DE69931817D1 - Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten - Google Patents

Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten

Info

Publication number
DE69931817D1
DE69931817D1 DE69931817T DE69931817T DE69931817D1 DE 69931817 D1 DE69931817 D1 DE 69931817D1 DE 69931817 T DE69931817 T DE 69931817T DE 69931817 T DE69931817 T DE 69931817T DE 69931817 D1 DE69931817 D1 DE 69931817D1
Authority
DE
Germany
Prior art keywords
block
polymerised
photo
polymer composition
conjugated diene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69931817T
Other languages
English (en)
Other versions
DE69931817T2 (de
Inventor
Marie-Louise Morren
Xavier Muyldermans
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kraton Polymers Research BV
Original Assignee
Kraton Polymers Research BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kraton Polymers Research BV filed Critical Kraton Polymers Research BV
Publication of DE69931817D1 publication Critical patent/DE69931817D1/de
Application granted granted Critical
Publication of DE69931817T2 publication Critical patent/DE69931817T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
DE69931817T 1998-12-31 1999-12-29 Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten Expired - Lifetime DE69931817T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98204491 1998-12-31
EP98204491 1998-12-31
PCT/EP1999/010500 WO2000041036A1 (en) 1998-12-31 1999-12-29 Photo-curable polymer composition and flexographic printing plates containing the same

Publications (2)

Publication Number Publication Date
DE69931817D1 true DE69931817D1 (de) 2006-07-20
DE69931817T2 DE69931817T2 (de) 2006-10-12

Family

ID=8234576

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69931817T Expired - Lifetime DE69931817T2 (de) 1998-12-31 1999-12-29 Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten

Country Status (7)

Country Link
US (1) US6326127B1 (de)
EP (1) EP1171803B1 (de)
JP (1) JP4454156B2 (de)
AT (1) ATE329293T1 (de)
AU (1) AU2104600A (de)
DE (1) DE69931817T2 (de)
WO (1) WO2000041036A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001068769A1 (en) * 2000-03-16 2001-09-20 Kraton Polymers Research B.V. Polymeric composition
NL1015180C2 (nl) * 2000-05-12 2001-11-15 Houtstra Polimero Deutschland Werkwijze voor het vervaardigen van een drukplaat.
EP1417538B1 (de) * 2001-08-03 2006-04-05 XSYS Print Solutions Deutschland GmbH Fotempfindliches flexodruckelement und verfahren zur herstellung von zeitungsflexodruckplatten
US6976426B2 (en) * 2002-04-09 2005-12-20 Day International, Inc. Image replication element and method and system for producing the same
AU2003231455A1 (en) * 2002-04-25 2003-11-10 Asahi Kasei Chemicals Corporation Block copolymer and composition thereof
EP1555571B1 (de) * 2002-10-23 2009-01-14 Kuraray Co., Ltd. Ausgehärtetes material und flexographische druckplatte damit
DE602004018362D1 (de) * 2003-09-25 2009-01-22 Zeon Corp Block-copolymerzusammensetzung für eine lichtempfindliche flexographische platte
US7348076B2 (en) 2004-04-08 2008-03-25 Saint-Gobain Ceramics & Plastics, Inc. Single crystals and methods for fabricating same
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
WO2006051863A1 (ja) * 2004-11-11 2006-05-18 Asahi Kasei Chemicals Corporation フレキソ印刷用感光性樹脂組成物
US20070078194A1 (en) * 2005-10-04 2007-04-05 St Clair David J Flexographic printing plate and flexographic printing plate precursor composition for preparing same
JP4868920B2 (ja) * 2006-04-07 2012-02-01 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
US8389203B2 (en) 2007-05-08 2013-03-05 Esko-Graphics Imaging Gmbh Exposing printing plates using light emitting diodes
WO2010084913A1 (ja) 2009-01-22 2010-07-29 日本製紙ケミカル株式会社 活性エネルギー線硬化型樹脂組成物
US20110236705A1 (en) 2010-03-29 2011-09-29 Ophira Melamed Flexographic printing precursors and methods of making
US8808968B2 (en) * 2012-08-22 2014-08-19 Jonghan Choi Method of improving surface cure in digital flexographic printing plates
WO2015004043A1 (en) * 2013-07-08 2015-01-15 Styrolution Group Gmbh Mono vinyl aromatic conjugated diene block copolymer and polymer composition comprising said block copolymer and a mono vinylarene acrylate copolymer
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
US10108087B2 (en) * 2016-03-11 2018-10-23 Macdermid Graphics Solutions Llc Method of improving light stability of flexographic printing plates featuring flat top dots
JP7339825B2 (ja) * 2019-09-19 2023-09-06 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
LU86698A1 (fr) * 1986-12-04 1988-07-14 Labofina Sa Procede pour fabriquer des copolymeres blocs transparents
US6040116A (en) * 1989-03-17 2000-03-21 Basf Aktiengesellschaft Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation
DE4001465A1 (de) * 1990-01-19 1991-07-25 Hoechst Ag Strahlungsempfindliches gemisch basierend auf oligomeren malein- und fumarsaeureestern und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
CA2041023C (en) 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
WO1992015046A1 (fr) 1991-02-15 1992-09-03 Asahi Kasei Kogyo Kabushiki Kaisha Composition elastomere photosensible
EP0699961B1 (de) 1993-03-31 2000-11-15 Nippon Zeon Co., Ltd. Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte
ES2122320T3 (es) * 1993-07-14 1998-12-16 Shell Int Research Procedimiento para curar una composicion de copolimero de bloques curable por radiacion ultravioleta.
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5496685A (en) 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
JP3510393B2 (ja) * 1994-08-10 2004-03-29 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー 光硬化性エラストマー組成物から得られるフレキソグラフ印刷プレート
US5863704A (en) 1995-04-26 1999-01-26 Nippon Zeon Company, Ltd. Photosensitive composition and photosensitive rubber plate
DE19628541A1 (de) * 1996-07-16 1998-01-22 Du Pont Deutschland Strahlungsempfindliche Zusammensetzung und ein diese enthaltendes strahlungsempfindliches Aufzeichnungsmaterial

Also Published As

Publication number Publication date
WO2000041036A1 (en) 2000-07-13
JP4454156B2 (ja) 2010-04-21
US6326127B1 (en) 2001-12-04
EP1171803B1 (de) 2006-06-07
DE69931817T2 (de) 2006-10-12
AU2104600A (en) 2000-07-24
EP1171803A1 (de) 2002-01-16
ATE329293T1 (de) 2006-06-15
JP2002534714A (ja) 2002-10-15

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