AU3466899A - Diffuser system and energy emission system for photolithography - Google Patents
Diffuser system and energy emission system for photolithographyInfo
- Publication number
- AU3466899A AU3466899A AU34668/99A AU3466899A AU3466899A AU 3466899 A AU3466899 A AU 3466899A AU 34668/99 A AU34668/99 A AU 34668/99A AU 3466899 A AU3466899 A AU 3466899A AU 3466899 A AU3466899 A AU 3466899A
- Authority
- AU
- Australia
- Prior art keywords
- photolithography
- energy emission
- diffuser
- emission system
- diffuser system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000206 photolithography Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/34—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to influence the nature of flow of the liquid or other fluent material, e.g. to produce swirl
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5503498A | 1998-04-03 | 1998-04-03 | |
US09055034 | 1998-04-03 | ||
PCT/US1999/007299 WO1999051355A1 (en) | 1998-04-03 | 1999-04-02 | Diffuser system and energy emission system for photolithography |
Publications (1)
Publication Number | Publication Date |
---|---|
AU3466899A true AU3466899A (en) | 1999-10-25 |
Family
ID=21995135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU34668/99A Abandoned AU3466899A (en) | 1998-04-03 | 1999-04-02 | Diffuser system and energy emission system for photolithography |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU3466899A (en) |
WO (1) | WO1999051355A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60143527D1 (en) * | 2000-07-28 | 2011-01-05 | Jettec Ab | METHOD AND DEVICE FOR GENERATING X-RAY RADIATION |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5487078A (en) * | 1994-03-14 | 1996-01-23 | Board Of Trustees Of The University Of Illinois | Apparatus and method for generating prompt x-radiation from gas clusters |
US5577092A (en) * | 1995-01-25 | 1996-11-19 | Kublak; Glenn D. | Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources |
US5637962A (en) * | 1995-06-09 | 1997-06-10 | The Regents Of The University Of California Office Of Technology Transfer | Plasma wake field XUV radiation source |
US6133577A (en) * | 1997-02-04 | 2000-10-17 | Advanced Energy Systems, Inc. | Method and apparatus for producing extreme ultra-violet light for use in photolithography |
JPH10221499A (en) * | 1997-02-07 | 1998-08-21 | Hitachi Ltd | Laser plasma x-ray source and device and method for exposing semiconductor using the same |
-
1999
- 1999-04-02 AU AU34668/99A patent/AU3466899A/en not_active Abandoned
- 1999-04-02 WO PCT/US1999/007299 patent/WO1999051355A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1999051355A1 (en) | 1999-10-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |