ATE319185T1 - Anordnung zum tragen eines substrates während eines angepassten schneidverfahrens - Google Patents

Anordnung zum tragen eines substrates während eines angepassten schneidverfahrens

Info

Publication number
ATE319185T1
ATE319185T1 AT99306965T AT99306965T ATE319185T1 AT E319185 T1 ATE319185 T1 AT E319185T1 AT 99306965 T AT99306965 T AT 99306965T AT 99306965 T AT99306965 T AT 99306965T AT E319185 T1 ATE319185 T1 AT E319185T1
Authority
AT
Austria
Prior art keywords
nest
arrangement
opening
substrate
supporting
Prior art date
Application number
AT99306965T
Other languages
English (en)
Inventor
Alois Tieber
Original Assignee
Towa Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/156,593 external-priority patent/US6187654B1/en
Priority claimed from US09/288,252 external-priority patent/US6325059B1/en
Application filed by Towa Corp filed Critical Towa Corp
Application granted granted Critical
Publication of ATE319185T1 publication Critical patent/ATE319185T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0094Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P54/00Cutting or separating of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/78Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/741Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support the auxiliary support including a cavity for storing a finished or partly finished device during manufacturing or mounting, e.g. for an IC package or for a chip

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
AT99306965T 1998-09-18 1999-09-02 Anordnung zum tragen eines substrates während eines angepassten schneidverfahrens ATE319185T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/156,593 US6187654B1 (en) 1998-03-13 1998-09-18 Techniques for maintaining alignment of cut dies during substrate dicing
US09/288,252 US6325059B1 (en) 1998-09-18 1999-04-08 Techniques for dicing substrates during integrated circuit fabrication

Publications (1)

Publication Number Publication Date
ATE319185T1 true ATE319185T1 (de) 2006-03-15

Family

ID=26853329

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99306965T ATE319185T1 (de) 1998-09-18 1999-09-02 Anordnung zum tragen eines substrates während eines angepassten schneidverfahrens

Country Status (7)

Country Link
EP (1) EP0987739B1 (de)
JP (1) JP4335377B2 (de)
KR (1) KR100330445B1 (de)
AT (1) ATE319185T1 (de)
DE (1) DE69930068T2 (de)
MY (1) MY125036A (de)
TW (1) TW423113B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4680362B2 (ja) * 2000-09-22 2011-05-11 株式会社石井工作研究所 電子部品の製造方法及び製造装置
WO2002067300A2 (en) * 2001-02-20 2002-08-29 Micro Component Technology, Inc. Singulation apparatus and method for manufacturing semiconductors
US7281535B2 (en) * 2004-02-23 2007-10-16 Towa Intercon Technology, Inc. Saw singulation
SG145540A1 (en) * 2004-03-12 2008-09-29 Advanced Systems Automation Semiconductor package singulating system and method
JP2005353723A (ja) * 2004-06-09 2005-12-22 Apic Yamada Corp 切断装置、及び切断方法
KR100555724B1 (ko) * 2004-11-08 2006-03-03 세크론 주식회사 반도체 제조용 척 테이블
KR100897306B1 (ko) * 2007-11-29 2009-05-14 주식회사 프로메카 인쇄회로기판용 진공흡착 툴링 블록
TWI425660B (zh) * 2010-10-20 2014-02-01 Advanced Optoelectronic Tech 發光二極體防水治具以及發光二極體的切割方法
JP5908681B2 (ja) * 2011-06-29 2016-04-26 株式会社ディスコ レーザー加工装置
CN102637649A (zh) * 2012-04-28 2012-08-15 日月光半导体制造股份有限公司 半导体结构的制造方法
SG11201504078TA (en) * 2012-12-17 2015-07-30 Agency Science Tech & Res Wafer dicing apparatus and wafer dicing method
JP2014175602A (ja) * 2013-03-12 2014-09-22 Disco Abrasive Syst Ltd 保持治具
JP6096047B2 (ja) * 2013-05-15 2017-03-15 株式会社ディスコ 切削装置およびパッケージ基板の加工方法
JP6301147B2 (ja) * 2014-02-13 2018-03-28 株式会社ディスコ 保持治具
JP2017054956A (ja) * 2015-09-10 2017-03-16 株式会社ディスコ 被加工物の支持治具
CN108515279A (zh) * 2018-06-13 2018-09-11 湖北易同科技发展有限公司 激光加工二维码自动化线用激光切割机
CN115039212B (zh) * 2020-02-27 2025-04-18 应用材料意大利有限公司 用于支撑基板的支撑装置、处理基板的方法及半导体基板

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3976288A (en) * 1975-11-24 1976-08-24 Ibm Corporation Semiconductor wafer dicing fixture
US4296542A (en) * 1980-07-11 1981-10-27 Presco, Inc. Control of small parts in a manufacturing operation
US4600936A (en) * 1983-07-12 1986-07-15 International Business Machines Corporation Chip registration mechanism
JP3496347B2 (ja) * 1995-07-13 2004-02-09 株式会社デンソー 半導体装置及びその製造方法
US5803797A (en) * 1996-11-26 1998-09-08 Micron Technology, Inc. Method and apparatus to hold intergrated circuit chips onto a chuck and to simultaneously remove multiple intergrated circuit chips from a cutting chuck

Also Published As

Publication number Publication date
TW423113B (en) 2001-02-21
KR20000023244A (ko) 2000-04-25
EP0987739B1 (de) 2006-03-01
EP0987739A3 (de) 2003-08-13
DE69930068T2 (de) 2006-09-21
JP4335377B2 (ja) 2009-09-30
JP2000100757A (ja) 2000-04-07
MY125036A (en) 2006-07-31
KR100330445B1 (ko) 2002-04-01
DE69930068D1 (de) 2006-04-27
EP0987739A2 (de) 2000-03-22

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