DE69824372D1 - Vorrichtung zur Exposition der peripheren Fläche eines Halbleiter-Wafers - Google Patents
Vorrichtung zur Exposition der peripheren Fläche eines Halbleiter-WafersInfo
- Publication number
- DE69824372D1 DE69824372D1 DE69824372T DE69824372T DE69824372D1 DE 69824372 D1 DE69824372 D1 DE 69824372D1 DE 69824372 T DE69824372 T DE 69824372T DE 69824372 T DE69824372 T DE 69824372T DE 69824372 D1 DE69824372 D1 DE 69824372D1
- Authority
- DE
- Germany
- Prior art keywords
- exposing
- peripheral surface
- semiconductor wafer
- wafer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32444097 | 1997-11-26 | ||
JP32444097 | 1997-11-26 | ||
JP2714598 | 1998-02-09 | ||
JP02714598A JP3356047B2 (ja) | 1997-11-26 | 1998-02-09 | ウエハ周辺露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69824372D1 true DE69824372D1 (de) | 2004-07-15 |
DE69824372T2 DE69824372T2 (de) | 2005-06-16 |
Family
ID=26365047
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69824372T Expired - Lifetime DE69824372T2 (de) | 1997-11-26 | 1998-11-25 | Vorrichtung zur Exposition der peripheren Fläche eines Halbleiter-Wafers |
Country Status (6)
Country | Link |
---|---|
US (1) | US6052173A (de) |
EP (1) | EP0920053B1 (de) |
JP (1) | JP3356047B2 (de) |
KR (1) | KR19990045608A (de) |
DE (1) | DE69824372T2 (de) |
TW (1) | TW392205B (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6529274B1 (en) * | 1999-05-11 | 2003-03-04 | Micron Technology, Inc. | System for processing semiconductor products |
US6495312B1 (en) * | 2001-02-01 | 2002-12-17 | Lsi Logic Corporation | Method and apparatus for removing photoresist edge beads from thin film substrates |
KR100597043B1 (ko) * | 2001-05-08 | 2006-07-04 | 에이에스엠엘 네델란즈 비.브이. | 광학적 노광방법, 디바이스제조방법 및 리소그래피투영장치 |
EP1256848A3 (de) * | 2001-05-08 | 2003-01-02 | ASML Netherlands B.V. | Optisches Belichtungsverfahren und lithographischer Projektionsapparat |
JP4019651B2 (ja) * | 2001-05-21 | 2007-12-12 | ウシオ電機株式会社 | 周辺露光装置 |
JP3820946B2 (ja) * | 2001-09-17 | 2006-09-13 | ウシオ電機株式会社 | 周辺露光装置 |
WO2003032081A1 (en) * | 2001-10-09 | 2003-04-17 | Ultratech Stepper, Inc. | Method and apparatus for optically defining an exposure exclusion region on a photosensitive workpiece |
JP3823805B2 (ja) * | 2001-10-30 | 2006-09-20 | ウシオ電機株式会社 | 露光装置 |
JP4302373B2 (ja) | 2002-07-25 | 2009-07-22 | 浜松ホトニクス株式会社 | 導光装置 |
CN1508631A (zh) * | 2002-12-19 | 2004-06-30 | Asml | 器件制造方法和所制出的器件以及计算机程序和光刻装置 |
KR100536596B1 (ko) * | 2003-03-25 | 2005-12-14 | 삼성전자주식회사 | 웨이퍼 가장자리 노광 장치 |
KR100550352B1 (ko) * | 2004-07-02 | 2006-02-08 | 삼성전자주식회사 | 반도체 기판의 노광방법 및 이를 이용하는 노광 장치 |
JPWO2006025386A1 (ja) * | 2004-08-31 | 2008-05-08 | 株式会社ニコン | 位置合わせ方法、処理システム、基板の投入再現性計測方法、位置計測方法、露光方法、基板処理装置、計測方法及び計測装置 |
US7074710B2 (en) * | 2004-11-03 | 2006-07-11 | Lsi Logic Corporation | Method of wafer patterning for reducing edge exclusion zone |
JP4642543B2 (ja) * | 2005-05-09 | 2011-03-02 | 東京エレクトロン株式会社 | 周縁露光装置、塗布、現像装置及び周縁露光方法 |
US7342642B2 (en) * | 2005-06-20 | 2008-03-11 | Asml Netherlands B.V. | Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method |
JP4923936B2 (ja) * | 2006-10-13 | 2012-04-25 | 東京エレクトロン株式会社 | 塗布、現像装置及び塗布、現像方法 |
JP6316082B2 (ja) * | 2014-04-30 | 2018-04-25 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
CN105632971B (zh) * | 2014-11-26 | 2019-06-25 | 上海微电子装备(集团)股份有限公司 | 一种硅片处理装置及方法 |
US9841299B2 (en) * | 2014-11-28 | 2017-12-12 | Canon Kabushiki Kaisha | Position determining device, position determining method, lithographic apparatus, and method for manufacturing object |
JP6308958B2 (ja) * | 2015-02-25 | 2018-04-11 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、プログラム及びコンピュータ記憶媒体 |
CN106292195B (zh) * | 2015-05-24 | 2018-08-14 | 上海微电子装备(集团)股份有限公司 | 边缘曝光装置和方法 |
CN108803245B (zh) * | 2017-04-28 | 2020-04-10 | 上海微电子装备(集团)股份有限公司 | 硅片处理装置及方法 |
CN113433799B (zh) * | 2020-03-23 | 2023-01-20 | 长鑫存储技术有限公司 | 晶圆边缘曝光方法、晶圆边缘曝光装置及掩膜板 |
CN115018834B (zh) * | 2022-08-08 | 2022-10-25 | 山东光岳九州半导体科技有限公司 | 一种半导体晶片图像对准方法 |
CN116958143B (zh) * | 2023-09-20 | 2023-12-22 | 绍兴中芯集成电路制造股份有限公司 | 一种晶圆风险曝光区域的识别方法、系统和存储介质 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4899195A (en) * | 1988-01-29 | 1990-02-06 | Ushio Denki | Method of exposing a peripheral part of wafer |
US5204224A (en) * | 1988-09-26 | 1993-04-20 | Ushio Denki | Method of exposing a peripheral part of a wafer |
US5289263A (en) * | 1989-04-28 | 1994-02-22 | Dainippon Screen Mfg. Co., Ltd. | Apparatus for exposing periphery of an object |
US5168021A (en) * | 1989-09-21 | 1992-12-01 | Ushio Denki | Method for exposing predetermined area of peripheral part of wafer |
US5229811A (en) * | 1990-06-15 | 1993-07-20 | Nikon Corporation | Apparatus for exposing peripheral portion of substrate |
JP2593831B2 (ja) * | 1991-03-20 | 1997-03-26 | ウシオ電機株式会社 | ウエハ上の不要レジスト露光装置および露光方法 |
US5420663A (en) * | 1993-03-19 | 1995-05-30 | Nikon Corporation | Apparatus for exposing peripheral portion of substrate |
JP3023058B2 (ja) * | 1994-09-30 | 2000-03-21 | ウシオ電機株式会社 | ウエハ上の不要レジスト露光装置 |
JPH0950951A (ja) * | 1995-08-04 | 1997-02-18 | Nikon Corp | リソグラフィ方法およびリソグラフィ装置 |
TW316322B (de) * | 1995-10-02 | 1997-09-21 | Ushio Electric Inc | |
JP3237522B2 (ja) * | 1996-02-05 | 2001-12-10 | ウシオ電機株式会社 | ウエハ周辺露光方法および装置 |
KR100257279B1 (ko) * | 1996-06-06 | 2000-06-01 | 이시다 아키라 | 주변노광장치 및 방법 |
-
1998
- 1998-02-09 JP JP02714598A patent/JP3356047B2/ja not_active Expired - Fee Related
- 1998-10-09 TW TW087116820A patent/TW392205B/zh not_active IP Right Cessation
- 1998-11-25 EP EP98122394A patent/EP0920053B1/de not_active Expired - Lifetime
- 1998-11-25 DE DE69824372T patent/DE69824372T2/de not_active Expired - Lifetime
- 1998-11-26 KR KR1019980050998A patent/KR19990045608A/ko not_active Application Discontinuation
- 1998-11-27 US US09/200,477 patent/US6052173A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH11219894A (ja) | 1999-08-10 |
KR19990045608A (ko) | 1999-06-25 |
TW392205B (en) | 2000-06-01 |
US6052173A (en) | 2000-04-18 |
EP0920053A2 (de) | 1999-06-02 |
EP0920053B1 (de) | 2004-06-09 |
DE69824372T2 (de) | 2005-06-16 |
JP3356047B2 (ja) | 2002-12-09 |
EP0920053A3 (de) | 2000-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |