ATE301869T1 - Verfahren und vorrichtung zur beschichtung oder reinigung eines substrats - Google Patents

Verfahren und vorrichtung zur beschichtung oder reinigung eines substrats

Info

Publication number
ATE301869T1
ATE301869T1 AT96870034T AT96870034T ATE301869T1 AT E301869 T1 ATE301869 T1 AT E301869T1 AT 96870034 T AT96870034 T AT 96870034T AT 96870034 T AT96870034 T AT 96870034T AT E301869 T1 ATE301869 T1 AT E301869T1
Authority
AT
Austria
Prior art keywords
field
plasma
created
microwave
substrate
Prior art date
Application number
AT96870034T
Other languages
English (en)
Inventor
Brande Pierre Vanden
Original Assignee
Usinor
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Usinor filed Critical Usinor
Application granted granted Critical
Publication of ATE301869T1 publication Critical patent/ATE301869T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3494—Adaptation to extreme pressure conditions

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AT96870034T 1995-03-24 1996-03-22 Verfahren und vorrichtung zur beschichtung oder reinigung eines substrats ATE301869T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9500260A BE1009356A5 (fr) 1995-03-24 1995-03-24 Procede et dispositif pour revetir ou nettoyer un substrat.

Publications (1)

Publication Number Publication Date
ATE301869T1 true ATE301869T1 (de) 2005-08-15

Family

ID=3888868

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96870034T ATE301869T1 (de) 1995-03-24 1996-03-22 Verfahren und vorrichtung zur beschichtung oder reinigung eines substrats

Country Status (6)

Country Link
EP (1) EP0734048B1 (de)
JP (1) JP2878176B2 (de)
AT (1) ATE301869T1 (de)
BE (1) BE1009356A5 (de)
DE (1) DE69635035T2 (de)
ES (1) ES2247601T3 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10037883A1 (de) 2000-08-03 2002-02-14 Henkel Kgaa Ferromagnetische Resonanzanregung und ihre Verwendung zur Erwärmung teilchengefüllter Substrate
CN114156157B (zh) * 2021-12-01 2024-08-16 大连理工大学 一种等离子体产生装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4986214A (en) * 1986-12-16 1991-01-22 Mitsubishi Denki Kabushiki Kaisha Thin film forming apparatus
JPH03111577A (ja) * 1989-09-26 1991-05-13 Idemitsu Petrochem Co Ltd マイクロ波プラズマ発生装置およびそれを利用するダイヤモンド膜の製造方法
DE4210284A1 (de) * 1992-03-28 1993-09-30 Leybold Ag Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung und Mikrowelleneinstrahlung
DE4230291C2 (de) * 1992-09-10 1999-11-04 Leybold Ag Mikrowellenunterstützte Zerstäubungsanordnung
DE4239843A1 (de) * 1992-11-27 1994-06-01 Leybold Ag Vorrichtung für die Erzeugung von Plasma, insbesondere zum Beschichten von Substraten

Also Published As

Publication number Publication date
DE69635035T2 (de) 2006-05-24
EP0734048B1 (de) 2005-08-10
JPH0982492A (ja) 1997-03-28
JP2878176B2 (ja) 1999-04-05
EP0734048A1 (de) 1996-09-25
ES2247601T3 (es) 2006-03-01
BE1009356A5 (fr) 1997-02-04
DE69635035D1 (de) 2005-09-15

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