EP0341983A3 - Belichtungssystem - Google Patents

Belichtungssystem Download PDF

Info

Publication number
EP0341983A3
EP0341983A3 EP89304684A EP89304684A EP0341983A3 EP 0341983 A3 EP0341983 A3 EP 0341983A3 EP 89304684 A EP89304684 A EP 89304684A EP 89304684 A EP89304684 A EP 89304684A EP 0341983 A3 EP0341983 A3 EP 0341983A3
Authority
EP
European Patent Office
Prior art keywords
mask
wafer
pattern
supporting
reflective member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP89304684A
Other languages
English (en)
French (fr)
Other versions
EP0341983B1 (de
EP0341983A2 (de
Inventor
Eigo Kawakami
Minoru Yoshii
Shunichi Uzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of EP0341983A2 publication Critical patent/EP0341983A2/de
Publication of EP0341983A3 publication Critical patent/EP0341983A3/de
Application granted granted Critical
Publication of EP0341983B1 publication Critical patent/EP0341983B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP89304684A 1988-05-10 1989-05-09 Belichtungssystem Expired - Lifetime EP0341983B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63111457A JP2799570B2 (ja) 1988-05-10 1988-05-10 露光装置
JP111457/88 1988-05-10

Publications (3)

Publication Number Publication Date
EP0341983A2 EP0341983A2 (de) 1989-11-15
EP0341983A3 true EP0341983A3 (de) 1990-06-13
EP0341983B1 EP0341983B1 (de) 1997-09-03

Family

ID=14561716

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89304684A Expired - Lifetime EP0341983B1 (de) 1988-05-10 1989-05-09 Belichtungssystem

Country Status (3)

Country Link
EP (1) EP0341983B1 (de)
JP (1) JP2799570B2 (de)
DE (1) DE68928288T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5168512A (en) * 1990-03-13 1992-12-01 Canon Kabushiki Kaisha Method of manufacture of semiconductor devices
US5195113A (en) * 1990-09-28 1993-03-16 Kabushiki Kaisha Toshiba X-ray exposure apparatus and method of positioning the same
TWI794924B (zh) * 2020-08-31 2023-03-01 美商希瑪有限責任公司 光學元件對準之設備及方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2274073A1 (fr) * 1974-06-06 1976-01-02 Ibm Procede de positionnement automatique des surfaces d'image et/ou d'objet dans les copieurs optiques
US4524280A (en) * 1981-07-27 1985-06-18 Tokyo Shibaura Denki Kabushiki Kaisha Method for detecting displacement of semiconductor device
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61276222A (ja) * 1985-05-30 1986-12-06 Nec Corp Ｘ線露光アライメント方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2274073A1 (fr) * 1974-06-06 1976-01-02 Ibm Procede de positionnement automatique des surfaces d'image et/ou d'objet dans les copieurs optiques
US4524280A (en) * 1981-07-27 1985-06-18 Tokyo Shibaura Denki Kabushiki Kaisha Method for detecting displacement of semiconductor device
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B *

Also Published As

Publication number Publication date
EP0341983B1 (de) 1997-09-03
DE68928288D1 (de) 1997-10-09
JP2799570B2 (ja) 1998-09-17
JPH01282817A (ja) 1989-11-14
DE68928288T2 (de) 1998-01-22
EP0341983A2 (de) 1989-11-15

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