DK652287A - Roentgenmikroskop - Google Patents

Roentgenmikroskop

Info

Publication number
DK652287A
DK652287A DK652287A DK652287A DK652287A DK 652287 A DK652287 A DK 652287A DK 652287 A DK652287 A DK 652287A DK 652287 A DK652287 A DK 652287A DK 652287 A DK652287 A DK 652287A
Authority
DK
Denmark
Prior art keywords
roentgen
microscope
roentgen microscope
Prior art date
Application number
DK652287A
Other languages
English (en)
Other versions
DK174016B1 (da
DK652287D0 (da
Inventor
Guenter Schmahl
Dietbert Rudolph
Original Assignee
Zeiss Carl Fa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Fa filed Critical Zeiss Carl Fa
Publication of DK652287D0 publication Critical patent/DK652287D0/da
Publication of DK652287A publication Critical patent/DK652287A/da
Application granted granted Critical
Publication of DK174016B1 publication Critical patent/DK174016B1/da

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
DK198706522A 1986-12-12 1987-12-11 Røntgenmikroskop DK174016B1 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863642457 DE3642457A1 (de) 1986-12-12 1986-12-12 Roentgen-mikroskop
DE3642457 1986-12-12

Publications (3)

Publication Number Publication Date
DK652287D0 DK652287D0 (da) 1987-12-11
DK652287A true DK652287A (da) 1988-06-13
DK174016B1 DK174016B1 (da) 2002-04-15

Family

ID=6316038

Family Applications (1)

Application Number Title Priority Date Filing Date
DK198706522A DK174016B1 (da) 1986-12-12 1987-12-11 Røntgenmikroskop

Country Status (5)

Country Link
US (1) US4870674A (da)
EP (1) EP0270968B1 (da)
JP (1) JPH0814640B2 (da)
DE (2) DE3642457A1 (da)
DK (1) DK174016B1 (da)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH678663A5 (da) * 1988-06-09 1991-10-15 Zeiss Carl Fa
US5199057A (en) * 1989-08-09 1993-03-30 Nikon Corporation Image formation-type soft X-ray microscopic apparatus
JP2775949B2 (ja) * 1990-01-10 1998-07-16 株式会社ニコン Ｘ線光学素子保持枠
US5022061A (en) * 1990-04-30 1991-06-04 The United States Of America As Represented By The United States Department Of Energy An image focusing means by using an opaque object to diffract x-rays
US5204887A (en) * 1990-06-01 1993-04-20 Canon Kabushiki Kaisha X-ray microscope
DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
US5432607A (en) * 1993-02-22 1995-07-11 International Business Machines Corporation Method and apparatus for inspecting patterned thin films using diffracted beam ellipsometry
US5432349A (en) * 1993-03-15 1995-07-11 The United State Of America As Represented By The Secretary Of The Navy Fourier transform microscope for x-ray and/or gamma-ray imaging
JP3703483B2 (ja) * 1993-09-15 2005-10-05 カール−ツァイス−スチフツング 位相コントラスト−ｘ線顕微鏡
JP3741411B2 (ja) * 1999-10-01 2006-02-01 株式会社リガク Ｘ線集光装置及びｘ線装置
JP2005519288A (ja) * 2002-03-05 2005-06-30 ムラジン アブベキロビッチ クマホフ， Ｘ線顕微鏡
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation
US7365909B2 (en) * 2002-10-17 2008-04-29 Xradia, Inc. Fabrication methods for micro compounds optics
US7119953B2 (en) * 2002-12-27 2006-10-10 Xradia, Inc. Phase contrast microscope for short wavelength radiation and imaging method
DE10352741B4 (de) * 2003-11-12 2012-08-16 Austriamicrosystems Ag Strahlungsdetektierendes optoelektronisches Bauelement, Verfahren zu dessen Herstellung und Verwendung
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
GB0409572D0 (en) * 2004-04-29 2004-06-02 Univ Sheffield High resolution imaging
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US8001862B2 (en) * 2007-11-20 2011-08-23 Harley-Davidson Motor Company Group, Inc. Reverse drive assembly for a motorcycle
CN102365052B (zh) * 2009-03-27 2015-05-13 皇家飞利浦电子股份有限公司 利用圆形光栅进行差分相衬成像
US9291578B2 (en) 2012-08-03 2016-03-22 David L. Adler X-ray photoemission microscope for integrated devices
US9129715B2 (en) 2012-09-05 2015-09-08 SVXR, Inc. High speed x-ray inspection microscope
JP2022069273A (ja) * 2020-10-23 2022-05-11 株式会社リガク 結像型ｘ線顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49300A (da) * 1972-03-15 1974-01-05
US4105289A (en) * 1976-04-29 1978-08-08 University Patents, Inc. Apparatus and method for image sampling
JPS6049300A (ja) * 1983-08-29 1985-03-18 日本電子株式会社 Ｘ線顕微鏡

Also Published As

Publication number Publication date
EP0270968A3 (en) 1989-08-02
DE3788508D1 (de) 1994-01-27
DK174016B1 (da) 2002-04-15
EP0270968A2 (de) 1988-06-15
US4870674A (en) 1989-09-26
EP0270968B1 (de) 1993-12-15
DK652287D0 (da) 1987-12-11
DE3642457A1 (de) 1988-06-30
JPS63163300A (ja) 1988-07-06
JPH0814640B2 (ja) 1996-02-14

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Legal Events

Date Code Title Description
B1 Patent granted (law 1993)
PBP Patent lapsed

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