DE69719151D1 - Verarbeitungssystem - Google Patents

Verarbeitungssystem

Info

Publication number
DE69719151D1
DE69719151D1 DE69719151T DE69719151T DE69719151D1 DE 69719151 D1 DE69719151 D1 DE 69719151D1 DE 69719151 T DE69719151 T DE 69719151T DE 69719151 T DE69719151 T DE 69719151T DE 69719151 D1 DE69719151 D1 DE 69719151D1
Authority
DE
Germany
Prior art keywords
processing system
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69719151T
Other languages
English (en)
Other versions
DE69719151T2 (de
Inventor
Masami Akimoto
Issei Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of DE69719151D1 publication Critical patent/DE69719151D1/de
Application granted granted Critical
Publication of DE69719151T2 publication Critical patent/DE69719151T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
DE69719151T 1996-11-19 1997-11-18 Verarbeitungssystem Expired - Lifetime DE69719151T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32340396A JP3774283B2 (ja) 1996-11-19 1996-11-19 処理システム

Publications (2)

Publication Number Publication Date
DE69719151D1 true DE69719151D1 (de) 2003-03-27
DE69719151T2 DE69719151T2 (de) 2003-12-04

Family

ID=18154334

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69719151T Expired - Lifetime DE69719151T2 (de) 1996-11-19 1997-11-18 Verarbeitungssystem

Country Status (6)

Country Link
US (2) US6126703A (de)
EP (1) EP0843343B1 (de)
JP (1) JP3774283B2 (de)
DE (1) DE69719151T2 (de)
SG (1) SG67441A1 (de)
TW (1) TW354406B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3926890B2 (ja) * 1997-06-11 2007-06-06 東京エレクトロン株式会社 処理システム
US6533531B1 (en) * 1998-12-29 2003-03-18 Asml Us, Inc. Device for handling wafers in microelectronic manufacturing
US6293713B1 (en) * 1999-07-02 2001-09-25 Tokyo Electron Limited Substrate processing apparatus
JP3635214B2 (ja) * 1999-07-05 2005-04-06 東京エレクトロン株式会社 基板処理装置
TW511169B (en) 2000-02-01 2002-11-21 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method
US6395648B1 (en) 2000-02-25 2002-05-28 Wafermasters, Inc. Wafer processing system
JP3943828B2 (ja) * 2000-12-08 2007-07-11 東京エレクトロン株式会社 塗布、現像装置及びパターン形成方法
JP3916473B2 (ja) * 2002-01-31 2007-05-16 東京エレクトロン株式会社 基板処理装置および基板処理方法
US20030168175A1 (en) * 2002-03-08 2003-09-11 Kim Kyung-Tae Substrate alignment apparatus
DE10217028C1 (de) * 2002-04-11 2003-11-20 Nanophotonics Ag Meßmodul für Waferfertigungsanlagen
WO2006124472A2 (en) * 2005-05-12 2006-11-23 Applied Materials, Inc. Method and apparatus for vertical transfer of semiconductor substrates in a cleaning module
JP5132920B2 (ja) * 2006-11-22 2013-01-30 東京エレクトロン株式会社 塗布・現像装置および基板搬送方法、ならびにコンピュータプログラム
JP4853374B2 (ja) * 2007-04-27 2012-01-11 東京エレクトロン株式会社 塗布、現像装置及びその方法並びに記憶媒体
JP4464993B2 (ja) * 2007-06-29 2010-05-19 東京エレクトロン株式会社 基板の処理システム
JP4684268B2 (ja) * 2007-08-30 2011-05-18 株式会社アルバック 真空処理装置、基板搬送方法
KR101681185B1 (ko) * 2014-11-04 2016-12-02 세메스 주식회사 인터페이스 모듈 및 이를 포함하는 기판 처리 장치 및 방법
CN110817391B (zh) * 2019-11-24 2021-09-07 湖南凯通电子有限公司 基板装卸机

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4584045A (en) * 1984-02-21 1986-04-22 Plasma-Therm, Inc. Apparatus for conveying a semiconductor wafer
JPS61123150A (ja) * 1985-10-23 1986-06-11 Hitachi Ltd 製造装置
JPS62213259A (ja) * 1986-03-14 1987-09-19 Shinkawa Ltd バツフア装置
US4917556A (en) * 1986-04-28 1990-04-17 Varian Associates, Inc. Modular wafer transport and processing system
US5030057A (en) * 1987-11-06 1991-07-09 Tel Sagami Limited Semiconductor wafer transferring method and apparatus and boat for thermal treatment of a semiconductor wafer
JPH0617295Y2 (ja) * 1987-11-27 1994-05-02 大日本スクリーン製造株式会社 基板受け渡し装置
US5202716A (en) * 1988-02-12 1993-04-13 Tokyo Electron Limited Resist process system
KR970003907B1 (ko) * 1988-02-12 1997-03-22 도오교오 에레구토론 가부시끼 가이샤 기판처리 장치 및 기판처리 방법
US5024570A (en) * 1988-09-14 1991-06-18 Fujitsu Limited Continuous semiconductor substrate processing system
US5061144A (en) * 1988-11-30 1991-10-29 Tokyo Electron Limited Resist process apparatus
JPH04209110A (ja) * 1990-11-30 1992-07-30 Matsushita Electric Ind Co Ltd バッファー装置
KR970011065B1 (ko) * 1992-12-21 1997-07-05 다이닛뽕 스크린 세이조오 가부시키가이샤 기판처리장치와 기판처리장치에 있어서 기판교환장치 및 기판교환방법
JPH07164273A (ja) * 1993-12-16 1995-06-27 Deisuko Eng Service:Kk ２層テーブルを有する搬出入装置
JPH07297258A (ja) * 1994-04-26 1995-11-10 Tokyo Electron Ltd 板状体の搬送装置
US5826129A (en) * 1994-06-30 1998-10-20 Tokyo Electron Limited Substrate processing system
TW297910B (de) * 1995-02-02 1997-02-11 Tokyo Electron Co Ltd
US5788868A (en) * 1995-09-04 1998-08-04 Dainippon Screen Mfg. Co., Ltd. Substrate transfer method and interface apparatus
JP3734295B2 (ja) * 1995-09-04 2006-01-11 大日本スクリーン製造株式会社 基板搬送装置

Also Published As

Publication number Publication date
SG67441A1 (en) 1999-09-21
EP0843343A3 (de) 2000-01-12
DE69719151T2 (de) 2003-12-04
EP0843343A2 (de) 1998-05-20
TW354406B (en) 1999-03-11
US6126703A (en) 2000-10-03
EP0843343B1 (de) 2003-02-19
JPH10150089A (ja) 1998-06-02
US6264705B1 (en) 2001-07-24
JP3774283B2 (ja) 2006-05-10

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Legal Events

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