DE69705545T2 - Vorrichtung zur züchtung von grossen siliziumkarbideinkristallen - Google Patents

Vorrichtung zur züchtung von grossen siliziumkarbideinkristallen

Info

Publication number
DE69705545T2
DE69705545T2 DE69705545T DE69705545T DE69705545T2 DE 69705545 T2 DE69705545 T2 DE 69705545T2 DE 69705545 T DE69705545 T DE 69705545T DE 69705545 T DE69705545 T DE 69705545T DE 69705545 T2 DE69705545 T2 DE 69705545T2
Authority
DE
Germany
Prior art keywords
crucible
silicon carbide
stepped surface
bordered
furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69705545T
Other languages
English (en)
Other versions
DE69705545D1 (de
Inventor
L Barrett
G Seidensticker
H Hopkins
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Northrop Grumman Corp
Original Assignee
Northrop Grumman Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northrop Grumman Corp filed Critical Northrop Grumman Corp
Application granted granted Critical
Publication of DE69705545D1 publication Critical patent/DE69705545D1/de
Publication of DE69705545T2 publication Critical patent/DE69705545T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
DE69705545T 1997-01-31 1997-01-31 Vorrichtung zur züchtung von grossen siliziumkarbideinkristallen Expired - Lifetime DE69705545T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1997/001864 WO1998033961A1 (en) 1997-01-31 1997-01-31 Apparatus for growing large silicon carbide single crystals

Publications (2)

Publication Number Publication Date
DE69705545D1 DE69705545D1 (de) 2001-08-09
DE69705545T2 true DE69705545T2 (de) 2001-10-25

Family

ID=22260338

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69705545T Expired - Lifetime DE69705545T2 (de) 1997-01-31 1997-01-31 Vorrichtung zur züchtung von grossen siliziumkarbideinkristallen

Country Status (5)

Country Link
EP (1) EP0956381B1 (de)
JP (1) JP4052678B2 (de)
AT (1) ATE202807T1 (de)
DE (1) DE69705545T2 (de)
WO (1) WO1998033961A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009016132A1 (de) * 2009-04-03 2010-10-07 Sicrystal Ag Verfahren zur Herstellung eines langen Volumeneinkristalls aus SiC oder AIN und langer Volumeneinkristall aus SiC oder AIN

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4903946B2 (ja) 2000-12-28 2012-03-28 株式会社ブリヂストン 炭化ケイ素単結晶の製造方法及び製造装置
JP2012046424A (ja) * 2000-12-28 2012-03-08 Bridgestone Corp 炭化ケイ素単結晶
JP4480349B2 (ja) * 2003-05-30 2010-06-16 株式会社ブリヂストン 炭化ケイ素単結晶の製造方法及び製造装置
JP4888548B2 (ja) * 2009-12-24 2012-02-29 株式会社デンソー 炭化珪素単結晶の製造装置および製造方法
JP5440260B2 (ja) * 2010-03-02 2014-03-12 住友電気工業株式会社 炭化珪素結晶の製造方法およびその製造装置
KR101398048B1 (ko) 2012-01-16 2014-05-30 동의대학교 산학협력단 단결정 성장 장치
JP2016532629A (ja) * 2013-09-06 2016-10-20 ジーティーエイティー コーポレーションＧｔａｔ Ｃｏｒｐｏｒａｔｉｏｎ 炭化ケイ素前駆体からのバルクの炭化ケイ素の製造方法及び装置
KR102163489B1 (ko) * 2013-12-05 2020-10-07 재단법인 포항산업과학연구원 탄화규소(SiC) 단결정 성장 장치
JP2017065934A (ja) * 2015-09-28 2017-04-06 住友電気工業株式会社 炭化珪素単結晶の製造方法
KR101908043B1 (ko) * 2016-12-23 2018-10-16 주식회사 포스코 대구경 단결정 성장장치
CN112694090B (zh) * 2020-12-18 2022-11-29 北京汇琨新材料有限公司 一种改进的碳化硅原料合成方法
CN113846382A (zh) * 2021-09-27 2021-12-28 哈尔滨科友半导体产业装备与技术研究院有限公司 一种适用于生长大厚度SiC单晶的装置及方法
CN114873570B (zh) * 2022-07-11 2022-09-27 山西中科潞安半导体技术研究院有限公司 一种采用pvt法提纯氮化铝粉末的方法及装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3230727A1 (de) * 1982-08-18 1984-02-23 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von siliziumkarbid
US4866005A (en) * 1987-10-26 1989-09-12 North Carolina State University Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide
JPH05330995A (ja) * 1992-06-04 1993-12-14 Sharp Corp 炭化珪素単結晶の製造方法及びその装置
US5441011A (en) * 1993-03-16 1995-08-15 Nippon Steel Corporation Sublimation growth of single crystal SiC

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009016132A1 (de) * 2009-04-03 2010-10-07 Sicrystal Ag Verfahren zur Herstellung eines langen Volumeneinkristalls aus SiC oder AIN und langer Volumeneinkristall aus SiC oder AIN
DE102009016132B4 (de) * 2009-04-03 2012-12-27 Sicrystal Ag Verfahren zur Herstellung eines langen Volumeneinkristalls aus SiC oder AlN und langer Volumeneinkristall aus SiC oder AlN

Also Published As

Publication number Publication date
EP0956381B1 (de) 2001-07-04
DE69705545D1 (de) 2001-08-09
JP2001509769A (ja) 2001-07-24
WO1998033961A1 (en) 1998-08-06
EP0956381A1 (de) 1999-11-17
ATE202807T1 (de) 2001-07-15
JP4052678B2 (ja) 2008-02-27

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