BR9911835A - Composição fotocurada e polìmero elastomérico fotocurável - Google Patents

Composição fotocurada e polìmero elastomérico fotocurável

Info

Publication number
BR9911835A
BR9911835A BR9911835-1A BR9911835A BR9911835A BR 9911835 A BR9911835 A BR 9911835A BR 9911835 A BR9911835 A BR 9911835A BR 9911835 A BR9911835 A BR 9911835A
Authority
BR
Brazil
Prior art keywords
photocurable
present
elastomeric polymer
composition
optionally
Prior art date
Application number
BR9911835-1A
Other languages
English (en)
Inventor
Andre J Uzze
Calvin P Esneault
Michael O Myers
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of BR9911835A publication Critical patent/BR9911835A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/006—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00
    • C08F283/008—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00 on to unsaturated polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/062—Polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/04—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/48—Polymers modified by chemical after-treatment
    • C08G65/485—Polyphenylene oxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

"COMPOSIçãO FOTOCURADA E POLìMERO ELASTOMéRICO FOTOCURáVEL". A presente invenção compreende uma composição fotocurável compreendendo: (a) um componente elastomérico contendo um ou mais novos polímeros modificados com grupos terminais, de alto peso molecular, insaturados; (b) um sistema iniciador de fotopolimerização; opcionalmente (c) um ou mais agentes reticulantes; e opcionalmente, (d) outros aditivos. Composições fotocuráveis da presente invenção exibem velocidades de reticulação (isto é, cura) mais rápidas (isto é, menores tempos de exposição) que composições semelhantes não contendo polímeros modificados com grupos terminais. Composições curadas da presente invenção exibem menor intumescimento por solvente, e maciez aumentada (isto é, menor dureza conforme medida por dureza Shore A) quando comparadas com composições curadas não contendo polímeros modificados com grupos terminais, de alto peso molecular, insaturado.
BR9911835-1A 1998-06-11 1999-06-08 Composição fotocurada e polìmero elastomérico fotocurável BR9911835A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US8892398P 1998-06-11 1998-06-11
PCT/US1999/012788 WO1999064931A1 (en) 1998-06-11 1999-06-08 Photocurable elastomeric compositions

Publications (1)

Publication Number Publication Date
BR9911835A true BR9911835A (pt) 2001-03-20

Family

ID=22214301

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9911835-1A BR9911835A (pt) 1998-06-11 1999-06-08 Composição fotocurada e polìmero elastomérico fotocurável

Country Status (11)

Country Link
US (2) US20010024759A1 (pt)
EP (1) EP1092174B1 (pt)
JP (1) JP2002517802A (pt)
KR (1) KR20010052675A (pt)
CN (1) CN1307694A (pt)
AU (1) AU4954399A (pt)
BR (1) BR9911835A (pt)
CA (1) CA2333998A1 (pt)
DE (1) DE69906076T2 (pt)
ES (1) ES2190230T3 (pt)
WO (1) WO1999064931A1 (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005530030A (ja) 2002-07-03 2005-10-06 ザ プロクター アンド ギャンブル カンパニー 放射線硬化性低応力緩和エラストマー材料
JP4867217B2 (ja) * 2004-08-19 2012-02-01 三菱瓦斯化学株式会社 硬化性樹脂組成物および硬化性フィルムおよびフィルム
US7971730B2 (en) 2005-08-10 2011-07-05 The Regents Of The University Of California Collection tubes apparatus, systems and methods
US7673758B2 (en) 2005-08-10 2010-03-09 The Regents Of The University Of California Collection tubes apparatus, systems, and methods
US9669405B2 (en) 2012-10-22 2017-06-06 The Regents Of The University Of California Sterilizable photopolymer serum separator
EP3202844B1 (en) * 2014-09-30 2021-05-19 Zeon Corporation Block copolymer composition, adhesive composition, and adhesive sheet
CN105175645B (zh) * 2015-09-21 2017-12-22 江苏科技大学 一种含有大分子弹性体的3d打印光敏树脂材料及制备方法
JP7305290B2 (ja) * 2021-10-04 2023-07-10 日本化薬株式会社 共重合体、硬化性樹脂組成物およびその硬化物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1432783A (en) * 1972-04-14 1976-04-22 Cpc International Inc Macromolecular monomers
US4104330A (en) * 1976-05-27 1978-08-01 Cpc International Inc. Synthesis and copolymerization of tapered block macromer monomers
GB2195349B (en) * 1986-08-18 1990-07-11 Nippon Zeon Co Photosensitive elastomeric composition
EP0353471B1 (en) * 1988-08-05 1994-01-05 Edison Polymer Innovation Corporation ( Epic) UV curable polymer formulation

Also Published As

Publication number Publication date
EP1092174A1 (en) 2001-04-18
US20010024759A1 (en) 2001-09-27
ES2190230T3 (es) 2003-07-16
CN1307694A (zh) 2001-08-08
AU4954399A (en) 1999-12-30
DE69906076D1 (de) 2003-04-24
DE69906076T2 (de) 2003-12-24
US20020076644A1 (en) 2002-06-20
KR20010052675A (ko) 2001-06-25
EP1092174B1 (en) 2003-03-19
CA2333998A1 (en) 1999-12-16
WO1999064931A1 (en) 1999-12-16
JP2002517802A (ja) 2002-06-18

Similar Documents

Publication Publication Date Title
BR112012010838A2 (pt) elastômero pintável
BRPI0413493A (pt) composição para formar composições poliméricas de poliuretano, uso da mesma, e, método para formar um polìmero a base de poliuretano
ES2179965T3 (es) Polimeros y copolimeros de dieno que tienen un grupo de alcoxisilano.
BR9908423A (pt) Processo de vulcanização dinâmica de uma mistura de polìmeros polimerizados em solução, e, vulcanizado dinâmico
GB0606599D0 (en) Extenders for organosiloxane compositions
BR0100831A (pt) Composição de borracha vulcanizável que éutilizável para a fabricação de uma carcaça depneumático, processo de preparação de umacomposição de borracha e carcaça de pneumático
EP0997482A4 (en) MODIFIED CYCLOOLEFIN ADDITION POLYMER AND CURABLE RESIN COMPOSITION BASED ON SAID POLYMER
DE69628996D1 (de) Polymerzusammensetzung und Rezistmaterial
BR0212169A (pt) Composição polimérica, processos para a preparação da mesma e de um derivado de poliisobuteno, e, derivado de poliisobuteno
BR9911536A (pt) Composição polimérica fotocurável e pranchas de impressão contendo a mesma
BR0104468A (pt) Composição para enchimento de cabos e utilização da mesma
BR9911835A (pt) Composição fotocurada e polìmero elastomérico fotocurável
AR040186A1 (es) Composiciones de copolimeros de propileno flexibles con alta transparencia
BR9913439A (pt) Composições termofixas contendo polìmeros com funcionalidade de ácido carboxìlico, método para revistir um substrato; e substrato revestido
BR9913376A (pt) Composição termofixa compreedendo uma fase resinosa dispersada em um meio aquoso e método para revestir eletroliticamente um substrato condutivo
KR20220065759A (ko) 3d 프린팅을 위한 티올-아크릴레이트 엘라스토머
EP0999236A4 (en) HARDENABLE COMPOSITION
ES2132111T3 (es) Composiciones de resinas termoplasticas de poco brillo.
CA2019824A1 (en) Polyether acrylamide derivatives and active energy ray curable resin composition
BR0013990A (pt) Composição de polìmero termoplástico do tipo para filme elastomérico tendo desempenho elástico melhorado
ATE235515T1 (de) Verfahren zur hydrierung eines polymeren aufgebaut aus dienmonomeren und nitrilgruppen enthaltenden monomeren und hydriertes polymer
BR9808997A (pt) Composições para o tratamento pessoal contendo polìmeros lineares enxertados com silicone enrigecido
BR9917499A (pt) Composições termofixas contendo polìmeros com funcionalidade epóxi, método para revestir um substrato e substrato
ES2056502T3 (es) Adhesivo de estructura endurecible a base de caucho.
ES2170410T3 (es) Procedimiento para la fabricacion de un cuerpo moldeado adecuado para fines opticos.

Legal Events

Date Code Title Description
B25A Requested transfer of rights approved

Free format text: DOW GLOBAL TECHNOLOGIES INC (US)

B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE AS 6A, 7A E 8A ANUIDADES

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1907 DE 24/07/2007.