DE69723053D1 - Verfahren zur beschichtung eines substrates mit titandioxid - Google Patents
Verfahren zur beschichtung eines substrates mit titandioxidInfo
- Publication number
- DE69723053D1 DE69723053D1 DE69723053T DE69723053T DE69723053D1 DE 69723053 D1 DE69723053 D1 DE 69723053D1 DE 69723053 T DE69723053 T DE 69723053T DE 69723053 T DE69723053 T DE 69723053T DE 69723053 D1 DE69723053 D1 DE 69723053D1
- Authority
- DE
- Germany
- Prior art keywords
- coating
- substrate
- titanium dioxide
- dioxide
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9600210.0A GB9600210D0 (en) | 1996-01-05 | 1996-01-05 | Improved sputtering targets and method for the preparation thereof |
GB9600210 | 1996-01-05 | ||
PCT/EP1997/000021 WO1997025450A1 (en) | 1996-01-05 | 1997-01-03 | Process for coating a substrate with titanium dioxide |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69723053D1 true DE69723053D1 (de) | 2003-07-31 |
DE69723053T2 DE69723053T2 (de) | 2004-05-19 |
Family
ID=10786662
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69715592T Revoked DE69715592T2 (de) | 1996-01-05 | 1997-01-03 | Sputter-targets sowie verfahren zu deren herstellung |
DE69723053T Expired - Lifetime DE69723053T2 (de) | 1996-01-05 | 1997-01-03 | Verfahren zur beschichtung eines substrates mit titandioxid |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69715592T Revoked DE69715592T2 (de) | 1996-01-05 | 1997-01-03 | Sputter-targets sowie verfahren zu deren herstellung |
Country Status (12)
Country | Link |
---|---|
US (11) | US6461686B1 (de) |
EP (2) | EP0871792B1 (de) |
JP (3) | JP3980643B2 (de) |
KR (1) | KR100510609B1 (de) |
CN (2) | CN1208495C (de) |
AU (2) | AU716603B2 (de) |
BR (1) | BR9706954A (de) |
CA (1) | CA2241878C (de) |
DE (2) | DE69715592T2 (de) |
GB (1) | GB9600210D0 (de) |
IL (1) | IL125103A0 (de) |
WO (2) | WO1997025451A1 (de) |
Families Citing this family (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69633631T2 (de) * | 1995-08-23 | 2005-10-20 | Asahi Glass Ceramics Co., Ltd. | Target, verfahren zu dessen herstellung und herstellung hochrefraktiver filme |
GB9600210D0 (en) * | 1996-01-05 | 1996-03-06 | Vanderstraeten E Bvba | Improved sputtering targets and method for the preparation thereof |
US6292302B1 (en) | 1998-11-03 | 2001-09-18 | Cardinal Glass Industries, Inc. | Heat-treatable dichroic mirrors |
US6262850B1 (en) | 1998-11-03 | 2001-07-17 | Cardinal Glass Industries, Inc. | Heat-treatable dichroic mirrors |
GB2363131C (en) † | 1998-12-21 | 2007-10-09 | Cardinal Ig Co | Soil-resistant coating for glass surfaces |
DE19958424C2 (de) * | 1999-12-03 | 2002-05-29 | Zentrum Fuer Material Und Umwe | Zerstäubungstarget für die Dünnbeschichtung großflächiger Substrate und Verfahren zu seiner Herstellung |
CN1158403C (zh) * | 1999-12-23 | 2004-07-21 | 西南交通大学 | 一种人工器官表面改性方法 |
WO2001071055A1 (en) * | 2000-03-22 | 2001-09-27 | Nippon Sheet Glass Co., Ltd. | Substrate with photocatalytic film and method for producing the same |
JP3708429B2 (ja) * | 2000-11-30 | 2005-10-19 | Hoya株式会社 | 蒸着組成物の製造方法、蒸着組成物及び反射防止膜を有する光学部品の製造方法 |
EP1352105A2 (de) * | 2001-01-17 | 2003-10-15 | N.V. Bekaert S.A. | Targets für das photokatalytische sputtern und verfahren zur herstellung und verwendung davon |
DE10140514A1 (de) | 2001-08-17 | 2003-02-27 | Heraeus Gmbh W C | Sputtertarget auf Basis von Titandioxid |
EP1437609A4 (de) * | 2001-10-18 | 2004-11-17 | Bridgestone Corp | Optisches element und herstellungsverfahren dafür und bandpassfilter, nah-infrarot-sperrfilter und antireflexfilm |
US20040115362A1 (en) * | 2002-01-14 | 2004-06-17 | Klause Hartig | Photocatalytic sputtering targets and methods for the production and use thereof |
US7063893B2 (en) | 2002-04-29 | 2006-06-20 | Cardinal Cg Company | Low-emissivity coating having low solar reflectance |
KR20020077852A (ko) * | 2002-08-30 | 2002-10-14 | 주식회사 새롬원 | 김서림방지용 유리판 |
AU2003301622A1 (en) * | 2002-10-24 | 2004-05-13 | Honeywell International Inc | Target designs and related methods for enhanced cooling and reduced deflection and deformation |
US20040149307A1 (en) * | 2002-12-18 | 2004-08-05 | Klaus Hartig | Reversible self-cleaning window assemblies and methods of use thereof |
DE10320472A1 (de) * | 2003-05-08 | 2004-12-02 | Kolektor D.O.O. | Plasmabehandlung zur Reinigung von Kupfer oder Nickel |
US6915095B2 (en) * | 2003-06-16 | 2005-07-05 | Xerox Corporation | Charging member having titanium oxide outer coating on grit blasted substrate |
ATE550456T1 (de) * | 2003-10-07 | 2012-04-15 | Deposition Sciences Inc | Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid |
DE10359508B4 (de) * | 2003-12-18 | 2007-07-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Magnetronsputtern |
CA2550331A1 (en) * | 2003-12-22 | 2005-07-14 | Cardinal Cg Compagny | Graded photocatalytic coatings |
KR100968907B1 (ko) | 2004-02-25 | 2010-07-14 | 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 | 열안정화된 아화학량론적 유전체 |
EP1733870A1 (de) * | 2004-04-06 | 2006-12-20 | Teijin Dupont Films Japan Limited | Antireflexionsfilm |
US20080271988A1 (en) * | 2004-06-29 | 2008-11-06 | Yasuo Hosoda | Thin Film Forming Sputtering Target, Dielectric Thin Film, Optical Disc and Production Method Therefor |
DE102004032635A1 (de) * | 2004-07-06 | 2006-02-09 | Gfe Metalle Und Materialien Gmbh | Verfahren zur Herstellung eines Titan-Suboxid-basierten Beschichtungswerkstoff, entsprechend hergestellter Beschichtungswerkstoff und damit versehenes Sputtertarget |
ATE377579T1 (de) | 2004-07-12 | 2007-11-15 | Cardinal Cg Co | Wartungsarme beschichtungen |
WO2006020697A2 (en) * | 2004-08-10 | 2006-02-23 | Cardinal Cg Company | Lcd mirror system and method |
DE602005024993D1 (de) * | 2004-10-04 | 2011-01-05 | Cardinal Cg Co | Dünnfilmbeschichtung und technologie zum zeitweiligen schutz, isolierverglasungseinheiten und dazugehörige verfahren |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
US7968216B2 (en) * | 2005-01-08 | 2011-06-28 | Toyoda Gosei Co., Ltd. | Internal gear pump |
US7442933B2 (en) * | 2005-02-03 | 2008-10-28 | Lin Alice L | Bolometer having an amorphous titanium oxide layer with high resistance stability |
FR2881757B1 (fr) * | 2005-02-08 | 2007-03-30 | Saint Gobain | Procede d'elaboration par projection thermique d'une cible a base de silicium et de zirconium |
US8053048B2 (en) * | 2005-04-25 | 2011-11-08 | Baxter International Inc. | Overpouch film and container and method of making same |
DE102005029952B3 (de) * | 2005-06-28 | 2007-01-11 | Lanxess Deutschland Gmbh | Niveauausgleichslasche |
US7342716B2 (en) | 2005-10-11 | 2008-03-11 | Cardinal Cg Company | Multiple cavity low-emissivity coatings |
US8435388B2 (en) * | 2005-11-01 | 2013-05-07 | Cardinal Cg Company | Reactive sputter deposition processes and equipment |
US20070134500A1 (en) * | 2005-12-14 | 2007-06-14 | Klaus Hartig | Sputtering targets and methods for depositing film containing tin and niobium |
JP5129975B2 (ja) | 2006-04-11 | 2013-01-30 | 日本板硝子株式会社 | 向上した低保守特性を有する光触媒コーティング |
JP2009534563A (ja) | 2006-04-19 | 2009-09-24 | 日本板硝子株式会社 | 同等の単独の表面反射率を有する対向機能コーティング |
DE102006027029B4 (de) * | 2006-06-09 | 2010-09-30 | W.C. Heraeus Gmbh | Sputtertarget mit einem Sputtermaterial auf Basis TiO2 sowie Herstellverfahren |
US20070289869A1 (en) * | 2006-06-15 | 2007-12-20 | Zhifei Ye | Large Area Sputtering Target |
EP2035340B1 (de) * | 2006-06-30 | 2016-03-09 | Cardinal CG Company | Verfahren zur glasierung von kohlenstoffnanoröhrchen |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
KR20090091175A (ko) * | 2006-11-17 | 2009-08-26 | 쌩-고벵 글래스 프랑스 | 유기 발광 소자용 전극, 산 식각 및 이를 포함하는 유기 발광 소자 |
US7807248B2 (en) | 2007-08-14 | 2010-10-05 | Cardinal Cg Company | Solar control low-emissivity coatings |
US7622717B2 (en) * | 2007-08-22 | 2009-11-24 | Drs Sensors & Targeting Systems, Inc. | Pixel structure having an umbrella type absorber with one or more recesses or channels sized to increase radiation absorption |
EP2066594B1 (de) | 2007-09-14 | 2016-12-07 | Cardinal CG Company | Pflegeleichte beschichtungen und verfahren zur herstellung pflegeleichter beschichtungen |
US7655274B2 (en) † | 2007-11-05 | 2010-02-02 | Guardian Industries Corp. | Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings |
JP4993745B2 (ja) * | 2007-12-28 | 2012-08-08 | 株式会社アルバック | 成膜装置 |
US20130026535A1 (en) * | 2011-07-26 | 2013-01-31 | Battelle Energy Alliance, Llc | Formation of integral composite photon absorber layer useful for photoactive devices and sensors |
US9371226B2 (en) | 2011-02-02 | 2016-06-21 | Battelle Energy Alliance, Llc | Methods for forming particles |
US8324414B2 (en) | 2009-12-23 | 2012-12-04 | Battelle Energy Alliance, Llc | Methods of forming single source precursors, methods of forming polymeric single source precursors, and single source precursors and intermediate products formed by such methods |
US8003070B2 (en) * | 2008-03-13 | 2011-08-23 | Battelle Energy Alliance, Llc | Methods for forming particles from single source precursors |
US8951446B2 (en) | 2008-03-13 | 2015-02-10 | Battelle Energy Alliance, Llc | Hybrid particles and associated methods |
US20090272641A1 (en) * | 2008-04-30 | 2009-11-05 | Applied Materials, Inc. | Sputter target, method for manufacturing a layer, particularly a tco (transparent conductive oxide) layer, and method for manufacturing a thin layer solar cell |
EP2116631A1 (de) * | 2008-04-30 | 2009-11-11 | Applied Materials, Inc. | Sputtertarget |
JP5624712B2 (ja) * | 2008-09-01 | 2014-11-12 | 豊田合成株式会社 | TiO2からなる導電性透明層の製造方法及び当該導電性透明層の製造方法を利用した半導体発光素子の製造方法 |
JP2010231172A (ja) * | 2009-03-04 | 2010-10-14 | Seiko Epson Corp | 光学物品およびその製造方法 |
FR2944293B1 (fr) * | 2009-04-10 | 2012-05-18 | Saint Gobain Coating Solutions | Procede d'elaboration par projection thermique d'une cible |
JP5588135B2 (ja) * | 2009-08-10 | 2014-09-10 | ホーヤ レンズ マニュファクチャリング フィリピン インク | 光学物品の製造方法 |
JP2012032690A (ja) * | 2010-08-02 | 2012-02-16 | Seiko Epson Corp | 光学物品およびその製造方法 |
DE102010048089B4 (de) * | 2010-10-01 | 2016-09-01 | Carl Zeiss Vision International Gmbh | Verfahren zur Erzeugung einer mehrere Schichten aufweisenden antistatischen Beschichtung für ein Linsenelement |
CN103814151B (zh) | 2011-06-27 | 2016-01-20 | 梭莱有限公司 | Pvd靶材及其铸造方法 |
CN102286717B (zh) * | 2011-09-01 | 2013-07-03 | 基迈克材料科技(苏州)有限公司 | 以等离子喷涂制备圆柱形大面积镀膜靶材及方法 |
DE102011116062A1 (de) * | 2011-10-18 | 2013-04-18 | Sintertechnik Gmbh | Keramisches Erzeugnis zur Verwendung als Target |
EP2613358A2 (de) * | 2012-01-04 | 2013-07-10 | OC Oerlikon Balzers AG | Doppelschichtige Antireflexbeschichtung für siliziumbasierte Solarzellenmodule |
DE102012112739A1 (de) * | 2012-10-23 | 2014-04-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Licht absorbierendes Schichtsystem und dessen Herstellung sowie dafür geeignetes Sputtertarget |
DE102012022237A1 (de) | 2012-11-14 | 2014-05-15 | Heraeus Materials Technology Gmbh & Co. Kg | Sputtertarget mit optimierten Gebrauchseigenschaften |
US9758856B2 (en) | 2013-02-05 | 2017-09-12 | Soleras Advanced Coatings Bvba | (Ga) Zn Sn oxide sputtering target |
RU2013158730A (ru) * | 2013-12-27 | 2015-07-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Самарский государственный аэрокосмический университет имени академика С.П. Королева" (национальный исследовательский университет)" (СГАУ) | Способ изготовления катодной мишени для распыления керамических материалов |
JP5784849B2 (ja) * | 2015-01-21 | 2015-09-24 | 三井金属鉱業株式会社 | セラミックス円筒形スパッタリングターゲット材およびその製造方法 |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
HUE059508T2 (hu) * | 2017-03-14 | 2022-11-28 | Materion Advanced Mat Germany Gmbh | Hengeres titán-oxid porlasztási céltárgy és eljárás elõállítására |
DE102017118172A1 (de) * | 2017-08-09 | 2019-02-14 | Forplan AG | Beschichtungsverfahren, Beschichtungsvorrichtung zur Durchführung dieses Verfahrens und Beschichtungsanlage mit einer solchen Beschichtungsvorrichtung |
CN110257790B (zh) * | 2019-07-29 | 2020-07-03 | 福建阿石创新材料股份有限公司 | 一种三氧化二铝-TiOx靶材及其制备方法和应用 |
WO2023097583A1 (zh) * | 2021-12-01 | 2023-06-08 | 宁德时代新能源科技股份有限公司 | 一种掺杂氧化镍靶材及其制备方法和应用 |
Family Cites Families (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US232680A (en) | 1880-09-28 | Peters | ||
US1231280A (en) | 1916-11-16 | 1917-06-26 | John F Metten | Safety-valve. |
US1438462A (en) | 1919-04-17 | 1922-12-12 | Skf Svenska Kullagerfab Ab | Shock indicator |
US1595061A (en) | 1922-10-17 | 1926-08-03 | Valerius Johann | Electric cut-out |
GB232680A (en) | 1924-01-23 | 1925-04-23 | Metal & Thermit Corp | Improvements in the production of a form of titanium oxide |
US3616445A (en) | 1967-12-14 | 1971-10-26 | Electronor Corp | Titanium or tantalum base electrodes with applied titanium or tantalum oxide face activated with noble metals or noble metal oxides |
DE2300422C3 (de) * | 1973-01-05 | 1981-10-15 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung einer Elektrode |
DE2405010C3 (de) | 1974-02-02 | 1982-08-05 | Sigri Elektrographit Gmbh, 8901 Meitingen | Sinter-Elektrode für elektrochemische Prozesse und Verfahren zum Herstellen der Elektrode |
GB1595061A (en) * | 1976-11-22 | 1981-08-05 | Atomic Energy Authority Uk | Electrically conductive layers produced by plasma spraying |
DE2752875C2 (de) | 1977-11-26 | 1986-05-15 | Sigri GmbH, 8901 Meitingen | Elektrode für elektrochemische Prozesse und Verfahren zu deren Herstellung |
GB2028376B (en) | 1978-08-23 | 1982-11-03 | Ppg Industries Inc | Electrically conductive coatings |
US4216259A (en) | 1979-01-02 | 1980-08-05 | Bfg Glassgroup | Heat reflecting pane and a method of producing it |
US4422917A (en) * | 1980-09-10 | 1983-12-27 | Imi Marston Limited | Electrode material, electrode and electrochemical cell |
DE3039821A1 (de) * | 1980-10-22 | 1982-06-03 | Robert Bosch Gmbh, 7000 Stuttgart | Mehrschichtsystem fuer waermeschutzanwendung |
US4336119A (en) | 1981-01-29 | 1982-06-22 | Ppg Industries, Inc. | Method of and apparatus for control of reactive sputtering deposition |
US4422916A (en) * | 1981-02-12 | 1983-12-27 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US5126218A (en) | 1985-04-23 | 1992-06-30 | Clarke Robert L | Conductive ceramic substrate for batteries |
JPS62161945A (ja) | 1985-08-20 | 1987-07-17 | Toyo Soda Mfg Co Ltd | セラミックス系スパッタリングタ−ゲットの製造法 |
JPS63178474A (ja) | 1987-01-19 | 1988-07-22 | 日立金属株式会社 | 長波長赤外線を放射する発熱体 |
US4931213A (en) | 1987-01-23 | 1990-06-05 | Cass Richard B | Electrically-conductive titanium suboxides |
JPH0812302B2 (ja) * | 1987-11-02 | 1996-02-07 | 株式会社日立製作所 | チタン酸化物薄膜の製造方法 |
US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
US4861680A (en) | 1988-02-11 | 1989-08-29 | Southwall Technologies | Bronze-grey glazing film and window made therefrom |
US5605609A (en) | 1988-03-03 | 1997-02-25 | Asahi Glass Company Ltd. | Method for forming low refractive index film comprising silicon dioxide |
US5354446A (en) * | 1988-03-03 | 1994-10-11 | Asahi Glass Company Ltd. | Ceramic rotatable magnetron sputtering cathode target and process for its production |
US5196400A (en) * | 1990-08-17 | 1993-03-23 | At&T Bell Laboratories | High temperature superconductor deposition by sputtering |
US5105310A (en) | 1990-10-11 | 1992-04-14 | Viratec Thin Films, Inc. | Dc reactively sputtered antireflection coatings |
US5100527A (en) * | 1990-10-18 | 1992-03-31 | Viratec Thin Films, Inc. | Rotating magnetron incorporating a removable cathode |
US5616263A (en) * | 1992-11-09 | 1997-04-01 | American Roller Company | Ceramic heater roller |
US5589280A (en) | 1993-02-05 | 1996-12-31 | Southwall Technologies Inc. | Metal on plastic films with adhesion-promoting layer |
US5489369A (en) | 1993-10-25 | 1996-02-06 | Viratec Thin Films, Inc. | Method and apparatus for thin film coating an article |
GB9324069D0 (en) | 1993-11-23 | 1994-01-12 | Glaverbel | A glazing unit and a method for its manufacture |
US5451457A (en) | 1993-12-20 | 1995-09-19 | Libbey-Owens-Ford Co. | Method and material for protecting glass surfaces |
JPH07215074A (ja) | 1994-02-07 | 1995-08-15 | Toyota Motor Corp | 車両用アンダーカバー装置 |
JP3836163B2 (ja) * | 1994-02-22 | 2006-10-18 | 旭硝子セラミックス株式会社 | 高屈折率膜の形成方法 |
US5616225A (en) | 1994-03-23 | 1997-04-01 | The Boc Group, Inc. | Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
JPH08134638A (ja) | 1994-11-04 | 1996-05-28 | Asahi Glass Co Ltd | チタン酸化物膜の成膜方法 |
US5593786A (en) | 1994-11-09 | 1997-01-14 | Libbey-Owens-Ford Company | Self-adhering polyvinyl chloride safety glass interlayer |
DE4441206C2 (de) | 1994-11-19 | 1996-09-26 | Leybold Ag | Einrichtung für die Unterdrückung von Überschlägen in Kathoden-Zerstäubungseinrichtungen |
US5574079A (en) | 1994-12-21 | 1996-11-12 | Union Carbide Chemicals & Plastics Technology Corporation | Method for the preparation of water-borne coating compositions using thermoplastic polyhydroxyether resins having narrow polydispersity |
ES2124048T3 (es) | 1995-07-08 | 1999-01-16 | Leybold Ag | Sistema catodico para un dispositivo de pulverizacion sobre un objeto. |
WO1997003763A1 (en) | 1995-07-24 | 1997-02-06 | Southwall Technologies Inc. | Improved laminate structure and process for its production |
US5743931A (en) | 1995-08-14 | 1998-04-28 | Libbey-Owens-Ford Co. | Glass sheet conveying and bending apparatus |
DE69633631T2 (de) | 1995-08-23 | 2005-10-20 | Asahi Glass Ceramics Co., Ltd. | Target, verfahren zu dessen herstellung und herstellung hochrefraktiver filme |
JPH09189801A (ja) | 1996-01-09 | 1997-07-22 | Shin Etsu Chem Co Ltd | 耐熱性反射防止膜付き光学部品 |
GB9600210D0 (en) * | 1996-01-05 | 1996-03-06 | Vanderstraeten E Bvba | Improved sputtering targets and method for the preparation thereof |
AU1577697A (en) | 1996-01-11 | 1997-08-01 | Libbey-Owens-Ford Co. | Coated glass article having a solar control coating |
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1996
- 1996-01-05 GB GBGB9600210.0A patent/GB9600210D0/en active Pending
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1997
- 1997-01-03 WO PCT/EP1997/000020 patent/WO1997025451A1/en active IP Right Grant
- 1997-01-03 BR BR9706954-0A patent/BR9706954A/pt not_active IP Right Cessation
- 1997-01-03 KR KR10-1998-0705120A patent/KR100510609B1/ko not_active IP Right Cessation
- 1997-01-03 AU AU14390/97A patent/AU716603B2/en not_active Ceased
- 1997-01-03 CN CNB971925933A patent/CN1208495C/zh not_active Expired - Fee Related
- 1997-01-03 CN CNA2005100713029A patent/CN1727514A/zh active Pending
- 1997-01-03 DE DE69715592T patent/DE69715592T2/de not_active Revoked
- 1997-01-03 EP EP97900563A patent/EP0871792B1/de not_active Expired - Lifetime
- 1997-01-03 US US09/101,405 patent/US6461686B1/en not_active Expired - Lifetime
- 1997-01-03 JP JP52484697A patent/JP3980643B2/ja not_active Expired - Fee Related
- 1997-01-03 CA CA002241878A patent/CA2241878C/en not_active Expired - Fee Related
- 1997-01-03 AU AU13100/97A patent/AU1310097A/en not_active Abandoned
- 1997-01-03 JP JP52484597A patent/JP4087447B2/ja not_active Expired - Fee Related
- 1997-01-03 EP EP97900954A patent/EP0871794B1/de not_active Revoked
- 1997-01-03 IL IL12510397A patent/IL125103A0/xx unknown
- 1997-01-03 DE DE69723053T patent/DE69723053T2/de not_active Expired - Lifetime
- 1997-01-03 WO PCT/EP1997/000021 patent/WO1997025450A1/en active IP Right Grant
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2000
- 2000-06-08 US US09/589,098 patent/US6468402B1/en not_active Expired - Fee Related
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2001
- 2001-01-12 US US09/759,661 patent/US20010019738A1/en not_active Abandoned
- 2001-02-12 US US09/780,537 patent/US20010010288A1/en not_active Abandoned
- 2001-07-05 US US09/899,581 patent/US20020071971A1/en not_active Abandoned
- 2001-09-28 US US09/966,636 patent/US20020081465A1/en not_active Abandoned
- 2001-10-19 US US10/032,901 patent/US20020127349A1/en not_active Abandoned
- 2001-12-05 US US10/001,964 patent/US6511587B2/en not_active Expired - Fee Related
- 2001-12-07 US US10/008,949 patent/US20020125129A1/en not_active Abandoned
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2003
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2006
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