DE69901642T3 - Verfahren zur Herstellung einer positiv arbeitenden Druckplatte aus einem wärmeempfindlichem Bildaufzeichnungsmaterial - Google Patents
Verfahren zur Herstellung einer positiv arbeitenden Druckplatte aus einem wärmeempfindlichem Bildaufzeichnungsmaterial Download PDFInfo
- Publication number
- DE69901642T3 DE69901642T3 DE69901642.8T DE69901642T DE69901642T3 DE 69901642 T3 DE69901642 T3 DE 69901642T3 DE 69901642 T DE69901642 T DE 69901642T DE 69901642 T3 DE69901642 T3 DE 69901642T3
- Authority
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- Germany
- Prior art keywords
- layer
- printing plate
- imaging element
- heat
- lithographic printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000463 material Substances 0.000 title description 25
- 238000000034 method Methods 0.000 title description 24
- 230000008569 process Effects 0.000 title description 3
- 238000003384 imaging method Methods 0.000 claims description 33
- 150000001875 compounds Chemical class 0.000 claims description 20
- 238000011161 development Methods 0.000 claims description 18
- 230000005855 radiation Effects 0.000 claims description 17
- 239000011230 binding agent Substances 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 13
- 239000012670 alkaline solution Substances 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 13
- 229920003986 novolac Polymers 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 230000005660 hydrophilic surface Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
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- 238000005063 solubilization Methods 0.000 claims description 3
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- 150000007513 acids Chemical class 0.000 claims description 2
- 229920001600 hydrophobic polymer Polymers 0.000 claims 3
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- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
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- IWPZKOJSYQZABD-UHFFFAOYSA-N 3,4,5-trimethoxybenzoic acid Natural products COC1=CC(OC)=CC(C(O)=O)=C1 IWPZKOJSYQZABD-UHFFFAOYSA-N 0.000 description 5
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
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- 230000000052 comparative effect Effects 0.000 description 4
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- 239000011734 sodium Substances 0.000 description 4
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- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
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- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
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- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 229920001220 nitrocellulos Polymers 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
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- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229920003987 resole Polymers 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 239000007848 Bronsted acid Substances 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
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- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
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- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000000619 acesulfame-K Substances 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 239000012736 aqueous medium Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
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- 239000000084 colloidal system Substances 0.000 description 2
- IPHJYJHJDIGARM-UHFFFAOYSA-M copper phthalocyaninesulfonic acid, dioctadecyldimethylammonium salt Chemical compound [Cu+2].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC.C=1C(S(=O)(=O)[O-])=CC=C(C(=NC2=NC(C3=CC=CC=C32)=N2)[N-]3)C=1C3=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 IPHJYJHJDIGARM-UHFFFAOYSA-M 0.000 description 2
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- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
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- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
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- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Chemical group 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
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- 239000000377 silicon dioxide Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 230000003381 solubilizing effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
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- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
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- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
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- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
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- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- CUZKCNWZBXLAJX-UHFFFAOYSA-N 2-phenylmethoxyethanol Chemical compound OCCOCC1=CC=CC=C1 CUZKCNWZBXLAJX-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical group [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- AGGCEDYMGLPKNS-UHFFFAOYSA-N 5,5,6-trimethylundec-3-yne-2,2-diol Chemical compound CCCCCC(C)C(C)(C)C#CC(C)(O)O AGGCEDYMGLPKNS-UHFFFAOYSA-N 0.000 description 1
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- 241001479434 Agfa Species 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
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- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
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- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
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- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
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- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical group [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- 239000004288 Sodium dehydroacetate Substances 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XPNGNIFUDRPBFJ-UHFFFAOYSA-N alpha-methylbenzylalcohol Natural products CC1=CC=CC=C1CO XPNGNIFUDRPBFJ-UHFFFAOYSA-N 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
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- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
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- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
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- 235000010265 sodium sulphite Nutrition 0.000 description 1
- DSOWAKKSGYUMTF-GZOLSCHFSA-M sodium;(1e)-1-(6-methyl-2,4-dioxopyran-3-ylidene)ethanolate Chemical compound [Na+].C\C([O-])=C1/C(=O)OC(C)=CC1=O DSOWAKKSGYUMTF-GZOLSCHFSA-M 0.000 description 1
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- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
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- 229920003176 water-insoluble polymer Polymers 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98200831 | 1998-03-14 | ||
| EP98200831 | 1998-03-14 | ||
| EP99200336.8A EP0943451B3 (en) | 1998-03-14 | 1999-02-05 | A heat mode imaging element and a method for making positive working printing plates from said heat mode imaging element |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE69901642D1 DE69901642D1 (de) | 2002-07-11 |
| DE69901642T2 DE69901642T2 (de) | 2003-01-30 |
| DE69901642T3 true DE69901642T3 (de) | 2019-03-21 |
Family
ID=8233475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69901642.8T Expired - Lifetime DE69901642T3 (de) | 1998-03-14 | 1999-02-05 | Verfahren zur Herstellung einer positiv arbeitenden Druckplatte aus einem wärmeempfindlichem Bildaufzeichnungsmaterial |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2000035662A (enExample) |
| DE (1) | DE69901642T3 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6352812B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US7341815B2 (en) | 2001-06-27 | 2008-03-11 | Fujifilm Corporation | Planographic printing plate precursor |
| CN1332809C (zh) * | 2002-12-26 | 2007-08-22 | 富士胶片株式会社 | 平版印刷版前体 |
Citations (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1084070A (en) | 1960-08-05 | 1967-09-20 | Kalle Ag | Process and material for the preparation of planographic printing plates |
| FR1561957A (enExample) | 1966-10-24 | 1969-04-04 | ||
| GB1155035A (en) | 1966-06-23 | 1969-06-11 | Agfa Gevaert Nv | Thermographic Recording Process |
| GB1208415A (en) | 1966-10-24 | 1970-10-14 | Agfa Gevaert Nv | Improvements relating to thermo-copying |
| GB1245924A (en) | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
| GB1419512A (en) | 1972-01-07 | 1975-12-31 | Kodak Ltd | Presensitised lithographic material |
| US3971660A (en) | 1974-04-04 | 1976-07-27 | Eastman Kodak Company | Lithographic printing plate comprising hydrophilic layer of polyvinylacetate crosslinked with tetraethylorthosilicate |
| FR2300354A1 (fr) | 1975-02-04 | 1976-09-03 | Kodak Pathe | Plaque presensibilisee comprenant u |
| GB1492070A (en) | 1974-01-17 | 1977-11-16 | Scott Paper Co | Presensitized printing plate with in-situ laser imagable mask |
| EP0000262A1 (en) | 1977-06-30 | 1979-01-10 | International Business Machines Corporation | Method of and spinning head for spin coating resist onto a wafer |
| GB2046931A (en) | 1979-02-27 | 1980-11-19 | Fuji Photo Film Co Ltd | Method of developing positive- acting photosensitive lithographic printing plate precursor |
| US4284705A (en) | 1977-08-09 | 1981-08-18 | Eastman Kodak Company | Photosensitive diazo salt compositions and lithographic plate comprising same |
| US4374920A (en) | 1981-07-27 | 1983-02-22 | American Hoechst Corporation | Positive developer containing non-ionic surfactants |
| EP0101010A1 (de) | 1982-08-13 | 1984-02-22 | Hoechst Aktiengesellschaft | Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten |
| US4458005A (en) | 1981-07-06 | 1984-07-03 | Hoechst Aktiengesellschaft | Polyvinylmethylphosphinic acid, process for its manufacture and use |
| US4467027A (en) | 1981-05-25 | 1984-08-21 | Konishiroku Photo Industry Co., Ltd. | Process of developing posi-type lithographic printing plate with inorganic alkali solution |
| US4469776A (en) | 1982-04-30 | 1984-09-04 | Fuji Photo Film Co., Ltd. | Developing solution for light-sensitive printing plates |
| US4500625A (en) | 1982-11-05 | 1985-02-19 | Fuji Photo Film Co., Ltd. | Developer for light-sensitive lithographic printing plate precursor |
| JPS6061752A (ja) | 1983-09-16 | 1985-04-09 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| US4537496A (en) | 1981-11-30 | 1985-08-27 | Fuji Photo Film Company, Limited | Method of replenishing a developer for photosensitive plate |
| JPS60213943A (ja) | 1984-04-09 | 1985-10-26 | Fuji Photo Film Co Ltd | 現像液組成物 |
| US4606995A (en) | 1982-12-28 | 1986-08-19 | Fuji Photo Film Company, Limited | Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound |
| US4708925A (en) | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
| EP0291760A2 (de) | 1987-05-12 | 1988-11-23 | Hoechst Aktiengesellschaft | Druckplattenträger sowie Verfahren und Vorrichtung zu dessen Herstellung |
| EP0292801A2 (de) | 1987-05-26 | 1988-11-30 | Hoechst Aktiengesellschaft | Verfahren zur elektrochemischen Aufrauhung von Aluminium für Druckplattenträger |
| GB2208249A (en) | 1987-07-17 | 1989-03-15 | Fuji Photo Film Co Ltd | Method for supplementing replenisher for developer in automatic developing machine for presensitized plate |
| DE4001466A1 (de) | 1990-01-19 | 1991-07-25 | Hoechst Ag | Verfahren zur elektrochemischen aufrauhung von aluminium fuer druckplattentraeger |
| DE4007428A1 (de) | 1990-03-09 | 1991-09-12 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE4027301A1 (de) | 1990-08-29 | 1992-03-05 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial |
| EP0514490A1 (en) | 1990-02-07 | 1992-11-25 | Univ Texas | ALLELOMORPHIC ASSOCIATION OF THE HUMAN DOPAMINE (D 2?) RECEPTOR GENE IN COMPULSIVE DISORDERS SUCH AS ALCOHOLISM. |
| EP0537633A1 (de) | 1991-10-16 | 1993-04-21 | Hoechst Aktiengesellschaft | Verfahren zur Behandlung von aufgerauhten und anodisierten Flachdruckplatten und danach hergestellte Flachdruckplatten |
| EP0573092A1 (en) | 1992-06-05 | 1993-12-08 | Agfa-Gevaert N.V. | A method for obtaining an image using a heat mode recording material |
| EP0601240A1 (en) | 1992-12-11 | 1994-06-15 | Agfa-Gevaert N.V. | Water developable diazo based lithographic printing plate |
| US5340699A (en) | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| EP0619525A1 (en) | 1993-04-05 | 1994-10-12 | Agfa-Gevaert N.V. | A lithographic base and a method for making a lithographic printing plate therewith |
| EP0619524A1 (en) | 1993-04-05 | 1994-10-12 | Agfa-Gevaert N.V. | A lithographic base and a method for making a lithographic printing plate therewith |
| EP0620502A1 (en) | 1993-04-05 | 1994-10-19 | Agfa-Gevaert N.V. | A lithographic base and a method for making a lithographic printing plate therewith |
| EP0659909A1 (en) | 1993-12-22 | 1995-06-28 | Hoechst Aktiengesellschaft | Electrochemical graining method |
| EP0678380A2 (en) | 1994-04-13 | 1995-10-25 | Presstek, Inc. | Laser-imageable printing members for wet lithographic printing |
| US5466557A (en) | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| DE4417907A1 (de) | 1994-05-21 | 1995-11-23 | Hoechst Ag | Verfahren zur Nachbehandlung von platten-, folien- oder bandförmigem Material, Träger aus derartigem Material und seine Verwendung für Offsetdruckplatten |
| DE4423140A1 (de) | 1994-07-01 | 1996-01-04 | Hoechst Ag | Hydrophiliertes Trägermaterial und damit hergestelltes Aufzeichnungsmaterial |
| DE4445820A1 (de) | 1994-12-21 | 1996-06-27 | Hoechst Ag | Verfahren zum Entwickeln bestrahlter, strahlungsempfindlicher Aufzeichnungsmaterialien |
| US5641608A (en) | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| EP0823327A2 (en) | 1996-08-06 | 1998-02-11 | Mitsubishi Chemical Corporation | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate |
| EP0909657A2 (en) | 1997-10-17 | 1999-04-21 | Fuji Photo Film Co., Ltd | A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
-
1999
- 1999-02-05 DE DE69901642.8T patent/DE69901642T3/de not_active Expired - Lifetime
- 1999-03-11 JP JP11064936A patent/JP2000035662A/ja active Pending
Patent Citations (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1084070A (en) | 1960-08-05 | 1967-09-20 | Kalle Ag | Process and material for the preparation of planographic printing plates |
| GB1155035A (en) | 1966-06-23 | 1969-06-11 | Agfa Gevaert Nv | Thermographic Recording Process |
| FR1561957A (enExample) | 1966-10-24 | 1969-04-04 | ||
| GB1208415A (en) | 1966-10-24 | 1970-10-14 | Agfa Gevaert Nv | Improvements relating to thermo-copying |
| GB1245924A (en) | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
| GB1419512A (en) | 1972-01-07 | 1975-12-31 | Kodak Ltd | Presensitised lithographic material |
| GB1492070A (en) | 1974-01-17 | 1977-11-16 | Scott Paper Co | Presensitized printing plate with in-situ laser imagable mask |
| US3971660A (en) | 1974-04-04 | 1976-07-27 | Eastman Kodak Company | Lithographic printing plate comprising hydrophilic layer of polyvinylacetate crosslinked with tetraethylorthosilicate |
| FR2300354A1 (fr) | 1975-02-04 | 1976-09-03 | Kodak Pathe | Plaque presensibilisee comprenant u |
| EP0000262A1 (en) | 1977-06-30 | 1979-01-10 | International Business Machines Corporation | Method of and spinning head for spin coating resist onto a wafer |
| US4284705A (en) | 1977-08-09 | 1981-08-18 | Eastman Kodak Company | Photosensitive diazo salt compositions and lithographic plate comprising same |
| GB2046931A (en) | 1979-02-27 | 1980-11-19 | Fuji Photo Film Co Ltd | Method of developing positive- acting photosensitive lithographic printing plate precursor |
| US4467027A (en) | 1981-05-25 | 1984-08-21 | Konishiroku Photo Industry Co., Ltd. | Process of developing posi-type lithographic printing plate with inorganic alkali solution |
| US4458005A (en) | 1981-07-06 | 1984-07-03 | Hoechst Aktiengesellschaft | Polyvinylmethylphosphinic acid, process for its manufacture and use |
| US4374920A (en) | 1981-07-27 | 1983-02-22 | American Hoechst Corporation | Positive developer containing non-ionic surfactants |
| US4537496A (en) | 1981-11-30 | 1985-08-27 | Fuji Photo Film Company, Limited | Method of replenishing a developer for photosensitive plate |
| US4469776A (en) | 1982-04-30 | 1984-09-04 | Fuji Photo Film Co., Ltd. | Developing solution for light-sensitive printing plates |
| EP0101010A1 (de) | 1982-08-13 | 1984-02-22 | Hoechst Aktiengesellschaft | Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten |
| US4500625A (en) | 1982-11-05 | 1985-02-19 | Fuji Photo Film Co., Ltd. | Developer for light-sensitive lithographic printing plate precursor |
| US4606995A (en) | 1982-12-28 | 1986-08-19 | Fuji Photo Film Company, Limited | Process for developing light-sensitive o-quinonediazide lithographic plates with developing solution having cobalt or nickel compound |
| JPS6061752A (ja) | 1983-09-16 | 1985-04-09 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS60213943A (ja) | 1984-04-09 | 1985-10-26 | Fuji Photo Film Co Ltd | 現像液組成物 |
| US4708925A (en) | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
| EP0291760A2 (de) | 1987-05-12 | 1988-11-23 | Hoechst Aktiengesellschaft | Druckplattenträger sowie Verfahren und Vorrichtung zu dessen Herstellung |
| EP0292801A2 (de) | 1987-05-26 | 1988-11-30 | Hoechst Aktiengesellschaft | Verfahren zur elektrochemischen Aufrauhung von Aluminium für Druckplattenträger |
| GB2208249A (en) | 1987-07-17 | 1989-03-15 | Fuji Photo Film Co Ltd | Method for supplementing replenisher for developer in automatic developing machine for presensitized plate |
| DE4001466A1 (de) | 1990-01-19 | 1991-07-25 | Hoechst Ag | Verfahren zur elektrochemischen aufrauhung von aluminium fuer druckplattentraeger |
| EP0514490A1 (en) | 1990-02-07 | 1992-11-25 | Univ Texas | ALLELOMORPHIC ASSOCIATION OF THE HUMAN DOPAMINE (D 2?) RECEPTOR GENE IN COMPULSIVE DISORDERS SUCH AS ALCOHOLISM. |
| DE4007428A1 (de) | 1990-03-09 | 1991-09-12 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE4027301A1 (de) | 1990-08-29 | 1992-03-05 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial |
| EP0537633A1 (de) | 1991-10-16 | 1993-04-21 | Hoechst Aktiengesellschaft | Verfahren zur Behandlung von aufgerauhten und anodisierten Flachdruckplatten und danach hergestellte Flachdruckplatten |
| EP0573092A1 (en) | 1992-06-05 | 1993-12-08 | Agfa-Gevaert N.V. | A method for obtaining an image using a heat mode recording material |
| EP0601240A1 (en) | 1992-12-11 | 1994-06-15 | Agfa-Gevaert N.V. | Water developable diazo based lithographic printing plate |
| EP0619524A1 (en) | 1993-04-05 | 1994-10-12 | Agfa-Gevaert N.V. | A lithographic base and a method for making a lithographic printing plate therewith |
| EP0620502A1 (en) | 1993-04-05 | 1994-10-19 | Agfa-Gevaert N.V. | A lithographic base and a method for making a lithographic printing plate therewith |
| EP0619525A1 (en) | 1993-04-05 | 1994-10-12 | Agfa-Gevaert N.V. | A lithographic base and a method for making a lithographic printing plate therewith |
| US5340699A (en) | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| EP0625728A2 (en) | 1993-05-19 | 1994-11-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolak resin and use thereof in lithographic plates |
| EP0659909A1 (en) | 1993-12-22 | 1995-06-28 | Hoechst Aktiengesellschaft | Electrochemical graining method |
| EP0678380A2 (en) | 1994-04-13 | 1995-10-25 | Presstek, Inc. | Laser-imageable printing members for wet lithographic printing |
| DE4417907A1 (de) | 1994-05-21 | 1995-11-23 | Hoechst Ag | Verfahren zur Nachbehandlung von platten-, folien- oder bandförmigem Material, Träger aus derartigem Material und seine Verwendung für Offsetdruckplatten |
| DE4423140A1 (de) | 1994-07-01 | 1996-01-04 | Hoechst Ag | Hydrophiliertes Trägermaterial und damit hergestelltes Aufzeichnungsmaterial |
| US5466557A (en) | 1994-08-29 | 1995-11-14 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin, a novolac resin, a latent bronsted acid, an infrared absorber and terephthalaldehyde and use thereof in lithographic printing plates |
| DE4445820A1 (de) | 1994-12-21 | 1996-06-27 | Hoechst Ag | Verfahren zum Entwickeln bestrahlter, strahlungsempfindlicher Aufzeichnungsmaterialien |
| US5641608A (en) | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| EP0823327A2 (en) | 1996-08-06 | 1998-02-11 | Mitsubishi Chemical Corporation | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate |
| EP0909657A2 (en) | 1997-10-17 | 1999-04-21 | Fuji Photo Film Co., Ltd | A positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000035662A (ja) | 2000-02-02 |
| DE69901642D1 (de) | 2002-07-11 |
| DE69901642T2 (de) | 2003-01-30 |
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Owner name: AGFA GRAPHICS N.V., MORTSEL, BE |