DE69729588T2 - Verfahren und vorrichtung zur erzeugung von extrem-ultraviolettlicht für die verwendung in der fotolitographie - Google Patents

Verfahren und vorrichtung zur erzeugung von extrem-ultraviolettlicht für die verwendung in der fotolitographie Download PDF

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Publication number
DE69729588T2
DE69729588T2 DE69729588T DE69729588T DE69729588T2 DE 69729588 T2 DE69729588 T2 DE 69729588T2 DE 69729588 T DE69729588 T DE 69729588T DE 69729588 T DE69729588 T DE 69729588T DE 69729588 T2 DE69729588 T2 DE 69729588T2
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DE
Germany
Prior art keywords
gas
ultraviolet light
diffuser
extreme ultraviolet
flowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69729588T
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German (de)
English (en)
Other versions
DE69729588D1 (de
Inventor
M. Robert GUTOWSKI
S. Vincent CALIA
M. Alan TODD
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Systems Inc
Original Assignee
Advanced Energy Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Systems Inc filed Critical Advanced Energy Systems Inc
Publication of DE69729588D1 publication Critical patent/DE69729588D1/de
Application granted granted Critical
Publication of DE69729588T2 publication Critical patent/DE69729588T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69729588T 1997-02-04 1997-12-23 Verfahren und vorrichtung zur erzeugung von extrem-ultraviolettlicht für die verwendung in der fotolitographie Expired - Fee Related DE69729588T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/794,802 US6133577A (en) 1997-02-04 1997-02-04 Method and apparatus for producing extreme ultra-violet light for use in photolithography
US794802 1997-02-04
PCT/US1997/023915 WO1998034234A1 (en) 1997-02-04 1997-12-23 Method and apparatus for producing extreme ultra-violet light for use in photolithography

Publications (2)

Publication Number Publication Date
DE69729588D1 DE69729588D1 (de) 2004-07-22
DE69729588T2 true DE69729588T2 (de) 2005-06-23

Family

ID=25163724

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69729588T Expired - Fee Related DE69729588T2 (de) 1997-02-04 1997-12-23 Verfahren und vorrichtung zur erzeugung von extrem-ultraviolettlicht für die verwendung in der fotolitographie

Country Status (5)

Country Link
US (1) US6133577A (enExample)
EP (1) EP1016092B1 (enExample)
JP (1) JP2001511311A (enExample)
DE (1) DE69729588T2 (enExample)
WO (1) WO1998034234A1 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6194733B1 (en) 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
US6105885A (en) * 1998-04-03 2000-08-22 Advanced Energy Systems, Inc. Fluid nozzle system and method in an emitted energy system for photolithography
EP1068020A1 (en) * 1998-04-03 2001-01-17 Advanced Energy Systems, Inc. Fluid nozzle system , energy emission system for photolithography and its method of manufacture
US6065203A (en) * 1998-04-03 2000-05-23 Advanced Energy Systems, Inc. Method of manufacturing very small diameter deep passages
WO1999051357A1 (en) * 1998-04-03 1999-10-14 Advanced Energy Systems, Inc. Energy emission system for photolithography
AU3466899A (en) * 1998-04-03 1999-10-25 Advanced Energy Systems, Inc. Diffuser system and energy emission system for photolithography
US6190835B1 (en) * 1999-05-06 2001-02-20 Advanced Energy Systems, Inc. System and method for providing a lithographic light source for a semiconductor manufacturing process
KR100647968B1 (ko) 1999-07-22 2006-11-17 코닝 인코포레이티드 극 자외선 소프트 ｘ-선 투사 리소그라피 방법 및 마스크디바이스
US6304630B1 (en) * 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
WO2002019781A1 (en) * 2000-08-31 2002-03-07 Powerlase Limited Electromagnetic radiation generation using a laser produced plasma
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
GB0111204D0 (en) * 2001-05-08 2001-06-27 Mertek Ltd High flux,high energy photon source
US6744851B2 (en) 2002-05-31 2004-06-01 Northrop Grumman Corporation Linear filament array sheet for EUV production
US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
DE10306668B4 (de) * 2003-02-13 2009-12-10 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
DE10326279A1 (de) * 2003-06-11 2005-01-05 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Plasma-basierte Erzeugung von Röntgenstrahlung mit einem schichtförmigen Targetmaterial
US7154931B2 (en) * 2004-06-22 2006-12-26 Ksy Corporation Laser with Brayton cycle outlet pump
US7469710B1 (en) 2004-06-22 2008-12-30 Ksy Corporation Supersonic diffuser
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
CN102484938B (zh) 2009-09-01 2014-12-10 株式会社Ihi 等离子体光源
JP5578483B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP2011054376A (ja) * 2009-09-01 2011-03-17 Ihi Corp Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP5578482B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
WO2013156041A1 (en) * 2012-04-18 2013-10-24 Carl Zeiss Smt Gmbh A microlithographic apparatus and a method of changing an optical wavefront in an objective of such an apparatus
US20140166051A1 (en) * 2012-12-17 2014-06-19 Kla-Tencor Corporation Apparatus, system, and method for separating gases and mitigating debris in a controlled pressure environment
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
WO2017030948A1 (en) * 2015-08-19 2017-02-23 The Regents Of The University Of California Shock injector for low-laser energy electron injection in a laser plasma accelerator
WO2025153242A1 (en) * 2024-01-17 2025-07-24 Asml Netherlands B.V. Method and device for tuning flow velocity profile

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL292326A (enExample) * 1962-05-09
US3686528A (en) * 1969-12-05 1972-08-22 Tamarack Scient Co Inc Jet pinched plasma arc lamp and method of forming plasma arc
DE2020055A1 (de) * 1970-04-24 1971-12-02 Mueller Ernst Kg Verfahren und Vorrichtung zum UEberziehen von Gegenstaenden mit pulverfoermigen Stoffen
US3904985A (en) * 1971-12-21 1975-09-09 Us Energy Explosive laser
US3876149A (en) * 1973-04-26 1975-04-08 William J Futerko Method of forming a torch tip and torch tips
US3972474A (en) * 1974-11-01 1976-08-03 A. B. Dick Company Miniature ink jet nozzle
US4161280A (en) * 1977-10-13 1979-07-17 State Of Connecticut Method and apparatus for dispensing a deicer liquid
US4178078A (en) * 1978-09-19 1979-12-11 United Technologies Corporation Aerodynamic window
US4455470A (en) * 1981-08-14 1984-06-19 The Perkin-Elmer Corporation Plasma spray gun nozzle and coolant deionizer
US4408338A (en) * 1981-12-31 1983-10-04 International Business Machines Corporation Pulsed electromagnetic radiation source having a barrier for discharged debris
US4607167A (en) * 1982-10-19 1986-08-19 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
US4584479A (en) * 1982-10-19 1986-04-22 Varian Associates, Inc. Envelope apparatus for localized vacuum processing
US4549082A (en) * 1983-04-19 1985-10-22 Mcmillan Michael R Synthetic plasma ion source
US4560880A (en) * 1983-09-19 1985-12-24 Varian Associates, Inc. Apparatus for positioning a workpiece in a localized vacuum processing system
US4577122A (en) * 1983-12-28 1986-03-18 The Regents Of The University Of California Method and apparatus for generation of coherent VUV and XUV radiation
US4692934A (en) * 1984-11-08 1987-09-08 Hampshire Instruments X-ray lithography system
US4820927A (en) * 1985-06-28 1989-04-11 Control Data Corporation Electron beam source employing a photo-emitter cathode
LU86322A1 (fr) * 1986-02-25 1987-09-10 Arbed Lance de soufflage d'oxygene
US5204506A (en) * 1987-12-07 1993-04-20 The Regents Of The University Of California Plasma pinch surface treating apparatus and method of using same
US4830280A (en) * 1988-03-21 1989-05-16 Yankoff Gerald K Nozzle
JPH0637521Y2 (ja) * 1988-10-05 1994-09-28 高橋 柾弘 マイクロ波励起による紫外線発生装置
US5298835A (en) * 1988-07-21 1994-03-29 Electro-Plasma, Inc. Modular segmented cathode plasma generator
US5012853A (en) * 1988-09-20 1991-05-07 Sundstrand Corporation Process for making articles with smooth complex internal geometries
US4982067A (en) * 1988-11-04 1991-01-01 Marantz Daniel Richard Plasma generating apparatus and method
US5012105A (en) * 1989-02-02 1991-04-30 Nippon Seiko Kabushiki Kaisha Multiple-imaging charged particle-beam exposure system
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
US4954715A (en) * 1989-06-26 1990-09-04 Zoeld Tibor Method and apparatus for an optimized multiparameter flow-through particle and cell analyzer
US4980563A (en) * 1990-01-09 1990-12-25 United States Department Of Energy VUV lithography
US5185552A (en) * 1990-06-22 1993-02-09 Kabushiki Kaisha Toshiba Vacuum ultraviolet light source
JP2619565B2 (ja) * 1990-11-05 1997-06-11 株式会社日立製作所 電子ビーム描画装置
WO1994013010A1 (en) * 1991-04-15 1994-06-09 Fei Company Process of shaping features of semiconductor devices
US5175929A (en) * 1992-03-04 1993-01-05 General Electric Company Method for producing articles by chemical vapor deposition
US5643801A (en) * 1992-11-06 1997-07-01 Semiconductor Energy Laboratory Co., Ltd. Laser processing method and alignment
US5577091A (en) * 1994-04-01 1996-11-19 University Of Central Florida Water laser plasma x-ray point sources
US5499282A (en) * 1994-05-02 1996-03-12 University Of Central Florida Efficient narrow spectral width soft-X-ray discharge sources
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
US5644137A (en) * 1996-03-04 1997-07-01 Waggener; Herbert A. Stabilizing support mechanism for electron beam apparatus

Also Published As

Publication number Publication date
EP1016092B1 (en) 2004-06-16
EP1016092A4 (en) 2001-11-14
DE69729588D1 (de) 2004-07-22
WO1998034234A1 (en) 1998-08-06
JP2001511311A (ja) 2001-08-07
US6133577A (en) 2000-10-17
EP1016092A1 (en) 2000-07-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee