DE929460C - Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafuer - Google Patents

Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafuer

Info

Publication number
DE929460C
DE929460C DEK18240A DEK0018240A DE929460C DE 929460 C DE929460 C DE 929460C DE K18240 A DEK18240 A DE K18240A DE K0018240 A DEK0018240 A DE K0018240A DE 929460 C DE929460 C DE 929460C
Authority
DE
Germany
Prior art keywords
compound
formula
solution
layer
aromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DEK18240A
Other languages
German (de)
English (en)
Inventor
Werner Schaefer
Oskar Dr Sues
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE528898D priority Critical patent/BE528898A/xx
Priority to NL92615D priority patent/NL92615C/xx
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Priority to DEK18240A priority patent/DE929460C/de
Priority to AT185686D priority patent/AT185686B/de
Priority to FR1104302D priority patent/FR1104302A/fr
Priority to US430978A priority patent/US3092494A/en
Priority to CH331244D priority patent/CH331244A/de
Priority to GB15492/54A priority patent/GB745886A/en
Application granted granted Critical
Publication of DE929460C publication Critical patent/DE929460C/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/30—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/37—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
    • C07C311/38—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring having sulfur atoms of sulfonamide groups and amino groups bound to carbon atoms of six-membered rings of the same carbon skeleton
    • C07C311/44—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring having sulfur atoms of sulfonamide groups and amino groups bound to carbon atoms of six-membered rings of the same carbon skeleton having the nitrogen atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
DEK18240A 1953-05-28 1953-05-28 Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafuer Expired DE929460C (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
BE528898D BE528898A (enrdf_load_stackoverflow) 1953-05-28
NL92615D NL92615C (enrdf_load_stackoverflow) 1953-05-28
DEK18240A DE929460C (de) 1953-05-28 1953-05-28 Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafuer
AT185686D AT185686B (de) 1953-05-28 1954-05-07 Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafür
FR1104302D FR1104302A (fr) 1953-05-28 1954-05-18 Procédé pour la production photomécanique de formes d'impression planographiques, et matériel photosensible approprié
US430978A US3092494A (en) 1953-05-28 1954-05-19 Light sensitive azides, printing plates comprising such compounds and process for the production thereof
CH331244D CH331244A (de) 1953-05-28 1954-05-26 Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material zur Durchführung des Verfahrens
GB15492/54A GB745886A (en) 1953-05-28 1954-05-26 Improvements in or relating to processes for the photo-mechanical production of planographic printing plates and light-sensitive material therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK18240A DE929460C (de) 1953-05-28 1953-05-28 Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafuer

Publications (1)

Publication Number Publication Date
DE929460C true DE929460C (de) 1955-06-27

Family

ID=7215333

Family Applications (1)

Application Number Title Priority Date Filing Date
DEK18240A Expired DE929460C (de) 1953-05-28 1953-05-28 Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafuer

Country Status (8)

Country Link
US (1) US3092494A (enrdf_load_stackoverflow)
AT (1) AT185686B (enrdf_load_stackoverflow)
BE (1) BE528898A (enrdf_load_stackoverflow)
CH (1) CH331244A (enrdf_load_stackoverflow)
DE (1) DE929460C (enrdf_load_stackoverflow)
FR (1) FR1104302A (enrdf_load_stackoverflow)
GB (1) GB745886A (enrdf_load_stackoverflow)
NL (1) NL92615C (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1079949B (de) * 1955-07-29 1960-04-14 Eastman Kodak Co Lichtempfindliche Kopierschicht
DE1080403B (de) * 1955-07-29 1960-04-21 Eastman Kodak Co Verfahren zur Herstellung einer lichtempfindlichen Schicht fuer Druckplatten

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE615056A (enrdf_load_stackoverflow) * 1961-03-15
US3143423A (en) * 1962-04-02 1964-08-04 Eastman Kodak Co New photo-resist benzoylazide compositions
US3984250A (en) * 1970-02-12 1976-10-05 Eastman Kodak Company Light-sensitive diazoketone and azide compositions and photographic elements
US3844793A (en) * 1970-10-19 1974-10-29 American Cyanamid Co Photosensitive azido material
US3716367A (en) * 1971-05-26 1973-02-13 American Cyanamid Co N-succinimide additives for azide imaging systems
US3779762A (en) * 1971-05-26 1973-12-18 American Cyanamid Co N-succinimide additives for azide imaging systems
US3933497A (en) * 1972-12-08 1976-01-20 American Cyanamid Company Photosensitive azido processes
US4019907A (en) * 1973-10-24 1977-04-26 Hodogaya Chemical Co., Ltd. Photosensitive azido color-forming element
JPS5236697B2 (enrdf_load_stackoverflow) * 1974-09-09 1977-09-17
US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
US4622284A (en) * 1984-03-01 1986-11-11 Digital Recording Corporation Process of using metal azide recording media with laser
US5264318A (en) * 1987-06-15 1993-11-23 Sanyo-Kokusaku Pulp Co., Ltd. Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin
EP0353666A3 (en) * 1988-08-03 1990-05-23 Toyo Gosei Kogyo Co., Ltd. Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition
US6018471A (en) * 1995-02-02 2000-01-25 Integrated Environmental Technologies Methods and apparatus for treating waste
DE19623891A1 (de) * 1996-06-06 1997-12-11 Micro Resist Technology Ges Fu Lichtempfindlicher, wäßrig-alkalisch entwickelbarer, negativ arbeitender Resist
US6908719B1 (en) * 1999-03-31 2005-06-21 Sanyo Chemical Industries, Ltd. Photosensitive compound and photosensitive composition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1628279A (en) * 1924-05-28 1927-05-10 Kalle & Co Ag Sensitive layer on alpha suitable base and process of making same
DE456857C (de) * 1925-12-11 1928-03-03 Rheinische Kampfer Fabrik G M Verfahren zur Darstellung aromatischer Azide
BE365001A (enrdf_load_stackoverflow) * 1928-11-03
US2254191A (en) * 1940-08-06 1941-08-26 American Cyanamid Co P-azidobenzene compounds
NL59407C (enrdf_load_stackoverflow) * 1941-12-13
GB678599A (en) * 1949-10-10 1952-09-03 Kalle & Co Ag Improvements relating to the production of colloid photo-images for use in photomechanical printing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1079949B (de) * 1955-07-29 1960-04-14 Eastman Kodak Co Lichtempfindliche Kopierschicht
DE1080403B (de) * 1955-07-29 1960-04-21 Eastman Kodak Co Verfahren zur Herstellung einer lichtempfindlichen Schicht fuer Druckplatten

Also Published As

Publication number Publication date
GB745886A (en) 1956-03-07
FR1104302A (fr) 1955-11-18
AT185686B (de) 1956-05-25
BE528898A (enrdf_load_stackoverflow)
NL92615C (enrdf_load_stackoverflow)
US3092494A (en) 1963-06-04
CH331244A (de) 1958-07-15

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