DE8608209U1 - Auf Substraten aus halbleitenden oder piezoelektrischen Materialien erzeugte Mikrostrukturen aus elektronenstrahlempfindlichem Resistmaterial - Google Patents
Auf Substraten aus halbleitenden oder piezoelektrischen Materialien erzeugte Mikrostrukturen aus elektronenstrahlempfindlichem ResistmaterialInfo
- Publication number
- DE8608209U1 DE8608209U1 DE19868608209 DE8608209U DE8608209U1 DE 8608209 U1 DE8608209 U1 DE 8608209U1 DE 19868608209 DE19868608209 DE 19868608209 DE 8608209 U DE8608209 U DE 8608209U DE 8608209 U1 DE8608209 U1 DE 8608209U1
- Authority
- DE
- Germany
- Prior art keywords
- microstructures
- films
- microstructures according
- electron beam
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 title claims description 15
- 238000010894 electron beam technology Methods 0.000 title claims description 14
- 229920000642 polymer Polymers 0.000 claims description 6
- 239000002019 doping agent Substances 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002366 halogen compounds Chemical class 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 150000002978 peroxides Chemical class 0.000 claims description 3
- 239000012991 xanthate Substances 0.000 claims description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 claims description 2
- 239000000020 Nitrocellulose Substances 0.000 claims description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 229920001220 nitrocellulos Polymers 0.000 claims description 2
- JCBJVAJGLKENNC-UHFFFAOYSA-M potassium ethyl xanthate Chemical compound [K+].CCOC([S-])=S JCBJVAJGLKENNC-UHFFFAOYSA-M 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- ALWXETURCOIGIZ-UHFFFAOYSA-N 1-nitropropylbenzene Chemical compound CCC([N+]([O-])=O)C1=CC=CC=C1 ALWXETURCOIGIZ-UHFFFAOYSA-N 0.000 claims 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 claims 1
- 229940081735 acetylcellulose Drugs 0.000 claims 1
- 229920002301 cellulose acetate Polymers 0.000 claims 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 7
- 239000004922 lacquer Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 235000015097 nutrients Nutrition 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19868608209 DE8608209U1 (de) | 1986-03-25 | 1986-03-25 | Auf Substraten aus halbleitenden oder piezoelektrischen Materialien erzeugte Mikrostrukturen aus elektronenstrahlempfindlichem Resistmaterial |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19868608209 DE8608209U1 (de) | 1986-03-25 | 1986-03-25 | Auf Substraten aus halbleitenden oder piezoelektrischen Materialien erzeugte Mikrostrukturen aus elektronenstrahlempfindlichem Resistmaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE8608209U1 true DE8608209U1 (de) | 1987-10-29 |
Family
ID=6793046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19868608209 Expired DE8608209U1 (de) | 1986-03-25 | 1986-03-25 | Auf Substraten aus halbleitenden oder piezoelektrischen Materialien erzeugte Mikrostrukturen aus elektronenstrahlempfindlichem Resistmaterial |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE8608209U1 (US06491871-20021210-M00007.png) |
-
1986
- 1986-03-25 DE DE19868608209 patent/DE8608209U1/de not_active Expired
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2459156C3 (de) | Verfahren zum Herstellen einer Photolackmaske auf einem Halbleitersubstrat | |
| EP0114973A2 (de) | Wasserfester fotografischer Papierträger | |
| EP0438621B1 (de) | Beschichtungsmasse für die Rückseite fotografischer Trägermaterialien | |
| DE2708850C2 (de) | Verfahren zur Verbesserung der Haftungseigenschaften hydrophober photographischer Schichtträger | |
| DE2650532A1 (de) | Verfahren zur herstellung eines masshaltigen polyesterfilmtraegers | |
| DE2608827A1 (de) | Verfahren zur verbesserung der haftungseigenschaften von kunststofftraegern sowie die dabei erhaltenen produkte | |
| DE1097814B (de) | Blattfoermiges Traegermaterial mit Haftschicht fuer lichtempfindliche Schichten | |
| DE2827492A1 (de) | Photographischer filmtraeger | |
| DE2826894A1 (de) | Verfahren zur oberflaechenbehandlung eines kunststoffmaterials | |
| DE1961374A1 (de) | Filmmaterialien mit verbesserten Haftschichten | |
| DE8608209U1 (de) | Auf Substraten aus halbleitenden oder piezoelektrischen Materialien erzeugte Mikrostrukturen aus elektronenstrahlempfindlichem Resistmaterial | |
| DE2041667A1 (de) | Beschichtete Papierprodukte | |
| DE2502259C2 (de) | Diazotypiematerial und Verfahren zu dessen Herstellung | |
| DE2207503A1 (de) | Verfahren zum Aufbringen einer Zwi sehen bzw Haftschicht auf einen photo graphischen Film | |
| DE2128831A1 (de) | Photothermographisches Aufzeichnungs material | |
| EP0238965A2 (de) | Elektronenstrahlempfindliches Resistmaterial für Mikrostrukturen in der Elektronik | |
| DE1696264B2 (de) | Verfahren zur Herstellung lichtundurchlässiger Papiere für fotografische Zwecke | |
| DE2354652A1 (de) | Diazofilmmaterial | |
| DE2553519A1 (de) | Verfahren zur erzeugung eines bildes | |
| DE2056361A1 (de) | Substrierungsmasse fur Polyester Filmträger | |
| DE1447936A1 (de) | Lichtempfindliches Filmmaterial fuer die Herstellung von AEtzdruckplatten | |
| EP0028003B1 (de) | Diazoverbindungen enthaltendes Aufzeichnungsmaterial mit einer Filterschicht und Verfahren zur Herstellung desselben | |
| DE2150137A1 (de) | Verfahren zur Herstellung eines photographischen Materials | |
| DE1522456A1 (de) | Verfahren zur Herstellung von AEtzreserven und hierfuer geeignete Materialien | |
| DE2354651A1 (de) | Diazofilmmaterial |