DK0450061T3 - Forbedret radiofrekvens-resonansbølgekoblerapparat, som anvender højere modes - Google Patents

Forbedret radiofrekvens-resonansbølgekoblerapparat, som anvender højere modes

Info

Publication number
DK0450061T3
DK0450061T3 DK91900585.0T DK91900585T DK0450061T3 DK 0450061 T3 DK0450061 T3 DK 0450061T3 DK 91900585 T DK91900585 T DK 91900585T DK 0450061 T3 DK0450061 T3 DK 0450061T3
Authority
DK
Denmark
Prior art keywords
radio frequency
higher modes
frequency resonant
improved radio
resonant wave
Prior art date
Application number
DK91900585.0T
Other languages
Danish (da)
English (en)
Inventor
Jes Asmussen
Jeffrey A Hopwood
Original Assignee
Univ Michigan State
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Michigan State filed Critical Univ Michigan State
Application granted granted Critical
Publication of DK0450061T3 publication Critical patent/DK0450061T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Aerials With Secondary Devices (AREA)
  • Transmitters (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
DK91900585.0T 1989-10-20 1990-10-15 Forbedret radiofrekvens-resonansbølgekoblerapparat, som anvender højere modes DK0450061T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/424,720 US5081398A (en) 1989-10-20 1989-10-20 Resonant radio frequency wave coupler apparatus using higher modes

Publications (1)

Publication Number Publication Date
DK0450061T3 true DK0450061T3 (da) 1996-04-29

Family

ID=23683623

Family Applications (1)

Application Number Title Priority Date Filing Date
DK91900585.0T DK0450061T3 (da) 1989-10-20 1990-10-15 Forbedret radiofrekvens-resonansbølgekoblerapparat, som anvender højere modes

Country Status (9)

Country Link
US (1) US5081398A (ja)
EP (1) EP0450061B1 (ja)
JP (1) JP2822103B2 (ja)
AT (1) ATE132687T1 (ja)
DE (1) DE69024632T2 (ja)
DK (1) DK0450061T3 (ja)
ES (1) ES2084148T3 (ja)
GR (1) GR3019184T3 (ja)
WO (1) WO1991006199A1 (ja)

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US5292370A (en) * 1992-08-14 1994-03-08 Martin Marietta Energy Systems, Inc. Coupled microwave ECR and radio-frequency plasma source for plasma processing
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US5359621A (en) * 1993-05-11 1994-10-25 General Atomics High efficiency gas laser with axial magnetic field and tunable microwave resonant cavity
US5457298A (en) * 1993-07-27 1995-10-10 Tulip Memory Systems, Inc. Coldwall hollow-cathode plasma device for support of gas discharges
US5470423A (en) * 1994-01-25 1995-11-28 Board Of Trustees Operating Michigan State University Microwave pultrusion apparatus and method of use
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US5589737A (en) * 1994-12-06 1996-12-31 Lam Research Corporation Plasma processor for large workpieces
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JP3225855B2 (ja) * 1996-06-06 2001-11-05 株式会社島津製作所 薄膜形成装置
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
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US6759808B2 (en) * 2001-10-26 2004-07-06 Board Of Trustees Of Michigan State University Microwave stripline applicators
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US4585668A (en) * 1983-02-28 1986-04-29 Michigan State University Method for treating a surface with a microwave or UHF plasma and improved apparatus
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FR2583250B1 (fr) * 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
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Also Published As

Publication number Publication date
DE69024632D1 (de) 1996-02-15
JP2822103B2 (ja) 1998-11-11
WO1991006199A1 (en) 1991-05-02
ES2084148T3 (es) 1996-05-01
EP0450061A4 (en) 1992-08-05
EP0450061A1 (en) 1991-10-09
DE69024632T2 (de) 1996-05-15
GR3019184T3 (en) 1996-06-30
ATE132687T1 (de) 1996-01-15
US5081398A (en) 1992-01-14
EP0450061B1 (en) 1996-01-03

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