DE69814966D1 - Einkristall-Ziehvorrichtung, Einkristall-Trägermechanismus und Einkristall-Ziehverfahren - Google Patents

Einkristall-Ziehvorrichtung, Einkristall-Trägermechanismus und Einkristall-Ziehverfahren

Info

Publication number
DE69814966D1
DE69814966D1 DE69814966T DE69814966T DE69814966D1 DE 69814966 D1 DE69814966 D1 DE 69814966D1 DE 69814966 T DE69814966 T DE 69814966T DE 69814966 T DE69814966 T DE 69814966T DE 69814966 D1 DE69814966 D1 DE 69814966D1
Authority
DE
Germany
Prior art keywords
single crystal
crystal pulling
supporting mechanism
pulling device
pulling method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69814966T
Other languages
English (en)
Other versions
DE69814966T2 (de
Inventor
Yutaka Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Super Silicon Crystal Research Institute Corp
Original Assignee
Super Silicon Crystal Research Institute Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Super Silicon Crystal Research Institute Corp filed Critical Super Silicon Crystal Research Institute Corp
Application granted granted Critical
Publication of DE69814966D1 publication Critical patent/DE69814966D1/de
Publication of DE69814966T2 publication Critical patent/DE69814966T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/30Mechanisms for rotating or moving either the melt or the crystal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/911Seed or rod holders
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032Seed pulling
    • Y10T117/1068Seed pulling including heating or cooling details [e.g., shield configuration]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032Seed pulling
    • Y10T117/1072Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
DE69814966T 1997-03-31 1998-03-10 Einkristall-Ziehvorrichtung, Einkristall-Trägermechanismus und Einkristall-Ziehverfahren Expired - Fee Related DE69814966T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9096783A JPH10279386A (ja) 1997-03-31 1997-03-31 単結晶引上げ装置及び単結晶支持機構並びに単結晶引上げ方法

Publications (2)

Publication Number Publication Date
DE69814966D1 true DE69814966D1 (de) 2003-07-03
DE69814966T2 DE69814966T2 (de) 2004-01-29

Family

ID=14174242

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69814966T Expired - Fee Related DE69814966T2 (de) 1997-03-31 1998-03-10 Einkristall-Ziehvorrichtung, Einkristall-Trägermechanismus und Einkristall-Ziehverfahren

Country Status (6)

Country Link
US (1) US6077348A (de)
EP (1) EP0869202B1 (de)
JP (1) JPH10279386A (de)
KR (1) KR19980079894A (de)
DE (1) DE69814966T2 (de)
TW (1) TW426757B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW370580B (en) * 1997-09-22 1999-09-21 Super Silicon Crystal Res Monocrystal pulling device
DE102005040229B4 (de) 2005-08-25 2011-12-22 Siltronic Ag Unterstützungsvorrichtung zur Unterstützung eines wachsenden Einkristalls aus Halbleitermaterial und Verfahren zur Herstellung eines Einkristalls
KR100947747B1 (ko) * 2007-12-27 2010-03-17 주식회사 실트론 고체원료 공급장치와 단결정 성장장치의 연결장치
KR20200063672A (ko) * 2018-11-28 2020-06-05 웅진에너지 주식회사 잉곳 성장장치

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8102566A (nl) * 1980-06-14 1982-01-04 Leybold Heraeus Gmbh & Co Kg Inrichting voor het door middel van een opwikkelbaar trekorgaan uit een kroes trekken van een enkel kristal.
DE3414290A1 (de) * 1984-04-14 1985-10-24 Leybold-Heraeus GmbH, 5000 Köln Kristallhalter
JPS62288191A (ja) * 1986-06-06 1987-12-15 Kyushu Denshi Kinzoku Kk 単結晶成長方法及びその装置
JPS63252991A (ja) * 1987-04-09 1988-10-20 Mitsubishi Metal Corp 落下防止保持部を有するcz単結晶
DE69112463T2 (de) * 1990-03-30 1996-02-15 Shinetsu Handotai Kk Vorrichtung zur Herstellung von Monokristallen nach dem Czochralski-Verfahren.
JPH07103000B2 (ja) * 1990-03-30 1995-11-08 信越半導体株式会社 結晶引上装置
JPH07515B2 (ja) * 1990-04-11 1995-01-11 信越半導体株式会社 結晶引上装置
JPH04321583A (ja) * 1991-04-23 1992-11-11 Hitachi Cable Ltd 化合物半導体単結晶の引上げ法
JP2946935B2 (ja) * 1992-03-19 1999-09-13 三菱マテリアル株式会社 単結晶引上装置およびその引上方法
JP2946934B2 (ja) * 1992-03-19 1999-09-13 三菱マテリアル株式会社 単結晶引上装置
JP2946936B2 (ja) * 1992-03-19 1999-09-13 三菱マテリアル株式会社 単結晶引上装置およびその引上方法
JP2946933B2 (ja) * 1992-03-19 1999-09-13 三菱マテリアル株式会社 単結晶引上装置
JPH07172981A (ja) * 1993-12-14 1995-07-11 Komatsu Electron Metals Co Ltd 半導体単結晶の製造装置および製造方法
JP3402012B2 (ja) * 1995-04-21 2003-04-28 信越半導体株式会社 単結晶の成長方法及び装置
US5843226A (en) * 1996-07-16 1998-12-01 Applied Materials, Inc. Etch process for single crystal silicon
JP3528448B2 (ja) * 1996-07-23 2004-05-17 信越半導体株式会社 単結晶の引上げ方法及び装置
JP3438492B2 (ja) * 1996-10-18 2003-08-18 信越半導体株式会社 単結晶の引上げ方法

Also Published As

Publication number Publication date
DE69814966T2 (de) 2004-01-29
KR19980079894A (ko) 1998-11-25
JPH10279386A (ja) 1998-10-20
EP0869202B1 (de) 2003-05-28
TW426757B (en) 2001-03-21
EP0869202A3 (de) 1999-11-17
EP0869202A2 (de) 1998-10-07
US6077348A (en) 2000-06-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee