EG27080A - Thin film deposition method - Google Patents

Thin film deposition method

Info

Publication number
EG27080A
EG27080A EG2012030512A EG2012030512A EG27080A EG 27080 A EG27080 A EG 27080A EG 2012030512 A EG2012030512 A EG 2012030512A EG 2012030512 A EG2012030512 A EG 2012030512A EG 27080 A EG27080 A EG 27080A
Authority
EG
Egypt
Prior art keywords
thin film
deposition method
film deposition
thin
film
Prior art date
Application number
EG2012030512A
Other languages
English (en)
Inventor
Andriy Kharchenko
Nicolas Nadaud
Anne Durandeau
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Application granted granted Critical
Publication of EG27080A publication Critical patent/EG27080A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C23C14/5813—Thermal treatment using lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/322—Oxidation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/70—Nanostructure
    • Y10S977/755—Nanosheet or quantum barrier/well, i.e. layer structure having one dimension or thickness of 100 nm or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
    • Y10S977/891—Vapor phase deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
  • Catalysts (AREA)
EG2012030512A 2009-10-01 2012-03-21 Thin film deposition method EG27080A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0956866A FR2950878B1 (fr) 2009-10-01 2009-10-01 Procede de depot de couche mince
PCT/FR2010/052073 WO2011039488A1 (fr) 2009-10-01 2010-09-30 Procede de depot de couche mince

Publications (1)

Publication Number Publication Date
EG27080A true EG27080A (en) 2015-05-19

Family

ID=42144618

Family Applications (1)

Application Number Title Priority Date Filing Date
EG2012030512A EG27080A (en) 2009-10-01 2012-03-21 Thin film deposition method

Country Status (19)

Country Link
US (1) US9011649B2 (xx)
EP (1) EP2483214B1 (xx)
JP (1) JP5681194B2 (xx)
KR (1) KR101746245B1 (xx)
CN (1) CN102574731B (xx)
AU (1) AU2010302459B2 (xx)
BR (1) BR112012006868B8 (xx)
CA (1) CA2774937C (xx)
DE (1) DE202010018173U1 (xx)
DK (1) DK2483214T3 (xx)
EA (1) EA022598B1 (xx)
EG (1) EG27080A (xx)
ES (1) ES2530270T3 (xx)
FR (1) FR2950878B1 (xx)
IN (1) IN2012DN02079A (xx)
MX (1) MX336914B (xx)
PL (1) PL2483214T3 (xx)
PT (1) PT2483214E (xx)
WO (1) WO2011039488A1 (xx)

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US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
US9862640B2 (en) 2010-01-16 2018-01-09 Cardinal Cg Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
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FR2989388B1 (fr) * 2012-04-17 2019-10-18 Saint-Gobain Glass France Procede d'obtention d'un substrat muni d'un revetement
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FR3048244B1 (fr) * 2016-02-26 2018-03-16 Saint-Gobain Glass France Procede de gravure selective d'une couche ou d'un empilement de couches sur substrat verrier
FR3051804B1 (fr) * 2016-05-24 2018-06-29 Saint-Gobain Glass France Procede de depot de couches minces
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RU2635617C1 (ru) * 2016-12-23 2017-11-14 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" Способ изготовления фильтрующего материала
KR102515526B1 (ko) * 2017-01-26 2023-03-29 컴포시큐어 엘엘씨 파티네이션되거나 파티나-준비된 금속 거래 카드들 및 제조 공정들
FR3065722B1 (fr) * 2017-04-28 2021-09-24 Saint Gobain Vitrage colore et son procede d'obtention
US10822270B2 (en) 2018-08-01 2020-11-03 Guardian Glass, LLC Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
CN112779509A (zh) * 2019-11-07 2021-05-11 有研工程技术研究院有限公司 一种过渡金属氮化物核壳结构薄膜及其制备方法
EP3828304A1 (en) 2019-11-29 2021-06-02 Saint-Gobain Glass France Thin layer deposition process
FR3113672B1 (fr) 2020-08-25 2023-02-24 Saint Gobain Procede d’obtention d’un materiau revetu d’un revetement photocatalytique
WO2021205119A1 (fr) 2020-04-08 2021-10-14 Saint-Gobain Glass France Procede de depot de couches minces
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FR3122420A1 (fr) 2021-04-29 2022-11-04 Saint-Gobain Glass France Revêtement photocatalytique et procede d’obtention d’un revêtement photocatalytique
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FR2862961B1 (fr) 2003-11-28 2006-02-17 Saint Gobain Substrat transparent utilisable alternativement ou cumulativement pour le controle thermique, le blindage electromagnetique et le vitrage chauffant.
FR2865420B1 (fr) 2004-01-28 2007-09-14 Saint Gobain Procede de nettoyage d'un substrat
FR2868770B1 (fr) 2004-04-09 2006-06-02 Saint Gobain Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique modifiee pour pouvoir absorber des photons du visible
FR2868792B1 (fr) 2004-04-13 2006-05-26 Saint Gobain Substrat photocatalytique actif sous lumiere visible
FR2869324B1 (fr) 2004-04-21 2007-08-10 Saint Gobain Procede de depot sous vide
EP1666927A1 (de) * 2004-12-03 2006-06-07 Nanogate Advanced Materials GmbH Sonnenschutzfolie
FR2881757B1 (fr) 2005-02-08 2007-03-30 Saint Gobain Procede d'elaboration par projection thermique d'une cible a base de silicium et de zirconium
WO2006132380A2 (en) * 2005-06-07 2006-12-14 Fujifilm Corporation Functional film containing structure and method of manufacturing functional film
FR2889202B1 (fr) 2005-08-01 2007-09-14 Saint Gobain Procede de depot d'une couche anti-rayure
RU2430897C2 (ru) * 2005-10-21 2011-10-10 Сэн-Гобэн Гласс Франс Незагрязняющийся материал и способ его получения
FR2892409B1 (fr) 2005-10-25 2007-12-14 Saint Gobain Procede de traitement d'un substrat
FR2893023B1 (fr) 2005-11-08 2007-12-21 Saint Gobain Substrat muni d'un empilement a proprietes thermiques
FR2898122B1 (fr) 2006-03-06 2008-12-05 Saint Gobain Substrat muni d'un empilement a proprietes thermiques
FR2902422B1 (fr) 2006-06-16 2008-07-25 Saint Gobain Procede de depot par plasma atmopherique d'un revetement hydrophobe/oleophobe a durabilite amelioree
WO2007148795A1 (ja) * 2006-06-22 2007-12-27 National University Corporation Kitami Institute Of Technology 窒化金属膜、酸化金属膜、炭化金属膜またはその複合膜の製造方法、およびその製造装置
FR2911130B1 (fr) * 2007-01-05 2009-11-27 Saint Gobain Procede de depot de couche mince et produit obtenu
EP2114839A2 (fr) 2007-01-15 2009-11-11 Saint-Gobain Glass France Substrat verrier revetu de couches a tenue mecanique amelioree
FR2918981B1 (fr) 2007-07-20 2009-09-04 Saint Gobain Procede de texturation de surface d'un substrat a fonction verriere, produit verrier a surface texturee.
FR2929938B1 (fr) 2008-04-11 2010-05-07 Saint Gobain Procede de depot de couche mince.
WO2009157064A1 (ja) * 2008-06-25 2009-12-30 キヤノンアネルバ株式会社 トンネル磁気抵抗素子の製造方法および製造装置
FR2943050A1 (fr) 2009-03-11 2010-09-17 Saint Gobain Procede de depot de couche mince.
FR2946335B1 (fr) 2009-06-05 2011-09-02 Saint Gobain Procede de depot de couche mince et produit obtenu.
FR2946639B1 (fr) 2009-06-12 2011-07-15 Saint Gobain Procede de depot de couche mince et produit obtenu.

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EA201270487A1 (ru) 2012-08-30
PL2483214T3 (pl) 2015-04-30
US20120171439A1 (en) 2012-07-05
ES2530270T3 (es) 2015-02-27
FR2950878A1 (fr) 2011-04-08
BR112012006868B8 (pt) 2021-05-18
EP2483214B1 (fr) 2014-11-19
EA022598B1 (ru) 2016-01-29
CN102574731B (zh) 2016-02-24
US9011649B2 (en) 2015-04-21
KR20120091043A (ko) 2012-08-17
DK2483214T3 (da) 2015-02-09
BR112012006868B1 (pt) 2021-03-02
IN2012DN02079A (xx) 2015-08-21
MX336914B (es) 2016-02-05
CA2774937C (fr) 2018-02-27
MX2012003610A (es) 2012-04-19
DE202010018173U1 (de) 2014-10-16
AU2010302459B2 (en) 2014-08-14
KR101746245B1 (ko) 2017-06-12
FR2950878B1 (fr) 2011-10-21
EP2483214A1 (fr) 2012-08-08
AU2010302459A1 (en) 2012-05-10
CN102574731A (zh) 2012-07-11
JP2013506758A (ja) 2013-02-28
JP5681194B2 (ja) 2015-03-04
WO2011039488A1 (fr) 2011-04-07
PT2483214E (pt) 2015-02-25
CA2774937A1 (fr) 2011-04-07

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