ATE329293T1 - Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten - Google Patents

Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten

Info

Publication number
ATE329293T1
ATE329293T1 AT99965587T AT99965587T ATE329293T1 AT E329293 T1 ATE329293 T1 AT E329293T1 AT 99965587 T AT99965587 T AT 99965587T AT 99965587 T AT99965587 T AT 99965587T AT E329293 T1 ATE329293 T1 AT E329293T1
Authority
AT
Austria
Prior art keywords
block
polymerised
polymer composition
photo
conjugated diene
Prior art date
Application number
AT99965587T
Other languages
English (en)
Inventor
Karin Marie-Louise Rene Morren
Xavier Muyldermans
Original Assignee
Kraton Polymers Res Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kraton Polymers Res Bv filed Critical Kraton Polymers Res Bv
Application granted granted Critical
Publication of ATE329293T1 publication Critical patent/ATE329293T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
  • Materials For Photolithography (AREA)
AT99965587T 1998-12-31 1999-12-29 Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten ATE329293T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP98204491 1998-12-31

Publications (1)

Publication Number Publication Date
ATE329293T1 true ATE329293T1 (de) 2006-06-15

Family

ID=8234576

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99965587T ATE329293T1 (de) 1998-12-31 1999-12-29 Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten

Country Status (7)

Country Link
US (1) US6326127B1 (de)
EP (1) EP1171803B1 (de)
JP (1) JP4454156B2 (de)
AT (1) ATE329293T1 (de)
AU (1) AU2104600A (de)
DE (1) DE69931817T2 (de)
WO (1) WO2000041036A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001068769A1 (en) * 2000-03-16 2001-09-20 Kraton Polymers Research B.V. Polymeric composition
NL1015180C2 (nl) * 2000-05-12 2001-11-15 Houtstra Polimero Deutschland Werkwijze voor het vervaardigen van een drukplaat.
ATE390646T1 (de) * 2001-08-03 2008-04-15 Flint Group Germany Gmbh Verfahren zur herstellung von zeitungsflexodruckplatten
US6976426B2 (en) * 2002-04-09 2005-12-20 Day International, Inc. Image replication element and method and system for producing the same
WO2003091303A1 (fr) * 2002-04-25 2003-11-06 Asahi Kasei Chemicals Corporation Copolymere sequence et sa composition
US7432037B2 (en) * 2002-10-23 2008-10-07 Kuraray Co., Ltd. Curable resin composition and flexographic plate material using the same
JP4539561B2 (ja) * 2003-09-25 2010-09-08 日本ゼオン株式会社 感光性フレキソ版用ブロック共重合体組成物
US7348076B2 (en) 2004-04-08 2008-03-25 Saint-Gobain Ceramics & Plastics, Inc. Single crystals and methods for fabricating same
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
JP4675334B2 (ja) * 2004-11-11 2011-04-20 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
US20070078194A1 (en) * 2005-10-04 2007-04-05 St Clair David J Flexographic printing plate and flexographic printing plate precursor composition for preparing same
JP4868920B2 (ja) * 2006-04-07 2012-02-01 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
US8389203B2 (en) 2007-05-08 2013-03-05 Esko-Graphics Imaging Gmbh Exposing printing plates using light emitting diodes
JP5654876B2 (ja) * 2009-01-22 2015-01-14 日本製紙株式会社 活性エネルギー線硬化型樹脂組成物
US20110236705A1 (en) 2010-03-29 2011-09-29 Ophira Melamed Flexographic printing precursors and methods of making
US8808968B2 (en) * 2012-08-22 2014-08-19 Jonghan Choi Method of improving surface cure in digital flexographic printing plates
JP6594305B2 (ja) 2013-07-08 2019-10-23 イネオス・スタイロリューション・グループ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング モノビニル芳香族共役ジエンブロックコポリマー、および該ブロックコポリマーとモノビニルアレーンアクリラートコポリマーとを含むポリマー組成物
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
US10108087B2 (en) * 2016-03-11 2018-10-23 Macdermid Graphics Solutions Llc Method of improving light stability of flexographic printing plates featuring flat top dots
JP7339825B2 (ja) * 2019-09-19 2023-09-06 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
LU86698A1 (fr) * 1986-12-04 1988-07-14 Labofina Sa Procede pour fabriquer des copolymeres blocs transparents
US6040116A (en) * 1989-03-17 2000-03-21 Basf Aktiengesellschaft Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation
DE4001465A1 (de) * 1990-01-19 1991-07-25 Hoechst Ag Strahlungsempfindliches gemisch basierend auf oligomeren malein- und fumarsaeureestern und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
CA2041023C (en) 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
EP0525206B1 (de) 1991-02-15 1998-04-29 Asahi Kasei Kogyo Kabushiki Kaisha Lichtempfindliche Elastomerzusammensetzung
US5679485A (en) 1993-03-31 1997-10-21 Nippon Zeon Co., Ltd. Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same
ATE171972T1 (de) * 1993-07-14 1998-10-15 Shell Int Research Verfahren zur härtung einer durch uv-strahlen härtbaren blockcopolymerzusammensetzung
US5496684A (en) 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5496685A (en) 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
KR960008405A (ko) * 1994-08-10 1996-03-22 알베르투스 빌헬무스·요아네스 째스트라텐 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판
US5863704A (en) 1995-04-26 1999-01-26 Nippon Zeon Company, Ltd. Photosensitive composition and photosensitive rubber plate
DE19628541A1 (de) * 1996-07-16 1998-01-22 Du Pont Deutschland Strahlungsempfindliche Zusammensetzung und ein diese enthaltendes strahlungsempfindliches Aufzeichnungsmaterial

Also Published As

Publication number Publication date
DE69931817D1 (de) 2006-07-20
DE69931817T2 (de) 2006-10-12
JP4454156B2 (ja) 2010-04-21
EP1171803A1 (de) 2002-01-16
AU2104600A (en) 2000-07-24
US6326127B1 (en) 2001-12-04
JP2002534714A (ja) 2002-10-15
WO2000041036A1 (en) 2000-07-13
EP1171803B1 (de) 2006-06-07

Similar Documents

Publication Publication Date Title
ATE329293T1 (de) Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten
BR9911536A (pt) Composição polimérica fotocurável e pranchas de impressão contendo a mesma
JP2002519465A5 (de)
EP1158364A3 (de) Fotopolymerisierbare Flexodruckelemente mit SIS/SBS-Gemischen als Bindemittel zur Herstellung von Flexodruckformen
US20050233249A1 (en) Photopolymerizable compositions and flexographic printing plates derived therefrom
EP1743218B1 (de) Lichtaushärtbare zusammensetzungen und diese enthaltende flexographische druckplatten
KR20100053605A (ko) 상이한 이소프렌 및 부타디엔 중간블록을 보유하는 블록 공중합체, 이의 제조방법, 및 이러한 블록 공중합체의 용도
JP2007511805A (ja) 分布制御ブロックコポリマーから調製した光重合性組成物およびフレキソ印刷版
WO2017014401A1 (ko) 광학용 점착제 조성물 및 광학용 점착 필름
WO2005031459A1 (ja) 感光性フレキソ版用ブロック共重合体組成物
EP1555571B1 (de) Ausgehärtetes material und flexographische druckplatte damit
JP4748812B2 (ja) フレキソ印刷版
AU2005252957A1 (en) Photosensitive resin for flexographic printing plate
JP2017198743A (ja) フレキソ印刷版用感光性樹脂組成物、フレキソ印刷版用感光性樹脂構成体、及びフレキソ印刷版
US7785765B2 (en) Photosensitive resin composition
JPS6370242A (ja) 感光性エラストマ−組成物
US5998098A (en) Process for adhering the edges of photopolymerizable printing plates or photopolymer printing forms for flexographic printing
JP4166957B2 (ja) 画像形成性が改良されたフレキソ版用感光性樹脂構成体
WO2010059012A2 (ko) 마이크로 패턴 옵셋 인쇄용 다층 구조 실리콘 블랭킷
TW200600967A (en) Intaglio printing plate for printing photosensitive alignment layer, and photosensitive composition for manufacturing intaglio printing plate for printing alignment layer

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties