ATE329293T1 - Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten - Google Patents

Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten

Info

Publication number
ATE329293T1
ATE329293T1 AT99965587T AT99965587T ATE329293T1 AT E329293 T1 ATE329293 T1 AT E329293T1 AT 99965587 T AT99965587 T AT 99965587T AT 99965587 T AT99965587 T AT 99965587T AT E329293 T1 ATE329293 T1 AT E329293T1
Authority
AT
Austria
Prior art keywords
block
polymerised
polymer composition
photo
conjugated diene
Prior art date
Application number
AT99965587T
Other languages
English (en)
Inventor
Karin Marie-Louise Rene Morren
Xavier Muyldermans
Original Assignee
Kraton Polymers Res Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kraton Polymers Res Bv filed Critical Kraton Polymers Res Bv
Application granted granted Critical
Publication of ATE329293T1 publication Critical patent/ATE329293T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
AT99965587T 1998-12-31 1999-12-29 Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten ATE329293T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP98204491 1998-12-31

Publications (1)

Publication Number Publication Date
ATE329293T1 true ATE329293T1 (de) 2006-06-15

Family

ID=8234576

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99965587T ATE329293T1 (de) 1998-12-31 1999-12-29 Photohärtbare polymer-zusammensetzung und diese enthaltende flexodruckplatten

Country Status (7)

Country Link
US (1) US6326127B1 (de)
EP (1) EP1171803B1 (de)
JP (1) JP4454156B2 (de)
AT (1) ATE329293T1 (de)
AU (1) AU2104600A (de)
DE (1) DE69931817T2 (de)
WO (1) WO2000041036A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001250391A1 (en) * 2000-03-16 2001-09-24 Kraton Polymers Research B.V. Polymeric composition
NL1015180C2 (nl) * 2000-05-12 2001-11-15 Houtstra Polimero Deutschland Werkwijze voor het vervaardigen van een drukplaat.
CN1328627C (zh) * 2001-08-03 2007-07-25 Xsys印刷解决方案德国有限公司 光敏柔性印刷材料及制造报纸用柔性印刷版的方法
US6976426B2 (en) * 2002-04-09 2005-12-20 Day International, Inc. Image replication element and method and system for producing the same
AU2003231455A1 (en) * 2002-04-25 2003-11-10 Asahi Kasei Chemicals Corporation Block copolymer and composition thereof
ATE421113T1 (de) * 2002-10-23 2009-01-15 Kuraray Co Ausgehärtetes material und flexographische druckplatte damit
US7318985B2 (en) * 2003-09-25 2008-01-15 Zeon Corporation Block copolymer composition for photosensitive flexographic plate
US7348076B2 (en) 2004-04-08 2008-03-25 Saint-Gobain Ceramics & Plastics, Inc. Single crystals and methods for fabricating same
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
EP1811336B2 (de) 2004-11-11 2021-09-22 Asahi Kasei Chemicals Corporation Lichtempfindliche harzzusammensetzung für den flexografischen druck
US20070078194A1 (en) * 2005-10-04 2007-04-05 St Clair David J Flexographic printing plate and flexographic printing plate precursor composition for preparing same
JP4868920B2 (ja) * 2006-04-07 2012-02-01 旭化成イーマテリアルズ株式会社 フレキソ印刷用感光性樹脂組成物
US8389203B2 (en) 2007-05-08 2013-03-05 Esko-Graphics Imaging Gmbh Exposing printing plates using light emitting diodes
US8748507B2 (en) 2009-01-22 2014-06-10 Nippon Paper Chemicals Co., Ltd. Active energy ray curable resin composition
US20110236705A1 (en) 2010-03-29 2011-09-29 Ophira Melamed Flexographic printing precursors and methods of making
US8808968B2 (en) * 2012-08-22 2014-08-19 Jonghan Choi Method of improving surface cure in digital flexographic printing plates
EP3019542B1 (de) * 2013-07-08 2017-07-05 INEOS Styrolution Group GmbH Aromatisches und konjugiertes monovinyl-dien-blockcopolymer und polymerzusammensetzung mit diesem blockcopolymer und einem mono-vinylaren-acrylat-copolymer
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
US10108087B2 (en) 2016-03-11 2018-10-23 Macdermid Graphics Solutions Llc Method of improving light stability of flexographic printing plates featuring flat top dots
JP7339825B2 (ja) * 2019-09-19 2023-09-06 旭化成株式会社 フレキソ印刷原版、及びブロック共重合体組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
LU86698A1 (fr) * 1986-12-04 1988-07-14 Labofina Sa Procede pour fabriquer des copolymeres blocs transparents
US6040116A (en) * 1989-03-17 2000-03-21 Basf Aktiengesellschaft Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation
DE4001465A1 (de) * 1990-01-19 1991-07-25 Hoechst Ag Strahlungsempfindliches gemisch basierend auf oligomeren malein- und fumarsaeureestern und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
NZ237919A (en) 1990-04-26 1994-09-27 Grace W R & Co Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
US5250389A (en) 1991-02-15 1993-10-05 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
US5679485A (en) 1993-03-31 1997-10-21 Nippon Zeon Co., Ltd. Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same
DE69413823T2 (de) * 1993-07-14 1999-03-18 Shell Internationale Research Maatschappij B.V., Den Haag/S'gravenhage Verfahren zur härtung einer durch uv-strahlen härtbaren blockcopolymerzusammensetzung
US5496685A (en) 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
KR960008405A (ko) * 1994-08-10 1996-03-22 알베르투스 빌헬무스·요아네스 째스트라텐 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판
US5863704A (en) 1995-04-26 1999-01-26 Nippon Zeon Company, Ltd. Photosensitive composition and photosensitive rubber plate
DE19628541A1 (de) * 1996-07-16 1998-01-22 Du Pont Deutschland Strahlungsempfindliche Zusammensetzung und ein diese enthaltendes strahlungsempfindliches Aufzeichnungsmaterial

Also Published As

Publication number Publication date
WO2000041036A1 (en) 2000-07-13
JP4454156B2 (ja) 2010-04-21
DE69931817D1 (de) 2006-07-20
EP1171803B1 (de) 2006-06-07
JP2002534714A (ja) 2002-10-15
US6326127B1 (en) 2001-12-04
AU2104600A (en) 2000-07-24
DE69931817T2 (de) 2006-10-12
EP1171803A1 (de) 2002-01-16

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