DE69703941D1 - Photopolymerisierbare Zusammensetzung für eine photoempfindliche lithographische Druckplatte und die Druckplatte, die diese Zusammensetzung verwendet - Google Patents

Photopolymerisierbare Zusammensetzung für eine photoempfindliche lithographische Druckplatte und die Druckplatte, die diese Zusammensetzung verwendet

Info

Publication number
DE69703941D1
DE69703941D1 DE69703941T DE69703941T DE69703941D1 DE 69703941 D1 DE69703941 D1 DE 69703941D1 DE 69703941 T DE69703941 T DE 69703941T DE 69703941 T DE69703941 T DE 69703941T DE 69703941 D1 DE69703941 D1 DE 69703941D1
Authority
DE
Germany
Prior art keywords
printing plate
composition
photosensitive lithographic
lithographic printing
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69703941T
Other languages
English (en)
Other versions
DE69703941T2 (de
Inventor
Shigeo Tsuji
Hideaki Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa NV
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Application granted granted Critical
Publication of DE69703941D1 publication Critical patent/DE69703941D1/de
Publication of DE69703941T2 publication Critical patent/DE69703941T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE69703941T 1996-02-29 1997-02-26 Photopolymerisierbare Zusammensetzung für eine photoempfindliche lithographische Druckplatte und die Druckplatte, die diese Zusammensetzung verwendet Expired - Fee Related DE69703941T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4325996 1996-02-29
JP10247696 1996-04-24

Publications (2)

Publication Number Publication Date
DE69703941D1 true DE69703941D1 (de) 2001-03-01
DE69703941T2 DE69703941T2 (de) 2001-08-09

Family

ID=26383009

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69703941T Expired - Fee Related DE69703941T2 (de) 1996-02-29 1997-02-26 Photopolymerisierbare Zusammensetzung für eine photoempfindliche lithographische Druckplatte und die Druckplatte, die diese Zusammensetzung verwendet

Country Status (3)

Country Link
US (1) US5800965A (de)
EP (1) EP0793145B1 (de)
DE (1) DE69703941T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0851299B1 (de) * 1996-12-26 2000-10-25 Mitsubishi Chemical Corporation Photoempfindliche lithographische Druckplatte
JP3907144B2 (ja) * 1998-04-09 2007-04-18 富士フイルム株式会社 平版印刷版の製造方法、レーザ走査露光用平版印刷版原版、および光重合性組成物
US6153356A (en) * 1998-08-17 2000-11-28 Mitsubishi Chemical Corporation Photopolymerizable composition, photopolymerizable lithographic printing plate and process for forming an image
US6537723B1 (en) * 1998-10-05 2003-03-25 Nippon Telegraph And Telephone Corporation Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
US6232038B1 (en) 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
JP2001033961A (ja) * 1999-07-23 2001-02-09 Fuji Photo Film Co Ltd 感光性組成物および平版印刷版の製版方法
US6558875B1 (en) 1999-07-27 2003-05-06 Mitsubishi Chemical Corporation Method for treating photosensitive lithographic printing plate
EP1739484B1 (de) * 2000-04-19 2011-08-24 AGFA Graphics NV Lichtempfindliche lithografische Druckplatte und Verfahren zur Herstellung einer Druckplatte
JP4839525B2 (ja) 2000-09-29 2011-12-21 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
US6899994B2 (en) 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US20040259027A1 (en) * 2001-04-11 2004-12-23 Munnelly Heidi M. Infrared-sensitive composition for printing plate precursors
US6846614B2 (en) 2002-02-04 2005-01-25 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates
US7056639B2 (en) * 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
JP2003066593A (ja) * 2001-08-28 2003-03-05 Konica Corp 平版印刷版の作製方法
JP2004115673A (ja) * 2002-09-26 2004-04-15 Fuji Photo Film Co Ltd 重合性組成物
WO2004035546A1 (en) * 2002-10-15 2004-04-29 Showa Denko K. K. Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same
US7368215B2 (en) * 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
ATE491968T1 (de) 2003-07-22 2011-01-15 Fujifilm Corp Flachdruckplattenvorläufer und lithographisches druckverfahren
JP4167148B2 (ja) * 2003-08-22 2008-10-15 富士フイルム株式会社 画像記録材料
US20060001849A1 (en) * 2004-07-01 2006-01-05 Ray Kevin B Imaging a violet sensitive printing plate using multiple low power light sources
WO2006059564A1 (ja) * 2004-11-30 2006-06-08 Daicel Chemical Industries, Ltd. 脂環式エポキシ（メタ）アクリレート及びその製造方法、並びに共重合体
US20080008957A1 (en) * 2006-06-27 2008-01-10 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable elements
KR101420868B1 (ko) * 2007-07-16 2014-08-13 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR100950978B1 (ko) 2009-07-15 2010-04-01 (주)보문피앤에프 발효인삼 및 그 제조방법
CN110687748B (zh) * 2019-11-08 2023-04-07 杭州志英科技有限公司 光敏型树脂组合物及其制品

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527364A (en) * 1975-07-08 1977-01-20 Senju Metal Industry Co Method of manufacture of spheroidal metal particle
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
GB2219591B (en) * 1988-05-17 1992-01-22 Kansai Paint Co Ltd Radiation curable unsaturated resin
US5153102A (en) * 1990-08-10 1992-10-06 Industrial Technology Research Institute Alkalline-solution-developable liquid photographic composition
DE4102173A1 (de) * 1991-01-25 1992-07-30 Basf Ag Lagerstabile loesung eines carboxylgruppenhaltigen copolymerisats sowie verfahren zur herstellung von photoempfindlichen lacken und offsetdruckplatten
JPH04270345A (ja) * 1991-02-26 1992-09-25 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JPH06138659A (ja) * 1992-10-27 1994-05-20 Tamura Kaken Kk 感光性樹脂組成物
JP3187569B2 (ja) * 1992-11-10 2001-07-11 東京応化工業株式会社 感光性樹脂組成物及びこれを用いたｐｓ版
US5650233A (en) * 1995-01-05 1997-07-22 Daicel Chemical Industries, Ltd. Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition

Also Published As

Publication number Publication date
DE69703941T2 (de) 2001-08-09
EP0793145A1 (de) 1997-09-03
EP0793145B1 (de) 2001-01-24
US5800965A (en) 1998-09-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: LASTRA S.P.A., MANERBIO, IT

8327 Change in the person/name/address of the patent owner

Owner name: AGFA GRAPHICS N.V., MORTSEL, BE

8339 Ceased/non-payment of the annual fee