DE69734996T2 - Verfahren zur beschichtung mit acrylaten - Google Patents
Verfahren zur beschichtung mit acrylaten Download PDFInfo
- Publication number
- DE69734996T2 DE69734996T2 DE69734996T DE69734996T DE69734996T2 DE 69734996 T2 DE69734996 T2 DE 69734996T2 DE 69734996 T DE69734996 T DE 69734996T DE 69734996 T DE69734996 T DE 69734996T DE 69734996 T2 DE69734996 T2 DE 69734996T2
- Authority
- DE
- Germany
- Prior art keywords
- acrylate
- substrate
- layer
- monomer
- sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 25
- 238000000576 coating method Methods 0.000 title abstract description 80
- 239000011248 coating agent Substances 0.000 title abstract description 73
- 230000008569 process Effects 0.000 title description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 title 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 151
- 239000000178 monomer Substances 0.000 claims abstract description 107
- 239000000758 substrate Substances 0.000 claims abstract description 84
- 239000000463 material Substances 0.000 claims abstract description 61
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 38
- 230000004888 barrier function Effects 0.000 claims abstract description 38
- 239000001301 oxygen Substances 0.000 claims abstract description 38
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 38
- 238000001704 evaporation Methods 0.000 claims abstract description 30
- 238000009832 plasma treatment Methods 0.000 claims abstract description 28
- 230000008021 deposition Effects 0.000 claims abstract description 21
- 239000000203 mixture Substances 0.000 claims description 23
- 238000000151 deposition Methods 0.000 claims description 22
- 238000001816 cooling Methods 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 9
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 claims description 8
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- CYUZOYPRAQASLN-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid Chemical compound OC(=O)CCOC(=O)C=C CYUZOYPRAQASLN-UHFFFAOYSA-N 0.000 claims description 5
- 238000004132 cross linking Methods 0.000 claims description 5
- WPKYZIPODULRBM-UHFFFAOYSA-N azane;prop-2-enoic acid Chemical compound N.OC(=O)C=C WPKYZIPODULRBM-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 claims description 3
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 claims description 2
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 claims description 2
- DMQYPVOQAARSNF-UHFFFAOYSA-N 3-[2,3-bis(3-prop-2-enoyloxypropoxy)propoxy]propyl prop-2-enoate Chemical compound C=CC(=O)OCCCOCC(OCCCOC(=O)C=C)COCCCOC(=O)C=C DMQYPVOQAARSNF-UHFFFAOYSA-N 0.000 claims description 2
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 claims description 2
- XCHLRFRZJLYDOF-UHFFFAOYSA-N CCC.OC(=O)C=C.OC(=O)C=C Chemical compound CCC.OC(=O)C=C.OC(=O)C=C XCHLRFRZJLYDOF-UHFFFAOYSA-N 0.000 claims description 2
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 37
- 239000002184 metal Substances 0.000 abstract description 37
- -1 polypropylene Polymers 0.000 abstract description 34
- 239000004743 Polypropylene Substances 0.000 abstract description 30
- 229920001155 polypropylene Polymers 0.000 abstract description 30
- 238000009833 condensation Methods 0.000 abstract description 25
- 230000005494 condensation Effects 0.000 abstract description 25
- 238000010894 electron beam technology Methods 0.000 abstract description 13
- 239000004677 Nylon Substances 0.000 abstract description 8
- 229920001778 nylon Polymers 0.000 abstract description 8
- 229920000728 polyester Polymers 0.000 abstract description 8
- 239000002985 plastic film Substances 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 88
- 239000010408 film Substances 0.000 description 35
- 230000008020 evaporation Effects 0.000 description 26
- 239000004744 fabric Substances 0.000 description 26
- 230000035699 permeability Effects 0.000 description 25
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 23
- 238000001465 metallisation Methods 0.000 description 11
- 230000005855 radiation Effects 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 125000004386 diacrylate group Chemical group 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000004033 plastic Substances 0.000 description 7
- 229920003023 plastic Polymers 0.000 description 7
- 229920001169 thermoplastic Polymers 0.000 description 7
- 235000013305 food Nutrition 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000004806 packaging method and process Methods 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000004416 thermosoftening plastic Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000011104 metalized film Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000012462 polypropylene substrate Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 238000001227 electron beam curing Methods 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000011140 metalized polyester Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- DDLCHCHDTHYPTF-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propyl prop-2-enoate Chemical compound COC(C)COC(C)COC(C)COC(=O)C=C DDLCHCHDTHYPTF-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- QDHUQRBYCVAWEN-UHFFFAOYSA-N amino prop-2-enoate Chemical class NOC(=O)C=C QDHUQRBYCVAWEN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- RNTKIQDZDLKLCL-UHFFFAOYSA-N dodecyl prop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCCCCCCCCOC(=O)C=C RNTKIQDZDLKLCL-UHFFFAOYSA-N 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 235000019634 flavors Nutrition 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000004434 industrial solvent Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
- B05D3/141—Plasma treatment
- B05D3/142—Pretreatment
- B05D3/144—Pretreatment of polymeric substrates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2300/00—Characterised by the use of unspecified polymers
- C08J2300/22—Thermoplastic resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Polymerisation Methods In General (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74160996A | 1996-10-31 | 1996-10-31 | |
| US741609 | 1996-10-31 | ||
| PCT/US1997/019856 WO1998018852A1 (en) | 1996-10-31 | 1997-10-31 | Acrylate coating methods |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69734996D1 DE69734996D1 (de) | 2006-02-02 |
| DE69734996T2 true DE69734996T2 (de) | 2006-07-27 |
Family
ID=24981425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69734996T Expired - Lifetime DE69734996T2 (de) | 1996-10-31 | 1997-10-31 | Verfahren zur beschichtung mit acrylaten |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0935633B1 (enExample) |
| JP (1) | JP2001508089A (enExample) |
| KR (2) | KR19980033213A (enExample) |
| CN (2) | CN1238792A (enExample) |
| AT (1) | ATE314414T1 (enExample) |
| AU (1) | AU732631B2 (enExample) |
| CA (1) | CA2269271A1 (enExample) |
| DE (1) | DE69734996T2 (enExample) |
| NZ (1) | NZ335300A (enExample) |
| WO (1) | WO1998018852A1 (enExample) |
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| US6224948B1 (en) | 1997-09-29 | 2001-05-01 | Battelle Memorial Institute | Plasma enhanced chemical deposition with low vapor pressure compounds |
| JP2000080184A (ja) * | 1998-06-26 | 2000-03-21 | Dainippon Printing Co Ltd | フィルムシ―トの多段階表面改質方法及びその装置 |
| CA2353506A1 (en) | 1998-11-02 | 2000-05-11 | 3M Innovative Properties Company | Transparent conductive oxides for plastic flat panel displays |
| WO2000035671A1 (en) * | 1998-12-14 | 2000-06-22 | Sartomer Company, Inc. | Packaging material having improved barrier properties |
| US6217947B1 (en) | 1998-12-16 | 2001-04-17 | Battelle Memorial Institute | Plasma enhanced polymer deposition onto fixtures |
| US6274204B1 (en) | 1998-12-16 | 2001-08-14 | Battelle Memorial Institute | Method of making non-linear optical polymer |
| EP1145338B1 (en) | 1998-12-16 | 2012-12-05 | Samsung Display Co., Ltd. | Environmental barrier material for organic light emitting device and method of making |
| US6207239B1 (en) | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition of conjugated polymer |
| US6228434B1 (en) | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making a conformal coating of a microtextured surface |
| US6207238B1 (en) | 1998-12-16 | 2001-03-27 | Battelle Memorial Institute | Plasma enhanced chemical deposition for high and/or low index of refraction polymers |
| US6228436B1 (en) | 1998-12-16 | 2001-05-08 | Battelle Memorial Institute | Method of making light emitting polymer composite material |
| US6268695B1 (en) | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
| WO2000048749A1 (en) * | 1999-02-18 | 2000-08-24 | Battelle Memorial Institute | Method for adhering laminate structures |
| US6172810B1 (en) | 1999-02-26 | 2001-01-09 | 3M Innovative Properties Company | Retroreflective articles having polymer multilayer reflective coatings |
| US6503564B1 (en) | 1999-02-26 | 2003-01-07 | 3M Innovative Properties Company | Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile |
| US6358570B1 (en) | 1999-03-31 | 2002-03-19 | Battelle Memorial Institute | Vacuum deposition and curing of oligomers and resins |
| US6506461B2 (en) | 1999-03-31 | 2003-01-14 | Battelle Memorial Institute | Methods for making polyurethanes as thin films |
| CN1367721A (zh) * | 1999-09-07 | 2002-09-04 | 宝洁公司 | 水蒸气渗透性基材的疏水处理方法 |
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| EP1462183A1 (de) * | 2003-03-28 | 2004-09-29 | Sulzer Markets and Technology AG | Verfahren zur oberflächenbehandlung eines substrats sowie mit einem solchen verfahren behandeltes substrat |
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| EP1793938B1 (en) | 2004-09-06 | 2011-03-30 | Coloplast A/S | Silicone urisheath with integrated adhesive |
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| US7641952B2 (en) | 2006-02-21 | 2010-01-05 | E.I. Du Pont De Nemours And Company | Durable metallized self-adhesive laminates |
| JP4992252B2 (ja) * | 2006-03-07 | 2012-08-08 | 凸版印刷株式会社 | 積層体の形成方法およびその積層体 |
| EP2000297A1 (en) | 2006-03-24 | 2008-12-10 | Konica Minolta Medical & Graphic, Inc. | Transparent barrier sheet and method for producing transparent barrier sheet |
| WO2007111074A1 (ja) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | 透明バリア性シート及び透明バリア性シートの製造方法 |
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| EP2000300A4 (en) | 2006-03-24 | 2009-08-05 | Konica Minolta Med & Graphic | TRANSPARENT BARRIER SHEET AND METHOD FOR PRODUCING SAME |
| WO2007148539A1 (ja) * | 2006-06-23 | 2007-12-27 | Ulvac, Inc. | 巻取式真空蒸着装置 |
| KR100789604B1 (ko) * | 2006-09-15 | 2007-12-27 | 공배성 | 냉각드럼을 채용한 가열장치 |
| BRPI0721299B1 (pt) | 2006-12-28 | 2018-07-24 | 3M Innovative Properties Company. | Método para formação de um filme condutivo em um suporte de polímero flexível, filme condutivo e método para a fabricação de um artigo de vitrificação |
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| KR100955866B1 (ko) * | 2007-11-27 | 2010-05-07 | 신찬희 | 크랙 패턴 형성 잉크, 크랙 패턴 형성용 코팅제, 이를이용한 크랙 패턴 형성 방법 및 크랙 패턴이 형성된 패널 |
| JP2009270134A (ja) * | 2008-04-30 | 2009-11-19 | Fujifilm Corp | フラッシュ蒸着方法及び装置 |
| US9337446B2 (en) | 2008-12-22 | 2016-05-10 | Samsung Display Co., Ltd. | Encapsulated RGB OLEDs having enhanced optical output |
| US9184410B2 (en) | 2008-12-22 | 2015-11-10 | Samsung Display Co., Ltd. | Encapsulated white OLEDs having enhanced optical output |
| CN102356192A (zh) | 2009-03-18 | 2012-02-15 | 纳幕尔杜邦公司 | 金属化的动物舍窗帘 |
| US10544502B2 (en) | 2009-11-30 | 2020-01-28 | Xefco Pty Ltd | Functional composite garment materials |
| US8590338B2 (en) | 2009-12-31 | 2013-11-26 | Samsung Mobile Display Co., Ltd. | Evaporator with internal restriction |
| US8852685B2 (en) * | 2010-04-23 | 2014-10-07 | Lam Research Corporation | Coating method for gas delivery system |
| DE102010043204A1 (de) * | 2010-08-10 | 2012-02-16 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Verwendung einer Vorrichtung zur Erzeugung einer Schicht eines organischen Materials auf einem Substrat |
| KR101479528B1 (ko) * | 2010-09-03 | 2015-01-07 | 울박, 인크 | 보호막 형성 방법, 표면 평탄화 방법 |
| JP5694023B2 (ja) | 2011-03-23 | 2015-04-01 | 小島プレス工業株式会社 | 積層構造体の製造装置 |
| US20130004690A1 (en) * | 2011-06-29 | 2013-01-03 | Mikhael Michael G | Hydrophilic expanded fluoropolymer composite and method of making same |
| JPWO2013047279A1 (ja) * | 2011-09-29 | 2015-03-26 | 積水化学工業株式会社 | フィルムの表面処理開始方法及び表面処理装置 |
| US8778462B2 (en) | 2011-11-10 | 2014-07-15 | E I Du Pont De Nemours And Company | Method for producing metalized fibrous composite sheet with olefin coating |
| US8741393B2 (en) | 2011-12-28 | 2014-06-03 | E I Du Pont De Nemours And Company | Method for producing metalized fibrous composite sheet with olefin coating |
| US8993089B2 (en) | 2012-02-16 | 2015-03-31 | Zhik Pty Ltd | Closed cell materials |
| US11058161B2 (en) | 2012-02-16 | 2021-07-13 | Xefco Pty Ltd | Heat reflecting composites with knitted insulation |
| US10160184B2 (en) | 2013-06-03 | 2018-12-25 | Xefco Pty Ltd | Insulated radiant barriers in apparel |
| ITMI20131924A1 (it) | 2013-11-20 | 2015-05-21 | Cosmo Technologies Ltd | Emulsions or microemulsions for use in endoscopic mucosal resectioning and/or endoscopic submucosal dissection emulsioni o microemulsioni per uso nella resezione mucosale endoscopica e/o dissezione submucosale endoscopica |
| WO2016024160A1 (en) | 2014-08-11 | 2016-02-18 | Zhik Pty Ltd | Textile garment including the textile, and methods for manufacturing the textile and the garment |
| JP6516002B2 (ja) * | 2015-04-30 | 2019-05-22 | 王子ホールディングス株式会社 | コンデンサ用フィルムおよびその製造方法 |
| US9968963B2 (en) | 2015-08-31 | 2018-05-15 | Sigma Laboratories Of Arizona, Llc | Functional coating |
| CN106409980A (zh) * | 2016-11-29 | 2017-02-15 | 河南昊诚光电科技有限公司 | 保温光伏组件涂胶装置 |
| US20210214886A1 (en) | 2018-05-28 | 2021-07-15 | Xefco Pty Ltd | Insulated radiant barriers in apparel |
| US11752729B2 (en) | 2018-07-17 | 2023-09-12 | 3M Innovative Properties Company | Conformable color shifting laminates |
| GB2579871B (en) * | 2019-02-22 | 2021-07-14 | P2I Ltd | Coatings |
| KR102563018B1 (ko) * | 2020-12-10 | 2023-08-03 | (주)아이컴포넌트 | 폴더블 디스플레이용 광학 투명 복합 필름 및 이의 제조방법 |
| CN114843540B (zh) * | 2021-01-30 | 2024-08-30 | 上海韵量新能源科技有限公司 | 燃料电池堆的防泄漏密封方法 |
| CN114922003A (zh) * | 2022-04-22 | 2022-08-19 | 安徽文峰新材料科技股份有限公司 | 一种防水耐污相纸的制备方法 |
| CN117467308B (zh) * | 2023-09-22 | 2025-08-29 | 苏州星烁纳米科技有限公司 | 一种耐低压的量子点墨水及其制备方法、彩膜及显示装置 |
| CN117683456B (zh) * | 2023-12-21 | 2024-10-01 | 苏州奥美材料科技有限公司 | 一种用于生物基尼龙基材的底漆组合物及其制备方法和应用 |
| CN119735762A (zh) * | 2025-03-04 | 2025-04-01 | 成都友一包装材料有限公司 | 一种丙烯酸类乳液及其应用、乳液压敏胶 |
| CN120174330A (zh) * | 2025-05-20 | 2025-06-20 | 合肥东昇智能装备股份有限公司 | 一种复合薄膜成形生产设备及其生产方法 |
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| US3250638A (en) * | 1962-01-17 | 1966-05-10 | Frederic H Lassiter | Metal coated paper employing irradiated subbing layer |
| US4241129A (en) * | 1978-12-15 | 1980-12-23 | The Dow Chemical Company | Delamination resistant multilayer metal/polymer composites |
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| JPS63282921A (ja) * | 1987-05-15 | 1988-11-18 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造方法 |
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| US5403626A (en) * | 1990-09-27 | 1995-04-04 | Sam Yang Co., Limited | Process for preparing hydrophilic polymer films and apparatus thereof |
| US5108780A (en) * | 1991-01-28 | 1992-04-28 | Brigham Young University | Enhanced thermoplastic adhesion to fibers by using plasma discharge |
| IT1261918B (it) * | 1993-06-11 | 1996-06-04 | Cetev Cent Tecnolog Vuoto | Struttura per deposizione reattiva di metalli in impianti da vuoto continui e relativo processo. |
| US5440446A (en) * | 1993-10-04 | 1995-08-08 | Catalina Coatings, Inc. | Acrylate coating material |
-
1997
- 1997-10-28 KR KR1019970055472A patent/KR19980033213A/ko not_active Withdrawn
- 1997-10-31 KR KR1019990703867A patent/KR20000052989A/ko not_active Ceased
- 1997-10-31 CN CN97180182A patent/CN1238792A/zh active Pending
- 1997-10-31 JP JP52080098A patent/JP2001508089A/ja not_active Ceased
- 1997-10-31 WO PCT/US1997/019856 patent/WO1998018852A1/en not_active Ceased
- 1997-10-31 EP EP97913944A patent/EP0935633B1/en not_active Expired - Lifetime
- 1997-10-31 NZ NZ335300A patent/NZ335300A/xx unknown
- 1997-10-31 CA CA002269271A patent/CA2269271A1/en not_active Abandoned
- 1997-10-31 AU AU51002/98A patent/AU732631B2/en not_active Ceased
- 1997-10-31 CN CNA2004100598435A patent/CN1644608A/zh active Pending
- 1997-10-31 DE DE69734996T patent/DE69734996T2/de not_active Expired - Lifetime
- 1997-10-31 AT AT97913944T patent/ATE314414T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE69734996D1 (de) | 2006-02-02 |
| EP0935633A4 (en) | 2000-12-13 |
| JP2001508089A (ja) | 2001-06-19 |
| KR19980033213A (ko) | 1998-07-25 |
| EP0935633A1 (en) | 1999-08-18 |
| NZ335300A (en) | 2000-03-27 |
| CN1644608A (zh) | 2005-07-27 |
| AU5100298A (en) | 1998-05-22 |
| CN1238792A (zh) | 1999-12-15 |
| CA2269271A1 (en) | 1998-05-07 |
| KR20000052989A (ko) | 2000-08-25 |
| AU732631B2 (en) | 2001-04-26 |
| EP0935633B1 (en) | 2005-12-28 |
| WO1998018852A1 (en) | 1998-05-07 |
| ATE314414T1 (de) | 2006-01-15 |
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