EP0270968B1 - Röntgen-Mikroskop - Google Patents

Röntgen-Mikroskop Download PDF

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Publication number
EP0270968B1
EP0270968B1 EP87117658A EP87117658A EP0270968B1 EP 0270968 B1 EP0270968 B1 EP 0270968B1 EP 87117658 A EP87117658 A EP 87117658A EP 87117658 A EP87117658 A EP 87117658A EP 0270968 B1 EP0270968 B1 EP 0270968B1
Authority
EP
European Patent Office
Prior art keywords
ray
radiation
fact
layer
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP87117658A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0270968A3 (en
EP0270968A2 (de
Inventor
Günter Prof. Dr. Schmahl
Dietbert Dr. Rudolph
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
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Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of EP0270968A2 publication Critical patent/EP0270968A2/de
Publication of EP0270968A3 publication Critical patent/EP0270968A3/de
Application granted granted Critical
Publication of EP0270968B1 publication Critical patent/EP0270968B1/de
Anticipated expiration legal-status Critical
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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes

Definitions

  • the present invention relates to an X-ray microscope in which the object is illuminated coherently or partially coherently with quasi monochromatic X-ray radiation via a condenser and is magnified in the image plane by means of a high-resolution X-ray objective designed as a zone plate.
  • each imaging element that is to say, the condenser and the X-ray objective
  • a zone plate consists of a large number of very thin rings, for example made of gold, which are applied to a thin carrier film (for example made of polyimide). These rings form a circular grid with a radially increasing line density.
  • the zone plates diffract the incident monochromatic X-ray radiation of the wavelength and thus cause an image.
  • the contrast in the image is mediated by photoelectric absorption in the object, i.e. structures are imaged which effect an amplitude modulation of the X-rays passing through.
  • the wavelength range of the X-rays which is between 2.4 nm and 4.5 nm, ie between the oxygen K edge and the carbon K edge, is particularly suitable.
  • This area is also known as the water window, since water has a transmission that is about ten times higher than that of organic materials. In this wavelength range, organic materials and thus cells and cell organelles can be examined in a living state.
  • the resolution achieved so far in X-ray microscopy is about a factor of 10 better than in light microscopy, with a further increase in X-ray microscope resolution by about an order of magnitude being still possible.
  • the limit resolution in X-ray microscopy of amplitude structures will be given by the radiation exposure of the objects to be examined.
  • This object is achieved, starting from an X-ray microscope according to the invention, in that an element is arranged in the Fourier plane of the X-ray objective, which extends over the area affected by the zero or a preselected other order of the radiation refracted by the object and gives the transmitted radiation a phase shift and that the element additionally has an absorbing effect to compensate for the intensities of the different orders, the areas with absorbing effect and with phase shifting effect being distributed over different areas in the Fourier plane of the X-ray objective.
  • phase-shifting properties of object structures are used to form contrast.
  • the phase-shifting element arranged in the beam path gives the preselected order of the X-ray radiation coming from the object a phase shift with respect to the other radiation coming from the object that does not pass through the element.
  • the phase-shifted and the unaffected radiation components interfere in the image plane and thereby generate a contrast-correct, enlarged picture of the object.
  • the quantity ⁇ describes the absorption, which becomes smaller as the wavelength ⁇ of the X-ray radiation becomes shorter.
  • the size ⁇ is decisive for the phase shift which is given to the continuous X-ray radiation.
  • the size ⁇ generally varies very slowly with the wavelength. For this reason, when the phase shift is used by the object, a significant improvement in the contrast in the image can be achieved.
  • images can also be generated with a lower radiation exposure to the object, the contrast of which is no worse than when the amplitude contrast is used with higher radiation exposure.
  • phase-shifting element is designed according to claim 5.
  • n 1 - ⁇ - i ⁇ shows is always associated with a phase shift also an absorbing effect.
  • this also applies to the phase-shifting element used in the X-ray microscope according to the invention. Therefore, the intensities of the interfering orders in the image plane of the radiation coming from the object are adjusted to each other.
  • the phase-shifting and the absorbing effect of the phase-shifting element is distributed over different corresponding surfaces in the Fourier plane of the X-ray objective.
  • the radiation passing through these corresponding surfaces is influenced independently of one another in phase and amplitude, specifically in such a way that the intensities of the radiation interfering in the image plane are matched to one another.
  • the radiation coming from an X-ray source is designated by (1).
  • a synchrotron or another source described in Part 1 of the book “X-Ray Microscopy” by Schmahl and Rudolph, Springer-Verlag 1984 can be used as the X-ray source.
  • the x-ray radiation passes through an x-ray condenser (2) and is guided by this to the object (3) to be observed, which is arranged on a central diaphragm (4).
  • the X-ray radiation deflected by the object (3) passes through a high-resolution X-ray lens (5) and is imaged by the latter into the image plane (6).
  • the Fourier plane of the lens (5) is designated, in which the decomposition of the radiation passing through the object (3) is found in harmonic Fourier components. This distribution is represented again in the image plane (6) by a Fourier inverse transformation as a real image.
  • Zone plates such as are shown, for example, in FIG. 2 are advantageously used as imaging elements (2) and (5).
  • This zone plate consists of a large number of rings which are placed on a very thin carrier foil, e.g. are applied from polyimide.
  • the rings are usually made of gold or chrome and have a low layer thickness of approx. 0.1 ⁇ m.
  • the rings form a circular grid with a radially increasing line density.
  • a phase-shifting and / or absorbing element (8) is arranged in the Fourier plane (7) of the objective (5).
  • This consists, as shown in FIG. 3, of a thin carrier film (9) which is contained in a ring (10) and on which a thin layer of phase-shifting material, for example chrome in the form a central circular disc (11) is applied.
  • the zero-order X-ray radiation (1) coming from the object (3) penetrates the central circular disk (11).
  • This radiation is given a phase shift of 90 ° with respect to the orders diffracted by the object structures.
  • the image plane (6) there is interference between the phase-shifted radiation and the uninfluenced radiation and thus a high-contrast, enlarged image of the object (3) is created, which can be captured directly on a photosensitive layer, for example.
  • FIG 4 shows an exemplary embodiment of an element (8) used for phase shift and / or absorption, in which a ring (12) made of the appropriate material, for example chromium, is attached to the carrier film (9).
  • This ring gives higher orders of the radiation deflected by the object a phase shift. Which order is to be influenced is determined by the diameter and the width of the ring (12).

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Microscoopes, Condenser (AREA)
  • Liquid Crystal Substances (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
EP87117658A 1986-12-12 1987-11-28 Röntgen-Mikroskop Expired - Lifetime EP0270968B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863642457 DE3642457A1 (de) 1986-12-12 1986-12-12 Roentgen-mikroskop
DE3642457 1986-12-12

Publications (3)

Publication Number Publication Date
EP0270968A2 EP0270968A2 (de) 1988-06-15
EP0270968A3 EP0270968A3 (en) 1989-08-02
EP0270968B1 true EP0270968B1 (de) 1993-12-15

Family

ID=6316038

Family Applications (1)

Application Number Title Priority Date Filing Date
EP87117658A Expired - Lifetime EP0270968B1 (de) 1986-12-12 1987-11-28 Röntgen-Mikroskop

Country Status (5)

Country Link
US (1) US4870674A (da)
EP (1) EP0270968B1 (da)
JP (1) JPH0814640B2 (da)
DE (2) DE3642457A1 (da)
DK (1) DK174016B1 (da)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH678663A5 (da) * 1988-06-09 1991-10-15 Zeiss Carl Fa
US5199057A (en) * 1989-08-09 1993-03-30 Nikon Corporation Image formation-type soft X-ray microscopic apparatus
JP2775949B2 (ja) * 1990-01-10 1998-07-16 株式会社ニコン Ｘ線光学素子保持枠
US5022061A (en) * 1990-04-30 1991-06-04 The United States Of America As Represented By The United States Department Of Energy An image focusing means by using an opaque object to diffract x-rays
US5204887A (en) * 1990-06-01 1993-04-20 Canon Kabushiki Kaisha X-ray microscope
DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
US5432607A (en) * 1993-02-22 1995-07-11 International Business Machines Corporation Method and apparatus for inspecting patterned thin films using diffracted beam ellipsometry
US5432349A (en) * 1993-03-15 1995-07-11 The United State Of America As Represented By The Secretary Of The Navy Fourier transform microscope for x-ray and/or gamma-ray imaging
DE4432811B4 (de) * 1993-09-15 2006-04-13 Carl Zeiss Phasenkontrast-Röntgenmikroskop
JP3741411B2 (ja) * 1999-10-01 2006-02-01 株式会社リガク Ｘ線集光装置及びｘ線装置
KR100689308B1 (ko) * 2002-03-05 2007-03-26 아부베케로비츠 쿠마크호브 무라딘 엑스선 현미경
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
US7365909B2 (en) * 2002-10-17 2008-04-29 Xradia, Inc. Fabrication methods for micro compounds optics
US7119953B2 (en) * 2002-12-27 2006-10-10 Xradia, Inc. Phase contrast microscope for short wavelength radiation and imaging method
DE10352741B4 (de) 2003-11-12 2012-08-16 Austriamicrosystems Ag Strahlungsdetektierendes optoelektronisches Bauelement, Verfahren zu dessen Herstellung und Verwendung
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
GB0409572D0 (en) * 2004-04-29 2004-06-02 Univ Sheffield High resolution imaging
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US8001862B2 (en) * 2007-11-20 2011-08-23 Harley-Davidson Motor Company Group, Inc. Reverse drive assembly for a motorcycle
US9269471B2 (en) 2009-03-27 2016-02-23 Koninklijke Philips N.V. Differential phase-contrast imaging with circular gratings
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
JP7572033B2 (ja) * 2020-10-23 2024-10-23 株式会社リガク 結像型ｘ線顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49300A (da) * 1972-03-15 1974-01-05
US4105289A (en) * 1976-04-29 1978-08-08 University Patents, Inc. Apparatus and method for image sampling
JPS6049300A (ja) * 1983-08-29 1985-03-18 日本電子株式会社 Ｘ線顕微鏡

Also Published As

Publication number Publication date
EP0270968A3 (en) 1989-08-02
DK652287A (da) 1988-06-13
EP0270968A2 (de) 1988-06-15
DK174016B1 (da) 2002-04-15
DE3788508D1 (de) 1994-01-27
DE3642457A1 (de) 1988-06-30
US4870674A (en) 1989-09-26
JPS63163300A (ja) 1988-07-06
JPH0814640B2 (ja) 1996-02-14
DK652287D0 (da) 1987-12-11

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