DE69024632D1 - Verbesserte radiofrequenzwellen-resonanzkopplervorrichtung unter verwendung von höheren moden - Google Patents

Verbesserte radiofrequenzwellen-resonanzkopplervorrichtung unter verwendung von höheren moden

Info

Publication number
DE69024632D1
DE69024632D1 DE69024632T DE69024632T DE69024632D1 DE 69024632 D1 DE69024632 D1 DE 69024632D1 DE 69024632 T DE69024632 T DE 69024632T DE 69024632 T DE69024632 T DE 69024632T DE 69024632 D1 DE69024632 D1 DE 69024632D1
Authority
DE
Germany
Prior art keywords
radio frequency
coupling device
frequency wave
wave resonance
resonance coupling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69024632T
Other languages
English (en)
Other versions
DE69024632T2 (de
Inventor
Jes Asmussen
Jeffrey Hopwood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Michigan State University MSU
Original Assignee
Michigan State University MSU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Michigan State University MSU filed Critical Michigan State University MSU
Publication of DE69024632D1 publication Critical patent/DE69024632D1/de
Application granted granted Critical
Publication of DE69024632T2 publication Critical patent/DE69024632T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Aerials With Secondary Devices (AREA)
  • Transmitters (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
DE69024632T 1989-10-20 1990-10-15 Verbesserte radiofrequenzwellen-resonanzkopplervorrichtung unter verwendung von höheren moden Expired - Fee Related DE69024632T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/424,720 US5081398A (en) 1989-10-20 1989-10-20 Resonant radio frequency wave coupler apparatus using higher modes
PCT/US1990/005924 WO1991006199A1 (en) 1989-10-20 1990-10-15 Improved resonant radio frequency wave coupler apparatus using higher modes

Publications (2)

Publication Number Publication Date
DE69024632D1 true DE69024632D1 (de) 1996-02-15
DE69024632T2 DE69024632T2 (de) 1996-05-15

Family

ID=23683623

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024632T Expired - Fee Related DE69024632T2 (de) 1989-10-20 1990-10-15 Verbesserte radiofrequenzwellen-resonanzkopplervorrichtung unter verwendung von höheren moden

Country Status (9)

Country Link
US (1) US5081398A (de)
EP (1) EP0450061B1 (de)
JP (1) JP2822103B2 (de)
AT (1) ATE132687T1 (de)
DE (1) DE69024632T2 (de)
DK (1) DK0450061T3 (de)
ES (1) ES2084148T3 (de)
GR (1) GR3019184T3 (de)
WO (1) WO1991006199A1 (de)

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US5361016A (en) * 1992-03-26 1994-11-01 General Atomics High density plasma formation using whistler mode excitation in a reduced cross-sectional area formation tube
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EP0566143B1 (de) * 1992-04-17 1999-11-24 Matsushita Electric Industrial Co., Ltd. Vorrichtung und Verfahren zur Plasmaerzeugung
US5292370A (en) * 1992-08-14 1994-03-08 Martin Marietta Energy Systems, Inc. Coupled microwave ECR and radio-frequency plasma source for plasma processing
WO1994006150A1 (en) * 1992-09-02 1994-03-17 The University Of North Carolina At Chapel Hill Method for plasma processing at high pressures
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US5359621A (en) * 1993-05-11 1994-10-25 General Atomics High efficiency gas laser with axial magnetic field and tunable microwave resonant cavity
US5457298A (en) * 1993-07-27 1995-10-10 Tulip Memory Systems, Inc. Coldwall hollow-cathode plasma device for support of gas discharges
US5470423A (en) * 1994-01-25 1995-11-28 Board Of Trustees Operating Michigan State University Microwave pultrusion apparatus and method of use
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IT1269413B (it) * 1994-10-21 1997-04-01 Proel Tecnologie Spa Sorgente di plasma a radiofrequenza
TW285746B (de) * 1994-10-26 1996-09-11 Matsushita Electric Ind Co Ltd
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US5686796A (en) * 1995-12-20 1997-11-11 International Business Machines Corporation Ion implantation helicon plasma source with magnetic dipoles
US5767628A (en) * 1995-12-20 1998-06-16 International Business Machines Corporation Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel
JP3225855B2 (ja) * 1996-06-06 2001-11-05 株式会社島津製作所 薄膜形成装置
US20070048882A1 (en) * 2000-03-17 2007-03-01 Applied Materials, Inc. Method to reduce plasma-induced charging damage
US8617351B2 (en) * 2002-07-09 2013-12-31 Applied Materials, Inc. Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
US6541781B1 (en) * 2000-07-25 2003-04-01 Axcelis Technologies, Inc. Waveguide for microwave excitation of plasma in an ion beam guide
US7374636B2 (en) * 2001-07-06 2008-05-20 Applied Materials, Inc. Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
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WO2003039214A1 (en) * 2001-10-26 2003-05-08 Michigan State University Improved microwave stripline applicators
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US7059268B2 (en) * 2002-12-20 2006-06-13 Tokyo Electron Limited Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
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US20070020168A1 (en) * 2005-05-13 2007-01-25 Board Of Trustees Of Michigan State University Synthesis of long and well-aligned carbon nanotubes
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US10266802B2 (en) * 2013-01-16 2019-04-23 Orteron (T.O) Ltd. Method for controlling biological processes in microorganisms
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Also Published As

Publication number Publication date
EP0450061A4 (en) 1992-08-05
EP0450061A1 (de) 1991-10-09
JP2822103B2 (ja) 1998-11-11
GR3019184T3 (en) 1996-06-30
DK0450061T3 (da) 1996-04-29
DE69024632T2 (de) 1996-05-15
EP0450061B1 (de) 1996-01-03
ATE132687T1 (de) 1996-01-15
WO1991006199A1 (en) 1991-05-02
US5081398A (en) 1992-01-14
ES2084148T3 (es) 1996-05-01

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee