IN2012DN02079A - - Google Patents
Info
- Publication number
- IN2012DN02079A IN2012DN02079A IN2079DEN2012A IN2012DN02079A IN 2012DN02079 A IN2012DN02079 A IN 2012DN02079A IN 2079DEN2012 A IN2079DEN2012 A IN 2079DEN2012A IN 2012DN02079 A IN2012DN02079 A IN 2012DN02079A
- Authority
- IN
- India
- Prior art keywords
- film
- metal
- oxide
- intermediate film
- heat treatment
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
- C23C14/5813—Thermal treatment using lasers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/71—Photocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/322—Oxidation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/755—Nanosheet or quantum barrier/well, i.e. layer structure having one dimension or thickness of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
- Y10S977/891—Vapor phase deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps: - at least one intermediate film of a material chosen from the metal M, a nitride of the metal M, a carbide of the metal M and an oxygen-substoichiometric oxide of the metal M is deposited by sputtering, said intermediate film not being deposited above or beneath a titanium-oxide-based film, the physical thickness of said intermediate film being 30 nm or less; and - at least part of the surface of said intermediate film is oxidized using a heat treatment, during which said intermediate film is in direct contact with an oxidizing atmosphere, especially air, the temperature of said substrate during said heat treatment not exceeding 150oC.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0956866A FR2950878B1 (en) | 2009-10-01 | 2009-10-01 | THIN LAYER DEPOSITION METHOD |
PCT/FR2010/052073 WO2011039488A1 (en) | 2009-10-01 | 2010-09-30 | Thin film deposition method |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2012DN02079A true IN2012DN02079A (en) | 2015-08-21 |
Family
ID=42144618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN2079DEN2012 IN2012DN02079A (en) | 2009-10-01 | 2010-09-30 |
Country Status (19)
Country | Link |
---|---|
US (1) | US9011649B2 (en) |
EP (1) | EP2483214B1 (en) |
JP (1) | JP5681194B2 (en) |
KR (1) | KR101746245B1 (en) |
CN (1) | CN102574731B (en) |
AU (1) | AU2010302459B2 (en) |
BR (1) | BR112012006868B8 (en) |
CA (1) | CA2774937C (en) |
DE (1) | DE202010018173U1 (en) |
DK (1) | DK2483214T3 (en) |
EA (1) | EA022598B1 (en) |
EG (1) | EG27080A (en) |
ES (1) | ES2530270T3 (en) |
FR (1) | FR2950878B1 (en) |
IN (1) | IN2012DN02079A (en) |
MX (1) | MX336914B (en) |
PL (1) | PL2483214T3 (en) |
PT (1) | PT2483214E (en) |
WO (1) | WO2011039488A1 (en) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9862640B2 (en) | 2010-01-16 | 2018-01-09 | Cardinal Cg Company | Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
US11155493B2 (en) | 2010-01-16 | 2021-10-26 | Cardinal Cg Company | Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
FR2972447B1 (en) | 2011-03-08 | 2019-06-07 | Saint-Gobain Glass France | PROCESS FOR OBTAINING A SUBSTRATE WITH A COATING |
DE102011089884B4 (en) * | 2011-08-19 | 2016-03-10 | Von Ardenne Gmbh | Low-emissivity coating and method of making a low-emissivity coating system |
FR2989388B1 (en) * | 2012-04-17 | 2019-10-18 | Saint-Gobain Glass France | PROCESS FOR OBTAINING A SUBSTRATE WITH A COATING |
US9038419B2 (en) | 2012-06-08 | 2015-05-26 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Method of making heat treated coated article using carbon based coating and protective film |
FR2991980A1 (en) * | 2012-06-13 | 2013-12-20 | Saint Gobain | THIN FILM DEPOSITION METHOD WITH VACUUM TREATMENT STEP AND PRODUCT OBTAINED |
JP5452744B1 (en) * | 2013-02-26 | 2014-03-26 | 株式会社昭和 | A method for producing a surface-treated metal titanium material or titanium alloy material, and a surface treatment material. |
FR3005878B1 (en) * | 2013-05-24 | 2016-05-27 | Saint Gobain | PROCESS FOR OBTAINING A SUBSTRATE WITH A COATING |
WO2014198668A1 (en) * | 2013-06-10 | 2014-12-18 | Limo Patentverwaltung Gmbh & Co. Kg | Method for producing a scratch-resistant layer on a glass substrate |
US9976230B2 (en) * | 2014-09-19 | 2018-05-22 | Corning Incorporated | Method for forming a scratch resistant crystallized layer on a substrate and article formed therefrom |
US9674895B1 (en) | 2015-12-15 | 2017-06-06 | Cardinal Cg Company | Glazing perimeter anticondensation coating production technology |
US9810017B2 (en) | 2015-12-15 | 2017-11-07 | Cardinal Cg Company | Glazing perimeter anticondensation coating technology |
FR3048244B1 (en) * | 2016-02-26 | 2018-03-16 | Saint-Gobain Glass France | METHOD FOR SELECTIVELY ENGRAVING LAYER OR LAYER STACK ON GLASS SUBSTRATE |
FR3051804B1 (en) * | 2016-05-24 | 2018-06-29 | Saint-Gobain Glass France | THIN LAYER DEPOSITION METHOD |
US10526242B2 (en) | 2016-07-11 | 2020-01-07 | Guardian Glass, LLC | Coated article supporting titanium-based coating, and method of making the same |
RU2635617C1 (en) * | 2016-12-23 | 2017-11-14 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" | Method of filtration material production |
SG11201906082XA (en) * | 2017-01-26 | 2019-08-27 | Composecure Llc | Patinated or patina-ready metal transaction cards and manufacturing processes |
FR3065722B1 (en) * | 2017-04-28 | 2021-09-24 | Saint Gobain | COLORED GLAZING AND ITS OBTAINING PROCESS |
US10822270B2 (en) | 2018-08-01 | 2020-11-03 | Guardian Glass, LLC | Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same |
US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
CN112779509A (en) * | 2019-11-07 | 2021-05-11 | 有研工程技术研究院有限公司 | Transition metal nitride core-shell structure film and preparation method thereof |
EP3828304A1 (en) | 2019-11-29 | 2021-06-02 | Saint-Gobain Glass France | Thin layer deposition process |
FR3113672B1 (en) | 2020-08-25 | 2023-02-24 | Saint Gobain | METHOD FOR OBTAINING A MATERIAL COATED WITH A PHOTOCATALYTIC COATING |
FR3109147B1 (en) | 2020-04-08 | 2023-03-24 | Saint Gobain | THIN LAYER DEPOSIT PROCESS |
WO2021205119A1 (en) | 2020-04-08 | 2021-10-14 | Saint-Gobain Glass France | Thin layer deposition process |
FR3122420A1 (en) | 2021-04-29 | 2022-11-04 | Saint-Gobain Glass France | PHOTOCATALYTIC COATING AND METHOD FOR OBTAINING A PHOTOCATALYTIC COATING |
DE102021210660A1 (en) | 2021-09-24 | 2023-03-30 | Dr. Johannes Heidenhain Gmbh | Photocatalytic layer arrangement and method for producing such a layer arrangement |
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FR2793889B1 (en) | 1999-05-20 | 2002-06-28 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE WITH ANTI-REFLECTIVE COATING |
FR2800731B1 (en) | 1999-11-05 | 2002-01-18 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE HAVING A SILICON-DERIVED LAYER |
FR2800998B1 (en) | 1999-11-17 | 2002-04-26 | Saint Gobain Vitrage | TRANSPARENT SUBSTRATE HAVING AN ANTI-REFLECTIVE COATING |
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FR2814094B1 (en) * | 2000-09-20 | 2003-08-15 | Saint Gobain | SUBSTRATE WITH PHOTOCATALYTIC COATING AND MANUFACTURING METHOD THEREOF |
FR2818272B1 (en) | 2000-12-15 | 2003-08-29 | Saint Gobain | GLAZING PROVIDED WITH A STACK OF THIN FILMS FOR SUN PROTECTION AND / OR THERMAL INSULATION |
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FR2827855B1 (en) | 2001-07-25 | 2004-07-02 | Saint Gobain | GLAZING PROVIDED WITH A STACK OF THIN FILMS REFLECTING INFRARED AND / OR SOLAR RADIATION |
FR2832706B1 (en) | 2001-11-28 | 2004-07-23 | Saint Gobain | TRANSPARENT SUBSTRATE HAVING AN ELECTRODE |
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FR2841894B1 (en) | 2002-07-03 | 2006-03-10 | Saint Gobain | TRANSPARENT SUBSTRATE HAVING ANTIREFLECTION COATING |
FR2856627B1 (en) | 2003-06-26 | 2006-08-11 | Saint Gobain | TRANSPARENT SUBSTRATE WITH COATING WITH MECHANICAL STRENGTH PROPERTIES |
FR2856677B1 (en) | 2003-06-27 | 2006-12-01 | Saint Gobain | SUBSTRATE COATED WITH A DIELECTRIC LAYER AND METHOD FOR MANUFACTURING THE SAME |
FR2857030B1 (en) | 2003-07-01 | 2006-10-27 | Saint Gobain | PROCESS FOR TITANIUM OXIDE DEPOSITION BY PLASMA SOURCE |
FR2857885B1 (en) | 2003-07-23 | 2006-12-22 | Saint Gobain | PROCESS FOR THE PREPARATION OF A PHOTOCATALYTIC COATING INTEGRATED IN THE THERMAL TREATMENT OF A GLAZING |
FR2858816B1 (en) | 2003-08-13 | 2006-11-17 | Saint Gobain | TRANSPARENT SUBSTRATE HAVING ANTIREFLECTION COATING |
FR2858975B1 (en) | 2003-08-20 | 2006-01-27 | Saint Gobain | TRANSPARENT SUBSTRATE COATED WITH A STACK OF THIN LAYERS WITH INFRARED REFLECTION PROPERTIES AND / OR IN THE FIELD OF SOLAR RADIATION |
WO2005022624A1 (en) * | 2003-08-28 | 2005-03-10 | National University Corporation Tokyo University Of Agriculture And Technology | Method for forming insulating film |
FR2861385B1 (en) | 2003-10-23 | 2006-02-17 | Saint Gobain | SUBSTRATE, IN PARTICULAR GLASS SUBSTRATE, CARRYING AT LEAST ONE PHOTOCATALYTIC LAYER STACK WITH THE HETEROEPITAXIAL GROWTH LAYER OF THE LAYER |
FR2861386B1 (en) | 2003-10-23 | 2006-02-17 | Saint Gobain | SUBSTRATE, IN PARTICULAR GLASS SUBSTRATE, CARRYING A PHOTOCATALYTIC LAYER COATED WITH A PROTECTIVE THIN LAYER. |
FR2862961B1 (en) | 2003-11-28 | 2006-02-17 | Saint Gobain | TRANSPARENT SUBSTRATE USED ALTERNATELY OR CUMULATIVELY FOR THERMAL CONTROL, ELECTROMAGNETIC SHIELDING AND HEATED GLAZING. |
FR2865420B1 (en) | 2004-01-28 | 2007-09-14 | Saint Gobain | METHOD FOR CLEANING A SUBSTRATE |
FR2868770B1 (en) | 2004-04-09 | 2006-06-02 | Saint Gobain | SUBSTRATE, IN PARTICULAR GLASS SUBSTRATE, HAVING A MODIFIED PHOTOCATALYTIC LAYER TO ABSORB PHOTONS OF THE VISIBLE |
FR2868792B1 (en) | 2004-04-13 | 2006-05-26 | Saint Gobain | ACTIVE PHOTOCATALYTIC SUBSTRATE UNDER VISIBLE LIGHT |
FR2869324B1 (en) | 2004-04-21 | 2007-08-10 | Saint Gobain | VACUUM DEPOSITION METHOD |
EP1666927A1 (en) * | 2004-12-03 | 2006-06-07 | Nanogate Advanced Materials GmbH | Solar protection sheet |
FR2881757B1 (en) | 2005-02-08 | 2007-03-30 | Saint Gobain | THERMAL PROJECTION DEVELOPING METHOD OF TARGET BASED ON SILICON AND ZIRCONIUM |
EP1889307B1 (en) * | 2005-06-07 | 2011-04-20 | FUJIFILM Corporation | Functional film containing structure and method of manufacturing functional film |
FR2889202B1 (en) | 2005-08-01 | 2007-09-14 | Saint Gobain | METHOD FOR DEPOSITING ANTI-SCRATCH LAYER |
AU2006303170B2 (en) * | 2005-10-21 | 2012-10-11 | Saint-Gobain Glass France | Antifouling material and production method thereof |
FR2892409B1 (en) | 2005-10-25 | 2007-12-14 | Saint Gobain | PROCESS FOR TREATING A SUBSTRATE |
FR2893023B1 (en) | 2005-11-08 | 2007-12-21 | Saint Gobain | SUBSTRATE PROVIDED WITH A STACK WITH THERMAL PROPERTIES |
FR2898122B1 (en) | 2006-03-06 | 2008-12-05 | Saint Gobain | SUBSTRATE PROVIDED WITH A STACK WITH THERMAL PROPERTIES |
FR2902422B1 (en) | 2006-06-16 | 2008-07-25 | Saint Gobain | METHOD FOR ATMOSPHERIC PLASMA DEPOSITION OF HYDROPHOBIC / OLEOPHOBIC COATING WITH IMPROVED DURABILITY |
WO2007148795A1 (en) * | 2006-06-22 | 2007-12-27 | National University Corporation Kitami Institute Of Technology | Method for producing metal nitride film, metal oxide film, metal carbide film or composite film of them, and production apparatus therefor |
FR2911130B1 (en) * | 2007-01-05 | 2009-11-27 | Saint Gobain | THIN FILM DEPOSITION METHOD AND PRODUCT OBTAINED |
MX2009007526A (en) | 2007-01-15 | 2009-07-22 | Saint Gobain | Glass substrate coated with layers having an improved mechanical strength. |
FR2918981B1 (en) | 2007-07-20 | 2009-09-04 | Saint Gobain | METHOD FOR SURFACE TEXTURING A GLASS - FUNCTION SUBSTRATE, TEXTURED SURFACE - GLAZED PRODUCT. |
FR2929938B1 (en) | 2008-04-11 | 2010-05-07 | Saint Gobain | THIN LAYER DEPOSITION METHOD |
WO2009157064A1 (en) * | 2008-06-25 | 2009-12-30 | キヤノンアネルバ株式会社 | Method and equipment for manufacturing tunnel magnetoresistive element |
FR2943050A1 (en) | 2009-03-11 | 2010-09-17 | Saint Gobain | THIN LAYER DEPOSITION METHOD |
FR2946335B1 (en) | 2009-06-05 | 2011-09-02 | Saint Gobain | THIN LAYER DEPOSITION METHOD AND PRODUCT OBTAINED |
FR2946639B1 (en) | 2009-06-12 | 2011-07-15 | Saint Gobain | THIN LAYER DEPOSITION METHOD AND PRODUCT OBTAINED |
-
2009
- 2009-10-01 FR FR0956866A patent/FR2950878B1/en not_active Expired - Fee Related
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2010
- 2010-09-30 MX MX2012003610A patent/MX336914B/en active IP Right Grant
- 2010-09-30 ES ES10776775.8T patent/ES2530270T3/en active Active
- 2010-09-30 IN IN2079DEN2012 patent/IN2012DN02079A/en unknown
- 2010-09-30 DK DK10776775.8T patent/DK2483214T3/en active
- 2010-09-30 BR BR112012006868A patent/BR112012006868B8/en not_active IP Right Cessation
- 2010-09-30 DE DE201020018173 patent/DE202010018173U1/en not_active Expired - Lifetime
- 2010-09-30 EP EP10776775.8A patent/EP2483214B1/en active Active
- 2010-09-30 WO PCT/FR2010/052073 patent/WO2011039488A1/en active Application Filing
- 2010-09-30 JP JP2012531485A patent/JP5681194B2/en not_active Expired - Fee Related
- 2010-09-30 CN CN201080044800.3A patent/CN102574731B/en active Active
- 2010-09-30 CA CA2774937A patent/CA2774937C/en active Active
- 2010-09-30 US US13/496,090 patent/US9011649B2/en active Active
- 2010-09-30 AU AU2010302459A patent/AU2010302459B2/en not_active Ceased
- 2010-09-30 EA EA201270487A patent/EA022598B1/en not_active IP Right Cessation
- 2010-09-30 PT PT10776775T patent/PT2483214E/en unknown
- 2010-09-30 KR KR1020127008329A patent/KR101746245B1/en active IP Right Grant
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-
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Also Published As
Publication number | Publication date |
---|---|
CA2774937C (en) | 2018-02-27 |
BR112012006868B8 (en) | 2021-05-18 |
JP5681194B2 (en) | 2015-03-04 |
CA2774937A1 (en) | 2011-04-07 |
DK2483214T3 (en) | 2015-02-09 |
CN102574731B (en) | 2016-02-24 |
EP2483214B1 (en) | 2014-11-19 |
FR2950878B1 (en) | 2011-10-21 |
US9011649B2 (en) | 2015-04-21 |
EP2483214A1 (en) | 2012-08-08 |
KR101746245B1 (en) | 2017-06-12 |
DE202010018173U1 (en) | 2014-10-16 |
ES2530270T3 (en) | 2015-02-27 |
FR2950878A1 (en) | 2011-04-08 |
MX2012003610A (en) | 2012-04-19 |
US20120171439A1 (en) | 2012-07-05 |
AU2010302459B2 (en) | 2014-08-14 |
JP2013506758A (en) | 2013-02-28 |
CN102574731A (en) | 2012-07-11 |
WO2011039488A1 (en) | 2011-04-07 |
EG27080A (en) | 2015-05-19 |
EA022598B1 (en) | 2016-01-29 |
MX336914B (en) | 2016-02-05 |
EA201270487A1 (en) | 2012-08-30 |
AU2010302459A1 (en) | 2012-05-10 |
PL2483214T3 (en) | 2015-04-30 |
KR20120091043A (en) | 2012-08-17 |
BR112012006868B1 (en) | 2021-03-02 |
PT2483214E (en) | 2015-02-25 |
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