DK2483214T3 - Fremgangsmåde til afsætning af et tyndt lag og produkt omfattende et tyndt lag - Google Patents

Fremgangsmåde til afsætning af et tyndt lag og produkt omfattende et tyndt lag Download PDF

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Publication number
DK2483214T3
DK2483214T3 DK10776775.8T DK10776775T DK2483214T3 DK 2483214 T3 DK2483214 T3 DK 2483214T3 DK 10776775 T DK10776775 T DK 10776775T DK 2483214 T3 DK2483214 T3 DK 2483214T3
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DK
Denmark
Prior art keywords
thin layer
depositing
product
thin
layer
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DK10776775.8T
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English (en)
Inventor
Andriy Kharchenko
Anne Durandeau
Nicolas Nadaud
Original Assignee
Saint Gobain
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Publication of DK2483214T3 publication Critical patent/DK2483214T3/da

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C23C14/5813—Thermal treatment using lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/322—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/755—Nanosheet or quantum barrier/well, i.e. layer structure having one dimension or thickness of 100 nm or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
    • Y10S977/891—Vapor phase deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • Catalysts (AREA)
  • Physical Vapour Deposition (AREA)
DK10776775.8T 2009-10-01 2010-09-30 Fremgangsmåde til afsætning af et tyndt lag og produkt omfattende et tyndt lag DK2483214T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0956866A FR2950878B1 (fr) 2009-10-01 2009-10-01 Procede de depot de couche mince
PCT/FR2010/052073 WO2011039488A1 (fr) 2009-10-01 2010-09-30 Procede de depot de couche mince

Publications (1)

Publication Number Publication Date
DK2483214T3 true DK2483214T3 (da) 2015-02-09

Family

ID=42144618

Family Applications (1)

Application Number Title Priority Date Filing Date
DK10776775.8T DK2483214T3 (da) 2009-10-01 2010-09-30 Fremgangsmåde til afsætning af et tyndt lag og produkt omfattende et tyndt lag

Country Status (19)

Country Link
US (1) US9011649B2 (da)
EP (1) EP2483214B1 (da)
JP (1) JP5681194B2 (da)
KR (1) KR101746245B1 (da)
CN (1) CN102574731B (da)
AU (1) AU2010302459B2 (da)
BR (1) BR112012006868B8 (da)
CA (1) CA2774937C (da)
DE (1) DE202010018173U1 (da)
DK (1) DK2483214T3 (da)
EA (1) EA022598B1 (da)
EG (1) EG27080A (da)
ES (1) ES2530270T3 (da)
FR (1) FR2950878B1 (da)
IN (1) IN2012DN02079A (da)
MX (1) MX336914B (da)
PL (1) PL2483214T3 (da)
PT (1) PT2483214E (da)
WO (1) WO2011039488A1 (da)

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FR2991980A1 (fr) * 2012-06-13 2013-12-20 Saint Gobain Procede de depot de couches minces avec etape de traitement sous vide et produit obtenu
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FR3048244B1 (fr) * 2016-02-26 2018-03-16 Saint-Gobain Glass France Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier
FR3051804B1 (fr) * 2016-05-24 2018-06-29 Saint-Gobain Glass France Procede de depot de couches minces
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RU2635617C1 (ru) * 2016-12-23 2017-11-14 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" Способ изготовления фильтрующего материала
KR102586984B1 (ko) * 2017-01-26 2023-10-10 컴포시큐어 엘엘씨 파티네이션되거나 파티나-준비된 금속 거래 카드들 및 제조 공정들
FR3065722B1 (fr) * 2017-04-28 2021-09-24 Saint Gobain Vitrage colore et son procede d'obtention
US10822270B2 (en) 2018-08-01 2020-11-03 Guardian Glass, LLC Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
CN112779509A (zh) * 2019-11-07 2021-05-11 有研工程技术研究院有限公司 一种过渡金属氮化物核壳结构薄膜及其制备方法
EP3828304A1 (en) 2019-11-29 2021-06-02 Saint-Gobain Glass France Thin layer deposition process
FR3109147B1 (fr) 2020-04-08 2023-03-24 Saint Gobain Procede de depot de couches minces
FR3113672B1 (fr) 2020-08-25 2023-02-24 Saint Gobain Procede d’obtention d’un materiau revetu d’un revetement photocatalytique
EP4132890A1 (fr) 2020-04-08 2023-02-15 Saint-Gobain Glass France Procede de depot de couches minces
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DE102021210660A1 (de) 2021-09-24 2023-03-30 Dr. Johannes Heidenhain Gmbh Photokatalytische Schichtanordnung und Verfahren zum Herstellen einer derartigen Schichtanordnung

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JPWO2005022624A1 (ja) 2003-08-28 2007-11-01 国立大学法人東京農工大学 絶縁膜形成方法
FR2861385B1 (fr) 2003-10-23 2006-02-17 Saint Gobain Substrat, notamment substrat verrier, portant au moins un empilement couche a propriete photocatalytique sous couche de croissance heteroepitaxiale de ladite couche
FR2861386B1 (fr) 2003-10-23 2006-02-17 Saint Gobain Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique revetue d'une couche mince protectrice.
FR2862961B1 (fr) 2003-11-28 2006-02-17 Saint Gobain Substrat transparent utilisable alternativement ou cumulativement pour le controle thermique, le blindage electromagnetique et le vitrage chauffant.
FR2865420B1 (fr) 2004-01-28 2007-09-14 Saint Gobain Procede de nettoyage d'un substrat
FR2868770B1 (fr) 2004-04-09 2006-06-02 Saint Gobain Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique modifiee pour pouvoir absorber des photons du visible
FR2868792B1 (fr) 2004-04-13 2006-05-26 Saint Gobain Substrat photocatalytique actif sous lumiere visible
FR2869324B1 (fr) 2004-04-21 2007-08-10 Saint Gobain Procede de depot sous vide
EP1666927A1 (de) * 2004-12-03 2006-06-07 Nanogate Advanced Materials GmbH Sonnenschutzfolie
FR2881757B1 (fr) 2005-02-08 2007-03-30 Saint Gobain Procede d'elaboration par projection thermique d'une cible a base de silicium et de zirconium
US8012594B2 (en) * 2005-06-07 2011-09-06 Fujifilm Corporation Functional film containing structure and method of manufacturing functional film
FR2889202B1 (fr) 2005-08-01 2007-09-14 Saint Gobain Procede de depot d'une couche anti-rayure
EP1940750A2 (fr) * 2005-10-21 2008-07-09 Saint-Gobain Glass France Materiau anti-salissures et son procede d'obtention
FR2892409B1 (fr) 2005-10-25 2007-12-14 Saint Gobain Procede de traitement d'un substrat
FR2893023B1 (fr) 2005-11-08 2007-12-21 Saint Gobain Substrat muni d'un empilement a proprietes thermiques
FR2898122B1 (fr) 2006-03-06 2008-12-05 Saint Gobain Substrat muni d'un empilement a proprietes thermiques
FR2902422B1 (fr) 2006-06-16 2008-07-25 Saint Gobain Procede de depot par plasma atmopherique d'un revetement hydrophobe/oleophobe a durabilite amelioree
JP5268104B2 (ja) * 2006-06-22 2013-08-21 国立大学法人北見工業大学 窒化金属膜、酸化金属膜、炭化金属膜またはその複合膜の製造方法、およびその製造装置
FR2911130B1 (fr) * 2007-01-05 2009-11-27 Saint Gobain Procede de depot de couche mince et produit obtenu
KR101456560B1 (ko) 2007-01-15 2014-10-31 쌩-고벵 글래스 프랑스 향상된 기계적 강도를 갖는 층으로 코팅된 유리 기판
FR2918981B1 (fr) 2007-07-20 2009-09-04 Saint Gobain Procede de texturation de surface d'un substrat a fonction verriere, produit verrier a surface texturee.
FR2929938B1 (fr) 2008-04-11 2010-05-07 Saint Gobain Procede de depot de couche mince.
JP5341082B2 (ja) 2008-06-25 2013-11-13 キヤノンアネルバ株式会社 トンネル磁気抵抗素子の製造方法および製造装置
FR2943050A1 (fr) 2009-03-11 2010-09-17 Saint Gobain Procede de depot de couche mince.
FR2946335B1 (fr) 2009-06-05 2011-09-02 Saint Gobain Procede de depot de couche mince et produit obtenu.
FR2946639B1 (fr) 2009-06-12 2011-07-15 Saint Gobain Procede de depot de couche mince et produit obtenu.

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AU2010302459B2 (en) 2014-08-14
PL2483214T3 (pl) 2015-04-30
WO2011039488A1 (fr) 2011-04-07
EP2483214B1 (fr) 2014-11-19
FR2950878B1 (fr) 2011-10-21
JP5681194B2 (ja) 2015-03-04
BR112012006868B8 (pt) 2021-05-18
MX2012003610A (es) 2012-04-19
EA201270487A1 (ru) 2012-08-30
KR101746245B1 (ko) 2017-06-12
CA2774937A1 (fr) 2011-04-07
CN102574731A (zh) 2012-07-11
EG27080A (en) 2015-05-19
CA2774937C (fr) 2018-02-27
BR112012006868B1 (pt) 2021-03-02
US20120171439A1 (en) 2012-07-05
PT2483214E (pt) 2015-02-25
CN102574731B (zh) 2016-02-24
JP2013506758A (ja) 2013-02-28
ES2530270T3 (es) 2015-02-27
IN2012DN02079A (da) 2015-08-21
DE202010018173U1 (de) 2014-10-16
EA022598B1 (ru) 2016-01-29
EP2483214A1 (fr) 2012-08-08
US9011649B2 (en) 2015-04-21
KR20120091043A (ko) 2012-08-17
FR2950878A1 (fr) 2011-04-08
AU2010302459A1 (en) 2012-05-10
MX336914B (es) 2016-02-05

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