DE68928288T2 - Belichtungssystem - Google Patents
BelichtungssystemInfo
- Publication number
- DE68928288T2 DE68928288T2 DE1989628288 DE68928288T DE68928288T2 DE 68928288 T2 DE68928288 T2 DE 68928288T2 DE 1989628288 DE1989628288 DE 1989628288 DE 68928288 T DE68928288 T DE 68928288T DE 68928288 T2 DE68928288 T2 DE 68928288T2
- Authority
- DE
- Germany
- Prior art keywords
- exposure system
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63111457A JP2799570B2 (ja) | 1988-05-10 | 1988-05-10 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68928288D1 DE68928288D1 (de) | 1997-10-09 |
DE68928288T2 true DE68928288T2 (de) | 1998-01-22 |
Family
ID=14561716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1989628288 Expired - Fee Related DE68928288T2 (de) | 1988-05-10 | 1989-05-09 | Belichtungssystem |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0341983B1 (de) |
JP (1) | JP2799570B2 (de) |
DE (1) | DE68928288T2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69128207T2 (de) * | 1990-03-13 | 1998-04-16 | Canon Kk | Belichtungsanordnung mittels Synchrotronstrahlung |
US5195113A (en) * | 1990-09-28 | 1993-03-16 | Kabushiki Kaisha Toshiba | X-ray exposure apparatus and method of positioning the same |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1037606B (it) * | 1974-06-06 | 1979-11-20 | Ibm | Apparecchiatura ottica perfezionata utile per la fabbricazione di circuiti integrati |
JPS5818922A (ja) * | 1981-07-27 | 1983-02-03 | Toshiba Corp | 半導体装置 |
JPS61276222A (ja) * | 1985-05-30 | 1986-12-06 | Nec Corp | X線露光アライメント方法 |
US4724466A (en) * | 1986-01-17 | 1988-02-09 | Matsushita Electric Industrial Co., Ltd. | Exposure apparatus |
-
1988
- 1988-05-10 JP JP63111457A patent/JP2799570B2/ja not_active Expired - Fee Related
-
1989
- 1989-05-09 DE DE1989628288 patent/DE68928288T2/de not_active Expired - Fee Related
- 1989-05-09 EP EP89304684A patent/EP0341983B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2799570B2 (ja) | 1998-09-17 |
EP0341983A3 (de) | 1990-06-13 |
DE68928288D1 (de) | 1997-10-09 |
JPH01282817A (ja) | 1989-11-14 |
EP0341983B1 (de) | 1997-09-03 |
EP0341983A2 (de) | 1989-11-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |