DE69930068D1 - Anordnung zum Tragen eines Substrates während eines angepassten Schneidverfahrens - Google Patents
Anordnung zum Tragen eines Substrates während eines angepassten SchneidverfahrensInfo
- Publication number
- DE69930068D1 DE69930068D1 DE69930068T DE69930068T DE69930068D1 DE 69930068 D1 DE69930068 D1 DE 69930068D1 DE 69930068 T DE69930068 T DE 69930068T DE 69930068 T DE69930068 T DE 69930068T DE 69930068 D1 DE69930068 D1 DE 69930068D1
- Authority
- DE
- Germany
- Prior art keywords
- nest
- arrangement
- supporting
- opening
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title abstract 4
- 238000005520 cutting process Methods 0.000 title 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 abstract 2
- 239000012858 resilient material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68313—Auxiliary support including a cavity for storing a finished device, e.g. IC package, or a partly finished device, e.g. die, during manufacturing or mounting
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/156,593 US6187654B1 (en) | 1998-03-13 | 1998-09-18 | Techniques for maintaining alignment of cut dies during substrate dicing |
US156593 | 1998-09-18 | ||
US288252 | 1999-04-08 | ||
US09/288,252 US6325059B1 (en) | 1998-09-18 | 1999-04-08 | Techniques for dicing substrates during integrated circuit fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69930068D1 true DE69930068D1 (de) | 2006-04-27 |
DE69930068T2 DE69930068T2 (de) | 2006-09-21 |
Family
ID=26853329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69930068T Expired - Fee Related DE69930068T2 (de) | 1998-09-18 | 1999-09-02 | Anordnung zum Tragen eines Substrates während eines angepassten Schneidverfahrens |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0987739B1 (de) |
JP (1) | JP4335377B2 (de) |
KR (1) | KR100330445B1 (de) |
AT (1) | ATE319185T1 (de) |
DE (1) | DE69930068T2 (de) |
MY (1) | MY125036A (de) |
TW (1) | TW423113B (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4680362B2 (ja) * | 2000-09-22 | 2011-05-11 | 株式会社石井工作研究所 | 電子部品の製造方法及び製造装置 |
US20020139235A1 (en) * | 2001-02-20 | 2002-10-03 | Nordin Brett William | Singulation apparatus and method for manufacturing semiconductors |
US7281535B2 (en) * | 2004-02-23 | 2007-10-16 | Towa Intercon Technology, Inc. | Saw singulation |
SG145540A1 (en) * | 2004-03-12 | 2008-09-29 | Advanced Systems Automation | Semiconductor package singulating system and method |
JP2005353723A (ja) * | 2004-06-09 | 2005-12-22 | Apic Yamada Corp | 切断装置、及び切断方法 |
KR100555724B1 (ko) * | 2004-11-08 | 2006-03-03 | 세크론 주식회사 | 반도체 제조용 척 테이블 |
KR100897306B1 (ko) * | 2007-11-29 | 2009-05-14 | 주식회사 프로메카 | 인쇄회로기판용 진공흡착 툴링 블록 |
TWI425660B (zh) * | 2010-10-20 | 2014-02-01 | Advanced Optoelectronic Tech | 發光二極體防水治具以及發光二極體的切割方法 |
JP5908681B2 (ja) * | 2011-06-29 | 2016-04-26 | 株式会社ディスコ | レーザー加工装置 |
CN102637649A (zh) * | 2012-04-28 | 2012-08-15 | 日月光半导体制造股份有限公司 | 半导体结构的制造方法 |
CN104838483B (zh) * | 2012-12-17 | 2019-05-21 | 新加坡科技研究局 | 晶片划切装置和晶片划切方法 |
JP2014175602A (ja) * | 2013-03-12 | 2014-09-22 | Disco Abrasive Syst Ltd | 保持治具 |
JP6096047B2 (ja) * | 2013-05-15 | 2017-03-15 | 株式会社ディスコ | 切削装置およびパッケージ基板の加工方法 |
JP6301147B2 (ja) * | 2014-02-13 | 2018-03-28 | 株式会社ディスコ | 保持治具 |
JP2017054956A (ja) * | 2015-09-10 | 2017-03-16 | 株式会社ディスコ | 被加工物の支持治具 |
US20230058931A1 (en) * | 2020-02-27 | 2023-02-23 | Applied Materials Italia S.R.L. | Support device for supporting a substrate, method of processing a substrate and semiconductor substrate |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3976288A (en) * | 1975-11-24 | 1976-08-24 | Ibm Corporation | Semiconductor wafer dicing fixture |
US4296542A (en) * | 1980-07-11 | 1981-10-27 | Presco, Inc. | Control of small parts in a manufacturing operation |
US4600936A (en) * | 1983-07-12 | 1986-07-15 | International Business Machines Corporation | Chip registration mechanism |
JP3496347B2 (ja) * | 1995-07-13 | 2004-02-09 | 株式会社デンソー | 半導体装置及びその製造方法 |
US5803797A (en) * | 1996-11-26 | 1998-09-08 | Micron Technology, Inc. | Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck |
-
1999
- 1999-08-31 TW TW088114974A patent/TW423113B/zh active
- 1999-09-02 EP EP99306965A patent/EP0987739B1/de not_active Expired - Lifetime
- 1999-09-02 AT AT99306965T patent/ATE319185T1/de not_active IP Right Cessation
- 1999-09-02 DE DE69930068T patent/DE69930068T2/de not_active Expired - Fee Related
- 1999-09-11 MY MYPI99003942A patent/MY125036A/en unknown
- 1999-09-16 JP JP26195499A patent/JP4335377B2/ja not_active Expired - Fee Related
- 1999-09-17 KR KR1019990039997A patent/KR100330445B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
MY125036A (en) | 2006-07-31 |
ATE319185T1 (de) | 2006-03-15 |
KR20000023244A (ko) | 2000-04-25 |
JP2000100757A (ja) | 2000-04-07 |
KR100330445B1 (ko) | 2002-04-01 |
EP0987739A3 (de) | 2003-08-13 |
EP0987739A2 (de) | 2000-03-22 |
TW423113B (en) | 2001-02-21 |
DE69930068T2 (de) | 2006-09-21 |
EP0987739B1 (de) | 2006-03-01 |
JP4335377B2 (ja) | 2009-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |