DE69635035D1 - Verfahren und Vorrichtung zur Beschichtung oder Reinigung eines Substrats - Google Patents

Verfahren und Vorrichtung zur Beschichtung oder Reinigung eines Substrats

Info

Publication number
DE69635035D1
DE69635035D1 DE69635035T DE69635035T DE69635035D1 DE 69635035 D1 DE69635035 D1 DE 69635035D1 DE 69635035 T DE69635035 T DE 69635035T DE 69635035 T DE69635035 T DE 69635035T DE 69635035 D1 DE69635035 D1 DE 69635035D1
Authority
DE
Germany
Prior art keywords
field
plasma
created
microwave
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69635035T
Other languages
English (en)
Other versions
DE69635035T2 (de
Inventor
Brande Pierre Vanden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal France SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Application granted granted Critical
Publication of DE69635035D1 publication Critical patent/DE69635035D1/de
Publication of DE69635035T2 publication Critical patent/DE69635035T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3494—Adaptation to extreme pressure conditions

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE69635035T 1995-03-24 1996-03-22 Verfahren und Vorrichtung zur Beschichtung oder Reinigung eines Substrats Expired - Lifetime DE69635035T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE9500260A BE1009356A5 (fr) 1995-03-24 1995-03-24 Procede et dispositif pour revetir ou nettoyer un substrat.
BE9500260 1995-03-24

Publications (2)

Publication Number Publication Date
DE69635035D1 true DE69635035D1 (de) 2005-09-15
DE69635035T2 DE69635035T2 (de) 2006-05-24

Family

ID=3888868

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69635035T Expired - Lifetime DE69635035T2 (de) 1995-03-24 1996-03-22 Verfahren und Vorrichtung zur Beschichtung oder Reinigung eines Substrats

Country Status (6)

Country Link
EP (1) EP0734048B1 (de)
JP (1) JP2878176B2 (de)
AT (1) ATE301869T1 (de)
BE (1) BE1009356A5 (de)
DE (1) DE69635035T2 (de)
ES (1) ES2247601T3 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10037883A1 (de) * 2000-08-03 2002-02-14 Henkel Kgaa Ferromagnetische Resonanzanregung und ihre Verwendung zur Erwärmung teilchengefüllter Substrate
CN114156157A (zh) * 2021-12-01 2022-03-08 大连理工大学 一种等离子体产生装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4986214A (en) * 1986-12-16 1991-01-22 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus
JPH03111577A (ja) * 1989-09-26 1991-05-13 Idemitsu Petrochem Co Ltd マイクロ波プラズマ発生装置およびそれを利用するダイヤモンド膜の製造方法
DE4210284A1 (de) * 1992-03-28 1993-09-30 Leybold Ag Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung und Mikrowelleneinstrahlung
DE4230291C2 (de) * 1992-09-10 1999-11-04 Leybold Ag Mikrowellenunterstützte Zerstäubungsanordnung
DE4239843A1 (de) * 1992-11-27 1994-06-01 Leybold Ag Vorrichtung für die Erzeugung von Plasma, insbesondere zum Beschichten von Substraten

Also Published As

Publication number Publication date
EP0734048B1 (de) 2005-08-10
JP2878176B2 (ja) 1999-04-05
DE69635035T2 (de) 2006-05-24
BE1009356A5 (fr) 1997-02-04
ATE301869T1 (de) 2005-08-15
JPH0982492A (ja) 1997-03-28
EP0734048A1 (de) 1996-09-25
ES2247601T3 (es) 2006-03-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ARCELOR FRANCE S.A., ST. DENIS, FR

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWALTSKANZLEI VIEL & WIESKE, 66119 SAARBRUE