A (nl) * | 1979-12-17 | 1981-07-16 | Stork Screens Bv | Werkwijze voor de vervaardiging van een matrijs. |
DE3011192A1 (de) * | 1980-03-22 | 1981-10-01 | Hoechst Ag, 6000 Frankfurt | Verfahren zur herstellung von siebdruckschablonen auf galvanischem wege |
JPH0793255B2 (ja) * | 1987-07-23 | 1995-10-09 | 松下電器産業株式会社 | 微細パタ−ン形成方法 |
JPH01254944A (ja) * | 1988-04-04 | 1989-10-11 | Fuji Photo Film Co Ltd | ハロゲン化銀写真感光材料 |
NL8802928A (nl) * | 1988-11-28 | 1990-06-18 | Stork Screens Bv | Werkwijze en inrichting voor het vormen van een weerstandspatroon op een cylindrisch voorwerp alsmede een onder toepassing van een dergelijk weerstandspatroon verkregen geetste metalen cylinder. |
BE1002787A7 (fr) * | 1989-01-31 | 1991-06-11 | Centre Rech Metallurgique | Dispositif de fabrication, par electrodeposition, d'une feuille metallique perforee de faible epaisseur, ainsi que procedes de realisation et d'utilisation d'un tel dispositif. |
JP2727445B2 (ja) * | 1991-05-25 | 1998-03-11 | 株式会社 シンク・ラボラトリー | ロータリースクリーンの製造方法 |
US5328537A (en) * | 1991-12-11 | 1994-07-12 | Think Laboratory Co., Ltd. | Method for manufacturing screen printing plate |
US5334815A (en) * | 1992-01-15 | 1994-08-02 | Wear Guard Corp. | Apparatus and method for producing a printing screen |
US5573815A (en) * | 1994-03-07 | 1996-11-12 | E. I. Du Pont De Nemours And Company | Process for making improved metal stencil screens for screen printing |
-
1994
- 1994-02-12 DE DE4404560A patent/DE4404560C1/de not_active Revoked
-
1995
- 1995-02-09 DE DE59505958T patent/DE59505958D1/de not_active Expired - Lifetime
- 1995-02-09 ES ES95908917T patent/ES2133736T3/es not_active Expired - Lifetime
- 1995-02-09 AU AU17061/95A patent/AU1706195A/en not_active Abandoned
- 1995-02-09 WO PCT/EP1995/000458 patent/WO1995021951A1/de active IP Right Grant
- 1995-02-09 CN CN95190085A patent/CN1095881C/zh not_active Expired - Lifetime
- 1995-02-09 AT AT95908917T patent/ATE180291T1/de not_active IP Right Cessation
- 1995-02-09 US US08/535,131 patent/US5972194A/en not_active Expired - Lifetime
- 1995-02-09 EP EP95908917A patent/EP0694088B1/de not_active Expired - Lifetime
-
1999
- 1999-08-18 GR GR990402102T patent/GR3031024T3/el unknown
Also Published As
Publication number | Publication date |
---|---|
CN1123039A (zh) | 1996-05-22 |
DE59505958D1 (de) | 1999-06-24 |
US5972194A (en) | 1999-10-26 |
EP0694088A1 (de) | 1996-01-31 |
AU1706195A (en) | 1995-08-29 |
CN1095881C (zh) | 2002-12-11 |
DE4404560C1 (de) | 1995-08-24 |
ES2133736T3 (es) | 1999-09-16 |
WO1995021951A1 (de) | 1995-08-17 |
ATE180291T1 (de) | 1999-06-15 |
GR3031024T3 (en) | 1999-12-31 |
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