EP0607555B1 - Cleaning arrangement for a cooking oven - Google Patents
Cleaning arrangement for a cooking oven Download PDFInfo
- Publication number
- EP0607555B1 EP0607555B1 EP93119905A EP93119905A EP0607555B1 EP 0607555 B1 EP0607555 B1 EP 0607555B1 EP 93119905 A EP93119905 A EP 93119905A EP 93119905 A EP93119905 A EP 93119905A EP 0607555 B1 EP0607555 B1 EP 0607555B1
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- EP
- European Patent Office
- Prior art keywords
- muffle
- temperature
- heating body
- switching device
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C14/00—Stoves or ranges having self-cleaning provisions, e.g. continuous catalytic cleaning or electrostatic cleaning
- F24C14/005—Stoves or ranges having self-cleaning provisions, e.g. continuous catalytic cleaning or electrostatic cleaning using a cleaning liquid
Definitions
- the invention relates to an arrangement for cleaning a Oven, one muffle, one arranged below the muffle Radiator and possibly one above the Has muffle arranged radiator.
- This catalytic self cleaning is with a number of Disadvantages connected.
- the catalytic requires Self-cleaning, as already mentioned, a relatively high Temperature. This temperature should be chosen so that on the one hand the desired cleaning effect can be achieved can that on the other hand also damage or a Gradual destruction of the interior of the oven avoided becomes.
- Catalytic self-cleaning requires a high amount of energy and also has the further disadvantage that the oven when cleaning during a relative cannot be used for a long time.
- This Time is made up of the time in which the operating temperature is formed from the time of the actual cleaning and finally from the time that is required to cool the oven back down to a temperature safe operation of the oven allowed.
- the invention is based on this prior art the task based on an arrangement of the aforementioned Specify the type that simplifies the self-cleaning of ovens.
- this object is achieved by an arrangement which characterized in that the arrangement a Has switching device with which the below the muffle arranged radiators can be activated separately in the manner that the radiator arranged below the muffle is a first Temperature forms, which is introduced into a recess or a trough of the muffle Detergent evaporates.
- the arrangement according to the invention was characterized in that that only a comparatively low operating temperature of about 50 to 70 ° is required.
- the oven and in particular the muffle is by this temperature, which is far below the maximum operating temperature, for example for certain Baking and roasting is not affected.
- Corresponding to the comparatively low temperature for the Cleaning takes a short time to clean, so that the oven is long enough lets you use it as intended. It is it useful, more common in a household oven muffle Size and average pollution approx. 0.4 1 detergent heat about four minutes so that the soil pollution is intensified and then the heat supply to be dosed in such a way that e.g. 16 to 20 minutes this cleaning agent is partially evaporated and is reflected in the cool, other wall and door areas and releases the pollution there.
- the thus resolved Soiling can now be easily wiped off.
- the end of the resolution process should be signaled and optically and / or acoustically, so that the cheapest Time for the removal of the dissolved pollution is also displayed and can be used
- Another particular advantage of the arrangement according to the invention consists in the only necessary for cleaning low energy consumption.
- the muffle M shown in Figure 1 is in an electric oven arranged. However, the arrangement according to the invention is generally used in connection with ovens.
- the Muffle M is cuboid. In their floor area a depression, in particular a tub W, is arranged, the inclusion of a cleaning agent R, such as a soapy water or an enamel cleaner. Muffle M and trough W can be formed in one piece, alternatively a separate tub W is provided.
- FIG. 1 Below the muffle M is a in a known manner in Figure 1 electric radiator provided, which the bottom heat for generates the baking or roasting processes that can be carried out in the oven.
- This radiator is in particular by two radiator rods R1 and R2 formed along the side edges of the muffle bottom run approximately parallel, and from one Switching device shown in Figure 2 can be controlled.
- the oven can not another, in Figure 1 Radiators shown (RO in Figure 2) for the formation of Have top heat, being for baking or roasting the radiator R1, R2 and arranged below the muffle M.
- the radiator arranged above the muffle M at the same time by means of a corresponding switching device S (FIG. 2) can be activated so that the baked or fried food is and supply top heat.
- Both radiators can be used (RO; R1, R2 in Figure 2) designed for different powers be. If necessary, lower and upper heat individually in a specified performance range for the Set baking and roasting mode.
- the one inserted into the tub W or applied to the muffle bottom Detergent R is used by the one below the muffle M arranged radiators R1, R2 heated and eventually evaporated.
- the forms below the Muffle arranged radiators R1, R2 during two successive Periods different temperatures that first warm up the cleaning agent R and finally evaporate.
- a detergent solution for example, is used as the cleaning agent R. or an enamel cleaner.
- the first period lies e.g. in the range of 3 to 4 minutes while the second Period is in the range of 5 to 8 minutes.
- the period is determined by heating the cleaning agent R Contamination in the area of the muffle floor or the tub W solved.
- the evaporated cleaning agent arrives in the second period R directly onto the investment ring walls and the upper investment ring cover and acts directly on impurities located there a.
- a switching device 5 is shown with the the radiator R1, R2 arranged below the muffle M separately can be activated in such a way that this is a temperature forms the detergent introduced into the muffle M. R evaporates.
- the switching device S consists of an operating element B, that, for example, by a control knob, by a Key on a keyboard or by another input element is formed.
- the switching device S a circuit Z have triggered by the manual operation of the Control element B activates the radiator R1, R2 in the manner that the radiator R1, R2 in successive Generated periods of different temperatures, the Temperature in the second period (evaporation phase) is higher than the temperature in the previous period (warming phase).
- the evaporation temperature is 50, for example up to 70 ° C.
- the evaporated cleaning agent dissolves impurities on the Muffle M from the side walls and on the ceiling. Any more remaining impurities are relatively easy to manually remove.
- the electric radiator located below the muffle is represented by the ohmic resistors R1 and R2.
- the circuit component Z can further be configured in this way be that for regular baking and roasting of the furnace, triggered by the corresponding actuation of the Control element B, the radiator arranged below the muffle R1, R2 for the bottom heat together with one above the muffle arranged radiator RO via a switch SW3 is activated for the top heat.
- the switching component Z controls two switches SW1 and SW2 and thus the assignment of the two electrical heating elements R1, R2 to each other or to a voltage U.
- SW1 In a first switching position (SW1: “1”, SW2: “1”) they are Heating elements R1 and R2 connected in parallel; in a second Switch position (SW1: “2”) are the heating elements R1 and R2 in Series switched. With the first switch position becomes dependent the absolute amounts of the ohmic resistances R1 and R2 a higher heating output than in the second switching position educated.
- the switching device S can be the first and / or second temperature by clocked activation of the Form radiator R1, R2.
- first to fourth switching position; Clocking are timed by the circuit component Z. controlled in such a way that the heating phase (“first Period ”) is limited to about 3 to 4 minutes while the evaporation phase immediately following in particular (“second period”) limited to a further 5 to 8 minutes becomes.
Description
Die Erfindung betrifft eine Anordnung zur Reinigung eines Backofens, der eine Muffel, einen unterhalb der Muffel angeordneten Heizkörper und gegebenenfalls einen oberhalb der Muffel angeordneten Heizkörper aufweist.The invention relates to an arrangement for cleaning a Oven, one muffle, one arranged below the muffle Radiator and possibly one above the Has muffle arranged radiator.
Es sind bereits Backöfen bekannt, bei denen sowohl der unterhalb der Muffel angeordnete Heizkörper als auch der oberhalb der Muffel angeordnete Heizkörper neben dem Backen bzw. dem sonstigen Zubereiten von Speisen in der Muffel auch für eine sogenannte katalytische Selbstreinigung der Muffel benutzt wird. Dabei wird der Muffelinnenraum auf eine hohe Temperatur (> 550°C) gebracht, um verunreinigte Stellen an den Muffelinnenwänden zu entfernen.Ovens are already known in which both the below the muffle arranged radiator as well as the one above the muffle arranged radiators next to the jaws or other preparation of food in the muffle also for a so-called catalytic self-cleaning of the muffle is used becomes. The interior of the muffle is high Brought temperature (> 550 ° C) to contaminated areas to remove the muffle inner walls.
Diese katalytische Selbstreinigung ist mit einer Reihe von Nachteilen verbunden. Zunächst erfordert die katalytische Selbstreinigung, wie bereits erwähnt, eine relative hohe Temperatur. Diese Temperatur ist dabei so zu wählen, daß einerseits der gewünschte Reinigungseffekt erzielt werden kann, daß andererseits aber auch Beschädigungen bzw. eine allmähliche Zerstörung des Backofeninnenraums vermieden wird.This catalytic self cleaning is with a number of Disadvantages connected. First, the catalytic requires Self-cleaning, as already mentioned, a relatively high Temperature. This temperature should be chosen so that on the one hand the desired cleaning effect can be achieved can that on the other hand also damage or a Gradual destruction of the interior of the oven avoided becomes.
Die katalytische Selbstreinigung erfordert einen hohen Energieeinsatz und ist auch mit dem weiteren Nachteil verbunden, daß der Backofen bei einer Reinigung während einer relativ langen Zeit anderweitig nicht genutzt werden kann. Diese Zeit setzt sich aus der Zeit zusammen, in der die Betriebstemperatur gebildet wird, aus der Zeit der eigentlichen Reinigung und schließlich aus der Zeit, die erforderlich ist, den Backofen wieder auf eine Temperatur abzukühlen die eine gefahrlose Bedienung des Backofens erlaubt.Catalytic self-cleaning requires a high amount of energy and also has the further disadvantage that the oven when cleaning during a relative cannot be used for a long time. This Time is made up of the time in which the operating temperature is formed from the time of the actual cleaning and finally from the time that is required to cool the oven back down to a temperature safe operation of the oven allowed.
Ausgehend von diesem Stand der Technnik liegt der Erfindung die Aufgabe zugrunde, eine Anordnung der eingangs genannten Art anzugeben, die die Selbstreinigung von Backöfen vereinfacht.The invention is based on this prior art the task based on an arrangement of the aforementioned Specify the type that simplifies the self-cleaning of ovens.
Diese Aufgabe wird erfindungsgemäß durch eine Anordnung gelöst, die dadurch gekennzeichnet, daß die Anordnung eine Schaltvorrichtung aufweist, mit der der unterhalb der Muffel angeordnete Heizkörper separat in der Weise aktivierbar ist, daß der unterhalb der Muffel angeordnete Heizkörper eine erste Temperatur bildet, die ein in eine Vertiefung bzw. eine Wanne der Muffel eingebrachtes Reinigungsmittel verdampft.According to the invention, this object is achieved by an arrangement which characterized in that the arrangement a Has switching device with which the below the muffle arranged radiators can be activated separately in the manner that the radiator arranged below the muffle is a first Temperature forms, which is introduced into a recess or a trough of the muffle Detergent evaporates.
Die erfindungsgemäße Anordnung zeichnete sich dadurch aus, daß nur eine vergleichsweise geringe Betriebstemperatur von etwa 50 bis 70° erforderlich ist. Der Backofen und insbesondere die Muffel wird durch diese Temperatur, die weit unterhalb der maximalen Betriebstemperatur, zum Beispiel für bestimmte Back- und Bratvorgänge liegt, nicht beeinträchtigt. Entsprechend der vergleichsweise geringen Tempratur für die Reinigung wird für die Reinigung eine nur kurze Zeit beansprucht, so daß sich der Backofen entsprechend lange für seinen bestimmungsgemäßen Gebrauch einsetzen läßt. Dabei ist es zweckmäßig, bei einer Haushalts-Backofenmuffel üblicher Größe und durchschnittlicher Verschmutzung ca. 0,4 1 Reinigungsmittel ca. vier Minuten zu erwärmen, so daß die Bodenverschmutzung intensiviert angelöst wird und danach die Wärmezufuhr dahingehend zu dosieren, daß für z.B. 16 bis 20 Minuten dieses Reinigungsmittel teilweise verdampft wird und sich an den kühlen, sonstigen Wand- und Türbereichen abschlägt und die dortige Verschmutzung anlöst. Die somit angelösten Verschmutzungen sind nunmehr leicht auswischbar. Das Ende des Anlösungsprozesses sollte signalisiert werden, und zwar optisch und/oder akustisch, damit der günstigste Zeitpunkt für die Entfernung der angelösten Verschmutzung auch angezeigt wird und genutzt werden kann.The arrangement according to the invention was characterized in that that only a comparatively low operating temperature of about 50 to 70 ° is required. The oven and in particular the muffle is by this temperature, which is far below the maximum operating temperature, for example for certain Baking and roasting is not affected. Corresponding to the comparatively low temperature for the Cleaning takes a short time to clean, so that the oven is long enough lets you use it as intended. It is it useful, more common in a household oven muffle Size and average pollution approx. 0.4 1 detergent heat about four minutes so that the soil pollution is intensified and then the heat supply to be dosed in such a way that e.g. 16 to 20 minutes this cleaning agent is partially evaporated and is reflected in the cool, other wall and door areas and releases the pollution there. The thus resolved Soiling can now be easily wiped off. The end of the resolution process should be signaled and optically and / or acoustically, so that the cheapest Time for the removal of the dissolved pollution is also displayed and can be used.
Ein weiterer besonderer Vorteil der erfindungsgemäßen Anordnung besteht in dem für die Reinigung erforderlichen, nur geringen Energieeinsatz.Another particular advantage of the arrangement according to the invention consists in the only necessary for cleaning low energy consumption.
Die Erfindung wird nun anhand der Zeichnungen beschrieben. Es zeigt:
- Fig. 1
- eine perspektivische Darstellung einer Backofenmuffel der erfindungsgemäßen Anordnung und
- Fig. 2
- eine schaltungstechnische Ausgestaltung der erfindungsgemäßen Anordnung.
- Fig. 1
- a perspective view of an oven muffle of the arrangement according to the invention and
- Fig. 2
- a circuit design of the arrangement according to the invention.
Die in Figur 1 dargestellte Muffel M ist in einem Elektrobackofen angeordnet. Die erfindungsgemäße Anordnung ist jedoch allgemein im Zusammenhang mit Backöfen einsetzbar. Die Muffel M ist quaderförmig ausgebildet. In ihrem Bodenbereich ist eine Vertiefung, insbesondere eine Wanne W angeordnet, die der Aufnahme eines Reinigungsmittels R, wie beispielsweise einer Spüllauge oder eines Email-Reinigers, dient. Muffel M und Wanne W können einteilig ausgebildet sein, alternativ ist eine saparate Wanne W vorgesehen.The muffle M shown in Figure 1 is in an electric oven arranged. However, the arrangement according to the invention is generally used in connection with ovens. The Muffle M is cuboid. In their floor area a depression, in particular a tub W, is arranged, the inclusion of a cleaning agent R, such as a soapy water or an enamel cleaner. Muffle M and trough W can be formed in one piece, alternatively a separate tub W is provided.
Unterhalb der Muffel M ist in bekannter Weise ein in Figur 1 elektrischer Heizkörper vorgesehen, der die Unterhitze für die im Backofen durchführbaren Back- bzw. Bratvorgänge erzeugt. Dieser Heizkörper ist insbesondere durch zwei Heizkörperstäbe R1 und R2 gebildet, die längs der Seitenkanten des Muffelbodens in etwa parallel verlaufen, und von einer in Figur 2 dargestellten Schaltvorrichtung angesteuert werden.Below the muffle M is a in a known manner in Figure 1 electric radiator provided, which the bottom heat for generates the baking or roasting processes that can be carried out in the oven. This radiator is in particular by two radiator rods R1 and R2 formed along the side edges of the muffle bottom run approximately parallel, and from one Switching device shown in Figure 2 can be controlled.
Ferner kann der Backofen einen weiteren, in Figur 1 nicht dargestellten Heizkörper (RO in Figur 2) für die Bildung der Oberhitze aufweisen, wobei für den Back- bzw. Bratbetrieb der unterhalb der Muffel M angeordnete Heizkörper R1, R2 und der oberhalb der Muffel M angeordnete Heizkörper gleichzeitig durch eine entsprechende Schaltvorrichtung S (Figur 2) aktivierbar sind, um dem Back- bzw. Bratgut gleichzeitig Unter- und Oberhitze zuzuführen. Dabei können beide Heizkörper (RO; R1, R2 in Figur 2) für unterschiedliche Leistungen ausgelegt sein. Gegebenenfalls lassen sich Unter- und Oberhitze individuell in einem vorgegebenen Leistungsbereich für den Back- und Bratbetrieb einstellen.Furthermore, the oven can not another, in Figure 1 Radiators shown (RO in Figure 2) for the formation of Have top heat, being for baking or roasting the radiator R1, R2 and arranged below the muffle M. the radiator arranged above the muffle M at the same time by means of a corresponding switching device S (FIG. 2) can be activated so that the baked or fried food is and supply top heat. Both radiators can be used (RO; R1, R2 in Figure 2) designed for different powers be. If necessary, lower and upper heat individually in a specified performance range for the Set baking and roasting mode.
Die elektrotechnische Ansteuerung des unterhalb der Muffel M angeordneten Heizkörpers wird unten anhand von Figur 2 erläutert. The electrotechnical control of the M arranged radiator is explained below with reference to Figure 2.
Das in die Wanne W eingeführte bzw. auf den Muffelboden aufgetragene Reinigungsmittel R wird durch die von dem unterhalb der Muffel M angeordneten Heizkörper R1, R2 erwärmt und schließlich verdampft. Insbesondere bildet der unterhalb der Muffel angeordnete Heizkörper R1, R2 während zweier aufeinanderfolgender Zeiträume unterschiedliche Temperaturen, die zunächst das Reinmigungsmittel R erwärmen und schließlich verdampfen.The one inserted into the tub W or applied to the muffle bottom Detergent R is used by the one below the muffle M arranged radiators R1, R2 heated and eventually evaporated. In particular, the forms below the Muffle arranged radiators R1, R2 during two successive Periods different temperatures that first warm up the cleaning agent R and finally evaporate.
Als Reinigungsmittel R wird beispielsweise eine Spüllauge oder ein Email-Reinigungsmittel benutzt. Der erste Zeitraum liegt z.B. im Bereich von 3 bis 4 Minuten, während der zweite Zeitraum im Bereich von 5 bis 8 Minuten liegt. Im ersten Zeitraum werden durch die Erwärmung des Reinigungsmittels R Verunreinigungen im Bereich des Muffelbodens bzw. der Wanne W gelöst. Im zweiten Zeitraum gelangt das verdampfte Reinigungsmittel R direkt auf die Muffelwände und die obere Muffelabdeckung und wirkt unmittelbar auf dort befindliche Verunreinigungen ein.A detergent solution, for example, is used as the cleaning agent R. or an enamel cleaner. The first period lies e.g. in the range of 3 to 4 minutes while the second Period is in the range of 5 to 8 minutes. In the first The period is determined by heating the cleaning agent R Contamination in the area of the muffle floor or the tub W solved. The evaporated cleaning agent arrives in the second period R directly onto the investment ring walls and the upper investment ring cover and acts directly on impurities located there a.
In Figur 2 ist eine Schaltvorrichtung 5 dargestellt, mit der der unterhalb der Muffel M angeordnete Heizkörper R1, R2 separat in der Weise aktivierbar ist, daß dieser eine Temperatur bildet, die das in die Muffel M eingeführte Reinigungsmittel R verdampft.In Figure 2, a switching device 5 is shown with the the radiator R1, R2 arranged below the muffle M separately can be activated in such a way that this is a temperature forms the detergent introduced into the muffle M. R evaporates.
Die Schaltvorrichtung S besteht aus einem Bedienelement B, das beispielsweise durch einen Schaltdrehknopf, durch eine Taste einer Tastatur oder durch ein sonstiges Eingabeelement gebildet ist.The switching device S consists of an operating element B, that, for example, by a control knob, by a Key on a keyboard or by another input element is formed.
Zusätzlich kann die Schaltvorrichtung S eine Schaltung Z aufweisen, die ausgelöst durch die manuelle Betätigung des Bedienelements B den Heizkörper R1, R2 in der Weise aktiviert, daß der Heizkörper R1, R2 in aufeinanderfolgenden Zeiträumen unterschiedliche Temperaturen erzeugt, wobei die Temperatur im zweiten Zeitraum (Verdampfungsphase) höher ist als die Temperatur im vorangegangenen Zeitraum (Erwärmungsphase). Die Verdampfungstemperatur beträgt beispielsweise 50 bis 70°C.In addition, the switching device S a circuit Z have triggered by the manual operation of the Control element B activates the radiator R1, R2 in the manner that the radiator R1, R2 in successive Generated periods of different temperatures, the Temperature in the second period (evaporation phase) is higher than the temperature in the previous period (warming phase). The evaporation temperature is 50, for example up to 70 ° C.
Das verdampfte Reinigungsmittel löst Verunreinigungen an den Seitenwänden und an der Decke der Muffel M ab. Etwaige noch verbleibende Verunreinigungen lassen sich relativ leicht manuell entfernen.The evaporated cleaning agent dissolves impurities on the Muffle M from the side walls and on the ceiling. Any more remaining impurities are relatively easy to manually remove.
Der unterhalb der Muffel angeordnete elektrische Heizkörper ist durch die ohmschen Widerstände R1 und R2 dargestellt.The electric radiator located below the muffle is represented by the ohmic resistors R1 and R2.
Die Schaltungskomponente Z kann weiter in der Weise ausgestaltet sein, daß für den regulären Back- und Bratbetrieb des Ofens, ausgelöst durch die entsprechende Betätigung des Bedienelements B, der unterhalb der Muffel angeordnete Heizkörper R1, R2 für die Unterhitze gemeinsam mit einem oberhalb der Muffel angeordneten Heizkörper RO über einen Schalter SW3 für die Oberhitze aktiviert wird.The circuit component Z can further be configured in this way be that for regular baking and roasting of the furnace, triggered by the corresponding actuation of the Control element B, the radiator arranged below the muffle R1, R2 for the bottom heat together with one above the muffle arranged radiator RO via a switch SW3 is activated for the top heat.
Die Schaltkomponente Z steuert zwei Schalter SW1 und SW2 und damit die Zuordnung der beiden elektrischen Heizelemente R1, R2 zueinander bzw. zu einer Spannung U.The switching component Z controls two switches SW1 and SW2 and thus the assignment of the two electrical heating elements R1, R2 to each other or to a voltage U.
In einer ersten Schaltstellung (SW1: "1", SW2: "1") sind die Heizelemente R1 und R2 parallel geschaltet; in einer zweiten Schaltstellung (SW1: "2") sind die Heizelemente R1 und R2 in Serie geschaltet. Mit der ersten Schaltstellung wird in Abhängigkeit der absoluten Beträge der ohmschen Widerstände R1 und R2 eine höher Heizleistung als in der zweiten Schaltstellung gebildet.In a first switching position (SW1: "1", SW2: "1") they are Heating elements R1 and R2 connected in parallel; in a second Switch position (SW1: "2") are the heating elements R1 and R2 in Series switched. With the first switch position becomes dependent the absolute amounts of the ohmic resistances R1 and R2 a higher heating output than in the second switching position educated.
Darüberhinaus kann in einer dritten Schaltstellung (SW1: "1", SW2: "2") nur das Heizelement R1 aktiviert werden und in einer vierten Schaltstellung (SW1: "2", SW2: "1") wird nur das Heizelement R2 aktiviert. Je nach Ausgestaltung von R1 und R2 lassen sich damit bei einer vorgegebenen Betriebsspannung U weitere (erste und zweite) Temperaturen für die Erwärmungs- und Verdampfungsphase bilden.In addition, in a third switching position (SW1: "1", SW2: "2") only the heating element R1 can be activated and in a fourth switching position (SW1: "2", SW2: "1") only heating element R2 activated. Depending on the design of R1 and R2 can thus be used for a given operating voltage U further (first and second) temperatures for the Form heating and evaporation phase.
Unabhängig von diesen Umschaltmöglichkeiten (Reihen-/Parallelschaltung von R1 und R2 sowie der wahlweisen Anschaltung von R1 oder R2 kann die Schaltvorrichtung S die erste und-/ oder zweite Temperatur durch eine getaktete Ansteuerung des Heizkörpers R1, R2 bilden.Regardless of these switching options (series / parallel connection of R1 and R2 as well as the optional connection of R1 or R2, the switching device S can be the first and / or second temperature by clocked activation of the Form radiator R1, R2.
Die genannten Ansteuervorgänge (erste bis vierte Schaltstellung; Taktung) werden von der Schaltungskomponente Z zeitlich in der Weise gesteuert, daß die Erwärmungsphase ("erster Zeitraum") auf etwa 3 bis 4 Minuten begrenzt wird, während die insbesondere unmittelbar folgende Verdampfungsphase ("zweiter Zeitraum") auf weitere 5 bis 8 Minuten begrenzt wird.The control processes mentioned (first to fourth switching position; Clocking) are timed by the circuit component Z. controlled in such a way that the heating phase ("first Period ") is limited to about 3 to 4 minutes while the evaporation phase immediately following in particular ("second period") limited to a further 5 to 8 minutes becomes.
Claims (5)
- Arrangement for the cleaning of a baking oven, which comprises a muffle, a heating body arranged below the muffle and optionally also a heating body arranged above the muffle, characterised thereby that the arrangement comprises a switching device (5), by which the heating body (R1, R2) arranged under the muffle (M) can be separately activated in such a way that the heating body (R1, R2) arranged under the muffle (M) forms a first temperature which evaporates a cleaning agent (R) brought into a depression or a sump (W) of the muffle (M).
- Arrangement according to claim 1, characterised thereby that the heating body (R1, R2) arranged under the muffle (M) can be separately activated in such a way by the switching device that the heating body (R1, R2) arranged under the muffle (M) forms, during a first time period, a second temperature which lies below the first temperature and forms, during a second time period, the first temperature.
- Arrangement according to one of the preceding claims, characterised thereby that the heating body (R1, R2) consists of two electrical heating elements (R1, R2) which are connectible selectably in parallel or in series by a switching device (S).
- Arrangement according to one of the preceding claims, characterised thereby that the switching device (S) forms the first and/or second temperature by a keyed drive control of the heating body (R1, R2).
- Arrangement according to one of the preceding claims, characterised thereby that the muffle (M) has a depression (W) for reception of the cleaning agent (R).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4243947A DE4243947A1 (en) | 1992-12-23 | 1992-12-23 | Arrangement for cleaning an oven |
| DE4243947 | 1992-12-23 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0607555A2 EP0607555A2 (en) | 1994-07-27 |
| EP0607555A3 EP0607555A3 (en) | 1996-02-07 |
| EP0607555B1 true EP0607555B1 (en) | 1998-11-04 |
Family
ID=6476453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP93119905A Expired - Lifetime EP0607555B1 (en) | 1992-12-23 | 1993-12-09 | Cleaning arrangement for a cooking oven |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0607555B1 (en) |
| DE (2) | DE4243947A1 (en) |
| SI (1) | SI9300662A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19614439A1 (en) | 1996-04-12 | 1997-10-16 | Wiesheu Wiwa Gmbh | Furnace and method for cleaning a furnace space |
| DE102009001739B3 (en) * | 2009-03-23 | 2010-11-25 | BSH Bosch und Siemens Hausgeräte GmbH | Steam cooking device, has control unit heated to specific temperature and heating unit, which generates hot air, is reduced in power or switched off during steam generation, where steam generation takes place in operating mode of device |
| DE102011010283A1 (en) * | 2011-02-03 | 2012-08-09 | i-clean Technologies GmbH | Purifying household cooking appliance with cooking chamber for receiving attributable finished ready foods, comprises adding a cleaning solution A in a cooking chamber, and starting a first cleaning cycle |
| DE102014201427A1 (en) * | 2014-01-27 | 2015-07-30 | BSH Hausgeräte GmbH | Garofenvorrichtung |
| EP2944881B1 (en) | 2014-05-16 | 2020-03-25 | Electrolux Appliances Aktiebolag | Steam oven cleaning method |
| IT201800005863A1 (en) * | 2018-05-30 | 2019-11-30 | ELECTRICALLY POWERED OVEN AND OPERATING METHOD OF THIS OVEN |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3550576A (en) * | 1968-11-22 | 1970-12-29 | Burger Eisenwerke Ag | Food-treatment apparatus with washing means |
| DE2842771A1 (en) * | 1978-09-30 | 1980-04-10 | Lechmetall Landsberg Gmbh | Oven cleaning appts. using liq. sprays and steam - has supply system for changing from water to cleaning liq. |
| DE8631399U1 (en) * | 1986-11-24 | 1987-07-02 | Convotherm Elektrogeraete Gmbh, 8111 Eglfing, De | |
| US5193491A (en) * | 1991-04-01 | 1993-03-16 | Delaware Capital Formation, Inc. | Cleaning system for boiler |
-
1992
- 1992-12-23 DE DE4243947A patent/DE4243947A1/en not_active Withdrawn
-
1993
- 1993-12-09 DE DE59309110T patent/DE59309110D1/en not_active Expired - Lifetime
- 1993-12-09 EP EP93119905A patent/EP0607555B1/en not_active Expired - Lifetime
- 1993-12-16 SI SI9300662A patent/SI9300662A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE59309110D1 (en) | 1998-12-10 |
| SI9300662A (en) | 1994-06-30 |
| EP0607555A2 (en) | 1994-07-27 |
| EP0607555A3 (en) | 1996-02-07 |
| DE4243947A1 (en) | 1994-06-30 |
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