DE69726101D1 - Falle zur Trennung von Abgasen - Google Patents

Falle zur Trennung von Abgasen

Info

Publication number
DE69726101D1
DE69726101D1 DE69726101T DE69726101T DE69726101D1 DE 69726101 D1 DE69726101 D1 DE 69726101D1 DE 69726101 T DE69726101 T DE 69726101T DE 69726101 T DE69726101 T DE 69726101T DE 69726101 D1 DE69726101 D1 DE 69726101D1
Authority
DE
Germany
Prior art keywords
trap
exhaust gases
separating exhaust
separating
gases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69726101T
Other languages
English (en)
Other versions
DE69726101T2 (de
Inventor
Nobuharu Noji
Norihiko Nomura
Tetsuro Sugiura
Yuji Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Application granted granted Critical
Publication of DE69726101D1 publication Critical patent/DE69726101D1/de
Publication of DE69726101T2 publication Critical patent/DE69726101T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
DE69726101T 1996-12-16 1997-12-16 Falle zur Trennung von Abgasen Expired - Fee Related DE69726101T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35317496A JP3544604B2 (ja) 1996-12-16 1996-12-16 切替式トラップ装置
JP35317496 1996-12-16

Publications (2)

Publication Number Publication Date
DE69726101D1 true DE69726101D1 (de) 2003-12-18
DE69726101T2 DE69726101T2 (de) 2004-07-29

Family

ID=18429064

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69726101T Expired - Fee Related DE69726101T2 (de) 1996-12-16 1997-12-16 Falle zur Trennung von Abgasen

Country Status (4)

Country Link
US (1) US6158226A (de)
EP (1) EP0847789B1 (de)
JP (1) JP3544604B2 (de)
DE (1) DE69726101T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6423345B2 (en) * 1998-04-30 2002-07-23 Acusphere, Inc. Matrices formed of polymer and hydrophobic compounds for use in drug delivery
US6554879B1 (en) * 1999-08-03 2003-04-29 Ebara Corporation Trap apparatus
JP2001132638A (ja) * 1999-11-10 2001-05-18 Ebara Corp トラップ装置
US6830600B2 (en) * 2000-04-14 2004-12-14 Seagate Technology Llc Cold traps for vapor lubrication processes
JP4046474B2 (ja) * 2000-11-13 2008-02-13 株式会社荏原製作所 連続処理型トラップ装置及び該トラップ装置の運転方法
US20040211207A1 (en) * 2001-04-23 2004-10-28 Mordechai Forkosh Apparatus for conditioning air
FR2840232B1 (fr) * 2002-05-30 2004-08-27 Cit Alcatel Piege cryogenique a regeneration rapide
US6746516B2 (en) * 2002-06-10 2004-06-08 James A. Titmas Method and apparatus for treating air emissions and recovering products therefrom
JP4056829B2 (ja) * 2002-08-30 2008-03-05 東京エレクトロン株式会社 基板処理装置
US7000490B1 (en) * 2003-03-10 2006-02-21 The United States Of America As Represented By The United States Department Of Energy Thermoelectrically cooled water trap
US20080206445A1 (en) * 2007-02-22 2008-08-28 John Peck Selective separation processes
WO2007106462A2 (en) * 2006-03-14 2007-09-20 Praxair Technology, Inc. Temperature controlled cold trap for a vapour deposition process and uses thereof
JP5133013B2 (ja) * 2007-09-10 2013-01-30 東京エレクトロン株式会社 成膜装置の排気系構造、成膜装置、および排ガスの処理方法
JP5460982B2 (ja) * 2008-07-30 2014-04-02 東京エレクトロン株式会社 弁体、粒子進入阻止機構、排気制御装置及び基板処理装置
KR101605914B1 (ko) * 2010-10-04 2016-03-23 현대자동차주식회사 전기자동차의 냉난방장치
GB2489975A (en) * 2011-04-14 2012-10-17 Edwards Ltd Vacuum pumping system
TWI472678B (zh) * 2011-08-08 2015-02-11 Inotera Memories Inc 排氣裝置
TWI588286B (zh) * 2013-11-26 2017-06-21 烏翠泰克股份有限公司 經改良的電漿強化原子層沉積方法、周期及裝置
CN112604804A (zh) * 2020-12-14 2021-04-06 西安新程万创信息技术有限公司 一种密闭性好的广告制作用喷绘漆研磨装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1229984B (de) * 1961-07-19 1966-12-08 Polycarbona Chemie G M B H Vorrichtung zum kontinuierlichen Abscheiden von Phthalsaeure- und Maleinsaeureanhydrid aus diese enthaltenden Gasen
NL127840C (de) * 1963-08-17
US3719052A (en) * 1971-05-04 1973-03-06 G White Vacuum system cold trap
JPS58106186A (ja) * 1981-12-18 1983-06-24 Hitachi Ltd トラツプ装置
JPS58133586A (ja) * 1982-02-01 1983-08-09 富士写真フイルム株式会社 シリコン製造時における廃ガスの処理方法
JPS60156983A (ja) * 1984-01-25 1985-08-17 Hitachi Ltd コ−ルドトラツプ
US4551197A (en) * 1984-07-26 1985-11-05 Guilmette Joseph G Method and apparatus for the recovery and recycling of condensable gas reactants
JPS6138178A (ja) * 1984-07-27 1986-02-24 Hitachi Ltd 真空排気装置
JPH01110880A (ja) * 1987-09-08 1989-04-27 Ulvac Corp コールドトラップを備えた真空排気系
JPH01178787A (ja) * 1988-01-08 1989-07-14 Hitachi Ltd 真空ポンプの切替式トラップ装置
US5010737A (en) * 1989-03-30 1991-04-30 Aisin Seiki Kabushiki Kaisha Multi-headed cryopump apparatus
JP3019471B2 (ja) * 1991-06-11 2000-03-13 株式会社日立製作所 クライオポンプ
JPH0666255A (ja) * 1992-08-18 1994-03-08 Sony Corp 真空装置
DE4438874A1 (de) * 1994-10-31 1996-05-02 Bayer Ag Verfahren zur Reinigung von Abluftströmen durch Kristallisation oder Kondensation aus der Dampfphase
US5687575A (en) * 1996-04-29 1997-11-18 Regents Of The University Of California Miniature thermo-electric cooled cryogenic pump

Also Published As

Publication number Publication date
US6158226A (en) 2000-12-12
EP0847789A1 (de) 1998-06-17
JP3544604B2 (ja) 2004-07-21
EP0847789B1 (de) 2003-11-12
JPH10176662A (ja) 1998-06-30
DE69726101T2 (de) 2004-07-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee